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21.发明授权Pattern matching apparatus and semiconductor inspection system using the same 有权模式匹配装置和半导体检测系统采用相同的方式公开(公告)号：US07991218B2
公开(公告)日：2011-08-02
申请号：US11588418
申请日：2006-10-27
IPC分类号： G06K9/62
CPC分类号： G06T7/001 , G06T7/74 , G06T2207/30148
摘要： Solving means is configured of a signal input interface, a data calculation unit, and a signal output interface. The signal input interface allows image data which is obtained by photographing hole patterns, and CAD data which corresponds to hole patterns included in the image data, to be inputted. The data calculation unit includes: CAD hole-pattern central-position detection means which detects central positions respectively of hole patterns included in the CAD data from the CAD data, and which generates data which represents, with an image, the central positions of the respective hole patterns; pattern extraction means which extracts pattern data from the image data; image hole-pattern central-position detection means which detects central positions of the respective hole patterns in the image data from the pattern data, and which generates data which represents, with an image, the central positions of these hole patterns detected from the image data; and collation process means which detects positional data in the image data corresponding to that in the CAD data through a process of collating the CAD hole-pattern central-position data with the image hole-pattern central-position data. The signal output interface outputs the positional data outputted from the data calculation unit.
摘要翻译： 解码装置由信号输入接口，数据计算单元和信号输出接口构成。 信号输入接口允许输入通过拍摄孔图案获得的图像数据和与图像数据中包括的孔图案对应的CAD数据。 数据计算单元包括：CAD孔图形中心位置检测装置，其检测来自CAD数据的包括在CAD数据中的孔图案的中心位置，并且生成用图像表示相应的中心位置的数据 孔图案 图案提取装置，从图像数据中提取图案数据; 图像孔图形中心位置检测装置，其从图案数据检测图像数据中的各个孔图案的中心位置，并且生成用图像表示从图像数据检测到的这些孔图案的中心位置的数据 ; 以及对照处理装置，其通过将CAD孔图案中心位置数据与图像孔图形中心位置数据进行对照的处理来检测与CAD数据中的数据相对应的图像数据中的位置数据。 信号输出接口输出从数据计算单元输出的位置数据。
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22.发明授权公开(公告)号：US07925095B2
公开(公告)日：2011-04-12
申请号：US11698988
申请日：2007-01-29
IPC分类号： G06K9/32
CPC分类号： G06K9/6204 , G06K9/4633
摘要： A pattern matching method which is capable of selecting a suitable measurement object pattern, even on a sample containing a periodic structure, and a computer program for making a computer execute the pattern matching. In a pattern matching method which executes matching between the design data-based first image of an object sample, and a second image, whether or not a periodic structure is included in a region to execute the matching is determined, so as to select a pattern, based on distance between an original point which is set in said image, and the pattern configuring said periodic structure, in the case where the periodic structure is included in said region, and to select a pattern based on coincidence of the pattern in said image, in the case where the periodic structure is not included in said region, and a computer program product.
