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    UV RADIATION SOURCE ASSEMBLY
    31.
    发明申请
    UV RADIATION SOURCE ASSEMBLY 有权

    公开(公告)号：US20230139822A1

    公开(公告)日：2023-05-04

    申请号：US18147956

    申请日：2022-12-29

    Applicant: TROJAN TECHNOLOGIES GROUP ULC

    Inventor： Patrick Alexander FAY

    IPC: H01J61/36 ,  C02F1/32 ,  A61L2/08 ,  H01J5/60

    Abstract: A radiation source assembly comprises a source base, a UV transparent sleeve, and a UV lamp. The source base comprises a sealed electrical connection interface and an opposing sealed sleeve interface. The sealed electrical connection interface comprises a electrical contacts and the sealed sleeve interface comprise a radial sealing element, an outer collar, and a compression ring. The UV transparent sleeve is engaged with the sleeve interface such that the radial sealing element of the sealed sleeve interface is disposed between the UV transparent sleeve and the outer collar of the source base, and the compression ring is positioned over the UV transparent sleeve and engaged with the source base to compress the radial sealing element onto the UV transparent sleeve and the outer collar. The UV lamp is disposed within the UV transparent sleeve and electrically coupled to the electrical contacts of the electrical connection interface.

    LAMP WITH TEMPERATURE CONTROL
    32.
    发明申请
    LAMP WITH TEMPERATURE CONTROL 有权

    公开(公告)号：US20220037143A1

    公开(公告)日：2022-02-03

    申请号：US17351879

    申请日：2021-06-18

    Applicant: Trojan Technologies Group ULC

    Inventor： David Earl Bascin

    IPC: H01K1/62 ,  H01K1/54 ,  H01K1/58

    Abstract: An embodiment provides a lamp apparatus, including: at least one filament; an amount of amalgam; a heat-sink assembly connected to the lamp apparatus; and at least one control circuit comprising a heating element and a temperature measurement element connected to the at least one filament, wherein the control circuit varies the electrical power delivered to the heating element, thereby controlling an internal temperature of the lamp apparatus relative to a temperature set point. Other aspects are described and claimed.

    BALLAST WATER TREATMENT DURING DE-BALLASTING
    33.
    发明申请
    BALLAST WATER TREATMENT DURING DE-BALLASTING 有权

    公开(公告)号：US20210122647A1

    公开(公告)日：2021-04-29

    申请号：US16667756

    申请日：2019-10-29

    Applicant: Trojan Technologies Group ULC

    Inventor： Glen E. Latimer, JR. ,  Allison Diane Miller

    IPC: C02F1/00 ,  B63J4/00 ,  C02F1/32

    Abstract: An embodiment provides a ballast water treatment system, including: a ballast pump; a backwash pump, wherein an outflow of the backwash pump is mechanically coupled to an outlet of the ballast pump; a treatment unit, wherein the treatment unit is located fluidly between the ballast pump and the backwash pump; wherein the ballast water treatment system has at least two modes, comprising: a ballast mode, wherein, during the ballast mode, the ballast pump pumps water through the ballast treatment system to a ballast tank, and a de-ballast mode, wherein, during the de-ballast mode, the backwash pump conveys backwash water to an outlet of the ballast pump. Other aspects are described and claimed.

    Process and device for the treatment of a fluid containing a contaminant
    34.
    发明授权
    Process and device for the treatment of a fluid containing a contaminant 有权

    公开(公告)号：US10807882B2

    公开(公告)日：2020-10-20

    申请号：US15191001

    申请日：2016-06-23

    Applicant: Trojan Technologies

    Inventor： Yuri Andrew Lawryshyn ,  Tai Fung Tang ,  Domenico Santoro ,  Siva Rajan Sarathy

    IPC: C02F1/00 ,  C02F1/68 ,  C02F1/32 ,  C02F1/50

    Abstract: In one of its aspects, the invention relates to a process to optimize the dose of a treatment agent for the treatment of a fluid comprising a contaminant. In this first aspect the process comprises the steps of: (a) calculating the dose of the treatment agent based on the relationship between concentration of the treatment agent at one or more points and residence time distribution of the treatment system, and (b) contacting the fluid with the treatment agent in the concentration required to meet the dose calculated in step (a). In another one of its aspects, the invention relates to a process to optimize the dose of a treatment agent for reduction of a contaminant in a fluid.

