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公开(公告)号：US06534242B2
公开(公告)日：2003-03-18
申请号：US09783600
申请日：2001-02-15
IPC分类号： G03C500
CPC分类号： G03F7/2022 , G03F7/7045 , G03F7/70466
摘要： An exposure method for transferring a device pattern to a resist, wherein the device pattern includes a first element and a second element having a linewidth narrower than the first element. The method includes a first exposure step for exposing the resist by use of an interference fringe, produced by interference of two light beams, through an exposure amount substantially not greater than a threshold of the resist, and a second exposure step for exposing the resist with a light pattern related to the first and second elements. A light component, of the light pattern, related to the first element bears an exposure amount greater than the threshold, a light component, of the light pattern, related to the second element bears an exposure amount not greater than the threshold and is to be combined with light in a portion of the interference fringe, and a sum of the exposure amount of the light component related to the second element and an exposure amount provided by the light in the portion of the interference fringe is greater than the threshold.
摘要翻译： 一种用于将器件图案转印到抗蚀剂的曝光方法，其中所述器件图案包括第一元件和具有比所述第一元件窄的线宽的第二元件。 该方法包括第一曝光步骤，用于通过使用由两个光束的干涉产生的干涉条纹曝光抗蚀剂，所述干涉条纹通过基本上不大于抗蚀剂阈值的曝光量，以及第二曝光步骤，用于将抗蚀剂与 与第一和第二元素相关的光图案。 与第一元件相关的光图案的光分量具有大于阈值的曝光量，与第二元件相关的光图案的光分量具有不大于阈值的曝光量，并且为 与干涉条纹的一部分中的光结合，并且与第二元素相关的光分量的曝光量与干涉条纹部分中的光提供的曝光量之和大于阈值。
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公开(公告)号：US06403291B1
公开(公告)日：2002-06-11
申请号：US09340134
申请日：1999-06-28
申请人： Miyoko Kawashima , Akiyoshi Suzuki , Kenji Saitoh
发明人： Miyoko Kawashima , Akiyoshi Suzuki , Kenji Saitoh
IPC分类号： G03C500
CPC分类号： G03F7/70575 , G03F7/2022 , G03F7/70333 , G03F7/70408 , G03F7/70425 , G03F7/7045 , G03F7/70466
摘要： A multiple exposure method includes a step of exposing a photosensitive material with a first pattern having a periodic pattern, and a step of exposing the photosensitive material with a second pattern different from the first pattern by using a projection optical system, wherein the step of exposing the photosensitive material with the second pattern is performed in each of a plurality of positions of the photosensitive material in an optical axis direction of the projection optical system relative to a focus position of an image of the second pattern, and wherein a desired pattern is formed in the photosensitive material by a multiple exposure including the step of exposing the photosensitive material with the first pattern and the step of exposing the photosensitive material with the second pattern.
摘要翻译： 多重曝光方法包括以具有周期性图案的第一图案曝光感光材料的步骤，以及通过使用投影光学系统以与第一图案不同的第二图案曝光感光材料的步骤，其中曝光步骤 具有第二图案的感光材料相对于第二图案的图像的焦点位置在投影光学系统的光轴方向上的感光材料的多个位置中的每一个中进行，并且其中形成期望的图案 在感光材料中通过多次曝光，包括用第一图案曝光感光材料的步骤和用第二图案曝光感光材料的步骤。
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公开(公告)号：US07402378B2
公开(公告)日：2008-07-22
申请号：US11255559
申请日：2005-10-21
申请人： Kenji Saitoh , Miyoko Kawashima
发明人： Kenji Saitoh , Miyoko Kawashima
IPC分类号： G03C5/00
CPC分类号： G03F1/30 , G03F7/70091 , G03F7/701 , G03F7/70283 , G03F7/70433
摘要： There is provided an exposure method that includes the steps of forming a phase shift mask having a desired pattern and a cyclic dummy pattern overlaid onto the desired pattern, a part of the desired pattern to be resolved by effects of the dummy pattern being thicker than the dummy pattern's line width, illuminating the phase shift mask by using illumination light having a peak near or on an optical axis in an intensity distribution to transfer the desired pattern onto the exposure plane by projecting light having passed through the phase shift mask onto the exposure plane.
