Cleaning apparatus
    1.
    发明申请
    Cleaning apparatus 失效
    清洁装置

    公开(公告)号:US20040140434A1

    公开(公告)日:2004-07-22

    申请号:US10345951

    申请日:2003-01-17

    Inventor: Peter Ueberall

    CPC classification number: B08B9/023

    Abstract: A cleaning apparatus with cleaning rings for cleaning cylindrical bodies, preferably for the quartz cladding tubes in UV disinfection units, especially in UV disinfection sluices for waste water, which in addition to an axially parallel longitudinal movement over the outside surfaces perform an additional angularly limited and alternating rotational movement The object of the invention is a cleaning apparatus with cleaning rings for cleaning cylindrical bodies, preferably for the quartz cladding tubes in UV disinfection units, especially in UV disinfection sluices for waste water, which in addition to an axially parallel longitudinal movement over the outside surfaces perform an additional angularly limited and alternating rotational movement. According to the inventive idea the cleaning rings are moved slowly in an axially parallel way over the quartz cladding tubes, with the same moving additionally in an angularly limited and with suitable speed alternatingly about a rotational axis for reinforcing the cleaning performance and especially for the better penetration of troughs at places that are out of round. This manner of movement of the cleaning rings necessitates a considerably lower amount of mechanical complexity at virtually the same cleaning performance than would be necessary in a full and uninterrupted rotation of the cleaning rings. Compared with the usual rigid wiper rings which are moved back and forth in an axially parallel manner on the quartz cladding tubes without any rotational movement, the cleaning performance with the cleaning rings according to the inventive idea is considerably better.

    Abstract translation: 具有用于清洁圆柱体的清洁环的清洁装置,优选用于UV消毒单元中的石英包层管,特别是用于废水的UV消毒闸门,除了在外表面上的轴向平行的纵向运动之外,还执行额外的角度限制和 交替旋转运动本发明的目的是一种具有用于清洁圆柱体的清洁环的清洁装置,优选用于紫外线消毒单元中的石英包层管,特别是用于废水的紫外线消毒水闸,除了轴向平行的纵向运动 外表面执行额外的角度限制和交替的旋转运动。 根据本发明的想法,清洁环以轴向平行的方式缓慢地移动到石英包层管上方,并且以相对于旋转轴线交替地以角度限制和适当的速度另外移动,以增强清洁性能,特别是对于更好的 在不合适的地方渗透槽。 清洁环的这种移动方式在与清洁环的完全和不间断旋转所需的实质上相同的清洁性能下需要相当低的机械复杂性。 与在石英包层管上轴向平行移动而没有任何旋转运动的通常的刚性擦拭环相比,根据本发明构思的清洁环的清洁性能相当好。

    Fluid treatment system
    2.
    发明申请
    Fluid treatment system 失效
    流体处理系统

    公开(公告)号:US20030080071A1

    公开(公告)日:2003-05-01

    申请号:US10247317

    申请日:2002-09-20

    Abstract: There is described a fluid treatment system comprising an array of independent fluid treatment reactors. The reactors are arranged in a manner whereby a flow of fluid may be passed through the array in a substantially helical direction. The fluid treatment system is capable of treating large volumes of fluid (e.g., water) while requiring a relatively small foot print. In essence, the present fluid treatment system concentrates a relatively large number of radiation sources in a relatively small amount of space resulting in the ability to treat large volumes of fluid (e.g., water).

