IMAGE SENSOR AND METHOD FOR MANUFACTURING THE SAME
    32.
    发明申请
    IMAGE SENSOR AND METHOD FOR MANUFACTURING THE SAME 审中-公开
    图像传感器及其制造方法

    公开(公告)号:US20100164049A1

    公开(公告)日:2010-07-01

    申请号:US12647694

    申请日:2009-12-28

    IPC分类号: H01L31/00 H01L31/18

    CPC分类号: H01L27/14656 H01L27/14689

    摘要: Provided are an image sensor and a method for manufacturing the same. The image sensor comprises an active region including a photodiode region, a transistor region, and an active pattern; a photodiode; and a plurality of transistors. The active region is formed on a substrate. The active region is defined by a device isolation region. The photodiode region and the transistor region are formed in the active region. The photodiode is formed in the photodiode region. The plurality of transistors is formed on the transistor region. The active pattern connects the photodiode region to the transistor region at a second location.

    摘要翻译: 提供了一种图像传感器及其制造方法。 图像传感器包括有源区域,其包括光电二极管区域,晶体管区域和有源图案; 光电二极管 和多个晶体管。 有源区形成在基板上。 有源区域由器件隔离区域定义。 光电二极管区域和晶体管区域形成在有源区域中。 光电二极管形成在光电二极管区域中。 多个晶体管形成在晶体管区域上。 有源图案将第二位置处的光电二极管区域连接到晶体管区域。

    Pressure roller for an image forming apparatus and method of manufacturing the same
    33.
    发明授权
    Pressure roller for an image forming apparatus and method of manufacturing the same 有权
    用于图像形成装置的压力辊及其制造方法

    公开(公告)号:US07650106B2

    公开(公告)日:2010-01-19

    申请号:US11762386

    申请日:2007-06-13

    申请人: Jong Min Kim

    发明人: Jong Min Kim

    IPC分类号: G03G15/20

    摘要: An image forming apparatus capable of preventing sheets from being crumpled due to compressive deformation of a resilient layer thereof when the sheets pass through a fixing unit, and a method for manufacturing the same. The pressure roller may include a reinforcing member that reinforces a side of the resilient layer to prevent an axial compressive deformation of the resilient layer, a reinforcing member received between the shaft and the resilient layer to increase hardness of the resilient layer, or a reinforcing member interposed between the shaft and the resilient layer to reduce the compressive deformation of the resilient layer.

    摘要翻译: 一种图像形成装置及其制造方法,该图像形成装置能够防止片材通过定影单元时由于其弹性层的压缩变形而折皱。 压力辊可以包括增强弹性层的一侧以防止弹性层的轴向压缩变形的加强构件,容纳在轴和弹性层之间的增强构件以增加弹性层的硬度,或加强构件 插入在轴和弹性层之间以减小弹性层的压缩变形。

    Image Sensor and Method of Manufacturing the Same
    34.
    发明申请
    Image Sensor and Method of Manufacturing the Same 审中-公开
    图像传感器及其制造方法

    公开(公告)号:US20090166690A1

    公开(公告)日:2009-07-02

    申请号:US12258499

    申请日:2008-10-27

    申请人: Jong Min Kim

    发明人: Jong Min Kim

    IPC分类号: H01L31/112 H01L21/265

    摘要: An image sensor and manufacturing method thereof are provided. The image sensor can include a gate, a channel region, a first p-type doped region, a second p-type doped region, an n-type doped region, and a floating diffusion region. The gate can be disposed on a semiconductor substrate, and the channel region can be disposed in the semiconductor substrate under the gate. The first p-type doped region can be disposed at a side of the gate and can be adjacent to the channel region. The second p-type doped region can be disposed under the first p-type doped region and spaced apart from the gate. The n-type doped region can be disposed under the first and second p-type doped regions, and the floating diffusion region can be disposed at another side of the gate.

    摘要翻译: 提供了一种图像传感器及其制造方法。 图像传感器可以包括栅极,沟道区,第一p型掺杂区,第二p型掺杂区,n型掺杂区和浮动扩散区。 栅极可以设置在半导体衬底上,沟道区域可以设置在栅极之下的半导体衬底中。 第一p型掺杂区域可以设置在栅极的一侧并且可以与沟道区域相邻。 第二p型掺杂区域可以设置在第一p型掺杂区域下方并与栅极间隔开。 n型掺杂区域可以设置在第一和第二p型掺杂区域下方,并且浮置扩散区域可以设置在栅极的另一侧。

    Image Sensor and a Method for Manufacturing the Same
    35.
    发明申请
    Image Sensor and a Method for Manufacturing the Same 失效
    图像传感器及其制造方法

    公开(公告)号:US20090057797A1

    公开(公告)日:2009-03-05

    申请号:US12200021

    申请日:2008-08-28

    申请人: Jong Min Kim

    发明人: Jong Min Kim

    IPC分类号: H01L31/0232 H01L31/18

    摘要: An image sensor and manufacturing method thereof are provided. An insulating layer having a wiring can be provided on a semiconductor substrate. A barrier wiring can be provided in the insulating layer between the wiring of a unit pixel and an adjacent wiring of an adjacent pixel. A device isolating pattern can be provided on the barrier wiring, and a lower electrode can be provided on the insulating layer and the wiring. A photodiode can be provided on the lower electrode, and an upper electrode can be provided on the photodiode.

