利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

225 条记录 (耗时 0.063 秒)

    Microlithography projection optical system, tool and method of production
    31.
    发明授权
    Microlithography projection optical system, tool and method of production 有权
    微光投影光学系统，工具及生产方法

    公开(公告)号：US08970819B2

    公开(公告)日：2015-03-03

    申请号：US12235957

    申请日：2008-09-23

    申请人： Hans-Juergen Mann ,  Wilhelm Ulrich

    发明人： Hans-Juergen Mann ,  Wilhelm Ulrich

    IPC分类号： G03B27/42 ,  G03F7/20 ,  G03F1/62

    CPC分类号： G03F7/702 ,  G02B17/08 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/70233

    摘要： A microlithography projection optical system is disclosed. The system can include a plurality of optical elements arranged to image radiation having a wavelength λ from an object field in an object plane to an image field in an image plane. The plurality of optical elements can have an entrance pupil located more than 2.8 m from the object plane. A path of radiation through the optical system can be characterized by chief rays having an angle of 3° or more with respect to the normal to the object plane. This can allow the use of phase shifting masks as objects to be imaged, in particular for EUV wavelengths.

    摘要翻译： 公开了一种微光刻投影光学系统。 该系统可以包括多个光学元件，其被布置成将来自物体平面中的物体场的具有波长λ的辐射成像到图像平面中的图像场。 多个光学元件可以具有距离物面大于2.8μm的入射光瞳。 通过光学系统的辐射路径的特征在于主要光线相对于物平面的法线具有3°或更大的角度。 这可以允许使用相移掩模作为要成像的对象，特别是对于EUV波长。

    Catadioptric projection objective with mirror group
    32.
    发明授权
    Catadioptric projection objective with mirror group 有权
    反射折射投影物镜与镜组

    公开(公告)号：US08363315B2

    公开(公告)日：2013-01-29

    申请号：US11578101

    申请日：2005-04-07

    申请人： Alexander Epple ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Hans-Juergen Mann ,  David Shafer

    发明人： Alexander Epple ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Hans-Juergen Mann ,  David Shafer

    IPC分类号： G02B17/00

    CPC分类号： G02B17/0804 ,  G02B17/0808 ,  G02B17/0812 ,  G02B17/0816 ,  G02B17/0836 ,  G02B17/0844 ,  G02B17/0848 ,  G02B17/086 ,  G02B17/0892 ,  G03F7/70058 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70341

    摘要： A catadioptric projection objective for imaging an off-axis object field arranged in an object surface of the projection objective onto an off-axis image field arranged in an image surface of the projection objective has a front lens group, a mirror group comprising four mirrors and having an object side mirror group entry, an image side mirror group exit, and a mirror group plane aligned transversely to the optical axis and arranged geometrically between the mirror group entry and the mirror group exit; and a rear lens group. The mirrors of the mirror group are arranged such that at least one intermediate image is positioned inside the mirror group between mirror group entry and mirror group exit, and that radiation coming from the mirror group entry passes at least four times through the mirror group plane and is reflected at least twice on a concave mirror surface of the mirror group prior to exiting the mirror group at the mirror group exit. The mirror group entry is positioned in a region where radiation exiting the front lens group has an entry chief ray height. A second reflecting area is positioned in a region where radiation impinging on the second mirror has a second chief ray height deviating from the entry chief ray height in a first direction; and a fourth reflecting area is positioned in a region where radiation impinging on the fourth mirror has a fourth chief ray height deviating from the entry chief ray height in a second direction opposite to the first direction.

