摘要:
A transparent conductive film includes: a transparent film substrate; a transparent conductor layer provided on one or both sides of the transparent film substrate; and at least one undercoat layer interposed between the transparent film substrate and the transparent conductor layer; wherein: the transparent conductor layer is patterned; and a non-patterned portion not having the transparent conductor layer has the at least one undercoat layer.
摘要:
A transparent conductive film includes: a transparent film substrate; a transparent conductor layer provided on one or both sides of the transparent film substrate; and at least one undercoat layer interposed between the transparent film substrate and the transparent conductor layer; wherein: the transparent conductor layer is patterned; and a non-patterned portion not having the transparent conductor layer has the at least one undercoat layer.
摘要:
A transparent conductive film includes: a transparent film substrate; a transparent conductor layer provided on one or both sides of the transparent film substrate; and at least one undercoat layer interposed between the transparent film substrate and the transparent conductor layer; wherein: the transparent conductor layer is patterned; and a non-patterned portion not having the transparent conductor layer has the at least one undercoat layer.
摘要:
A transparent conductive laminated body comprising: a transparent film substrate having a thickness of 2 to 200 μm, and a first transparent dielectric thin film, a second transparent dielectric thin film and a transparent conductive thin film that are formed on one side of the substrate in this order from the side of the substrate, wherein the first transparent dielectric thin film is formed by vacuum deposition, sputtering or ion plating and comprises a complex oxide containing 0 to 20 parts by weight of tin oxide and 10 to 40 parts by weight of cerium oxide relative to 100 parts by weight of indium oxide, and the relationship: n2
摘要:
A transparent conductive multilayer body of the present invention is characterized by having: a transparent film base; an SiOx film (x is no less than 1.5 and less than 2) which is provided on one surface of the above described film base in accordance with a dry process, and has a thickness of 1 nm to 30 nm and a relative index of refraction of 1.6 to 1.9; an SiO2 film which is provided on the above described SiOx film and has a thickness of 10 nm to 50 nm; and a transparent conductive thin film which is provided on the above described SiO2 film and has a thickness of 20 nm to 35 nm.
摘要:
A transparent conductive laminate of the invention comprises: a transparent film substrate; a transparent conductive thin film provided on one side of the transparent film substrate; and a transparent base substrate bonded to another side of the transparent film substrate with a transparent pressure-sensitive adhesive layer interposed therebetween, wherein the transparent conductive thin film comprises a first transparent conductive thin film made of an indium-tin complex oxide in which SnO2/(SnO2+In2O3) is from 2 to 6% by weight and a second transparent conductive thin film made of an indium-tin complex oxide in which SnO2/(SnO2+In2O3) is more than 6% by weight and not more than 20% by weight, the first and second transparent conductive thin films are formed in this order from the transparent film substrate side, the thickness t1 of the first transparent conductive thin film and the thickness t2 of the second transparent conductive thin film have the following relationships: (1) t1 is from 10 to 30 nm; (2) t2 is from 5 to 20 nm; and (3) the sum of t1 and t2 is from 20 to 35 nm, the first transparent conductive thin film and the second transparent conductive thin film are both crystalline films, and the transparent base substrate is a transparent laminated base substrate comprising at least two transparent base films laminated to one another with a transparent pressure-sensitive adhesive layer interposed therebetween. The transparent conductive laminate has satisfactory reliability at high temperature and high humidity for touch panels and also has pen input durability and surface pressure durability.
摘要:
A transparent conductive laminated body comprising: a transparent film substrate having a thickness of 2 to 200 μm, and a first transparent dielectric thin film, a second transparent dielectric thin film and a transparent conductive thin film that are formed on one side of the substrate in this order from the side of the substrate, wherein the first transparent dielectric thin film is formed by vacuum deposition, sputtering or ion plating and comprises a complex oxide containing 0 to 20 parts by weight of tin oxide and 10 to 40 parts by weight of cerium oxide relative to 100 parts by weight of indium oxide, and the relationship: n2
摘要:
The present invention provides a touch panel having: a first panel board having a first base layer and a first conductive thin film disposed on one side of the first base layer; and a second panel board having a second base layer and a second conductive thin film disposed on one side of the second base layer; wherein the first panel board and the second panel board are arranged thorough a spacer so that the first conductive thin film and the second conductive thin film face each other, wherein the distance between the first conductive thin film and the second conductive thin film is from 20 to 100 μm, wherein the touch panel has a pushing angle of 3.9° or less at a point distant from an electrode provided at an end portion of the first panel board by 1.5 mm.
摘要:
The present invention provides a touch panel having: a first panel board having a first base layer and a first conductive thin film disposed on one side of the first base layer; and a second panel board having a second base layer and a second conductive thin film disposed on one side of the second base layer; wherein the first panel board and the second panel board are arranged thorough a spacer so that the first conductive thin film and the second conductive thin film face each other, wherein the distance between the first conductive thin film and the second conductive thin film is from 20 to 100 μm, wherein the touch panel has a pushing angle of 3.9° or less at a point distant from an electrode provided at an end portion of the first panel board by 1.5 mm.
摘要:
The present invention is a transparent conductive film having a flexible transparent base and a transparent conductive layer made of a crystalline conductive metal oxide that is formed on one surface of the flexible transparent base, in which the thickness of the flexible transparent base is 80 μm or less, and the difference H1−H2 between the dimensional change rate H1 when the transparent conductive film is heated at 140° C. for 30 minutes and the dimensional change rate H2 when the transparent conductive layer is removed from the transparent conductive film by etching and the transparent conductive film is heated at 140° C. for 30 minutes is −0.02 to 0.043%. Because of that, the level difference at the pattern boundary when the film is assembled into a touch panel, etc. is decreased and the deterioration of the appearance can be also suppressed.