Abstract:
A sled carriage is configured to move in a direction of an axis. A platform is attached with the sled carriage and a sled buck is attached with the platform. Upon acceleration of the sled carriage, the sled buck and platform move relative to the sled carriage.
Abstract:
A method and apparatus for an adaptive search user interface is provided. An interface is provided that returns search results upon receiving each alphanumeric character of a search query term. Correlations of prefixes of alphanumeric characters and search results selected from previous searches are stored in a correlation matrix. Based upon the correlations in the correlation matrix, relevance rankings for search results with respect to the prefixes of alphanumeric characters are updated. Search results may be grouped based upon one or more common traits. Relevance rankings are also updated based upon the rate of change of selections recorded for a search result.
Abstract:
A power amplifier includes a LDMOS transistor having a source, a drain, a control gate and a shielding electrode positioned between the control gate and the drain, and means for adaptively biasing the drain and shielding electrode power information for a RF signal.
Abstract:
A laminating machine includes two side frames and two rolls rotatably mounted between the side frames. One of the rolls has a first gear securely mounted thereon, and the other roll has a second gear securely mounted thereon. A movable plate is pivoted to one of the side frames. A unidirectional motor is mounted to a side of the movable plate and has an output shaft on which a clutch gear is securely mounted. The clutch gear is optionally meshed with one of the first gear and the second gear upon pivotal movement of the movable plate between a first position and a second position, allowing the object to be laminated to be moved forward or rearward depending on the need of the user.
Abstract:
Soft-labeled keys (SLKs) of a wireless terminal or other type of terminal in a communication system are controlled in an efficient manner using a state-based control model. In an illustrative embodiment, a state machine is generated such that each state in the state machine specifies a set of labels for a corresponding set of soft-labeled keys associated with the wireless terminal. At least a portion of the state machine is downloaded from a switch of the system, and processed to generate a display including a given one of the sets of labels. The state machine may be in the form of a state transition table which includes, for each state, (i) a set of labels for the set of soft-labeled keys, (ii) a set of feature identifiers, e.g., system codes, each identifying, for a given one of the labels, a particular feature supported by the switch, and (iii) a next state which is entered when the corresponding soft-labeled key is selected by the user. After a given one of the soft-labeled keys is selected by a user, the corresponding feature identifier is transmitted from the wireless terminal to the switch. The state transition table may also support a local mode in which selecting a particular SLK in a given state causes the terminal to execute a specified local program, after which the terminal returns to the given state. Updating of the display may be controlled locally by the wireless terminal, or by the switch sending an indication of the next state to the wireless terminal.
Abstract:
A method is disclosed for forming self-aligned, borderless contact and vias together and simultaneously with relaxed photolithographic alignment tolerances using a modified dual damascene process having two etch-stop layers. A first etch-stop layer is formed over a first dielectric layer. A second dielectric layer and a second etch-stop layer are next formed sequentially over the first etch-stop layer. Contact/via hole pattern is etched into the first etch-stop layer using a first photoresist layer. A second photoresist layer, patterned with metal line trench pattern, is formed over the contact/via patterned first etch-stop layer. The contact/via hole openings are etched into the first dielectric layer until the second etch-stop layer is reached. Then, both the first and second etch-stop layers are etched through the openings. The openings in the first and second etch-stop layers are both extended by etching the second and first dielectric layers, respectively, until the former opening reaches the second etch-stop layer, and the latter reaches the underlying substructure of devices within the semiconductor substrate. Thus, a combination of contact via interconnects, without borders, and self-aligned with respect to metal lines with relaxed photolithographic tolerances is formed together and simultaneously using a modified dual damascene process having two etch-stop layers.
Abstract:
A method for making a planar interlevel dielectric (ILD) layer, having improved thickness uniforming across the substrate surface, over a patterned electrically conducting layer is achieved. The method involves forming electrically conducting lines on which is deposited a conformal first insulating layer that is uniformly thick across the substrate. An etch-stop composed of Si3N4 is deposited and a second insulating layer, composed of SiO2 or a low-dielectric-constant insulator, is deposited. The second insulating layer is then partially chemically/mechanically polished back to within a few thousand Angstroms of the etch-stop layer. The remaining second insulating layer is then plasma etched back selectively to the etch-stop layer to form a planar surface having a uniformly thick first insulating layer over the electrically conducting lines. The contact openings or via holes can now etched to a uniform depth in the etch-stop layer and the first insulating layer across the substrate. This results in contact openings having a constant aspect ratio across the substrate, thereby resulting in more repeatable and reliable contact resistance (Rc).
Abstract:
A blanket, having a blanket head and a blanket foot. The blanket has a light side and a heavy side, both extending between the blanket head and blanket foot. The light side has a light side insulation thickness, and the heavy side has a heavy side insulation thickness. A transitional area is located between the light side and heavy side, the transitional area uniformly varies in insulation thickness between the light side insulation thickness and the heavy side insulation thickness. Straps present at the blanket foot and at the heavy side are present to secure the blanket to a bed frame.