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公开(公告)号：US11016394B2
公开(公告)日：2021-05-25
申请号：US16901109
申请日：2020-06-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Michel Riepen
IPC: G03F7/20
Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
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公开(公告)号：US10678139B2
公开(公告)日：2020-06-09
申请号：US16245400
申请日：2019-01-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Johannes Catherinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Erik Theodorus Maria Bijlaart , Christiaan Alexander Hoogendam , Helmar Van Santen , Marcus Adrianus Van De Kerkhof , Mark Kroon , Arie Jeffrey Den Boef , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens
IPC: G03F7/20
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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公开(公告)号：US10509326B2
公开(公告)日：2019-12-17
申请号：US15624419
申请日：2017-06-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Jansen , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Marco Koert Stavenga , Bob Streefkerk , Jan Cornelis Van Der Hoeven , Cedric Desire Grouwstra
Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
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公开(公告)号：US10345712B2
公开(公告)日：2019-07-09
申请号：US15918575
申请日：2018-03-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
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公开(公告)号：US10248027B2
公开(公告)日：2019-04-02
申请号：US15525610
申请日：2015-11-16
Applicant: ASML Netherlands B.V.
Inventor： Hans Butler , Raoul Maarten Simon Knops , Bob Streefkerk , Christiaan Louis Valentin , Jan Bernard Plechelmus Van Schoot , Wilhelmus Franciscus Johannes Simons , Leon Leonardus Franciscus Merkx , Robertus Johannes Marinus De Jongh , Roel Johannes Elisabeth Merry , Michael Frederik Ypma
IPC: G03F7/20
Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.
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Patent Agency Ranking
公开(公告)号：US10222706B2
公开(公告)日：2019-03-05
申请号：US14743775
申请日：2015-06-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
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公开(公告)号：US20180239260A1
公开(公告)日：2018-08-23
申请号：US15960089
申请日：2018-04-23
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
CPC classification number: G03F7/70341
Abstract: An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.
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公开(公告)号：US20170285488A1
公开(公告)日：2017-10-05
申请号：US15624419
申请日：2017-06-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Jansen , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Huberts Mulkens , Marco Koert Stavenga , Bob Streefkerk , Jan Cornelis Van Der Hoeven , Cedric Desire Grouwstra
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70925
Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
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公开(公告)号：US09568840B2
公开(公告)日：2017-02-14
申请号：US14956075
申请日：2015-12-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Aleksey Yurievich Kolesnychenko , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Felix Godfried Peter Peeters , Bob Streefkerk , Franciscus Johannes Herman Maria Teunissen , Helmar Van Santen
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
Abstract translation: 公开了一种浸没式光刻设备的衬底台，其包括构造成收集液体的阻挡层。 屏障围绕基板并与衬底间隔开。 以这种方式，可以收集从液体供应系统溢出的任何液体，以降低光刻投影设备的精细部件污染的风险。
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公开(公告)号：US09477159B2
公开(公告)日：2016-10-25
申请号：US13951222
申请日：2013-07-25
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70058 , G03F7/70108 , G03F7/70225 , G03F7/70358 , G03F2007/2067
Abstract: In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens.
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