摘要翻译： 能够选择合适的测量对象图案的模式匹配方法，即使在包含周期性结构的样本上，也可以使计算机程序使计算机执行模式匹配。 在执行对象样本的基于设计数据的第一图像与第二图像之间的匹配的图案匹配方法中，确定在区域中是否包括周期性结构以执行匹配，以便选择图案 基于在所述图像中设置的原始点与构成所述周期性结构的图案之间的距离，在所述区域中包括周期性结构的情况下，以及基于所述图像中的图案的一致性来选择图案 在周期性结构不包括在所述区域中的情况下，以及计算机程序产品。
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23.发明授权Dimension measuring SEM system, method of evaluating shape of circuit pattern and a system for carrying out the method 有权尺寸测量SEM系统，电路图案形状评估方法和执行该方法的系统公开(公告)号：US07449689B2
公开(公告)日：2008-11-11
申请号：US11260082
申请日：2005-10-28
申请人： Wataru Nagatomo , Ryoichi Matsuoka , Takumichi Sutani , Akiyuki Sugiyama , Yasuhiro Yoshitake , Hideaki Sasazawa
发明人： Wataru Nagatomo , Ryoichi Matsuoka , Takumichi Sutani , Akiyuki Sugiyama , Yasuhiro Yoshitake , Hideaki Sasazawa
CPC分类号： H01J37/28 , G03F1/36 , G03F1/68 , G03F7/70625 , H01J37/222 , H01J2237/24578 , H01J2237/24592 , H01J2237/2817
摘要： The present invention relates to a dimension measuring SEM system and a circuit pattern evaluating system capable of achieving accurate, minute OPC evaluation, the importance of which increase with the progressive miniaturization of design pattern of a circuit pattern for a semiconductor device, and a circuit pattern evaluating method. Design data and measured data on an image of a resist pattern formed by photolithography are superposed for the minute evaluation of differences between a design pattern defined by the design data and the image of the resist pattern, and one- or two-dimensional geometrical features representing differences between the design pattern and the resist pattern are calculated. In some cases, the shape of the resist pattern differs greatly from the design pattern due to OPE effect (optical proximity effect). To superpose the design data and the measured data on the resist pattern stably and accurately, an exposure simulator calculates a simulated pattern on the basis of photomask data on a photomask for an exposure process and exposure conditions and superposes the simulated pattern and the image of the resist pattern.
摘要翻译： 本发明涉及一种尺寸测量SEM系统和电路图案评估系统，其能够实现精确的分钟OPC评估，其随着半导体器件的电路图案的设计图案的逐渐小型化以及电路图案的增加而增加的重要性 评估方法。 将通过光刻形成的抗蚀剂图案的图像上的设计数据和测量数据叠加以便对由设计数据定义的设计图案与抗蚀剂图案的图像之间的差异进行微小评估，以及表示一维或二维几何特征 计算设计图案和抗蚀剂图案之间的差异。 在某些情况下，由于OPE效应（光学邻近效应），抗蚀剂图案的形状与设计图案有很大的不同。 为了稳定准确地将设计数据和测量数据叠加在抗蚀剂图案上，曝光模拟器基于用于曝光处理和曝光条件的光掩模上的光掩模数据计算模拟图案，并将模拟图案和图像 抗蚀图案
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公开(公告)号：US20080024601A1
公开(公告)日：2008-01-31
申请号：US11699062
申请日：2007-01-29
申请人： Hidetoshi Sato , Takumichi Sutani , Yutaka Hojo
发明人： Hidetoshi Sato , Takumichi Sutani , Yutaka Hojo
IPC分类号： H04N9/47
CPC分类号： H01J37/28 , H01J2237/221 , H01J2237/2485 , H01J2237/2816 , H01J2237/2817
摘要： There is provided an electron microscope which is capable of making a significant contribution to accomplishment of efficiency in investigating causes for pattern abnormalities found out. The electron microscope including an I/O for capturing image data on a microscopic image acquired by another electron microscope, a computation processing unit for generating a display signal based on the image data on the microscopic image acquired by another electron microscope and captured via the I/O and image data on a microscopic image acquired by the electron microscope itself, in order that the microscopic image acquired by another electron microscope and the microscopic image acquired by the electron microscope itself are displayed at the same scale and under the same display condition, and a display unit for displaying both of the microscopic images based on the display signal from the computation processing unit.
