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    Trioka Acid Semiconductor Cleaning Compositions and Methods of Use
    27.
    发明申请
    Trioka Acid Semiconductor Cleaning Compositions and Methods of Use 有权
    三孔酸性半导体清洁组合物和使用方法

    公开(公告)号：US20110180747A1

    公开(公告)日：2011-07-28

    申请号：US13082540

    申请日：2011-04-08

    申请人： WAI MUN LEE

    发明人： WAI MUN LEE

    IPC分类号： C09K13/00 ,  C11D7/36

    CPC分类号： H01L21/31133 ,  C23F1/14 ,  C23G1/066 ,  H01L21/02057 ,  H01L21/02074

    摘要： Semiconductor processing compositions for use with silicon wafers having an insulating layers and metalization layers on the wafers comprising water and one or more Troika acids which is also referred to as α,α-disubstituted trifunctional oximes or α-(Hydroxyimino) Phosphonoacetic acids, their salts, and their derivatives.

    摘要翻译： 在晶片上具有绝缘层和金属化层的半导体处理组合物，其包含水和一种或多种Troika酸，其也称为α，α-二取代三官能肟或α-（羟基亚氨基）膦酰基乙酸，其盐 ，及其衍生物。

    Process for removing deposits from water-carrying systems and devices for water supply
    29.
    发明申请
    Process for removing deposits from water-carrying systems and devices for water supply 失效
    从载水系统和供水设备中清除沉积物的方法

    公开(公告)号：US20030205536A1

    公开(公告)日：2003-11-06

    申请号：US09923051

    申请日：2001-08-06

    发明人： Michael Nurnberger ,  Robert Nusko ,  Georg Maier

    IPC分类号： B01D017/00

    CPC分类号： C02F5/105 ,  C02F1/66 ,  C02F1/683 ,  C02F1/70 ,  C02F1/722 ,  C02F5/08 ,  C02F5/145 ,  C02F2103/023 ,  C02F2305/04 ,  C23F14/02 ,  C23G1/065 ,  C23G1/066 ,  C23G1/26

    摘要： Process for removing deposits from water-carrying systems and devices for water supply, or from their individual parts, in which the deposits are dissolved by means of an aqueous treatment solution and removed in dissolved form from the system or the device or their individual parts, wherein the deposits are dissolved by means of an aqueous treatment solution comprised of a combination of (i) a reducing agent, in particular in the form of a slat-like, reducing sulfur-oxygen compound, nitrogen-oxygen compound or phosphorous-oxygen compound, and (ii) a complexing agent having phosphonic acid groups or phosphonate groups or a complexing agent of the hydroxy acid type at pH values in the range of approximately 4.5 to 9.5, in particular from approximately 6.0 to 8.0.

    摘要翻译： 从含水处理溶液中溶解有沉积物并从系统或设备或其各自部件中以溶解形式除去的用于从用水供应系统和设备供水的沉积物或其各自的部分去除沉积物的方法， 其中所述沉积物通过由以下组合组成的水处理溶液溶解：（i）还原剂，特别是板状的还原性硫 - 氧化合物，氮氧化合物或磷 - 氧化合物 ，和（ii）具有膦酸基团或膦酸酯基团的络合剂或羟基酸型络合剂，其pH值在约4.5至9.5，特别是约6.0至8.0的范围内。

    Phosphorylated and thiophosphorylated poly(oxyalkylated) hydrazines and selected adducts and their use as corrosion inhibitors
    30.
    发明授权
    Phosphorylated and thiophosphorylated poly(oxyalkylated) hydrazines and selected adducts and their use as corrosion inhibitors 失效
    磷酸化和硫代磷酸化的聚（烷氧基化）肼和选择的加合物及其用作腐蚀抑制剂

    公开(公告)号：US4438013A

    公开(公告)日：1984-03-20

    申请号：US499039

    申请日：1983-05-27

    申请人： Gregory W. Grynkewich

    发明人： Gregory W. Grynkewich

    IPC分类号： C07F9/09 ,  C07F9/165 ,  C23F11/04 ,  C23G1/06 ,  C07F9/02 ,  C23G1/18

    CPC分类号： C23G1/066 ,  C07F9/091 ,  C07F9/1651 ,  C23F11/04

    摘要： Disclosed are compositions comprising the reaction products of poly(oxyalkylated) hydrazine and at least one compound selected from the group consisting of phosphorylation agents, thiophosphorylation agents, and mixtures thereof; wherein the poly(oxyalkylated) hydrazine has the formula: ##STR1## wherein each R is individually selected from hydrogen, lower alkyl groups having 1 to 4 carbon atoms, phenyl and mixtures thereof; the sum of w, x, y and z is from about 4 to about 25, and wherein the mole ratio of said poly(oxyalkylated) hydrazine to said compound being from about 0.1:1 to about 10:1. These compositions are shown to be effective corrosion inhibitors in corrosive aqueous solutions such as brines and acid metal-treating baths.

    摘要翻译： 公开了包含聚（烷氧基化）肼和选自磷酸化剂，硫代磷酸化剂及其混合物中的至少一种化合物的反应产物的组合物; 其中所述聚（烷氧基化）肼具有下式：其中每个R独立地选自氢，具有1至4个碳原子的低级烷基，苯基及其混合物; w，x，y和z的和为约4至约25，并且其中所述聚（烷氧基化）肼与所述化合物的摩尔比为约0.1:1至约10:1。 这些组合物显示在腐蚀性水溶液如盐水和酸性金属处理浴中是有效的腐蚀抑制剂。