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公开(公告)号:US20110001942A1
公开(公告)日:2011-01-06
申请号:US12698938
申请日:2010-02-02
申请人: Joeri Lof , Erik Theodorus Maria Butler , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Staaijer , Bob Streefkerk , Helmar Van Santen
发明人: Joeri Lof , Erik Theodorus Maria Butler , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Staaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号: G03B27/58
CPC分类号: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
摘要翻译: 公开了一种光刻投影装置,其中投影系统和基板之间的空间填充有液体。 边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体,以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。
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公开(公告)号:US07075616B2
公开(公告)日:2006-07-11
申请号:US10705785
申请日:2003-11-12
申请人: Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Timotheus Franciscus Sengers , Alexander Straaijer , Bob Streefkerk
发明人: Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Timotheus Franciscus Sengers , Alexander Straaijer , Bob Streefkerk
CPC分类号: G03F7/707 , G03F7/70341 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要: In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.
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公开(公告)号:US08634056B2
公开(公告)日:2014-01-21
申请号:US13186991
申请日:2011-07-20
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
IPC分类号: G03B27/52
CPC分类号: G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
摘要: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
摘要翻译: 公开了一种浸没式光刻投影装置,其中液体设置在装置的投影系统和基板之间。 为了防止在液体中形成气泡,有助于减少与液体接触后的元件上的残留物,就可以在设备的各种元件上使用液体和液体两层。
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公开(公告)号:US08208120B2
公开(公告)日:2012-06-26
申请号:US12078997
申请日:2008-04-09
申请人: Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen , Sjoerd Nicolaas Lambertus Donders
发明人: Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen , Sjoerd Nicolaas Lambertus Donders
IPC分类号: G03B27/42
CPC分类号: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.
摘要翻译: 在光刻投影装置中,结构围绕投影系统与光刻投影装置的基板台之间的空间。 在结构和衬底的表面之间使用气体以在空间中容纳液体。
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公开(公告)号:US20110279800A1
公开(公告)日:2011-11-17
申请号:US13194136
申请日:2011-07-29
申请人: Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人: Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号: G03B27/42
CPC分类号: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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公开(公告)号:US20110181859A1
公开(公告)日:2011-07-28
申请号:US13082038
申请日:2011-04-07
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
IPC分类号: G03B27/54
CPC分类号: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号:US07936444B2
公开(公告)日:2011-05-03
申请号:US12068546
申请日:2008-02-07
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
CPC分类号: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
摘要翻译: 在光刻设备中,将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度,以将液体供应系统保持在基板表面上方的预定高度。
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公开(公告)号:US07932999B2
公开(公告)日:2011-04-26
申请号:US11499780
申请日:2006-08-07
申请人: Christiaan Alexander Hoogendam , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
发明人: Christiaan Alexander Hoogendam , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
CPC分类号: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
摘要翻译: 光刻投影装置包括被配置为保持图案形成装置的支撑结构,所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统,被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统,被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门,被配置为隔离所述基板的空间或被基板占据的空间。
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公开(公告)号:US20100014061A1
公开(公告)日:2010-01-21
申请号:US12567617
申请日:2009-09-25
申请人: Bob STREEFKERK , Sjoerd Nicolaas Lambertus Donders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens
发明人: Bob STREEFKERK , Sjoerd Nicolaas Lambertus Donders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens
CPC分类号: G03F7/70875 , B05C9/12 , G03F7/70341
摘要: A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.
摘要翻译: 公开了一种光刻投影装置,其中液体供应系统在投影系统和基板之间提供液体。 提供主动干燥站,以在浸没基材W或其它物体的表面的全部或部分之后主动地从基材W或其它物体中除去液体。
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公开(公告)号:US07528929B2
公开(公告)日:2009-05-05
申请号:US10986178
申请日:2004-11-12
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
CPC分类号: G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
摘要: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
摘要翻译: 公开了一种浸没式光刻投影装置,其中液体设置在装置的投影系统和基板之间。 为了防止在液体中形成气泡,有助于减少与液体接触后的元件上的残留物,就可以在设备的各种元件上使用液体和液体两层。
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