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公开(公告)号：US20170115578A1
公开(公告)日：2017-04-27
申请号：US15311548
申请日：2015-04-24
Applicant: ASML Netherlands B.V.
Inventor： Christianus Wilhelmus Johannes BERENDSEN , Marcel BECKERS , Henricus Jozef CASTELIJNS , Hubertus Antonius GERAETS , Adrianus Hendrik KOEVOETS , Leon Martin LEVASIER , Peter SCHAAP , Bob STREEFKERK , Siegfried Alexander TROMP
IPC: G03F7/20
CPC classification number: G03F7/70883 , G03F7/70033 , G03F7/70625 , G03F7/70783 , G03F7/70875 , G03F7/70891 , G03F7/70941
Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.
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公开(公告)号：US20170102621A1
公开(公告)日：2017-04-13
申请号：US15385584
申请日：2016-12-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri LOF , Hans BUTLER , Sjoerd Nicolaas Lambertus DONDERS , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MEIJER , Johannes Catherinus Hubertus MULKENS , Roelof Aeilko Siebranc RITSEMA , Frank VAN SCHAIK , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Erik Theodorus Maria BIJLAART , Christiaan Alexander HOOGENDAM , Helmar VAN SANTEN , Marcus Adrianus VAN DE KERKHOF , Mark KROON , Arie Jeffrey DEN BOEF , Joost Jeroen OTTENS , Jeroen Johannes Sophia Maria MERTENS
IPC: G03F7/20
CPC classification number: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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公开(公告)号：US20170045830A1
公开(公告)日：2017-02-16
申请号：US15338116
申请日：2016-10-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Christiaan Alexander HOOGENDAM , Bob STREEFKERK , Johannes Catharinus Hubertus MULKENS , Erik Theodorus Maria BIJLAART , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Bernardus Antonius SLAGHEKKE , Patricius Aloysius Jacobus TINNEMANS , Helmar VAN SANTEN
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/70808
Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
Abstract translation: 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。
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公开(公告)号：US20160085161A1
公开(公告)日：2016-03-24
申请号：US14956075
申请日：2015-12-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Aleksey Yurievich KOLESNYCHENKO , Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Hans JANSEN , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Felix Godfried Peter PEETERS , Bob STREEFKERK , Franciscus Johannes Herman Maria TEUNISSEN , Helmar VAN SANTEN
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
Abstract translation: 公开了一种浸没式光刻设备的衬底台，其包括构造成收集液体的阻挡层。 屏障围绕基板并与衬底间隔开。 以这种方式，可以收集从液体供应系统溢出的任何液体，以减少光刻投影设备的精细部件污染的风险。
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公开(公告)号：US20150015858A1
公开(公告)日：2015-01-15
申请号：US14504191
申请日：2014-10-01
Applicant: ASML NETHERLANDS B.V. , CARL ZEISS SMT AG
Inventor： Christiaan Alexander HOOGENDAM , Erik Roelof LOOPSTRA , Bob STREEFKERK , Bernhard GELLRICH , Andreas WURMBRAND
IPC: G03F7/20
CPC classification number: G03F7/70341
Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
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Patent Agency Ranking
公开(公告)号：US20200310252A1
公开(公告)日：2020-10-01
申请号：US16901109
申请日：2020-06-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christian Alexander Hoogendam , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Michel Riepen
IPC: G03F7/20
Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
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公开(公告)号：US20190317411A1
公开(公告)日：2019-10-17
申请号：US16454126
申请日：2019-06-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS
Abstract: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
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公开(公告)号：US20190227444A1
公开(公告)日：2019-07-25
申请号：US16369721
申请日：2019-03-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Christiaan Alexander HOOGENDAM , Bob STREEFKERK , Johannes Catharinus Hubertus MULKENS , Erik Theodorus Maria BIJLAART , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Bernardus Antonius SLAGHEKKE , Patricius Aloysius Jacobus TINNEMANS , Helmar VAN SANTEN
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/70808
Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
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公开(公告)号：US20180081282A1
公开(公告)日：2018-03-22
申请号：US15823188
申请日：2017-11-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Aleksey Yurievich KOLESNYCHENKO , Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Hans JANSEN , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Felix Godfried Peter PEETERS , Bob STREEFKERK , Franciscus Johannes Herman Maria TEUNISSEN , Helmar VAN SANTEN
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
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公开(公告)号：US20170248854A1
公开(公告)日：2017-08-31
申请号：US15470491
申请日：2017-03-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Martinus Hendrikus Antonius LEENDERS , Jeroen Johannes Sophia Maria MERTENS , Michel RIEPEN
IPC: G03F7/20
CPC classification number: G03F7/70341
Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
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