    Abstract translation: 描述了包括独立流体处理反应器阵列的流体处理系统。 反应器以这样的方式排列,使得流体流可以以基本螺旋方向通过阵列。 流体处理系统能够处理大量的流体(例如水),同时需要相对小的脚印。 本质上,本流体处理系统将相对大量的辐射源集中在相对少量的空间中,从而产生处理大量流体(例如水)的能力。

    Sectoral ring brush
    3.
    发明申请
    Sectoral ring brush 审中-公开
    部门环刷

    公开(公告)号:US20040216254A1

    公开(公告)日:2004-11-04

    申请号:US10428156

    申请日:2003-05-02

    Inventor: Peter Ueberall

    Abstract: A sectoral ring brush with inside trimming for keeping clear and/or cleaning cylindrical bodies, preferably quartz cladding tubes in UV disinfection units, especially in UV disinfection sluices for the disinfection of waste water, characterized in that the sectoral ring brush consists of sectoral elements whose trimming can be integrated prior to the installation in a housing, with the sectoral element being fastened individually or in a connected fashion, e.g. by connecting bridges on the circumference, in a ring-shaped housing.

    Abstract translation: 具有内部修整的扇形环刷,用于保持清洁和/或清洁圆柱形体,优选在UV消毒单元中的石英包层管,特别是用于消毒废水的UV消毒闸门中,其特征在于扇形环刷由扇形元件组成, 修整可以在安装在外壳中之前集成,其中扇形元件单独地或以连接方式固定,例如 通过在圆周上连接桥,在环形壳体中。

    Radiation source module
    4.
    发明申请
    Radiation source module 失效
    辐射源模块

    公开(公告)号:US20040211926A1

    公开(公告)日:2004-10-28

    申请号:US10846592

    申请日:2004-05-17

    CPC classification number: C02F1/325 A61L2/10 C02F2201/3227

    Abstract: The present invention provides a radiation source module for use in a fluid treatment system. In one embodiment, the module comprises: a substantially elongate first support member having a longitudinal first axis; and a first pair of radiation source assemblies extending from the first support member, each radiation source assembly comprising a radiation source; wherein the first pair of radiation source assemblies is oriented such that a second axis extending through a center point of each radiation source assembly is disposed at an angle with respect to the first axis. In another embodiment, the module comprises a substantially elongate first support member having a longitudinal first axis; and a first column of radiation source assemblies extending from the first support member, and a second column of radiation source assemblies extending from the first support member, each radiation source assembly comprising a radiation source;the first column of radiation source assemblies and the second column of radiation source assemblies disposed adjacent one another.

    Abstract translation: 本发明提供一种用于流体处理系统的辐射源模块。 在一个实施例中,模块包括:具有纵向第一轴线的基本细长的第一支撑构件; 以及从所述第一支撑构件延伸的第一对辐射源组件,每个辐射源组件包括辐射源; 其中所述第一对辐射源组件被定向成使得穿过每个辐射源组件的中心点的第二轴线相对于所述第一轴线成一定角度设置。 在另一个实施例中,模块包括具有纵向第一轴线的基本细长的第一支撑构件; 以及从第一支撑构件延伸的第一列辐射源组件和从第一支撑构件延伸的第二列辐射源组件,每个辐射源组件包括辐射源;第一列辐射源组件和第二列 的相邻的辐射源组件。

    Fluid treatment system and radiation sources module for use therein
    5.
    发明申请
    Fluid treatment system and radiation sources module for use therein 有权
    流体处理系统和辐射源模块

    公开(公告)号:US20040069954A1

    公开(公告)日:2004-04-15

    申请号:US10464849

    申请日:2003-06-19

    Abstract: A radiation source module comprising a support member, a radiation source assembly connected to the support member, the radiation source assembly comprising at least one elongate radiation source having a source longitudinal axis and a module-to-surface seal disposed on a first elongate surface of the module, the first elongate surface comprising a first longitudinal axis transverse to the source longitudinal axis, the seal operable to provide a substantially fluid tight seal between the first surface and a second surface which is adjacent to the first surface. A fluid treatment system employ the radiation source module is also described.