    Radiation Source Assembly
    36.
    发明申请
    Radiation Source Assembly 有权
    辐射源组件

    公开(公告)号：US20170022073A1

    公开(公告)日：2017-01-26

    申请号：US15302618

    申请日：2015-04-10

    Applicant: Trojan Technologies

    Inventor： Douglas Penhale

    IPC: C02F1/32 ,  H01J5/60 ,  H01J61/36

    CPC classification number: C02F1/325 ,  A61L2/08 ,  C02F2201/3227 ,  H01J5/60 ,  H01J61/02 ,  H01J61/36

    Abstract: There is disclosed a coupling for a radiation source assembly that comprises an elongate radiation source and an elongate radiation transparent protective sleeve for receiving the elongate radiation source. The coupling disengages in two stages when it is desired to remove the elongate radiation source for servicing (or any other purpose). The coupling is disengaged from a first position in which a seal is made between the sleeve bolt element and the lamp plug element. When this action takes place, the lamp plug element is still secure with respect to the sleeve bolt element but since there is no seal between the two, any fluid which has flooded the elongate radiation source (e.g., due to breakage or other damage to the protective sleeve) will emerge from the coupling warning the operator not to fully disengage the lamp plug element from the sleeve bolt element. If no such fluid is seen by operator, the operator may continue to disengage the lamp plug element from the sleeve bolt element to withdraw the elongate radiation source from the elongate radiation transparent protective sleeve.

    Abstract translation: 公开了一种用于辐射源组件的联接器，其包括细长辐射源和用于接纳细长辐射源的细长辐射透明保护套筒。 当期望除去用于维修的细长辐射源（或任何其它目的）时，联接器在两个阶段中脱离。 联接器从其中在套筒螺栓元件和灯头元件之间形成密封件的第一位置脱离。 当该动作发生时，灯头元件相对于套筒螺栓元件仍然是固定的，但由于两者之间没有密封，所以已经淹没了细长辐射源的任何流体（例如，由于断裂或其他损坏 保护套）将从联轴器中出现，警告操作者不要将灯塞元件与套筒螺栓元件完全脱离。 如果操作者没有看到这样的流体，则操作者可以继续使灯插头元件与套筒螺栓元件脱离接合，以从细长辐射透明保护套筒中取出细长辐射源。

    CLEANING APPARATUS
    38.
    发明申请
    CLEANING APPARATUS 审中-公开
    清洁装置

    公开(公告)号：US20150329380A1

    公开(公告)日：2015-11-19

    申请号：US14650426

    申请日：2013-12-09

    Applicant: TROJAN TECHNOLOGIES

    Inventor： Chongze Zhu ,  Yonglin Chen

    IPC: C02F1/32 ,  B08B1/00

    CPC classification number: C02F1/325 ,  B01J19/12 ,  B08B1/008 ,  B08B9/023 ,  C02F2201/3223 ,  C02F2201/3225 ,  C02F2201/324 ,  C02F2303/14

    Abstract: There is disclosed a cleaning apparatus for a radiation source assembly in a fluid treatment system. The cleaning system comprises: a cleaning carriage comprising at least one cleaning element for contact with at least a portion of the exterior of the radiation source assembly; a rodless cylinder comprising an elongate housing having a longitudinal axis; a slidable element disposed on an exterior surface of the elongate housing, the slidable element being: (i) coupled to the cleaning carriage, and (ii) magnetically coupled to a driving element disposed within the elongate housing, the driving element comprising a friction modifying element in contact with an interior surface of the elongate housing to define a first frictional resistance in a rotational direction about the longitudinal axis and a second frictional resistance in an axial direction along the longitudinal axis, the friction modifying element configured such that the first frictional resistance is greater than the second friction resistance; and an elongate motive element coupled to the driving element.

    Abstract translation: 公开了一种用于流体处理系统中的辐射源组件的清洁装置。 清洁系统包括：清洁托架，其包括用于与辐射源组件的外部的至少一部分接触的至少一个清洁元件; 无杆气缸，包括具有纵向轴线的细长壳体; 可滑动元件，其设置在所述细长壳体的外表面上，所述可滑动元件：（i）联接到所述清洁托架，以及（ii）磁耦合到设置在所述细长壳体内的驱动元件，所述驱动元件包括摩擦修正 元件，其与所述细长壳体的内表面接触以限定围绕所述纵向轴线的旋转方向上的第一摩擦阻力，以及沿着所述纵向轴线沿轴向方向的第二摩擦阻力，所述摩擦修改元件构造成使得所述第一摩擦阻力 大于第二摩擦阻力; 以及耦合到驱动元件的细长动力元件。

    FLUID TREATMENT SYSTEM
    39.
    发明申请
    FLUID TREATMENT SYSTEM 审中-公开
    流体处理系统

    公开(公告)号：US20140360947A1

    公开(公告)日：2014-12-11

    申请号：US14458692

    申请日：2014-08-13

    Applicant: TROJAN TECHNOLOGIES INC.