摘要翻译： 提供了一种曝光方法，其包括以下步骤：形成具有期望图案的相移掩模和覆盖在期望图案上的循环虚拟图案，通过虚拟图案的效果而被分解的期望图案的一部分比 通过在强度分布中使用具有在光轴附近或在光轴上的峰值的照明光来照射相移掩模，以通过将穿过相移掩模的光投射到曝光平面上将期望的图案转印到曝光平面上 。
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公开(公告)号：US20060033900A1
公开(公告)日：2006-02-16
申请号：US11255559
申请日：2005-10-21
申请人： Kenji Saitoh , Miyoko Kawashima
发明人： Kenji Saitoh , Miyoko Kawashima
CPC分类号： G03F1/30 , G03F7/70091 , G03F7/701 , G03F7/70283 , G03F7/70433
摘要： There is provided an exposure method that includes the steps of forming a phase shift mask having a desired pattern and a cyclic dummy pattern overlaid onto the desired pattern, a part of the desired pattern to be resolved by effects of the dummy pattern being thicker than the dummy pattern's line width, illuminating the phase shift mask by using illumination light having a peak near or on an optical axis in an intensity distribution to transfer the desired pattern onto the exposure plane by projecting light having passed through the phase shift mask onto the exposure plane.
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公开(公告)号：US06991877B2
公开(公告)日：2006-01-31
申请号：US10128707
申请日：2002-04-23
申请人： Kenji Saitoh , Miyoko Kawashima
发明人： Kenji Saitoh , Miyoko Kawashima
CPC分类号： G03F1/30 , G03F7/70091 , G03F7/701 , G03F7/70283 , G03F7/70433
摘要： There is provided an exposure method that includes the steps of forming a phase shift mask having a desired pattern and a cyclic dummy pattern overlaid onto the desired pattern, a part of the desired pattern to be resolved by effects of the dummy pattern being thicker than the dummy pattern's line width, illuminating the phase shift mask by using illumination light having a peak near or on an optical axis in an intensity distribution to transfer the desired pattern onto the exposure plane by projecting light having passed through the phase shift mask onto the exposure plane.
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公开(公告)号：US06839890B2
公开(公告)日：2005-01-04
申请号：US10247947
申请日：2002-09-20
申请人： Mitsuro Sugita , Kenji Saitoh , Kenji Yamazoe
发明人： Mitsuro Sugita , Kenji Saitoh , Kenji Yamazoe
CPC分类号： G03F1/36
摘要： A method for forming, on a mask, a mask pattern used for exposure. The mask pattern includes a first pattern that blends plural types of patterns, and second pattern that is smaller in size than the first pattern. The mask pattern is arranged on the mask so that the first pattern may be resolved and the second pattern is restrained from being resolved. The method includes the steps of classifying the first pattern into one of a periodic pattern having at least three elements having two equal intervals in at least one direction among two orthogonal directions, an isolated pair pattern that does not belong to the periodic pattern and includes a pair of elements arranged in at least one direction among the two orthogonal directions, and an isolated element that does not belong to the isolated pair pattern and includes only one element without constituting any pair in any of the two orthogonal directions, arranging the second pattern for the isolated pair pattern, arranging the second pattern for the isolated element, and arranging the second pattern for the periodic pattern.