摘要翻译： 提供了一种电子显微镜，其能够对发现的图案异常的调查原因的效率的实现方面作出重大贡献。 电子显微镜包括用于在由另一电子显微镜获取的显微镜图像上捕获图像数据的I / O，计算处理单元，用于根据由另一电子显微镜获取的显微图像上的图像数据产生显示信号，并通过I / O和通过电子显微镜本身获取的显微镜图像上的图像数据，以便通过另一电子显微镜获得的显微图像和由电子显微镜本身获取的显微图像以相同的尺度显示在相同的显示条件下， 以及显示单元，用于基于来自计算处理单元的显示信号显示两个微观图像。
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公开(公告)号：US20060193508A1
公开(公告)日：2006-08-31
申请号：US11359374
申请日：2006-02-23
IPC分类号： G06K9/00
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/2817
摘要： A pattern measuring method and device are provided which set a reference position for a measuring point to be measured by a scanning electron microscope and the like, based on position information of a reference pattern on an image acquired from the scanning electron microscope and based on a positional relation, detected by using design data, between the measuring point and the reference pattern formed at a position isolated from the measuring point.
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26.发明授权Electron microscope for inspecting dimension and shape of a pattern formed on a wafer 有权用于检查在晶片上形成的图案的尺寸和形状的电子显微镜公开(公告)号：US08199191B2
公开(公告)日：2012-06-12
申请号：US11699062
申请日：2007-01-29
申请人： Hidetoshi Sato , Takumichi Sutani , Yutaka Hojo
发明人： Hidetoshi Sato , Takumichi Sutani , Yutaka Hojo
CPC分类号： H01J37/28 , H01J2237/221 , H01J2237/2485 , H01J2237/2816 , H01J2237/2817
摘要： There is provided an electron microscope which is capable of making a significant contribution to accomplishment of efficiency in investigating causes for pattern abnormalities found out. The electron microscope including an I/O for capturing image data on a microscopic image acquired by another electron microscope, a computation processing unit for generating a display signal based on the image data on the microscopic image acquired by another electron microscope and captured via the I/O and image data on a microscopic image acquired by the electron microscope itself, in order that the microscopic image acquired by another electron microscope and the microscopic image acquired by the electron microscope itself are displayed at the same scale and under the same display condition, and a display unit for displaying both of the microscopic images based on the display signal from the computation processing unit.
摘要翻译： 提供了一种电子显微镜，其能够对发现的图案异常的调查原因的效率的实现方面作出重大贡献。 电子显微镜包括用于在由另一电子显微镜获取的显微镜图像上捕获图像数据的I / O，计算处理单元，用于根据由另一电子显微镜获取的显微图像上的图像数据产生显示信号，并通过I / O和通过电子显微镜本身获取的显微镜图像上的图像数据，以便通过另一电子显微镜获得的显微图像和由电子显微镜本身获取的显微图像以相同的尺度显示在相同的显示条件下， 以及显示单元，用于基于来自计算处理单元的显示信号显示两个微观图像。
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27.发明授权Method and apparatus of pattern inspection and semiconductor inspection system using the same 有权图案检查方法和装置以及使用其的半导体检查系统公开(公告)号：US08115169B2
公开(公告)日：2012-02-14
申请号：US12388968
申请日：2009-02-19
CPC分类号： G06T7/0006 , G06T2207/30148 , H01J2237/221 , H01J2237/2817
摘要： A pattern inspection apparatus can be provided, for example, in a scanning electron microscope system. When patterns of a plurality of layers are included in a SEM image, the apparatus separates the patterns according to each layer by using design data of the plurality of layers corresponding to the patterns. Consequently, the apparatus can realize inspection with use of only the pattern of a target layer to be inspected, pattern inspection differently for different layers, or detection of a positional offset between the layers.