    Inventor： WES FROM ,  BOYKO M. TCHAVDAROV ,  MIKE MARCU ,  RICHARD GRATTON ,  DAVID OLSON ,  JIM FRASER ,  DUSKO A. KEZELE

    IPC: C02F1/32

    CPC classification number: C02F1/325 ,  A61L2/10 ,  C02F1/006 ,  C02F1/32 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/3228 ,  C02F2201/324 ,  C02F2201/328

    Abstract: A fluid treatment system having an inlet, an outlet, and a fluid treatment zone therebetween. The zone has an array of rows of radiation source assemblies. Each radiation source assembly has a longitudinal axis disposed at an oblique angle with respect to a direction of fluid flow. Each row has a plurality of radiation source assemblies in spaced relation in a direction transverse to the direction of fluid flow, to define a gap through which fluid may flow between an adjacent pair of assemblies. Preferably, all rows in the array are staggered with respect to one another in a direction orthogonal to the direction of fluid flow, such that the gap between an adjacent pair of radiation source assemblies in an upstream row of assemblies is partially or completely obstructed in the direction of fluid flow by a serially disposed radiation source assembly in at least one downstream row.

    Abstract translation: 一种在其间具有入口，出口和流体处理区域的流体处理系统。 该区域具有排列的辐射源组件。 每个辐射源组件具有相对于流体流动方向以倾斜角度设置的纵向轴线。 每排具有在横向于流体流动方向的方向上间隔开的多个辐射源组件，以限定一个间隙，流体可以通过该间隙在相邻的一对组件之间流动。 优选地，阵列中的所有行在与流体流动方向正交的方向上彼此交错，使得上游排组件中相邻的一对辐射源组件之间的间隙在 在至少一个下游排中通过串联设置的辐射源组件的流体流动方向。

    FLUID TREATMENT SYSTEM
    40.
    发明申请
    FLUID TREATMENT SYSTEM 有权
    流体处理系统

    公开(公告)号：US20130277571A1

    公开(公告)日：2013-10-24

    申请号：US13920327

    申请日：2013-06-18

    Applicant: TROJAN TECHNOLOGIES INC.

    Inventor： WES FROM ,  BOYKO M. TCHAVDAROV ,  MIKE MARCU ,  RICHARD GRATTON ,  DAVID OLSON ,  JIM FRASER ,  DUSKO A. KEZELE

    IPC: C02F1/32

    CPC classification number: C02F1/325 ,  A61L2/10 ,  C02F1/006 ,  C02F1/32 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/3228 ,  C02F2201/324 ,  C02F2201/328

    Abstract: A fluid treatment system having an inlet, an outlet, and a fluid treatment zone therebetween. The zone has an array of rows of radiation source assemblies. Each radiation source assembly has a longitudinal axis disposed at an oblique angle with respect to a direction of fluid flow. Each row has a plurality of radiation source assemblies in spaced relation in a direction transverse to the direction of fluid flow, to define a gap through which fluid may flow between an adjacent pair of assemblies. Preferably, all rows in the array are staggered with respect to one another in a direction orthogonal to the direction of fluid flow, such that the gap between an adjacent pair of radiation source assemblies in an upstream row of assemblies is partially or completely obstructed in the direction of fluid flow by a serially disposed radiation source assembly in at least one downstream row.

    Abstract translation: 一种在其间具有入口，出口和流体处理区域的流体处理系统。 该区域具有排列的辐射源组件。 每个辐射源组件具有相对于流体流动方向以倾斜角度设置的纵向轴线。 每排具有在横向于流体流动方向的方向上间隔开的多个辐射源组件，以限定一个间隙，流体可以通过该间隙在相邻的一对组件之间流动。 优选地，阵列中的所有行在与流体流动方向正交的方向上彼此交错，使得上游排组件中相邻的一对辐射源组件之间的间隙在 在至少一个下游排中通过串联设置的辐射源组件的流体流动方向。

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