摘要翻译： 一种在掩模上形成用于曝光的掩模图案的方法。 掩模图案包括混合多种类型的图案的第一图案和尺寸小于第一图案的第二图案。 掩模图案被布置在掩模上，使得可以解析第一图案并且限制第二图案被解析。 该方法包括以下步骤：将第一图案分类为在两个正交方向之间的至少一个方向上具有至少三个具有两个等间隔的元件的周期性图案之一，不属于周期性图案的隔离对图案，并且包括 在两个正交方向上沿至少一个方向布置的一对元件，以及不属于隔离对图案并且仅包含一个元件而不在两个正交方向中的任一个中构成任何对的隔离元件，将第二图案设置为 隔离对图案，布置用于隔离元件的第二图案，并且布置用于周期性图案的第二图案。
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公开(公告)号：US06842255B2
公开(公告)日：2005-01-11
申请号：US10116924
申请日：2002-04-05
申请人： Yumiko Ohsaki , Akiyoshi Suzuki , Kenji Saitoh
发明人： Yumiko Ohsaki , Akiyoshi Suzuki , Kenji Saitoh
CPC分类号： G01B11/2441 , G01B9/02039
摘要： There is provided an interferometer for measuring a surface shape of an optical element using interference, including a reference wave-front deformation system for deforming a wave front of reference light.
摘要翻译： 提供了一种用于使用干涉测量光学元件的表面形状的干涉仪，包括用于使参考光的波前变形的参考波前变形系统。
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公开(公告)号：US07217503B2
公开(公告)日：2007-05-15
申请号：US10132001
申请日：2002-04-24
申请人： Kenji Saitoh , Akiyoshi Suzuki , Kenji Yamazoe
发明人： Kenji Saitoh , Akiyoshi Suzuki , Kenji Yamazoe
IPC分类号： G03F7/20
CPC分类号： G03F1/30 , G03F1/36 , G03F7/70125 , G03F7/70466
摘要： An exposure method comprising the steps of forming onto a mask that arranges a pattern of a contact hole and a plurality of patterns each being smaller than the contact hole pattern, and illuminating the mask using plural kinds of light so as to resolve the desired pattern without the smaller patterns on a target via a projection optical system.
摘要翻译： 一种曝光方法，包括以下步骤：形成掩模，所述掩模布置接触孔和多个图案的图案，每个图案都小于接触孔图案，并且使用多种光照射所述掩模，以便解析所需图案而无需 通过投影光学系统在目标上的较小图案。
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9.发明授权公开(公告)号：US07214453B2
公开(公告)日：2007-05-08
申请号：US10783218
申请日：2004-02-20
申请人： Kenji Yamazoe , Kenji Saitoh , Akiyoshi Suzuki
发明人： Kenji Yamazoe , Kenji Saitoh , Akiyoshi Suzuki
IPC分类号： G03F1/00
CPC分类号： G03F7/70433 , G03F1/36
摘要： A mask arranges a predetermined pattern and an auxiliary pattern smaller than the predetermined pattern so that where a virtual lattice is assumed which has a lattice point located at a center of the predetermined pattern, a center of the auxiliary pattern is offset from the lattice point of the virtual lattice.
摘要翻译： 掩模布置预定图案和小于预定图案的辅助图案，使得假定具有位于预定图案的中心的格子点的虚拟网格，辅助图案的中心偏离 虚拟网格。
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公开(公告)号：US07107573B2
公开(公告)日：2006-09-12
申请号：US10251581
申请日：2002-09-20
申请人： Kenji Yamazoe , Akiyoshi Suzuki , Kenji Saitoh
发明人： Kenji Yamazoe , Akiyoshi Suzuki , Kenji Saitoh
CPC分类号： G03F1/36 , G03F7/70125 , G03F7/70433 , G03F7/70441
摘要： A method for setting a mask pattern and an illumination condition suitable for an exposure method for using plural kinds of light to illuminate a mask that arranges a predetermined pattern and an auxiliary pattern smaller than the predetermined pattern, so as to resolve the predetermined pattern without resolving the auxiliary pattern on a target via a projection optical system includes the steps of forming data for the predetermined pattern, forming data for the auxiliary pattern, and setting the illumination condition for defining an effective light source of illumination using the plural kinds of light.
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