Process for removing a layer
    31.
    发明申请
    Process for removing a layer 审中-公开
    去除层的过程

    公开(公告)号:US20070170150A1

    公开(公告)日:2007-07-26

    申请号:US10587702

    申请日:2005-01-17

    IPC分类号: C23G1/00 B44C1/22 C23F1/00

    CPC分类号: B08B7/00 C23G1/00 C23G5/00

    摘要: Components comprising corrosion products are often reused, in which case the corrosion product has to be removed. According to the prior art, this takes a very long time since the reaction times with the corrosion product are often very long. According to the invention, the corrosion product is pretreated in order to produce a larger attackable surface area, so that the corrosion product can be removed more quickly.

    摘要翻译: 包含腐蚀产物的组分通常被重复使用,在这种情况下必须除去腐蚀产物。 根据现有技术,由于与腐蚀产物的反应时间通常非常长,所以需要很长时间。 根据本发明,预处理腐蚀产物以产生更大的可发现的表面积,从而可以更快地除去腐蚀产物。

    Method for the production of monocrystalline structures and component
    40.
    发明申请
    Method for the production of monocrystalline structures and component 审中-公开
    生产单晶结构和组分的方法

    公开(公告)号:US20060225641A1

    公开(公告)日:2006-10-12

    申请号:US10541691

    申请日:2003-12-15

    IPC分类号: C30B25/00 C30B28/12 C30B28/14

    CPC分类号: C30B11/00 C30B29/52

    摘要: According to prior art, structural errors in substrates in epitactic crystal growth are often carried over from the substrate on which the new material is to be deposited. This leads to a reduction in mechanical properties. According to the method, an intermediate layer is deposited prior to the deposition of epitactic material. Said intermediate layer prevents structural errors in the substrate from being carried over to the newly filled area.

    摘要翻译: 根据现有技术,在外延晶体生长中的衬底中的结构误差通常从其上将要沉积新材料的衬底承载。 这导致机械性能的降低。 根据该方法,在沉积外延材料之前沉积中间层。 所述中间层防止衬底中的结构错误被传送到新填充区域。