摘要翻译： 例如，可以在扫描型电子显微镜系统中设置图案检查装置。 当在SEM图像中包含多层图案时，该装置通过使用与图案相对应的多个层的设计数据，根据每层分离图案。 因此，该装置可以仅使用要检查的目标层的图案，不同层的图案检查或层之间的位置偏移的检测来实现检查。
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公开(公告)号：US07978904B2
公开(公告)日：2011-07-12
申请号：US11834218
申请日：2007-08-06
CPC分类号： G06T7/0004 , G06T7/001
摘要： There is provided a pattern inspection apparatus that is capable of detecting a defect accurately and efficiently to inspect a pattern of a semiconductor device. The pattern inspection apparatus includes: a contour extraction means for extracting contour data of a pattern from a captured image of the semiconductor device; a non-linear part extraction means for extracting a non-linear part from the contour data; an angular part extraction means for extracting an angular part of a pattern from design data of the semiconductor device; and a defect detection section that compares a position of the non-linear part extracted by the non-linear part extraction section with a position of the angular part extracted by the angular part extraction section so as to detect a position of a defective part of a pattern.
摘要翻译： 提供了能够精确有效地检测缺陷以检查半导体器件的图案的图案检查装置。 图案检查装置包括：轮廓提取装置，用于从半导体装置的拍摄图像中提取图案的轮廓数据; 非线性部分提取装置，用于从轮廓数据中提取非线性部分; 角部分提取装置，用于从半导体器件的设计数据提取图案的角部; 以及缺陷检测部，其将由非线性部分提取部提取的非线性部的位置与由角部提取部提取的角部的位置进行比较，以检测不均匀部分的位置 模式。
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29.发明申请公开(公告)号：US20110150345A1
公开(公告)日：2011-06-23
申请号：US13034237
申请日：2011-02-24
IPC分类号： G06K9/62
CPC分类号： G06K9/6204 , G06K9/4633
摘要： A pattern matching method which is capable of selecting a suitable measurement object pattern, even on a sample containing a periodic structure, and a computer program for making a computer execute the pattern matching. In a pattern matching method which executes matching between the design data-based first image of an object sample, and a second image, whether or not a periodic structure is included in a region to execute the matching is determined, so as to select a pattern, based on distance between an original point which is set in said image, and the pattern configuring said periodic structure, in the case where the periodic structure is included in said region, and to select a pattern based on coincidence of the pattern in said image, in the case where the periodic structure is not included in said region, and a computer program product.
摘要翻译： 能够选择合适的测量对象图案的模式匹配方法，即使在包含周期性结构的样本上，也可以使计算机程序使计算机执行模式匹配。 在执行对象样本的基于设计数据的第一图像与第二图像之间的匹配的图案匹配方法中，确定在区域中是否包括周期性结构以执行匹配，以便选择图案 基于在所述图像中设置的原始点与构成所述周期性结构的图案之间的距离，在所述区域中包括周期性结构的情况下，以及基于所述图像中的图案的一致性来选择图案 在周期性结构不包括在所述区域中的情况下，以及计算机程序产品。
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公开(公告)号：US07800060B2
公开(公告)日：2010-09-21
申请号：US12182810
申请日：2008-07-30
CPC分类号： G01N23/2251 , G03F1/86
摘要： Easily and correctly measuring a dimension of a pattern of a photomask or of an OPC pattern of the photomask.A pattern measurement method of the present invention includes steps of obtaining both a standard pattern corresponding to a predetermined pattern and a measurement point specified in advance; setting a measurement area so that it includes two straight line segments on both sides of the measurement point among outlines of the standard pattern; and measuring a dimension between two contours of the scanned image of the predetermined pattern in the measurement area by superposing the measurement area on the scanned image of the predetermined pattern. The measurement area is set so as not to include portions near corner portions connected to two line segments.
摘要翻译： 轻松正确地测量光掩模图案或光掩模的OPC图案的尺寸。 本发明的图案测量方法包括以下步骤：获得与预定图案相对应的标准图案和预先指定的测量点; 设置测量区域，使其在标准图案的轮廓中包括测量点两侧的两条直线段; 以及通过将测量区域叠加在预定图案的扫描图像上，来测量测量区域中预定图案的扫描图像的两个轮廓之间的尺寸。 测量区域被设置成不包括连接到两个线段的拐角部分附近的部分。
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