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公开(公告)号:US5378506A
公开(公告)日:1995-01-03
申请号:US58132
申请日:1993-05-10
Applicant: Nobuhiko Imai , Mamoru Sekiguchi , Mitsuru Kano , Thomas Krug , Gerhard Steiniger , Andreas Meier
Inventor: Nobuhiko Imai , Mamoru Sekiguchi , Mitsuru Kano , Thomas Krug , Gerhard Steiniger , Andreas Meier
CPC classification number: B65D65/42 , C23C14/081
Abstract: This invention relates to a source material for vapor deposition, which is useful for forming a magnesium oxide thin film by vacuum vapor deposition process, and to a method of forming a transparent barrier film by using the magnesium oxide source material. The source material is composed of a magnesium oxide having a bulk density of 2.5 g/ml or more. This magnesium oxide can be obtained by sintering or fusing magnesium oxide material. For producing a transparent barrier film having a gas barrier property, this magnesium oxide is vapor-deposited on a surface of a transparent plastic base film by means of vacuum vapor deposition. The volume shrinkage or cracking of the evaporation source material can be avoided, thereby stabilizing the evaporation and prolonging duration of the evaporation. Further, it is possible to utilize a high power of electron beam. Since the evaporation source material is substantially free from pore, the evacuation of gas from the evaporation apparatus can be finished within a short period of time, and the vacuum degree within the evaporation apparatus can be stabilized. Since there is no splash or scattering during the evaporation., a transparent barrier film which is uniform in thickness and free from pinhole can be obtained.
Abstract translation: 本发明涉及一种用于气相沉积的源材料,其用于通过真空气相沉积法形成氧化镁薄膜,以及通过使用氧化镁源材料形成透明阻挡膜的方法。 源材料由堆积密度为2.5g / ml以上的氧化镁构成。 该氧化镁可以通过烧结或熔融氧化镁材料得到。 为了制造具有阻气性的透明阻挡膜,通过真空气相沉积将该氧化镁气相沉积在透明塑料基膜的表面上。 可以避免蒸发源材料的体积收缩或破裂,从而稳定蒸发并延长蒸发的持续时间。 此外,可以利用大功率的电子束。 由于蒸发源材料基本上没有孔,所以可以在短时间内完成从蒸发装置排出的气体,并且可以使蒸发装置内的真空度稳定。 由于在蒸发期间没有飞溅或散射,可以获得厚度均匀且无针孔的透明阻挡膜。
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公开(公告)号:US1779014A
公开(公告)日:1930-10-21
申请号:US35059529
申请日:1929-03-28
Applicant: RICHARD SCHAFER , ANDREAS MEIER
Inventor: RICHARD SCHAFER , ANDREAS MEIER
IPC: B60C19/12
CPC classification number: B60C19/122 , Y10T152/10234
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