公开(公告)号：US09812284B2

公开(公告)日：2017-11-07

申请号：US15070679

申请日：2016-03-15

申请人： NUFLARE TECHNOLOGY, INC.

发明人： Hideki Matsui

IPC分类号： H01J37/147 ,  H01J37/317

CPC分类号： H01J37/1472 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/103 ,  H01J2237/1504 ,  H01J2237/2485 ,  H01J2237/3175 ,  H01J2237/31754 ,  H01J2237/31762 ,  H01J2237/31766

摘要： In one embodiment, a charged particle beam drawing apparatus deflects a charged particle beam with a deflector to draw a pattern. The apparatus includes a storage unit that stores an approximate formula indicating a correspondence relationship between a settling time for a DAC amplifier that controls the deflector, and a position shift amount, from a design position, of a drawn position of each evaluation pattern drawn on a first substrate while the settling time and an amount of deflection by the deflector are changed, a shot position correction unit that creates a correction formula indicating a relationship between an amount of deflection and a shot position shift amount at the settling time, from the approximate formula and the settling time for the DAC amplifier based on an amount of deflection of a shot, obtains a position correction amount by using the amount of deflection of the shot and the correction formula, and corrects a shot position defined by the shot data based on the position correction amount, and a drawing unit that performs drawing by using the shot data with a corrected shot position.

公开(公告)号：US20160379799A1

公开(公告)日：2016-12-29

申请号：US15262087

申请日：2016-09-12

申请人： Varian Semiconductor Equipment Associates, Inc.

发明人： Frank Sinclair ,  Victor M. Benveniste

IPC分类号： H01J37/317

CPC分类号： H01J37/3171 ,  H01J37/1471 ,  H01J2237/047 ,  H01J2237/2485 ,  H01J2237/30472

摘要： A system includes a first electrode to receive an ion beam, a second electrode to receive the ion beam after passing through the first electrode, the first and second electrode forming an upstream gap defined by a convex surface on one of the first or second electrode and concave surface on the other electrode, a third electrode to receive the ion beam after passing through the second electrode, wherein the second and third electrode form a downstream gap defined by a convex surface on one of the second or third electrode and concave surface on the other electrode, wherein the second electrode has either two concave surfaces or two convex surfaces; and a voltage supply system to independently supply voltage signals to the first, second and third electrode, that accelerate and decelerate the ion beam as it passes through the first, second, and third electrode.

公开(公告)号：US20150364298A1

公开(公告)日：2015-12-17

申请号：US14736388

申请日：2015-06-11

申请人： CANON KABUSHIKI KAISHA

发明人： Masashi Kotoku ,  Kuniyasu Haginiwa

IPC分类号： H01J37/302 ,  H01J37/317

CPC分类号： H01J37/3023 ,  H01J37/3174 ,  H01J2237/2485 ,  H01J2237/30433 ,  H01L21/0274 ,  H01L23/544 ,  H01L2223/54426 ,  H01L2223/54433 ,  H01L2223/5446

摘要： There is provided a lithography apparatus advantageous in a process on a substrate, on which patterning has been performed thereby, that an external apparatus performs (in a succeeding step). The apparatus includes a controller and a transmitter. The controller extracts log information to be transmitted to the external apparatus that performs a process on the substrate, on which the patterning has been performed, among log information associated with the patterning. The transmitter transmits the extracted log information to the external apparatus.

摘要翻译： 提供了一种在外部设备执行（在后续步骤中）执行图案化的基板上的工艺中有利的光刻设备。 该装置包括控制器和发射器。 控制器提取要发送到外部设备的日志信息，该外部设备在与图案化相关联的日志信息中执行已经执行了图案化的基板上的处理。 发射机将提取的日志信息发送到外部设备。

公开(公告)号：US20150136994A1

公开(公告)日：2015-05-21

申请号：US14400561

申请日：2013-05-08

申请人： MAPPER LITHOGRAPHY IP B.V.

发明人： Teunis Van De Peut ,  Hendrik Den Boer

IPC分类号： H01J37/317 ,  H01J37/30

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/243 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0264 ,  H01J2237/0437 ,  H01J2237/2485 ,  H01J2237/31754 ,  H01J2237/31774

摘要： The invention relates to a modulation device for modulating charged particle beamlets in accordance with pattern data in a multi-beamlet charged particle lithography system. The device comprises a plate-like body, an array of beamlet deflectors, a plurality of power supply terminals (202-205) for supplying at least two different voltages, a plurality of control circuits, and a conductive slab (201) for supplying electrical power to one or more of the power supply terminals (202-205). The plate-like body is divided into an elongated beam area (51) and an elongated non-beam area (52) positioned with their long edges adjacent to each other. The beamlet deflectors are located in the beam area. The control circuits are located in non-beam area. The conductive slab is connected to the control circuits in the non-beam area. The conductive slab comprises a plurality of thin conductive plates (202-205).