    Abstract translation: 辐射源模块,包括支撑构件,连接到所述支撑构件的辐射源组件,所述辐射源组件包括至少一个细长辐射源,所述辐射源组件具有源纵向轴线和模块到表面密封件,所述辐射源组件设置在第一细长表面上 所述模块,所述第一细长表面包括横向于所述源纵向轴线的第一纵向轴线,所述密封件可操作以在所述第一表面与邻近所述第一表面的第二表面之间提供基本上流体密封的密封。 还描述了采用辐射源模块的流体处理系统。

    Cleaning formulation and method of cleaning a surface
    6.
    发明申请
    Cleaning formulation and method of cleaning a surface 有权
    清洁配方和清洁表面的方法

    公开(公告)号:US20040048769A1

    公开(公告)日:2004-03-11

    申请号:US10659309

    申请日:2003-09-11

    CPC classification number: C11D3/364 C11D3/042 C11D3/1266 C11D3/323 C11D17/003

    Abstract: A cleaning formulation comprising a cleaning agent, a particulate clay material and an aqueous carrier. The formulation has a pH less than about 4.0 and is characterized by at least a 90% reduction in viscosity at 25null C. at a shear rate of up to about 0.10 snull1. The cleaning formulation is thixotropic and has a highly desirable combination of acid stability, temperature stability, electrolyte stability and ultraviolet radiation stability.

    Abstract translation: 一种清洁制剂,其包含清洁剂,颗粒状粘土材料和水性载体。 该制剂具有小于约4.0的pH,并且其特征在于在高达约0.10s -1的剪切速率下在25℃下至少降低90%的粘度。 清洗配方是触变性的,具有很好的酸稳定性,温度稳定性,电解液稳定性和紫外线辐射稳定性的组合。

    FLUID TREATMENT SYSTEM
    7.
    发明申请
    FLUID TREATMENT SYSTEM 审中-公开
    流体处理系统

    公开(公告)号:US20140360947A1

    公开(公告)日:2014-12-11

    申请号:US14458692

    申请日:2014-08-13

    Abstract: A fluid treatment system having an inlet, an outlet, and a fluid treatment zone therebetween. The zone has an array of rows of radiation source assemblies. Each radiation source assembly has a longitudinal axis disposed at an oblique angle with respect to a direction of fluid flow. Each row has a plurality of radiation source assemblies in spaced relation in a direction transverse to the direction of fluid flow, to define a gap through which fluid may flow between an adjacent pair of assemblies. Preferably, all rows in the array are staggered with respect to one another in a direction orthogonal to the direction of fluid flow, such that the gap between an adjacent pair of radiation source assemblies in an upstream row of assemblies is partially or completely obstructed in the direction of fluid flow by a serially disposed radiation source assembly in at least one downstream row.

    Abstract translation: 一种在其间具有入口,出口和流体处理区域的流体处理系统。 该区域具有排列的辐射源组件。 每个辐射源组件具有相对于流体流动方向以倾斜角度设置的纵向轴线。 每排具有在横向于流体流动方向的方向上间隔开的多个辐射源组件,以限定一个间隙,流体可以通过该间隙在相邻的一对组件之间流动。 优选地,阵列中的所有行在与流体流动方向正交的方向上彼此交错,使得上游排组件中相邻的一对辐射源组件之间的间隙在 在至少一个下游排中通过串联设置的辐射源组件的流体流动方向。

    FLUID TREATMENT SYSTEM
    8.
    发明申请
    FLUID TREATMENT SYSTEM 有权
    流体处理系统

    公开(公告)号:US20130277571A1

    公开(公告)日:2013-10-24

    申请号:US13920327

    申请日:2013-06-18

    Abstract: A fluid treatment system having an inlet, an outlet, and a fluid treatment zone therebetween. The zone has an array of rows of radiation source assemblies. Each radiation source assembly has a longitudinal axis disposed at an oblique angle with respect to a direction of fluid flow. Each row has a plurality of radiation source assemblies in spaced relation in a direction transverse to the direction of fluid flow, to define a gap through which fluid may flow between an adjacent pair of assemblies. Preferably, all rows in the array are staggered with respect to one another in a direction orthogonal to the direction of fluid flow, such that the gap between an adjacent pair of radiation source assemblies in an upstream row of assemblies is partially or completely obstructed in the direction of fluid flow by a serially disposed radiation source assembly in at least one downstream row.

