公开(公告)号：US06660448B2

公开(公告)日：2003-12-09

申请号：US09986274

申请日：2001-11-08

申请人： Seiichiro Tachibana ,  Mutsuo Nakashima ,  Tsunehiro Nishi ,  Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe ,  Jun Hatakeyama

发明人： Seiichiro Tachibana ,  Mutsuo Nakashima ,  Tsunehiro Nishi ,  Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe ,  Jun Hatakeyama

IPC分类号： C08F2400

CPC分类号： C08F222/06 ,  C08F232/08 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： The invention provides a polymer comprising recurring units containing bridged aliphatic rings in the backbone and having a hydroxyl, acyloxy or alkoxylcarbonyloxy group as well as a lactone structure bonded through a spacer, the polymer having a weight average molecular weight of 1,000-500,000. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.

公开(公告)号：US06500961B2

公开(公告)日：2002-12-31

申请号：US09867656

申请日：2001-05-31

申请人： Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

发明人： Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

IPC分类号： C07D30720

CPC分类号： C07D307/33 ,  G03F7/0395

摘要： Lactone compounds of formula (1) are useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography. R1 is H or C1-6 alkyl, R2 is H or an acyl or alkoxycarbonyl group of 1-15 carbon atoms which may be substituted with halogen atoms, Z is a divalent C1-15 organic group which forms a lactone ring with the carbonyloxy group, k is 0 or 1, and m is an integer from 0 to 5.

摘要翻译： 式（1）的内酯化合物可用作单体以形成适用于微图案光刻的化学放大抗蚀剂组合物的基础树脂.R1为H或C1-6烷基，R2为H或1-15碳的酰基或烷氧基羰基 可以被卤素原子取代的原子，Z是与羰基氧基形成内酯环的二价C1-15有机基团，k为0​​或1，m为0-5的整数。

公开(公告)号：US06472543B2

公开(公告)日：2002-10-29

申请号：US09897985

申请日：2001-07-05

申请人： Takeshi Kinsho ,  Takeru Watanabe ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

发明人： Takeshi Kinsho ,  Takeru Watanabe ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

IPC分类号： C07D40700

CPC分类号： C07D315/00 ,  G03F7/0395

摘要： Lactone compounds of formula (1) are novel and useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography. Letter k is 0 or 1 and m is an integer of 1-8.

摘要翻译： 式（1）的内酯化合物是新颖的并且可用作单体以形成适用于微图案光刻的化学放大抗蚀剂组合物的基础树脂。引发剂k为0或1，m为1-8的整数。

公开(公告)号：US06403823B2

公开(公告)日：2002-06-11

申请号：US09842006

申请日：2001-04-26

申请人： Koji Hasegawa ,  Takeru Watanabe ,  Takeshi Kinsho ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Tsunehiro Nishi ,  Jun Hatakeyama

发明人： Koji Hasegawa ,  Takeru Watanabe ,  Takeshi Kinsho ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Tsunehiro Nishi ,  Jun Hatakeyama

IPC分类号： C07C6974

CPC分类号： G03F7/039 ,  C07C67/343 ,  C07C69/732

摘要： Ester compounds of formula (1) are useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography. R1 is H or C1-6 alkyl, R2 is an unsubstituted or halo-substituted acyl or alkoxycarbonyl group of 1-15 carbon atoms, R3 is an acid labile group, k is 0 or 1, and m is an integer from 0 to 5.

摘要翻译： 式（1）的酯化合物可用作单体以形成适用于微图案光刻的化学放大抗蚀剂组合物的基础树脂.R1是H或C1-6烷基，R2是未取代的或卤素取代的酰基或烷氧基羰基， -15个碳原子，R3是酸不稳定基团，k是0或1，m是0-5的整数。

