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52 条记录 (耗时 0.016 秒)

    Clip spring member
    35.
    外观设计
    Clip spring member 失效
    夹子弹簧件

    公开(公告)号：USD476553S1

    公开(公告)日：2003-07-01

    申请号：US29145526

    申请日：2001-07-26

    申请人： Kenji Niwa

    设计人： Kenji Niwa

    Part support tool
    36.
    外观设计
    Part support tool 失效
    零件支持工具

    公开(公告)号：USD464364S1

    公开(公告)日：2002-10-15

    申请号：US29136321

    申请日：2001-01-30

    申请人： Kenji Niwa

    设计人： Kenji Niwa

    Semiconductor device and method of manufacturing the same
    37.
    发明授权
    Semiconductor device and method of manufacturing the same 失效
    半导体装置及其制造方法

    公开(公告)号：US06218721B1

    公开(公告)日：2001-04-17

    申请号：US09006222

    申请日：1998-01-13

    申请人： Kenji Niwa

    发明人： Kenji Niwa

    IPC分类号： H01L2900

    CPC分类号： H01L23/5258 ,  H01L2924/0002 ,  H01L2924/00

    摘要： A semiconductor device includes a fuse constituted by a lower interconnection, an upper metal interconnection, and a plug. The lower interconnection is formed on a semiconductor substrate. The upper metal interconnection is formed on the lower interconnection through interlevel insulating film to have an overlap region that overlaps at least part of the lower interconnection. The plug is formed in the overlap region to electrically connect the upper metal interconnection and the lower interconnection to each other. A method of manufacturing a semiconductor device is also disclosed.

    摘要翻译： 半导体器件包括由下互连，上金属互连和插头构成的保险丝。 下部互连形成在半导体衬底上。 上金属互连通过层间绝缘膜形成在下布线上，以具有与下互连的至少一部分重叠的重叠区域。 插头形成在重叠区域中以将上金属互连和下互连彼此电连接。 还公开了半导体器件的制造方法。

    Rotatable circular saw with parallelism adjustment function
    38.
    发明授权
    Rotatable circular saw with parallelism adjustment function 失效
    可旋转圆锯具有平行度调节功能

    公开(公告)号：US5848472A

    公开(公告)日：1998-12-15

    申请号：US736737

    申请日：1996-10-25

    申请人： Naoya Eto ,  Hiroshi Sato ,  Takuma Nonaka ,  Kenji Niwa

    发明人： Naoya Eto ,  Hiroshi Sato ,  Takuma Nonaka ,  Kenji Niwa

    IPC分类号： B23D59/00 ,  B27B9/00 ,  B23D45/16

    CPC分类号： B23D59/002 ,  B27B9/00

    摘要： A portable circular saw is disclosed which includes a mechanism for simply and efficiently adjusting parallelism of the saw blade to the base. Two connecting members positioned at the front and rear of the saw connect the base of the saw to the saw cover, and the mechanism for adjusting parallelism is part of the front connecting member.

    摘要翻译： 公开了一种便携式圆锯，其包括用于简单且有效地调节锯片与基座的平行度的机构。 定位在锯的前后的两个连接构件将锯的基部连接到锯盖，并且用于调节平行度的机构是前连接构件的一部分。

    Positive photoresist aqueous developer solution containing quaternary ammonium hydroxide with aliphatic ketone or cyclic ether alone or with amine as development modifier
    39.
    发明授权
    Positive photoresist aqueous developer solution containing quaternary ammonium hydroxide with aliphatic ketone or cyclic ether alone or with amine as development modifier 失效
    含有季铵氢氧化物与单独的脂族酮或环状醚或与胺作为显影改性剂的正性光致抗蚀剂水性显影剂溶液

    公开(公告)号：US4741989A

    公开(公告)日：1988-05-03

    申请号：US869858

    申请日：1986-05-28

    申请人： Kenji Niwa ,  Ichiro Ichikawa

    发明人： Kenji Niwa ,  Ichiro Ichikawa

    IPC分类号： G03C1/72 ,  G03F7/32 ,  G03C5/00 ,  G03C5/34

    CPC分类号： G03F7/322

    摘要： A developer for positive photoresists which can improve the sensitivity and resolution of the resist is disclosed. The developer comprises an aqueous solution of a quaternary ammonium hydroxide represented by the formula (I): ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, and R.sub.4 are each an alkyl group having 1 to 4 carbon atoms or a hydroxyalkyl group having 1 to 5 carbon atoms, and at least one development modifier selected from the group consisting of water-soluble aliphatic ketones, cyclic ethers, and tertiary amines, and optionally, at least one another development modifier selected from the group consisting of water-soluble primary amines and secondary amines.

    摘要翻译： 公开了一种可以提高抗蚀剂的灵敏度和分辨率的正光致抗蚀剂的显影剂。 显色剂包含由式（I）表示的季铵氢氧化物的水溶液：其中R 1，R 2，R 3和R 4各自为具有1至4个碳原子的烷基或具有 1至5个碳原子，和至少一种显影改性剂，其选自水溶性脂族酮，环醚和叔胺，以及任选的至少一种其它显影改性剂，其选自水溶性初级 胺和仲胺。

    Method of purifying tantalum
    40.
    发明授权
    Method of purifying tantalum 失效
    钽的净化方法

    公开(公告)号：US4673554A

    公开(公告)日：1987-06-16

    申请号：US808767

    申请日：1985-12-13

    申请人： Kenji Niwa ,  Ichiro Ichikawa

    发明人： Kenji Niwa ,  Ichiro Ichikawa

    IPC分类号： C01G35/00 ,  C22B3/28 ,  C22B34/24

    CPC分类号： C22B34/24 ,  C01G35/003 ,  C22B3/0016 ,  Y02P10/234

    摘要： A method for obtaining high-purity tantalum pentoxide is disclosed, which comprises the following steps:dissolving a crude tantalum-containing compound in an acid containing hydrofluoric acid;mixing and bringing the resulting acidic aqueous solution of the crude tantalum-containing compound into contact with an organic solution composed of a water-insoluble quaternary ammonium compound and a water-insoluble organic solvent, to extract the tantalum from said acidic aqueous solution into said organic solution;mixing said organic solution with an aqueous solution containing at least one compound selected from the group consisting of an inorganic acid and an ammonium salt, to remove any of the impurities that have partly been extracted into said organic solution together with tantalum from said organic solution;converting the tantalum in said organic solution to tantalum hydroxide by treatment with an alkali containing ammonium hydroxide; andprecipitating said tantalum hydroxide and separating it, followed by calcining it to obtain high-purity tantalum pentoxide. The tantalum pentoxide has an extremely high purity as five to six nines (99.999% to 99.9999%).

    摘要翻译： 公开了一种获得高纯度五氧化二钽的方法，其包括以下步骤：将含粗钽的化合物溶解在含有氢氟酸的酸中; 将得到的含粗钽化合物的酸性水溶液混合并与由水不溶性季铵化合物和水不溶性有机溶剂组成的有机溶液接触，将钽从所述酸性水溶液中提取到所述有机溶剂中 解; 将所述有机溶液与含有至少一种选自无机酸和铵盐的化合物的水溶液混合，以除去部分从所述有机溶液中与钽一起萃取到所述有机溶液中的杂质; 通过用含氢氧化铵处理将所述有机溶液中的钽转化为氢氧化钽; 并沉淀所述氢氧化钽并分离，然后煅烧，得到高纯度的五氧化二钽。 五氧化二钽具有非常高的纯度，为五至六（99.999％至99.9999％）。