公开(公告)号：US06743735B2

公开(公告)日：2004-06-01

申请号：US10102288

申请日：2002-03-19

Applicant: Po-Tao Chu ,  Hsin-Yuan Chen ,  Chung-Jen Chen ,  Tai-Ming Yang ,  Cheng-Ming Wu

Inventor： Po-Tao Chu ,  Hsin-Yuan Chen ,  Chung-Jen Chen ,  Tai-Ming Yang ,  Cheng-Ming Wu

IPC: H01L21302

CPC classification number: G03F7/2026 ,  G03F7/2028 ,  H01L23/544 ,  H01L2223/54493 ,  H01L2924/0002 ,  Y10S438/906 ,  H01L2924/00

Abstract: Removing photoresist from alignment marks on a semiconductor wafer using a wafer edge exposure process is disclosed. The alignment marks on the wafer are covered by photoresist used in conjunction with semiconductor processing of one or more layers deposited on the semiconductor wafer. One or more parts of the edge of the wafer are exposed to remove the photoresist from these parts and thus reveal alignment marks on the wafer. The exposure of the one or more parts of the wafer is accomplished without performing a photolithographic clear out process. Rather, a wafer edge exposure (WEE) process is inventively utilized. Once the WEE process is performed, subsequent layers may be deposited by aligning them using the revealed alignment marks.

Abstract translation: 公开了使用晶片边缘曝光工艺从半导体晶片上的对准标记去除光致抗蚀剂。 晶片上的对准标记由与沉积在半导体晶片上的一个或多个层的半导体处理结合使用的光致抗蚀剂覆盖。 暴露晶片边缘的一个或多个部分以从这些部分去除光致抗蚀剂，从而在晶片上露出对准标记。 晶片的一个或多个部分的曝光是在不执行光刻清除工艺的情况下实现的。 相反，本发明利用晶片边缘曝光（WEE）工艺。 一旦执行了WEE过程，可以使用所显示的对准标记对准它们来沉积后续层。

公开(公告)号：US06310650B1

公开(公告)日：2001-10-30

申请号：US09158995

申请日：1998-09-23

Applicant: Michael J. Johnson ,  Chung-Jen Chen ,  Rajesh Chandrasekhar

Inventor： Michael J. Johnson ,  Chung-Jen Chen ,  Rajesh Chandrasekhar

IPC: H04N566

CPC classification number: H04N9/3147 ,  H04N9/12 ,  H04N9/3194 ,  H04N17/04

Abstract: A display system that can be calibrated and re-calibrated with a minimal amount of manual intervention. To accomplish this, one or more cameras are provided to capture an image of the display screen. The resulting captured image is processed to identify any non-desirable characteristics, including visible artifacts such as seams, bands, rings, etc. Once the non-desirable characteristics are identified, an appropriate transformation function is determined. The transformation function is used to pre-warp the input video signal that is provided to the display such that the non-desirable characteristics are reduced or eliminated from the display. The transformation function preferably compensates for spatial non-uniformity, color non-uniformity, luminance non-uniformity, and other visible artifacts.

Abstract translation: 显示系统，可以用最少量的手动干预进行校准和重新校准。 为了实现这一点，提供一个或多个相机来捕获显示屏幕的图像。 处理所得到的捕获图像以识别任何不期望的特征，包括诸如接缝，带，环等的可见伪影。一旦识别出不期望的特征，就确定适当的变换函数。 转换函数用于对提供给显示器的输入视频信号进行预变形，使得不希望的特征被减少或从显示器中消除。 变换函数优选地补偿空间不均匀性，颜色不均匀性，亮度不均匀性和其他可见伪像。