摘要翻译： 本发明涉及一种用于根据多子束带电粒子光刻系统中的图案数据调制带电粒子子束的调制装置。 该装置包括板状主体，​​子束偏转器阵列，用于提供至少两个不同电压的多个电源端子（202-205），多个控制电路和用于提供电气的导电板（201） 一个或多个电源端子（202-205）的电力。 板状体被分成细长的射束区域（51）和长边相邻的细长非光束区域（52）。 子束偏转器位于光束区域中。 控制电路位于非光束区域。 导电板连接到非射束区域中的控制电路。 导电板包括多个薄导电板（202-205）。

公开(公告)号：US20150131077A1

公开(公告)日：2015-05-14

申请号：US14604488

申请日：2015-01-23

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

发明人： Ming-Zhang Kuo ,  Ping-Lin Yang ,  Cheng-Chung Lin ,  Osamu Takahashi ,  Sang Hoo Dhong

IPC分类号： H01J37/317

CPC分类号： H01J37/3175 ,  H01J37/3023 ,  H01J37/3177 ,  H01J2237/2485 ,  H01J2237/31762

摘要： An embodiment of a method of lithography includes generating a beam of electrons. A first pixel and a second pixel are each configured to pattern the beam. Using time domain multiplex loading, the first and second pixels are controlled such that the beam is patterned. The patterning includes receiving a first clock signal and using the first clock signal to generate a second clock signal and a third clock signal. The second clock signal is sent to the first pixel and sending the third clock signal is sent to the second pixel.

摘要翻译： 光刻方法的一个实施例包括产生电子束。 第一像素和第二像素都被配置为对光束进行图案化。 使用时域多路复用加载，控制第一和第二像素使得光束被图案化。 图案化包括接收第一时钟信号并使用第一时钟信号产生第二时钟信号和第三时钟信号。 第二时钟信号被发送到第一像素，并且发送第三时钟信号被发送到第二像素。

公开(公告)号：US08384048B2

公开(公告)日：2013-02-26

申请号：US12146331

申请日：2008-06-25

申请人： John C. Wiesner

发明人： John C. Wiesner

IPC分类号： G01N23/00

CPC分类号： H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/1472 ,  H01J37/244 ,  H01J37/3045 ,  H01J37/3174 ,  H01J2237/2025 ,  H01J2237/20292 ,  H01J2237/2485 ,  H01J2237/30438 ,  H01J2237/3045 ,  H01J2237/30455

摘要： The invention provides a method for patterning a resist coated substrate carried on a stage, where the patterning utilizes a charged particle beam. The method comprises the steps of: moving the stage at a nominally constant velocity in a first direction; while the stage is moving, deflecting the charged particle beam in the first direction to compensate for the movement of the stage, the deflecting including: (a) compensating for an average velocity of the stage; and (b) separately compensating for the difference between an instantaneous position of the stage and a calculated position based on the average velocity. The separately compensating step uses a bandwidth of less than 10 MHz. The invention also provides a deflector control circuit for implementing the separate compensation functions.

摘要翻译： 本发明提供了一种用于图案化承载在载物台上的抗蚀剂涂覆的基底的方法，其中图案化使用带电粒子束。 该方法包括以下步骤：在第一方向以标称恒定的速度移动舞台; 当舞台正在移动时，使带电粒子束沿第一方向偏转以补偿舞台的移动，偏转包括：（a）补偿舞台的平均速度; 和（b）基于平均速度分别补偿载物台的瞬时位置与计算的位置之间的差。 单独的补偿步骤使用小于10MHz的带宽。 本发明还提供一种用于实现单独补偿功能的偏转器控制电路。

公开(公告)号：US08344320B2

公开(公告)日：2013-01-01

申请号：US12985708

申请日：2011-01-06

申请人： Shohei Terada ,  Yoshihumi Taniguchi ,  Kazutoshi Kaji

发明人： Shohei Terada ,  Yoshihumi Taniguchi ,  Kazutoshi Kaji

IPC分类号： H01J37/147 ,  H01J37/28 ,  G01N23/02 ,  G21K5/04

CPC分类号： H01J37/26 ,  H01J37/05 ,  H01J37/224 ,  H01J37/265 ,  H01J2237/0492 ,  H01J2237/057 ,  H01J2237/10 ,  H01J2237/153 ,  H01J2237/24485 ,  H01J2237/2485 ,  H01J2237/30433

摘要： A lens adjustment method and a lens adjustment system which adjust a plurality of multi-pole lenses of an electron spectrometer attached to a transmission electron microscope, optimum conditions of the multi-pole lenses are determined through simulation based on a parameter design method using exciting currents of the multi-pole lenses as parameters.

摘要翻译： 通过使用激励电流的参数设计方法，通过模拟来确定多透镜的最佳条件，调整透镜电子显微镜的电子光谱仪的多个多极透镜的透镜调整方法和透镜调整系统 的多极镜头作为参数。

公开(公告)号：US08277603B2

公开(公告)日：2012-10-02

申请号：US11649753

申请日：2007-01-05

申请人： Shuichi Tamamushi ,  Shuichiro Fukutome

发明人： Shuichi Tamamushi ,  Shuichiro Fukutome

IPC分类号： C23F1/00 ,  H01L21/306 ,  C23C16/48 ,  C23C16/52 ,  C23C16/06 ,  C23C16/22

CPC分类号： H01J37/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/2025 ,  H01J2237/20292 ,  H01J2237/2482 ,  H01J2237/2485 ,  H01J2237/30433

摘要： A move mechanism for horizontally moving a target object in an accelerating manner, includes a moving unit configured to be horizontally moved in an accelerating manner, a plate part arranged on the moving unit and supported by the moving unit at a substantially center-of-gravity height position, and a mirror part configured to reflect a laser beam for measuring a position, the mirror part being connected to the plate part such that a center-of-gravity height position of the mirror part is arranged at the substantially center-of-gravity height position of the plate part.