公开(公告)号：US20070218402A1

公开(公告)日：2007-09-20

申请号：US11713709

申请日：2007-03-05

申请人： Takeshi Kinsho ,  Mutsuo Nakashima ,  Koji Hasegawa ,  Takeru Watanabe

发明人： Takeshi Kinsho ,  Mutsuo Nakashima ,  Koji Hasegawa ,  Takeru Watanabe

IPC分类号： G03C1/00

CPC分类号： G03F7/0757 ,  C07F7/1804 ,  G03F7/0045 ,  G03F7/0046 ,  Y10S430/106 ,  Y10S430/108

摘要： Fluorine-containing silicon compounds having the general formula (1): wherein X1, X2, and X3 each are hydrogen, hydroxyl, halogen, a straight, branched or cyclic alkoxy group of 1 to 6 carbon atoms, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, Y is a divalent organic group, R1 and R2 are each independently hydrogen or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, or R1 and R2 may bond together to form a ring with the carbon atom to which they are attached silicone resins obtained from the compounds of formula (1) has an appropriate acidity to enable formation of a finer pattern while minimizing the pattern collapse by swelling when used in a resist composition.

摘要翻译： 具有通式（1）的含氟硅化合物：其中X 1，X 2和X 3各自为氢，羟基， 卤素，1〜6个碳原子的直链，支链或环状烷氧基，或具有直链，支链，环状或多环骨架的1〜20个碳原子的一价有机基团，Y为二价有机基团， 1和R 2各自独立地为氢或具有直链，支链，环状或多环骨架的1至20个碳原子的一价有机基团，或R 1 >和R 2可以键合在一起形成与它们所连接的碳原子形成的环，由式（1）化合物获得的有机硅树脂具有适当的酸度以使得能够形成更精细的图案，同时 当在抗蚀剂组合物中使用时，通过溶胀使图案崩溃最小化。

公开(公告)号：US07485408B2

公开(公告)日：2009-02-03

申请号：US11713709

申请日：2007-03-05

申请人： Takeshi Kinsho ,  Mutsuo Nakashima ,  Koji Hasegawa ,  Takeru Watanabe

发明人： Takeshi Kinsho ,  Mutsuo Nakashima ,  Koji Hasegawa ,  Takeru Watanabe

IPC分类号： G03C1/73 ,  G03F7/075 ,  G03F7/039 ,  G03F7/20 ,  G03F7/30

CPC分类号： G03F7/0757 ,  C07F7/1804 ,  G03F7/0045 ,  G03F7/0046 ,  Y10S430/106 ,  Y10S430/108

摘要： Fluorine-containing silicon compounds having the general formula (1): wherein X1, X2, and X3 each are hydrogen, hydroxyl, halogen, a straight, branched or cyclic alkoxy group of 1 to 6 carbon atoms, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, Y is a divalent organic group, R1 and R2 are each independently hydrogen or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, or R1 and R2 may bond together to form a ring with the carbon atom to which they are attached silicone resins obtained from the compounds of formula (1) has an appropriate acidity to enable formation of a finer pattern while minimizing the pattern collapse by swelling when used in a resist composition.

摘要翻译： 具有通式（1）的含氟硅化合物：其中X 1，X 2和X 3各自为氢，羟基，卤素，1至6个碳原子的直链，支链或环状烷氧基或1价有机基团1 具有直链，支链，环状或多环骨架的20个碳原子，Y为二价有机基团，R 1和R 2各自独立地为氢或具有直链，支链，环状或多环骨架的1〜20个碳原子的一价有机基团 ，或者R 1和R 2可以键合在一起形成与它们所连接的碳原子一起形成的环。由式（1）化合物获得的有机硅树脂具有适当的酸度以使得形成更精细的图案同时最小化图案由于膨胀膨胀 当用于抗蚀剂组合物时。

公开(公告)号：US5650092A

公开(公告)日：1997-07-22

申请号：US545889

申请日：1995-10-20

申请人： Takaaki Shimizu ,  Takeshi Kinsho ,  Tsutomu Ogihara ,  Tatsushi Kaneko ,  Mutsuo Nakashima ,  Hideshi Kurihara

发明人： Takaaki Shimizu ,  Takeshi Kinsho ,  Tsutomu Ogihara ,  Tatsushi Kaneko ,  Mutsuo Nakashima ,  Hideshi Kurihara

