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公开(公告)号：US4683834A
公开(公告)日：1987-08-04
申请号：US830882
申请日：1986-02-19
申请人： Masashi Fujimoto , Kazuo Okazaki
发明人： Masashi Fujimoto , Kazuo Okazaki
摘要： A wire chain connector for an anchor line has a swivel coupled to a rope socket via a link, and a ball adapter mounted on the outer periphery of the link. A wire rope groove is formed in the inner surface of a peripheral groove in a sheave to allow a wire rope to pass along it. A chain pocket is formed in the central portion of the peripheral groove in the sheave to allow a chain to pass along it. A connector groove is formed in the outer surface of the peripheral groove in the sheave to allow the anchor line to pass along it. The body of the swivel and the ball adapter are so sized that they can be seated in the connector groove.
摘要翻译： 用于锚定线的线链连接器具有通过连接件连接到绳索插座的旋转件，以及安装在连杆的外周上的球适配器。 钢丝绳槽形成在绳轮中的周边槽的内表面中，以允许钢丝绳沿着其移动。 在槽轮中的周边槽的中心部分形成有一个链袋，以使链条沿着其传递。 在滑轮中的周边槽的外表面中形成连接器槽，以允许锚定线沿其延伸。 旋转体和球适配器的主体的尺寸使得它们可以安置在连接器凹槽中。
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22.发明授权Pattern forming method, semiconductor device manufacturing method and phase shift photomask having dummy gate patterns 有权图案形成方法，半导体器件制造方法和具有虚拟栅极图案的相移光掩模公开(公告)号：US08617797B2
公开(公告)日：2013-12-31
申请号：US13484966
申请日：2012-05-31
申请人： Masashi Fujimoto
发明人： Masashi Fujimoto
IPC分类号： H01L21/00
摘要： A method for manufacturing a semiconductor device that includes a plurality of gate patterns in parallel with each other within one circuit block provided over a semiconductor substrate includes preparing a first photomask, performing a first photolithography process upon a photoresist layer within a circuit block by using the first photomask, preparing a second photomask that includes a trim photomask having at least one trim opening corresponding to a dummy gate pattern to remove a portion of the photoresist layer corresponding to the dummy gate pattern, and performing a second photolithography process upon the photoresist layer by using the second photomask.
摘要翻译： 一种制造半导体器件的方法，该半导体器件包括在半导体衬底上提供的一个电路块内彼此并联的多个栅极图案，包括制备第一光掩模，通过使用第一光掩模，在电路块内的光刻胶层上进行第一光刻工艺 第一光掩模，制备第二光掩模，其包括修整光掩模，所述修整光掩模具有对应于伪栅极图案的至少一个修剪开口，以去除对应于所述伪栅极图案的所述光致抗蚀剂层的一部分，以及对所述光致抗蚀剂层进行第二光刻工艺， 使用第二个光掩模。
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公开(公告)号：US20090211389A1
公开(公告)日：2009-08-27
申请号：US12285081
申请日：2008-09-29
IPC分类号： F16H61/26
CPC分类号： F16H63/20 , F16H61/32 , F16H61/688 , F16H2061/2892 , F16H2063/025 , F16H2063/208 , F16H2063/3083 , F16H2063/3086 , Y10T74/19279 , Y10T74/20104 , Y10T74/20177
摘要： A gear change control system of an automatic transmission, includes: a shift member, including a shaft portion disposed in such a manner that a selection axis is oriented in a selecting direction, and including a pair of arm portions formed on the shaft portion in such a manner as to project therefrom; shift rail members, having rail shaft portions, and arranged in such a manner that shift axes are oriented in a shifting direction; shift fork portions, formed on the rail shaft portions; shift lug members, formed on the rail shaft portions and including pillar-shaped portions. The pair of the arm portions swing about the selection axis to apply a pressure in the shifting direction from one side of the pillar-shaped portion by one of the arm portions so as to cause the shift fork portion to perform a shift making operation, and to apply a pressure in the shifting direction from the other side of the pillar-shaped portion by the other arm portion so as to cause the shift fork portion to perform a shift withdrawing operation.