摘要翻译： 一种用于以加速的方式水平移动目标物体的移动机构包括被构造成以加速方式水平移动的移动单元，布置在移动单元上并且基本上重心由移动单元支撑的板部分 高度位置以及被配置为反射用于测量位置的激光束的反射镜部分，所述反射镜部分连接到所述板部分，使得所述反射镜部分的重心高度位置被布置在基本上中心的位置， 板部分的重力高度位置。

公开(公告)号：US08249828B2

公开(公告)日：2012-08-21

申请号：US13166547

申请日：2011-06-22

申请人： Janet Teshima ,  Daniel E. Partin ,  James E. Hudson

发明人： Janet Teshima ,  Daniel E. Partin ,  James E. Hudson

IPC分类号： G01R27/28

CPC分类号： H01J37/28 ,  H01J37/302 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/24592 ,  H01J2237/2485 ,  H01J2237/2817 ,  H01J2237/31745 ,  H01L21/67253 ,  H01L21/67276

摘要： The present invention provides methods, devices, and systems for analyzing defects in an object such as a semiconductor wafer. In one embodiment, it provides a method of characterizing defects in semiconductor wafers during fabrication in a semiconductor fabrication facility. This method comprises the following actions. The semiconductor wafers are inspected to locate defects. Locations corresponding to the located defects are then stored in a defect file. A dual charged-particle beam system is automatically navigated to the vicinity defect location using information from the defect file. The defect is automatically identified and a charged particle beam image of the defect is then obtained. The charged particle beam image is then analyzed to characterize the defect. A recipe is then determined for further analysis of the defect. The recipe is then automatically executed to cut a portion of the defect using a charged particle beam. The position of the cut is based upon the analysis of the charged particle beam image. Ultimately, a surface exposed by the charged particle beam cut is imaged to obtain additional information about the defect.

摘要翻译： 本发明提供了用于分析诸如半导体晶片的物体中的缺陷的方法，装置和系统。 在一个实施例中，其提供了在半导体制造设备中制造期间表征半导体晶片中的缺陷的方法。 该方法包括以下动作。 检查半导体晶片以定位缺陷。 然后将与定位的缺陷相对应的位置存储在缺陷文件中。 使用来自缺陷文件的信息，双电荷粒子束系统被自动导航到附近的缺陷位置。 自动识别缺陷，得到缺陷的带电粒子束图像。 然后分析带电粒子束图像以表征缺陷。 然后确定配方以进一步分析缺陷。 然后自动执行配方以使用带电粒子束切割缺陷的一部分。 切割的位置是基于带电粒子束图像的分析。 最终，通过带电粒子束切割暴露的表面被成像以获得关于缺陷的附加信息。

公开(公告)号：US08199191B2

公开(公告)日：2012-06-12

申请号：US11699062

申请日：2007-01-29

申请人： Hidetoshi Sato ,  Takumichi Sutani ,  Yutaka Hojo

发明人： Hidetoshi Sato ,  Takumichi Sutani ,  Yutaka Hojo

IPC分类号： H04N7/18 ,  G02B21/00 ,  G06K9/00

CPC分类号： H01J37/28 ,  H01J2237/221 ,  H01J2237/2485 ,  H01J2237/2816 ,  H01J2237/2817

摘要： There is provided an electron microscope which is capable of making a significant contribution to accomplishment of efficiency in investigating causes for pattern abnormalities found out. The electron microscope including an I/O for capturing image data on a microscopic image acquired by another electron microscope, a computation processing unit for generating a display signal based on the image data on the microscopic image acquired by another electron microscope and captured via the I/O and image data on a microscopic image acquired by the electron microscope itself, in order that the microscopic image acquired by another electron microscope and the microscopic image acquired by the electron microscope itself are displayed at the same scale and under the same display condition, and a display unit for displaying both of the microscopic images based on the display signal from the computation processing unit.

摘要翻译： 提供了一种电子显微镜，其能够对发现的图案异常的调查原因的效率的实现方面作出重大贡献。 电子显微镜包括用于在由另一电子显微镜获取的显微镜图像上捕获图像数据的I / O，计算处理单元，用于根据由另一电子显微镜获取的显微图像上的图像数据产生显示信号，并通过I / O和通过电子显微镜本身获取的显微镜图像上的图像数据，以便通过另一电子显微镜获得的显微图像和由电子显微镜本身获取的显微图像以相同的尺度显示在相同的显示条件下， 以及显示单元，用于基于来自计算处理单元的显示信号显示两个微观图像。