IPC分类号： C07F7/08 ,  C07F7/12 ,  C09K19/40 ,  C09K19/34 ,  C09K19/52

CPC分类号： C09K19/406 ,  C07F7/0818 ,  C07F7/0896 ,  C07F7/12

摘要： A silacyclohexane compound of the following formula (I) ##STR1## wherein R is an unsubstituted or substituted organic residue, W is H, F, Cl or methyl, X is CN, F, Cl or an unsubstituted or substituted organic residue, and Y and Z independently represent H, F or Cl. The silacyclohexane compounds are useful in liquid crystal compositions and also in liquid crystal devices.

摘要翻译： 下式（I）的硅环己烷化合物其中R是未取代或取代的有机残基，W是H，F，Cl或甲基，X是CN，F，Cl或未取代或取代的有机残基 ，Y和Z独立地表示H，F或Cl。 硅环己烷化合物可用于液晶组合物，也可用于液晶装置。

公开(公告)号：US5595686A

公开(公告)日：1997-01-21

申请号：US523095

申请日：1995-09-01

申请人： Takaaki Shimizu ,  Takeshi Kinsho ,  Tsutomu Ogihara ,  Tatsushi Kaneko ,  Mutsuo Nakashima ,  Hideshi Kurihara

发明人： Takaaki Shimizu ,  Takeshi Kinsho ,  Tsutomu Ogihara ,  Tatsushi Kaneko ,  Mutsuo Nakashima ,  Hideshi Kurihara

IPC分类号： C07F7/08 ,  C07F7/12 ,  C09K19/40 ,  C09K19/34 ,  C09K19/30 ,  G02F1/13

CPC分类号： C07F7/0896 ,  C07F7/0818 ,  C07F7/12 ,  C09K19/406

摘要： A silacyclohexane compound of the following formula (I) ##STR1## wherein R represents an organic residue; at least one of ##STR2## represents a substituted or unsubstituted trans-1-sila-1,4-cyclohexylene group or trans-4-sila-1,4-cyclohexylene group and the other represents a trans-1,4-cyclohexylene group, L.sub.1 and L.sub.2 independently represent H, F, Cl or CH.sub.3 ; X represents an organic residue or CN, F, Cl; and m and n are, respectively, 0 or 1 provided that m+n=1. Silacyclohexane compounds are useful in liquid crystal compositions and also in liquid crystal devices.

摘要翻译： 下式（I）的硅环己烷化合物其中R表示有机残基; “IMAGE”中的至少一个表示取代或未取代的反式-1-硅烷-1,4-亚环己基或反式-4-硅烷-1,4-亚环己基，另一个表示反式-1,4-亚环己基 ，L1和L2独立地表示H，F，Cl或CH3; X表示有机残基或CN，F，Cl; 如果m + n = 1，则m和n分别为0或1。 硅环己烷化合物可用于液晶组合物和液晶装置中。

公开(公告)号：US5641430A

公开(公告)日：1997-06-24

申请号：US566392

申请日：1995-12-01

申请人： Mutsuo Nakashima ,  Takaaki Shimizu ,  Tsutomu Ogihara ,  Takeshi Kinsho ,  Tatsushi Kaneko ,  Kazuyuki Asakura ,  Hideshi Kurihara

发明人： Mutsuo Nakashima ,  Takaaki Shimizu ,  Tsutomu Ogihara ,  Takeshi Kinsho ,  Tatsushi Kaneko ,  Kazuyuki Asakura ,  Hideshi Kurihara

IPC分类号： C07F7/08 ,  C07F7/12 ,  C09K19/40 ,  C09K19/34 ,  C09K19/30

CPC分类号： C07F7/0818 ,  C07F7/0896 ,  C07F7/12 ,  C09K19/406

摘要： A silacyclohexane compound of the following formula (I) or (II) ##STR1## wherein R is an organic residue, ##STR2## represents an unsubstituted or substituted trans-1-sila-1,4-cyclohexylene group or trans-4-sila-1,4-cyclohexylene group, L.sub.1 and L.sub.2 independently represent H, F, Cl or CH.sub.3 ; and X represents an organic residue, CN, F or Cl, or ##STR3## wherein R, L.sub.1, L.sub.2 and X are, respectively, as defined above, and at least one of ##STR4## represents an unsubstituted or substituted trans-1-sila-1,4-cyclohexylene group or trans-4-sila-1,4-cyclohexylene group, and the other may be a trans-1,4-cyclohexylene group. The preparation of these compounds is described along with a composition comprising the compound (I) and/or (II) and a display device comprising the composition.

