公开(公告)号：US20050245409A1

公开(公告)日：2005-11-03

申请号：US10836259

申请日：2004-05-03

申请人： Mihaela Cernat ,  Shihying Lee

发明人： Mihaela Cernat ,  Shihying Lee

IPC分类号： C11D1/00 ,  C11D7/08 ,  C11D7/32 ,  C11D7/50 ,  C11D11/00 ,  C23F11/14 ,  C23F11/167 ,  C23F11/173 ,  C23G1/06 ,  H01L21/02 ,  H01L21/306 ,  H01L21/311

CPC分类号： H01L21/02063 ,  C11D7/08 ,  C11D7/3209 ,  C11D7/5004 ,  C11D11/0047 ,  C23F11/141 ,  C23F11/1676 ,  C23F11/173 ,  C23G1/061 ,  C23G1/066

摘要： A novel cleaning composition used for post-etch resist residue removal is disclosed. In contrast to the conventional cleaning solutions based on fluoride chemistries, the present invention can significantly reduce the oxide loss resulting from the exfoliation, while still providing an excellent cleaning efficiency.

摘要翻译： 公开了用于蚀刻后抗蚀剂残渣去除的新型清洁组合物。 与基于氟化物化学的常规清洁溶液相比，本发明可以显着降低由剥离引起的氧化物损失，同时仍然提供优异的清洁效率。

公开(公告)号：US07479474B2

公开(公告)日：2009-01-20

申请号：US10836259

申请日：2004-05-03

申请人： Mihaela Cernat ,  Shihying Lee

发明人： Mihaela Cernat ,  Shihying Lee

IPC分类号： C09K13/08

CPC分类号： H01L21/02063 ,  C11D7/08 ,  C11D7/3209 ,  C11D7/5004 ,  C11D11/0047 ,  C23F11/141 ,  C23F11/1676 ,  C23F11/173 ,  C23G1/061 ,  C23G1/066

摘要： A novel cleaning composition used for post-etch resist residue removal is disclosed. In contrast to the conventional cleaning solutions based on fluoride chemistries, the present invention can significantly reduce the oxide loss resulting from the exfoliation, while still providing an excellent cleaning efficiency.

摘要翻译： 公开了用于蚀刻后抗蚀剂残渣去除的新型清洁组合物。 与基于氟化物化学的常规清洁溶液相比，本发明可以显着降低由剥离引起的氧化物损失，同时仍然提供优异的清洁效率。

公开(公告)号：US07273060B2

公开(公告)日：2007-09-25

申请号：US11450291

申请日：2006-06-12

申请人： Bakul P. Patel ,  Mihaela Cernat ,  Robert J. Small

发明人： Bakul P. Patel ,  Mihaela Cernat ,  Robert J. Small

IPC分类号： B08B3/04 ,  B08B3/08 ,  C11D7/32 ,  C11D7/50

CPC分类号： C23F3/06 ,  C11D3/0094 ,  C11D3/046 ,  C11D3/2058 ,  C11D3/2075 ,  C11D3/2082 ,  C11D3/2086 ,  C11D3/26 ,  C11D3/28 ,  C11D3/30 ,  C11D3/32 ,  C11D3/33 ,  C11D3/3445 ,  C11D3/43 ,  C11D11/0047

摘要： The present invention relates to methods and compositions for treating a surface of a substrate by foam technology that includes at least one treatment chemical. The invention more particularly relates to the removal of undesired matter from the surface of substrates with small features, where such undesired matter may comprise organic and inorganic compounds such as particles, films from photoresist material, and traces of any other impurities such as metals deposited during planarization or etching. A method according to the present invention for treating a surface of a substrate comprises generating a foam from a liquid composition, wherein the liquid composition comprises a gas; a surfactant; and at least one component selected from the group consisting of a fluoride, a hydroxylamine, an amine and periodic acid; contacting the foam with the surface of a substrate; and, removing the undesired matter from the surface of the substrate.

公开(公告)号：US20070135321A1

公开(公告)日：2007-06-14

申请号：US11450291

申请日：2006-06-12

申请人： Bakul Patel ,  Mihaela Cernat ,  Robert Small

发明人： Bakul Patel ,  Mihaela Cernat ,  Robert Small

IPC分类号： C11D7/32

CPC分类号： C23F3/06 ,  C11D3/0094 ,  C11D3/046 ,  C11D3/2058 ,  C11D3/2075 ,  C11D3/2082 ,  C11D3/2086 ,  C11D3/26 ,  C11D3/28 ,  C11D3/30 ,  C11D3/32 ,  C11D3/33 ,  C11D3/3445 ,  C11D3/43 ,  C11D11/0047

摘要： The present invention relates to methods and compositions for treating a surface of a substrate by foam technology that includes at least one treatment chemical. The invention more particularly relates to the removal of undesired matter from the surface of substrates with small features, where such undesired matter may comprise organic and inorganic compounds such as particles, films from photoresist material, and traces of any other impurities such as metals deposited during planarization or etching. A method according to the present invention for treating a surface of a substrate comprises generating a foam from a liquid composition, wherein the liquid composition comprises a gas; a surfactant; and at least one component selected from the group consisting of a fluoride, a hydroxylamine, an amine and periodic acid; contacting the foam with the surface of a substrate; and, removing the undesired matter from the surface of the substrate.

摘要翻译： 本发明涉及通过包括至少一种处理化学品的泡沫技术处理基材表面的方法和组合物。 本发明更具体地涉及从具有小特征的基板的表面去除不期望的物质，其中这种不期望的物质可以包含有机和无机化合物，例如颗粒，来自光致抗蚀剂材料的膜，以及痕迹的任何其它杂质，例如在 平面化或蚀刻。 根据本发明的用于处理基材表面的方法包括从液体组合物生成泡沫，其中所述液体组合物包含气体; 表面活性剂; 和选自氟化物，羟胺，胺和高碘酸的至少一种组分; 使泡沫与基材的表面接触; 并且从衬底的表面去除不需要的物质。