摘要翻译： 一种自动变速器的变速控制系统，包括：换挡构件，包括以选择轴线选择方向设置的轴部，并且包括形成在轴部上的一对臂部 从中推出的方式; 换档导轨构件，具有轨道轴部，并且以使变速轴在换档方向上定向的方式布置; 形成在轨道轴部上的换挡叉部; 形成在轨道轴部上并且包括柱状部分的换档凸耳构件。 一对臂部围绕选择轴线摆动，通过其中一个臂部分从柱状部分的一侧向移动方向施加压力，以使换档拨叉部分进行换档操作， 通过另一个臂部从柱状部分的另一侧施加沿换档方向的压力，从而使换档拨叉部分进行换档操作。
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公开(公告)号：US20090205456A1
公开(公告)日：2009-08-20
申请号：US12285080
申请日：2008-09-29
CPC分类号： F16H61/32 , F16H61/688 , F16H63/20 , F16H2061/2892 , F16H2063/025 , F16H2063/208 , Y10T74/19251 , Y10T74/20104 , Y10T74/20177 , Y10T74/20183
摘要： A gear change control system of an automatic transmission, include: a shift member, including a shaft portion which is s disposed in such a manner that a selection axis thereof is oriented in a selecting direction and including an arm portion; shift fork portions, operable to make gear shifts of gears; shift rail members, connected to the sift fork portions and arranged in such a manner that shift axes thereof are oriented in a shifting direction; and shift lug members, projecting from the shift rail members and including pillar-shaped portions. The arm portion swings about the selection axis to apply a pressure in the shifting direction from one side of the pillar-shaped portion so as to cause the shift fork portion to perform a shift making operation, and to apply a pressure in the shifting direction from the other side of the pillar-shaped portion so as to cause the shift fork portion to perform a shift withdrawing operation.
摘要翻译： 一种自动变速器的变速控制系统，包括：换档构件，其包括轴部，该轴部以使其选择轴在选择方向上定向并且包括臂部的方式设置; 换档拨叉部分，可操作以进行齿轮换档; 移动轨道构件，其连接到所述筛子叉部并且以使其换档轴沿换档方向定向的方式布置; 以及从换档导轨构件突出并且包括柱状部分的换档凸耳构件。 臂部围绕选择轴线摆动以从柱状部分的一侧施加沿换档方向的压力，从而使换档拨叉部分进行换档操作，并且向变速方向施加压力 柱状部分的另一侧，以使换档拨叉部分执行换档操作。
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公开(公告)号：US07537864B2
公开(公告)日：2009-05-26
申请号：US11020131
申请日：2004-12-27
申请人： Masashi Fujimoto , Seiji Matsuura
发明人： Masashi Fujimoto , Seiji Matsuura
CPC分类号： G03F7/70441 , G03F1/36 , G03F7/70433
摘要： A method of designing hole patterns for arranging hole patterns on a pattern drawing of a photomask used during an exposure process in semiconductor integrated circuit manufacturing, wherein a grid is provided on the pattern drawing with a space smaller than a minimum pitch allowed by the design rule of the semiconductor integrated circuit, and the hole patterns are provided at lattice points, which are the intersections of the grid. Flexibility of hole pattern arrangement is improved and the quality of hole pattern arrangement can be easily evaluated.
摘要翻译： 一种设计用于在半导体集成电路制造中的曝光处理期间使用的光掩模的图案上布置孔图案的孔图案的方法，其中，在图案图形上设置格栅，其间距小于设计规则允许的最小间距 的半导体集成电路，并且在格栅点设置孔图案，栅格点是网格的交点。 孔图案布置的灵活性得到改善，并且可以容易地评估孔图案布置的质量。
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公开(公告)号：US20080085592A1
公开(公告)日：2008-04-10
申请号：US11600057
申请日：2006-11-16
申请人： Masashi Fujimoto
发明人： Masashi Fujimoto
IPC分类号： H01L21/3205
CPC分类号： H01L21/32139 , G03F1/70 , H01L21/823437 , H01L27/0207 , H01L27/105
摘要： A predetermined pattern containing a plurality of gate patterns, in the process of formation thereof, is classified into fine gate patterns and the other patterns (S102), and a hard mask film is formed on a process target film (S106). Next, a first resist film having a fine first pattern is formed on the hard mask film, and the hard mask film is then patterned (S108). Thereafter, a resist film having a separate pattern is formed on the hard mask film, and a process target film is selectively dry-etched through the hard mask film and the resist film used as masks (S110 and S112).