摘要翻译： 下式（I）或（II）的硅环己烷化合物其中R是有机残基，IMAGE表示未取代或取代的反式-1-硅烷-1,4-亚环己基或反式-1- 4-硅烷-1,4-亚环己基，L1和L2独立地表示H，F，Cl或CH3; 和X表示有机残基，CN，F或Cl，或如上所定义，并且所述反式-1-硅烷-1,4-亚环己基或反式-4-硅烷-1,4-亚环己基中的至少一种 ，另一个可以是反式-1,4-亚环己基。 这些化合物的制备与包含化合物（I）和/或（II）的组合物以及包含该组合物的显示装置一起被描述。

公开(公告)号：US5582764A

公开(公告)日：1996-12-10

申请号：US395706

申请日：1995-02-28

申请人： Mutsuo Nakashima ,  Takaaki Shimizu ,  Tsutomu Ogihara ,  Takeshi Kinsho ,  Tatsushi Kaneko ,  Hideshi Kurihara

发明人： Mutsuo Nakashima ,  Takaaki Shimizu ,  Tsutomu Ogihara ,  Takeshi Kinsho ,  Tatsushi Kaneko ,  Hideshi Kurihara

IPC分类号： C07F7/08 ,  C07F7/12 ,  C09K19/40 ,  C09K19/34 ,  C09K19/30 ,  G02F1/13

CPC分类号： C09K19/406 ,  C07F7/0818 ,  C07F7/0896 ,  C07F7/12

摘要： A silacyclohexane compound represented by the following general formula (I). ##STR1## In this formula, R denotes a linear-chain alkyl group with a carbon number of 1-10, a fluoroalkyl group with a carbon number of 1-10 in which a fluorine atom(s) is substituted for one or two hydrogen atoms, an alkoxy group, a branched-chain alkyl group with a carbon number of 3-8, an alkoxyalkyl group with a carbon number of 2-7, or an alkenyl group with a carbon number of 2-8. a and b denote 0 or 1 and (a+b)=0 or 1; For ##STR2## at least one of the two denotes a trans-1-sila-1,4-cyclohexylene or a trans-4-sila-1,4-cyclohexylene group whose silicon at position 1 or position 4 has a substitutional group(s) of H, F, Cl or CH.sub.3. X denotes H, CN, F, Cl, CF.sub.3, CF.sub.2 Cl, CHFCl, OCF.sub.3, OCF.sub.2 Cl, OCHFCl, OCHF.sub.2, R or OR. Y and Z denote F, Cl or CH.sub.3. i and j denotes 0, 1 or 2.

摘要翻译： 由以下通式（I）表示的硅环己烷化合物。 （I）在该式中，R表示碳数为1-10的直链烷基，碳原子数为1-10的氟代烷基，其中氟原子取代一个 或两个氢原子，烷氧基，碳数为3-8的支链烷基，碳数为2-7的烷氧基烷基或碳数为2-8的烯基。 a和b表示0或1，（a + b）= 0或1; 对于，两个中的至少一个表示反式-1-硅烷-1,4-亚环己基或反式-4-硅烷-1,4-亚环己基，其位置1或位置4的硅具有取代基（ s）H，F，Cl或CH 3。 X表示H，CN，F，Cl，CF 3，CF 2 Cl，CHFCl，OCF 3，OCF 2 Cl，OCHFCl，OCHF 2，R或OR。 Y和Z表示F，Cl或CH3。 i和j表示0,1或2。