    摘要翻译: 提供了一种图像传感器及其制造方法。 具有布线的绝缘层可以设置在半导体衬底上。 可以在单位像素的布线与相邻像素的相邻布线之间的绝缘层中设置阻挡布线。 可以在阻挡布线上设置器件隔离图案,并且可以在绝缘层和布线上设置下电极。 可以在下电极上设置光电二极管,并且可以在光电二极管上设置上电极。

    METHOD FOR CLEANING A TUB IN A WASHING MACHINE AND A WASHING MACHINE PERFORMING THE SAME
    36.
    发明申请
    METHOD FOR CLEANING A TUB IN A WASHING MACHINE AND A WASHING MACHINE PERFORMING THE SAME 有权
    清洗洗衣机中的管道和执行洗衣机的洗衣机的方法

    公开(公告)号:US20090050178A1

    公开(公告)日:2009-02-26

    申请号:US11628753

    申请日:2005-12-22

    IPC分类号: D06F39/02 D06F35/00

    摘要: The present invention relates to a method for washing a washing tub and a washing machine having the same applied thereto, and more particularly, a method for washing a washing tub including the step of washing a washing tub with powder detergent and a step for washing the washing tub with bleaching agent; and a washing machine having the same applied thereto. A method for cleaning a tub in a washing machine includes a washing water supply step for supplying washing water to the washing tub, a powder detergent supply step for supplying powder detergent to the washing tub, a powder detergent washing step for washing the washing tub with the powder detergent, a bleaching agent supply step for supplying bleaching agent to the washing tub, and a bleaching agent washing step for washing the washing tub with bleaching agent.

    摘要翻译: 本发明涉及一种洗衣机的洗涤方法及其应用的洗衣机,更具体地,涉及一种清洗洗衣盆的方法,该方法包括:用粉末洗涤剂洗涤洗涤桶和洗涤洗衣机的步骤 带漂白剂的洗衣盆; 以及与其一起使用的洗衣机。 一种清洗洗衣机中的洗涤桶的方法,包括向洗涤桶供给洗涤水的清洗水供给步骤,向洗涤桶供给粉末洗涤剂的粉末洗涤剂供给步骤,用于洗涤洗涤桶的粉末洗涤剂洗涤步骤, 该粉末洗涤剂,用于向洗涤桶供给漂白剂的漂白剂供给步骤和用漂白剂洗涤洗涤桶的漂白剂洗涤步骤。

    Semiconductor Device and Method of Fabricating the Semiconductor Device
    38.
    发明申请
    Semiconductor Device and Method of Fabricating the Semiconductor Device 有权
    半导体器件及半导体器件制造方法

    公开(公告)号:US20080315306A1

    公开(公告)日:2008-12-25

    申请号:US12144432

    申请日:2008-06-23

    IPC分类号: H01L29/78 H01L21/336

    摘要: A semiconductor device comprises a gate electrode on a semiconductor substrate, drift regions at opposite sides of the gate electrode, source and drain regions in the respective drift regions, and shallow trench isolation (STI) regions in the respective drift regions between the gate electrode and the source or drain region, wherein the drift regions comprise first and second conductivity-type impurities.

    摘要翻译: 半导体器件包括半导体衬底上的栅极电极,栅电极的相对侧的漂移区域,各个漂移区域中的源极和漏极区域以及栅极电极与栅极电极之间的各个漂移区域中的浅沟槽隔离(STI)区域 源极或漏极区域,其中漂移区域包括第一和第二导电型杂质。

    Method for cleaning a photomask
    40.
    发明授权
    Method for cleaning a photomask 有权
    清洁光掩模的方法

    公开(公告)号:US07377984B2

    公开(公告)日:2008-05-27

    申请号:US11624275

    申请日:2007-01-18

    IPC分类号: B08B3/04

    CPC分类号: G03F1/82

    摘要: Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.

    摘要翻译: 本文公开了一种清洁光掩模的方法,其防止在光刻工艺期间在光掩模的表面上产生雾度。 光掩模被热处理以除去其表面上的残余离子并引起Cr和MoSiON层的固化和氧化,从而防止离子的扩散。 抑制由于清洗过程而导致的Cr和MoSiON层的蚀刻,以显着地减少Cr和MoSiON的光学性质的相位变化和透射率。