公开(公告)号：US5750312A

公开(公告)日：1998-05-12

申请号：US236706

申请日：1994-05-02

Applicant: Edwin Arthur Chandross ,  Omkaram Nalamasu ,  Elsa Reichmanis ,  Gary Newton Taylor ,  Larry Flack Thompson

Inventor： Edwin Arthur Chandross ,  Omkaram Nalamasu ,  Elsa Reichmanis ,  Gary Newton Taylor ,  Larry Flack Thompson

IPC: C08L33/00 ,  C08L33/04 ,  G03F7/004 ,  G03F7/027 ,  G03F7/039 ,  G03F7/09 ,  H01L21/027 ,  H01L21/30 ,  H01L21/302 ,  H01L21/3065 ,  G03C5/00 ,  G03F7/00

CPC classification number: G03F7/092 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/094 ,  Y10S430/162

Abstract: It has been found that surface reactions with basic materials such as amines found in the processing environment during lithographic processing contribute to a loss of linewidth control for resists such as chemically amplified resists. This loss in linewidth results from the reaction of the acid generated by exposing radiation with, for example, the amine resulting in a lack of chemical reaction where such reaction is desired. The problem is solved in one embodiment by employing an acid containing barrier layer on the resist.

Abstract translation: 已经发现，在光刻处理期间在处理环境中发现的碱性物质如胺的表面反应有助于抗蚀剂如化学放大抗蚀剂的线宽控制的损失。 这种线宽的损失是由于通过曝光辐射而产生的酸与例如胺产生的酸的反应导致缺乏需要这种反应的化学反应。 在一个实施方案中通过在抗蚀剂上使用含酸阻挡层来解决问题。

公开(公告)号：US5741629A

公开(公告)日：1998-04-21

申请号：US730560

申请日：1996-10-15

Applicant: Edwin Arthur Chandross ,  Janet Mihoko Kometani ,  Omkaram Nalamasu ,  Elsa Reichmanis ,  Kathryn Elizabeth Uhrich

Inventor： Edwin Arthur Chandross ,  Janet Mihoko Kometani ,  Omkaram Nalamasu ,  Elsa Reichmanis ,  Kathryn Elizabeth Uhrich

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/38 ,  H01L21/027 ,  G03C5/00

CPC classification number: G03F7/0758 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/039

Abstract: Polymers suitable for chemically amplified resists based on styrene chemistry are advantageously formed with a meta substituent on the phenyl ring of the styrene moiety. Additionally, polymers for such applications including, but not limited to, meta substituted polymers are advantageously formed by reacting a first monomer having a first protective group with a second monomer having a second protective group. After polymerization, the second protective group is removed without substantially affecting the first protective group. For example, if the first protective group is an alkoxy carbonyl group, and the second protective group is a silyl ether group, treatment with a lower alcohol with trace amounts of acid transforms the silyl group into an OH-moiety without affecting the alkoxy carbonyl group.

Abstract translation: 适用于基于苯乙烯化学的化学放大抗蚀剂的聚合物有利地由苯乙烯部分的苯环上的间位取代基形成。 此外，通过使具有第一保护基的第一单体与具有第二保护基的第二单体反应，可有利地形成用于这种应用的聚合物，包括但不限于间位取代的聚合物。 聚合后，除去第二保护基，而基本不影响第一保护基。 例如，如果第一保护基为烷氧基羰基，第二保护基为甲硅烷基醚基，则用低级醇与微量酸处理将甲硅烷基转变为OH-部分而不影响烷氧基羰基 。

公开(公告)号：US4400461A

公开(公告)日：1983-08-23

申请号：US265554

申请日：1981-05-22

Applicant: Edwin A. Chandross ,  Elsa Reichmanis ,  Cletus W. Wilkins, Jr.

Inventor： Edwin A. Chandross ,  Elsa Reichmanis ,  Cletus W. Wilkins, Jr.

IPC: C08K5/00 ,  C08K5/32 ,  C08L33/00 ,  C08L33/02 ,  G03C1/00 ,  G03F7/004 ,  G03F7/039 ,  G03C5/00

CPC classification number: G03F7/0045

Abstract: Photosensitive bodies that are sensitive to ultraviolet radiation and that exhibit excellent contrast are formed from base soluble polymers such as poly(methyl methacrylate-co-methacrylic acid) physically mixed with base insoluble materials such as o-nitrobenzyl esters. The base insoluble esters decompose upon irradiation to form base soluble entities in the irradiated regions. These irradiated portions are then soluble in basic solutions that are used to develop the desired image.

Abstract translation: 对紫外线辐射敏感并且表现出优异对比度的感光体由基础可溶性聚合物形成，例如与基础不溶性物质如邻硝基苄基酯物理混合的聚（甲基丙烯酸甲酯 - 共 - 甲基丙烯酸）。 碱不溶性酯在照射时分解，以在照射区域中形成碱溶性实体。 然后这些照射的部分可溶于用于显影所需图像的碱性溶液中。