公开(公告)号：US20080076128A1

公开(公告)日：2008-03-27

申请号：US11748175

申请日：2007-05-14

申请人： Jung-hwan HAH ,  Sung-min Chi ,  Kyoung-seon Kim ,  Won-sun Kim

发明人： Jung-hwan HAH ,  Sung-min Chi ,  Kyoung-seon Kim ,  Won-sun Kim

IPC分类号： C12Q1/68

CPC分类号： B01J19/0046 ,  B01J2219/00382 ,  B01J2219/00432 ,  B01J2219/00527 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/00659 ,  B01J2219/00711 ,  B01J2219/00722 ,  B82Y30/00 ,  C40B50/18

摘要： A method of manufacturing a microarray includes providing a substrate having a surface that is immobilized with a functional group protected with an acid-labile protecting group and capable of coupling with an oligomer probe, providing a photoacid generator onto the substrate, disposing on the substrate an imprint template comprising a convex region and a plurality of concave regions surrounding the convex region so that the convex region contacts with or is adjacent to an upper surface of the substrate to define a plurality of reaction zones by the upper surface of the substrate and the convex region and the concave regions of the imprint template, exposing one or more of the reaction zones to light so that an acid is generated by the photoacid generator in the one or more exposed reaction zones and a functional group in the one or more exposed reaction zones is deprotected by the acid, and providing an oligomer probe onto the substrate so that the oligomer probe couples with the deprotected functional group.

摘要翻译： 一种制造微阵列的方法包括提供具有固定有被酸不稳定保护基团保护的官能团并且能够与低聚物探针耦合的表面的基底，在基底上提供光致酸产生剂，在基底上设置 压印模板，其包括凸区域和围绕所述凸区域的多个凹区域，使得所述凸区域与所述衬底的上表面接触或邻近所述衬底的上表面，以通过所述衬底的上表面和所述凸起部分限定多个反应区域 区域和压印模板的凹区域，使一个或多个反应区域曝光，使得在一个或多个暴露的反应区域中的光酸产生剂产生酸，并且在一个或多个暴露的反应区域中的官能团 通过酸脱保护，并在基底上提供低聚物探针，使得寡聚物探针与沉淀物结合 无效的功能组。

公开(公告)号：US20080038712A1

公开(公告)日：2008-02-14

申请号：US11686492

申请日：2007-03-15

申请人： Jung-hwan Hah ,  Sung-min Chi ,  Kyoung-seon Kim ,  Won-sun Kim

发明人： Jung-hwan Hah ,  Sung-min Chi ,  Kyoung-seon Kim ,  Won-sun Kim

IPC分类号： G01N33/53

CPC分类号： B01J19/0046 ,  B01J2219/00317 ,  B01J2219/00605 ,  B01J2219/00662 ,  B01J2219/00722

摘要： An oligomer probe array with improved signal-to-noise ratio and desired detection sensitivity ever when a reduced design rule is employed includes a substrate, a plurality of probe cell active regions formed on or in the substrate, each of the plurality of probe cell active regions having a three-dimensional surface and being coupled, with at least one oligomer probe with its own sequence, and a probe cell isolation region defining the probe cell active regions and having no functional groups for coupling with the oligomer probes on a surface.

摘要翻译： 当采用减少的设计规则时，具有改进的信噪比和期望的检测灵敏度的低聚物探针阵列包括：衬底，形成在衬底上或衬底中的多个探针单元有源区，多个探针单元中的每个探针单元活性 具有三维表面并与其自身序列的至少一个低聚物探针偶联的区域和限定探针细胞活性区并且不具有用于与表面上的低聚物探针偶联的官能团的探针细胞隔离区。

公开(公告)号：US20070258867A1

公开(公告)日：2007-11-08

申请号：US11738042

申请日：2007-04-20

申请人： Sung-min Chi ,  Jung-hwan Hah ,  Kyoung-seon Kim ,  Won-sun Kim

发明人： Sung-min Chi ,  Jung-hwan Hah ,  Kyoung-seon Kim ,  Won-sun Kim

IPC分类号： B01J19/00

CPC分类号： C40B60/14 ,  B01J19/0046 ,  B01J2219/00286 ,  B01J2219/00389 ,  B01J2219/00432 ,  B01J2219/00527 ,  B01J2219/00533 ,  B01J2219/00536 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/00659 ,  B01J2219/00675 ,  B01J2219/00689 ,  B01J2219/00722 ,  B01J2219/00725 ,  B82Y30/00

摘要： A biopolymer synthesis apparatus including at least one chamber in which a biopolymer is to be synthesized includes a chamber body and a chamber cover covering the chamber body, wherein the chamber cover includes at least one through hole at an upper surface thereof, and at least one first fluid-supply pipe coupled with the chamber via the at least one through-hole of the chamber cover.

摘要翻译： 一种生物聚合物合成装置，其包括要合成生物聚合物的至少一个室，包括室主体和覆盖室主体的室盖，其中室盖在其上表面包括至少一个通孔，以及至少一个 第一流体供应管通过腔室盖的至少一个通孔与腔室连接。

公开(公告)号：US20090093380A1

公开(公告)日：2009-04-09

申请号：US12149141

申请日：2008-04-28

申请人： Chang-eun Yoo ,  Sung-min Chi

发明人： Chang-eun Yoo ,  Sung-min Chi

IPC分类号： C40B50/18

CPC分类号： B01J19/0046 ,  B01J2219/00432 ,  B01J2219/00439 ,  B01J2219/00529 ,  B01J2219/00596 ,  B01J2219/00608 ,  B01J2219/00659 ,  B01J2219/00675 ,  B01J2219/00711 ,  B01J2219/00722 ,  B01J2219/00725 ,  B82Y30/00 ,  C40B50/14

摘要： Provided is a method of manufacturing a polymer array by photolithography in which a molecule containing a photolabile protecting group is reacted with a surface of a substrate, and then a photosensitizer is coated on the surface of the substrate together with a coating material and the resulting substrate is exposed to light to perform a photochemical reaction. Even by using conventional semiconductor equipment and compounds without separately fabricating light exposure equipment or synthesizing a compound, a polymer array may be effectively manufactured by photolithography with lower exposure energy (shorter period of time).

摘要翻译： 本发明提供一种通过光刻法制造聚合物阵列的方法，其中含有光不稳定保护基的分子与基底的表面反应，然后将光敏剂与涂层材料一起涂覆在基材的表面上，并将得到的基底 曝光以进行光化学反应。 即使通过使用常规的半导体设备和化合物而不单独制造曝光设备或合成化合物，聚合物阵列可以通过光刻以较低的曝光能量（较短的时间）有效地制造。