    摘要翻译： 用于将布置在投影物镜的物体表面中的离轴物体场成像到布置在投影物镜的图像表面中的离轴图像场的反射折射投射物镜具有前透镜组，包括四个反射镜的镜组和 具有物体侧反射镜组入口，图像侧反射镜组出口和反射镜组平面，其横向于光轴对准并且几何地布置在反射镜组入口和反射镜组出口之间; 和后透镜组。 反射镜组的镜子被布置成使得至少一个中间图像位于反射镜组入口和反射镜组出口之间的反射镜组内，并且来自镜组入口的辐射至少穿过镜组平面四次， 在镜组出口处离开镜组之前，在镜组的凹面镜面上反射至少两次。 反射镜组入口位于离开前透镜组的辐射具有入射主光线高度的区域中。 第二反射区域位于辐射入射在第二反射镜上的第一主光线高度偏离第一方向上的入射光线高度的区域中; 并且第四反射区域位于与第一反射镜相反的第二方向上具有偏离入射光线高度的第四主光线高度的入射在第四反射镜上的辐射区域。

    Catoptric objectives and systems using catoptric objectives
    36.
    发明授权
    Catoptric objectives and systems using catoptric objectives 有权
    使用反射目标的目标和系统

    公开(公告)号：US08004755B2

    公开(公告)日：2011-08-23

    申请号：US12700169

    申请日：2010-02-04

    申请人： Hans-Juergen Mann ,  David Shafer ,  Wilhelm Ulrich

    发明人： Hans-Juergen Mann ,  David Shafer ,  Wilhelm Ulrich

    IPC分类号： G02B17/06

    CPC分类号： G03F7/70233 ,  G02B13/143 ,  G02B17/061 ,  G02B17/0652 ,  G02B17/0657

    摘要： In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.

    摘要翻译： 通常，在一个方面，本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标，包括布置成将来自物体平面的辐射引导到图像平面的多个元件，其中物镜具有图像 侧面数值孔径大于0.55，最大像侧场尺寸大于1 mm，目标是一个反射目标。

    CATADIOPTRIC PROJECTION OBJECTIVE
    39.
    发明申请
    CATADIOPTRIC PROJECTION OBJECTIVE 有权
    目标投影目标

    公开(公告)号：US20100253999A1

    公开(公告)日：2010-10-07

    申请号：US12817628

    申请日：2010-06-17

    申请人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf Von Buenau ,  Hans-Juergen Mann ,  Alexander Epple

    发明人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf Von Buenau ,  Hans-Juergen Mann ,  Alexander Epple

    IPC分类号： G02B17/08

    CPC分类号： G02B17/0804 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/0844 ,  G02B17/0856 ,  G02B17/0892 ,  G03F7/70225

    摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.

    摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的反射折射投射物镜包括：用于将设置在物平面中的图案成像为第一中间图像的第一物镜部分; 第二目标部分，用于将第一中间成像成像成第二中间图像; 用于将第二中间成像直接成像到图像平面上的第三目标部分; 其中具有第一连续镜面的第一凹面镜和具有第二连续镜面的至少一个第二凹面镜布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。 该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。

    Catoptric objectives and systems using catoptric objectives
    40.
    发明授权
    Catoptric objectives and systems using catoptric objectives 有权
    使用反射目标的目标和系统

    公开(公告)号：US07414781B2

    公开(公告)日：2008-08-19

    申请号：US11520558

    申请日：2006-09-13

    申请人： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Marco Pretorius

    发明人： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Marco Pretorius

    IPC分类号： G02B17/00 ,  G02B3/00

    CPC分类号： G03F7/70233 ,  G02B13/0065 ,  G02B13/16 ,  G02B17/0621 ,  G02B17/0663 ,  G02B17/08 ,  G02B17/0804 ,  G02B21/04 ,  G03F7/70308

    摘要： In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength λ from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about λ or more at one or more locations of the rotationally-asymmetric surface.

    摘要翻译： 通常，在第一方面，本发明的特征在于包括微光刻投影光学系统的系统。 微光刻投影光学系统包括多个元件，其被布置成使得在操作期间，多个元件将从物体平面到像平面的波长λ的图像辐射。 元件中的至少一个是具有位于辐射路径中的旋转非对称表面的反射元件。 旋转非对称表面在旋转对称表面的一个或多个位置处偏离旋转对称的参考表面约λ或更大的距离。