摘要翻译： 在其形成过程中，包含多个栅极图案的预定图案分为精细栅极图案和其它图案（S102），并且在处理目标膜上形成硬掩模膜（S106）。 接下来，在硬掩模膜上形成具有微细的第一图案的第一抗蚀剂膜，然后对硬掩模膜进行图案化（S108）。 此后，在硬掩模膜上形成具有单独图案的抗蚀剂膜，并且通过硬掩模膜和用作掩模的抗蚀剂膜选择性地干蚀刻处理目标膜（S110和S112）。
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公开(公告)号：US20070297837A1
公开(公告)日：2007-12-27
申请号：US11896695
申请日：2007-09-05
申请人： Masashi Fujimoto
发明人： Masashi Fujimoto
IPC分类号： G03G15/20
CPC分类号： G03G15/2053
摘要： A fixing roller 30, which has an internal heating device and is supported to rotate around a cylindrical shaft 40, and a pressure roller 81 whose circumferential face presses against the fixing roller 30, and which is supported to rotate around the pressure roller axle 82, are mounted in a housing 11, so that, by passing paper P to which a toner image has been transferred, a fixing process is performed on this toner image. The fixing roller 30 is mounted in the housing 11 by heat resistant bushings 50, which are fitted on both ends of the cylindrical shaft 40. Annular grooves 41 are arranged on the cylindrical shaft 40 for receiving C-shaped retaining rings 70, for preventing the heat resistant bushings 50 from coming off. The heat resistant bushings 50 and the retaining rings 70 engage with each other to rotate in unison around the cylindrical shaft 40.
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28.发明申请Photomask, photomask set, photomask design method, and photomask set design method 审中-公开光掩模，光掩模组，光掩模设计方法和光掩模集设计方法公开(公告)号：US20060259893A1
公开(公告)日：2006-11-16
申请号：US11116350
申请日：2005-04-28
申请人： Masashi Fujimoto
发明人： Masashi Fujimoto
CPC分类号： G06F17/5068 , G03F1/26 , G03F1/70
摘要： There is provided a photomask in which influences of line-end shortening and corner rounding of a gate pattern are suppressed. A block having a plurality of gate electrodes are formed in the photomask, all of the longitudinal directions of the plurality of gate electrodes in each block are equal to each other, and the patterns of the plurality of gate electrodes are extended to an end of the block in the longitudinal direction.
摘要翻译： 提供了一种光栅，其中抑制了栅极图案的线端缩短和拐角四舍五入的影响。 在光掩模中形成具有多个栅电极的块，每个块中的多个栅电极的所有纵向方向彼此相等，并且多个栅电极的图案延伸到 沿纵向阻塞。
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29.发明申请Image processing alignment method and method of manufacturing semiconductor device 失效图像处理对准方法及制造半导体器件的方法公开(公告)号：US20050082693A1
公开(公告)日：2005-04-21
申请号：US10986661
申请日：2004-11-12
申请人： Masashi Fujimoto
发明人： Masashi Fujimoto
IPC分类号： H01L21/027 , G03F9/00 , H01L23/544 , H01L21/8238
CPC分类号： G03F9/7092 , G03F9/7076 , H01L23/544 , H01L2223/5442 , H01L2223/54426 , H01L2223/54453 , H01L2223/5446 , H01L2924/0002 , H01L2924/00
摘要： An alignment mark is arranged to be within an image screen and the alignment mark is formed with rectangular patterns having varied dimensions from each other. The signal waveforms from each of the rectangular patterns are measured. The number of the rectangular patterns with normal waveforms is compared to the minimum required number of marks prescribed beforehand. The amount of deviation in alignment is calculated by excluding the abnormal measured result.
摘要翻译： 对准标记被布置成在图像屏幕内，并且对准标记形成为具有彼此变化的尺寸的矩形图案。 测量来自每个矩形图案的信号波形。 将具有正常波形的矩形图案的数量与预先规定的最小所需数量进行比较。 通过排除异常测量结果计算排列偏差量。
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30.发明授权Wafer alignment mark for image processing including rectangular patterns, image processing alignment method and method of manufacturing semiconductor device 失效包括矩形图案的图像处理的晶片对准标记，图像处理对准方法以及制造半导体器件的方法公开(公告)号：US06841890B2
公开(公告)日：2005-01-11
申请号：US10408349
申请日：2003-04-08
申请人： Masashi Fujimoto
发明人： Masashi Fujimoto
IPC分类号： H01L21/027 , G03F9/00 , H01L23/544
CPC分类号： G03F9/7092 , G03F9/7076 , H01L23/544 , H01L2223/5442 , H01L2223/54426 , H01L2223/54453 , H01L2223/5446 , H01L2924/0002 , H01L2924/00
摘要： An alignment mark is arranged to be within an image screen and the alignment mark is formed with rectangular patterns having varied dimensions from each other. The signal waveforms from each of the rectangular patterns are measured. The number of the rectangular patterns with normal waveforms is compared to the minimum required number of marks prescribed beforehand. The amount of deviation in alignment is calculated by excluding the abnormal measured result.
摘要翻译： 对准标记被布置成在图像屏幕内，并且对准标记形成为具有彼此变化的尺寸的矩形图案。 测量来自每个矩形图案的信号波形。 将具有正常波形的矩形图案的数量与预先规定的最小所需数量进行比较。 通过排除异常测量结果计算排列偏差量。
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