公开(公告)号：US07196773B2

公开(公告)日：2007-03-27

申请号：US10538230

申请日：2004-09-10

申请人： Akiyoshi Suzuki

发明人： Akiyoshi Suzuki

IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/54

CPC分类号： G02B27/0961 ,  G02B5/32 ,  G02B27/0905 ,  G02B27/0927 ,  G03F7/70108 ,  G03F7/70158 ,  G03F7/70566

摘要： An illumination optical system for illuminating an illuminated surface using light from a light source includes a first diffraction optical element upon which the light from the light source is incident, and a second diffraction optical element upon which the light from the light source is incident, wherein the light from the first diffraction optical element forms a first part of an illumination distribution on a predetermined surface that substantially has a Fourier transform relationship with the illuminated surface, and the light from the second diffraction optical element forms a second part of the illumination distribution.

摘要翻译： 使用来自光源的光照射照明面的照明光学系统包括：来自光源的光入射的第一衍射光学元件和来自光源的光入射的第二衍射光学元件，其中， 来自第一衍射光学元件的光在与被照射面基本上具有傅立叶变换关系的预定表面上形成照明分布的第一部分，并且来自第二衍射光学元件的光形成照明分布的第二部分。

公开(公告)号：US06681844B1

公开(公告)日：2004-01-27

申请号：US09806503

申请日：2001-04-13

申请人： Naoyuki Inoue ,  Toshio Matsubara ,  Tomoyoshi Irie ,  Akiyoshi Suzuki ,  Tomoyuki Uchimura

发明人： Naoyuki Inoue ,  Toshio Matsubara ,  Tomoyoshi Irie ,  Akiyoshi Suzuki ,  Tomoyuki Uchimura

IPC分类号： F28D900

CPC分类号： F28F3/046 ,  F25B33/00 ,  F25B37/00 ,  F25B39/00 ,  F28D5/02 ,  F28D9/0043 ,  F28D2021/007 ,  F28D2021/0071 ,  F28F3/042 ,  F28F3/044 ,  F28F3/083 ,  F28F9/0275 ,  F28F2250/104

摘要： The present invention relates to a plate type heat exchanger having a heat exchange element composed of two plates for exchanging heat between a fluid flowing inside the heat exchange element and a fluid flowing outside the heat exchange element. In the plate type heat exchanger, the two plates (1) have a plurality of depressions (8), and the depressions are brought into contact with and bonded to each other. Peripheral portions of the plates are sealed to form a space in which a fluid flows and constitute a heat exchange element (2) having opening portions (5, 6) at both ends thereof. The heat exchange elements (2) are piled on and bonded to each other so that the opening portions (5, 6) communicate with each other.

摘要翻译： 本发明涉及一种板式热交换器，其具有热交换元件，该热交换元件由在热交换元件内部流动的流体与流过热交换元件的流体之间进行热交换的两个板构成。 在板式热交换器中，两个板（1）具有多个凹部（8），并且使凹部彼此接触并接合。 板的外围部分被密封以形成流体流动的空间，并且构成在其两端具有开口部分（5,6）的热交换元件（2）。 热交换元件（2）彼此堆叠并彼此结合，使得开口部（5,6）彼此连通。

公开(公告)号：US06534242B2

公开(公告)日：2003-03-18

申请号：US09783600

申请日：2001-02-15

申请人： Mitsuro Sugita ,  Akiyoshi Suzuki ,  Miyoko Kawashima ,  Kenji Saitoh ,  Yuichi Iwasaki

发明人： Mitsuro Sugita ,  Akiyoshi Suzuki ,  Miyoko Kawashima ,  Kenji Saitoh ,  Yuichi Iwasaki

IPC分类号： G03C500

CPC分类号： G03F7/2022 ,  G03F7/7045 ,  G03F7/70466

摘要： An exposure method for transferring a device pattern to a resist, wherein the device pattern includes a first element and a second element having a linewidth narrower than the first element. The method includes a first exposure step for exposing the resist by use of an interference fringe, produced by interference of two light beams, through an exposure amount substantially not greater than a threshold of the resist, and a second exposure step for exposing the resist with a light pattern related to the first and second elements. A light component, of the light pattern, related to the first element bears an exposure amount greater than the threshold, a light component, of the light pattern, related to the second element bears an exposure amount not greater than the threshold and is to be combined with light in a portion of the interference fringe, and a sum of the exposure amount of the light component related to the second element and an exposure amount provided by the light in the portion of the interference fringe is greater than the threshold.