    Abstract translation: 一种在其间具有入口,出口和流体处理区域的流体处理系统。 该区域具有排列的辐射源组件。 每个辐射源组件具有相对于流体流动方向以倾斜角度设置的纵向轴线。 每排具有在横向于流体流动方向的方向上间隔开的多个辐射源组件,以限定一个间隙,流体可以通过该间隙在相邻的一对组件之间流动。 优选地,阵列中的所有行在与流体流动方向正交的方向上彼此交错,使得上游排组件中相邻的一对辐射源组件之间的间隙在 在至少一个下游排中通过串联设置的辐射源组件的流体流动方向。

    Cleaning formulation for optical surfaces
    9.
    发明申请
    Cleaning formulation for optical surfaces 审中-公开
    光学表面清洁配方

    公开(公告)号:US20040242451A1

    公开(公告)日:2004-12-02

    申请号:US10648444

    申请日:2003-08-27

    Abstract: A cleaning formulation for removing materials from a surface (e.g., an optical surface, a metal surface and the like), the cleaning formulation comprising from about 0.5 to about 60 weight percent of a compound derived from urea and a phosphorus-containing acid, together with a carrier therefor. A method for removing fouling materials from a surface is also described. The cleaning formulation may be used to remove materials, inter alia, from optical radiation surfaces, optical lens surfaces (e.g., a contact lens) and the like.

    Abstract translation: 用于从表面(例如光学表面,金属表面等)去除材料的清洁配方,所述清洁制剂包含约0.5至约60重量%的衍生自脲和含磷酸的化合物,一起 有一个承运人。 还描述了从表面除去结垢材料的方法。 清洁制剂可以用于除去材料,特别是从光学辐射表面,光学透镜表面(例如隐形眼镜)等去除材料。

    Fluid treatment system
    10.
    发明申请
    Fluid treatment system 失效
    流体处理系统

    公开(公告)号:US20040118786A1

    公开(公告)日:2004-06-24

    申请号:US10678637

    申请日:2003-10-06

    CPC classification number: A61L2/10 C02F1/325 C02F2201/3227 C02F2201/324

    Abstract: A fluid treatment system for placement in a flanged pipe fluid conveyance system. The fluid treatment system comprises a flanged ductile iron pipe fitting. The ductile iron pipe fitting comprises: a first flanged opening and a second flanged opening in substantial alignment to define a flow axis aligned substantially parallel to a direction of fluid flow through the first opening and the second opening; and a third flanged opening comprising a first cover element. The first cover element has connected thereto at least one radiation source assembly comprising at least one elongate radiation source having a longitudinal axis substantially transverse to the flow axis. In its preferred form, the fluid treatment system may be advantageously utilized to treat fluid such as water, e.g., municipal waste water, municipal drinking water and the like. The fluid treatment system is particularly advantageous since it utilizes a standard ductile iron pipe fitting and thus, can be readily nullsplicednull into existing piping systems. This facilitates installation of the system and also allows for a significant lowering of manufacturing costs of the system.

    Abstract translation: 一种用于放置在法兰管道流体输送系统中的流体处理系统。 流体处理系统包括带凸缘的球墨铸铁管件。 所述球墨铸铁管配件包括:第一凸缘开口和第二凸缘开口,其基本对齐以限定基本上平行于通过所述第一开口和所述第二开口的流体流动方向排列的流动轴线; 以及包括第一盖元件的第三凸缘开口。 第一覆盖元件已连接至少一个辐射源组件,该辐射源组件包括至少一个具有基本上横向于流动轴线的纵向轴线的细长辐射源。 在其优选形式中,流体处理系统可以有利地用于处理诸如水的流体,例如城市废水,市政饮用水等。 流体处理系统是特别有利的,因为它使用标准的球墨铸铁管件,因此可以容易地“拼接”到现有管道系统中。 这有助于系统的安装,并且还可以显着降低系统的制造成本。

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