公开(公告)号：US07368731B2

公开(公告)日：2008-05-06

申请号：US11241197

申请日：2005-09-30

申请人： Jeffrey S. Sullivan

发明人： Jeffrey S. Sullivan

IPC分类号： G21G5/00

CPC分类号： H01J37/265 ,  H01J2237/24507 ,  H01J2237/24542 ,  H01J2237/2826

摘要： The PSF for a metrology array for high resolution particle beam profile measurement has been improved by improving five major elements of the metrology array. While improvement in each of the five elements provides and improved PSF, a combination of all five of the elements provides an unexpected synergistic effect. The individual elements include the use of a plurality of slots as apertures; use of a high-Z material in forming the array; employing sidewalls on the slotted opening apertures where the sidewall forms an angle with a horizontal surface at the base of the array which is at least 75°; employing a knife edge where the upper corner radius ranges from about 1 nm to about 5 nm; and providing a surface finish at the upper corner of each knife edge which is less than 5 nm RMS.

摘要翻译： 用于高分辨率粒子束轮廓测量的计量阵列的PSF已经通过改进计量学阵列的五个主要元素而得到改进。 虽然五个要素中的每一个的改进提供和改进的PSF，但所有五个要素的组合提供了意想不到的协同效应。 各个元件包括使用多个槽作为孔; 在形成阵列时使用高Z材料; 在所述开槽开口孔处采用侧壁，其中所述侧壁与所述阵列的所述底部处的水平表面形成至少75°的角度; 使用上角半径范围为约1nm至约5nm的刀刃; 并且在每个刀刃的上角提供小于5nm RMS的表面光洁度。

公开(公告)号：US07095037B2

公开(公告)日：2006-08-22

申请号：US10803352

申请日：2004-03-18

申请人： Andres Fernadez ,  Marian Mankos ,  Jeffrey S. Sullivan ,  Paul C. Allen

发明人： Andres Fernadez ,  Marian Mankos ,  Jeffrey S. Sullivan ,  Paul C. Allen

IPC分类号： H01J40/06 ,  H01J37/08 ,  H01J27/02

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/70375 ,  H01J37/073 ,  H01J37/3175 ,  H01J2237/06333 ,  H01J2237/31779

摘要： An electron beam lithography system has an electron gun including at least one laser that is operable in a first mode to generate electrons for lithography. The electron beam lithography system is operable in a second mode to regenerate the photocathode of the electron gun by application of the laser. The photocathode includes a layer of cesium telluride.