摘要翻译： 一种用于将器件图案转印到抗蚀剂的曝光方法，其中所述器件图案包括第一元件和具有比所述第一元件窄的线宽的第二元件。 该方法包括第一曝光步骤，用于通过使用由两个光束的干涉产生的干涉条纹曝光抗蚀剂，所述干涉条纹通过基本上不大于抗蚀剂阈值的曝光量，以及第二曝光步骤，用于将抗蚀剂与 与第一和第二元素相关的光图案。 与第一元件相关的光图案的光分量具有大于阈值的曝光量，与第二元件相关的光图案的光分量具有不大于阈值的曝光量，并且为 与干涉条纹的一部分中的光结合，并且与第二元素相关的光分量的曝光量与干涉条纹部分中的光提供的曝光量之和大于阈值。

公开(公告)号：US06441886B2

公开(公告)日：2002-08-27

申请号：US09414437

申请日：1999-10-07

申请人： Akiyoshi Suzuki ,  Yoshiyuki Sekine

发明人： Akiyoshi Suzuki ,  Yoshiyuki Sekine

IPC分类号： G03B2772

CPC分类号： G03F7/70091 ,  G03B27/54

摘要： An illumination optical system for use in an exposure apparatus for projecting a pattern of a mask onto a substrate. The illumination system includes a first beam shape changing optical system for transforming a light, supplied from a light source, into a slit-like light of an oblong shape, and a second beam shape changing optical system for transforming the slit-like light of oblong shape into a slit-like light of an arcuate shape, the second beam shape changing optical system having a prism element. The mask is illuminated with the slit-like light of arcuate shape.

摘要翻译： 一种用于曝光装置的照明光学系统，用于将掩模的图案投影到基底上。 照明系统包括用于将从光源提供的光转换成长方形的狭缝状光的第一光束形状变化光学系统和用于变换长方形狭缝状光的第二光束形状变化光学系统 形成为弧形的狭缝状的光，第二光束形状变化光学系统具有棱镜元件。 面罩用弧形的狭缝状光照亮。

公开(公告)号：US06377337B1

公开(公告)日：2002-04-23

申请号：US09299558

申请日：1999-04-27

申请人： Mitsuro Sugita ,  Akiyoshi Suzuki

发明人： Mitsuro Sugita ,  Akiyoshi Suzuki

IPC分类号： G03B2754

CPC分类号： G03F7/70216 ,  G03B27/54 ,  G03F7/7045

摘要： A projection exposure apparatus, having a multiple exposure mode, for projecting a pattern of a mask onto a wafer. In the apparatus, an illumination system illuminates the mask and a projection system supplies into an optical path a filter which blocks a zero-order light beam of diffracted light projected from the mask. An exposure step in the mode of multiple exposure is performed in a state in which the filter has been supplied into the optical path.

摘要翻译： 一种具有多重曝光模式的投影曝光装置，用于将掩模的图案投影到晶片上。 在该装置中，照明系统照亮掩模，并且投影系统向光路提供阻挡从掩模投影的衍射光的零级光束的滤光器。 在将滤光器提供到光路中的状态下进行多次曝光模式的曝光步骤。

公开(公告)号：US5361122A

公开(公告)日：1994-11-01

申请号：US11097

申请日：1993-01-29

申请人： Yoshiharu Kataoka ,  Akiyoshi Suzuki ,  Yuichi Yamada

发明人： Yoshiharu Kataoka ,  Akiyoshi Suzuki ,  Yuichi Yamada

IPC分类号： G03F7/207 ,  G03F9/00 ,  G03B27/42

CPC分类号： G03F9/7026

摘要： A focusing method is disclosed wherein a substrate is moved substantially along a focal plane of a projection optical system up to a predetermined station adjacent to the focal plane of the projection optical system and then, at the predetermined station, the surface of the substrate is brought into substantial coincidence with the focal plane of the projection optical system. The method includes the steps of detecting a deviation of the surface of the substrate with respect to the focal plane of the projection optical system, before the substrate, being moved substantially along the focal plane of the projection optical system, is moved up to the predetermined station; and substantially correcting the deviation on the basis of the detection.

摘要翻译： 公开了一种聚焦方法，其中基板沿着投影光学系统的焦平面移动直到与投影光学系统的焦平面相邻的预定台，然后在预定的位置，使基板的表面 与投影光学系统的焦平面大致一致。 该方法包括以下步骤：在基板沿着投影光学系统的焦平面移动之前，检测基板相对于投影光学系统的焦平面的表面的偏差， 站; 并且基于检测基本上校正偏差。

公开(公告)号：US5359407A

公开(公告)日：1994-10-25

申请号：US177189

申请日：1994-01-03

申请人： Akiyoshi Suzuki ,  Michio Kohno

发明人： Akiyoshi Suzuki ,  Michio Kohno

IPC分类号： G01B11/30 ,  G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  G02B26/12 ,  G03F1/84 ,  G03F7/20 ,  H01L21/66

CPC分类号： G01N21/8806 ,  G02B26/123 ,  G03F7/70483 ,  G01N2201/0636

摘要： An optical system is arranged so that a scanning light beam for scanning a first region to be inspected and a scanning light beam for scanning a second region to be inspected are not simultaneously incident upon an object to be inspected. This prevents an adverse influence on the inspection caused by flare light generated when one scanning light beam is incident upon an edge of the object and is received by a light-receiving optical system for the region to be inspected scanned by another scanning light beam. The system includes two polygon mirrors provided as one body in an optical system at a position for projecting the light beams so that the distance between a focus point of the light beam projected on the lower surface of the object and a focus point of the light beam projected on the upper surface of the object in the beam scanning direction is greater than the width of the object in the beam scanning direction. As a result, the two light beams are alternately incident upon the object.

摘要翻译： 光学系统被布置成使得用于扫描待检查的第一区域的扫描光束和用于扫描待检查的第二区域的扫描光束不会同时入射到待检查对象上。 这防止了当一个扫描光束入射到物体的边缘上并且被受光光学系统接收的由另一个扫描光束进行检查的区域的光束所产生的火炬光引起的检查的不利影响。 该系统包括在用于投射光束的位置处的光学系统中作为一体设置的两个多面镜，使得投射在物体的下表面上的光束的焦点与光束的焦点之间的距离 投影在物体的上表面上的光束扫描方向大于物体在光束扫描方向上的宽度。 结果，两个光束交替地入射到物体上。

公开(公告)号：US4875076A

公开(公告)日：1989-10-17

申请号：US206490

申请日：1988-06-14

申请人： Makoto Torigoe ,  Akiyoshi Suzuki

发明人： Makoto Torigoe ,  Akiyoshi Suzuki

IPC分类号： G03F9/00

CPC分类号： G03F9/70

摘要： Step-and-repeat exposure apparatus for printing, by way of a projection optical system, images of a pattern formed on a reticle upon different portions of a semiconductor wafer, placed on a movable stage, is disclosed. On the portion of the movable stage other than the portion upon which the semiconductor wafer is placed, an erasably writable recording medium such as, for example, a magneto-optic recording material or a photochromic material is provided. An image of a mark of a reticle is formed on the recording medium by use of the projection optical system, the thus formed image being photoelectrically detected. From the result of the detection, alignment information concerning, for example, a magnification error, a focus error, a positional error between the reticle and the wafer, for example is obtained.

公开(公告)号：US4795911A

公开(公告)日：1989-01-03

申请号：US14033

申请日：1987-02-12

申请人： Michio Kohno ,  Eiichi Murakami ,  Akiyoshi Suzuki

发明人： Michio Kohno ,  Eiichi Murakami ,  Akiyoshi Suzuki

IPC分类号： G01N21/94 ,  G01N21/88

CPC分类号： G01N21/94

摘要： An apparatus usable with an object having a surface with a pattern, for examining the state of the surface, includes a projecting system for directing a light beam to the surface of the object, and a collecting system for collecting scattered light from the surface of the object. A projection of the optical axis of the collecting system onto the surface of the object extends in a direction different from a projection onto the surface of the object of a major portion of light diffracted from the pattern. A light-receiving unit receives the scattered light as collected by the collecting system and for producing an output corresponding to the state of the surface of the object.

摘要翻译： 可用于具有用于检查表面状态的具有图案的表面的物体的装置包括用于将光束引导到物体的表面的投影系统和用于从该物体的表面收集散射光的收集系统 目的。 将收集系统的光轴投射到物体表面上的方向不同于从图案衍射的大部分光的物体的表面上的投影。 光接收单元接收由收集系统收集的散射光并产生与物体表面的状态对应的输出。

公开(公告)号：US4711568A

公开(公告)日：1987-12-08

申请号：US836630

申请日：1986-03-05

申请人： Makoto Torigoe ,  Akiyoshi Suzuki ,  Terumasa Sakai

发明人： Makoto Torigoe ,  Akiyoshi Suzuki ,  Terumasa Sakai

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G03B27/74 ,  G03B27/80

CPC分类号： G03F7/70558

摘要： An exposure apparatus and method for irradiating a mask having a circuit pattern with light emitted from an intermittently emitting type light source so that the mask pattern is photolithographically transferred onto a semiconductor wafer, wherein the output of the intermittent-emission type light source is detected prior to the photolithographic transfer of the mask pattern onto the wafer and, in accordance with the result of such detection, the amount of exposure of the wafer to the light beam from the mask is controlled.

摘要翻译： 一种曝光装置和方法，用于将具有电路图案的掩模与从间歇发射型光源发射的光照射，使得掩模图案被光刻转印到半导体晶片上，其中先前检测到间歇发射型光源的输出 将掩模图案的光刻传输到晶片上，并且根据这种检测的结果，控制晶片对来自掩模的光束的曝光量。