-
31.发明授权Precision positioning apparatus for positioning a component especially an optical component 失效用于定位组件，特别是光学部件的精密定位装置公开(公告)号：US06603615B2
公开(公告)日：2003-08-05
申请号：US09866089
申请日：2001-05-25
申请人： Frank Melzer , Martin Bayer
发明人： Frank Melzer , Martin Bayer
IPC分类号： G02B702
CPC分类号： G02B7/1824 , G02B7/023
摘要： An apparatus for the precision positioning of an optical component a group of lenses or mirror, in the axial direction and/or for tilting the component and has an axial adjustment device and/or a tilting device. The axial adjustment device has an adjusting nut that includes a guide ring and a clamping ring. The two rings are connected to one another elastically via a blade. Individual clamping jaws are formed by axial incisions in the clamping ring and are braced with the guide ring via tensioning members. The tilting device has an inner and an outer tilting part. The inner tilting part is connected to the outer tilting part via torsion joints, and the outer tilting part is connected to a bearing part via torsion joints.
摘要翻译： 一种用于在轴向方向上精确定位一组透镜或反射镜的光学部件和/或用于倾斜部件并具有轴向调节装置和/或倾斜装置的装置。 轴向调节装置具有包括引导环和夹紧环的调节螺母。 两个环通过叶片弹性地相互连接。 单个夹爪通过夹紧环中的轴向切口形成，并通过张紧构件与导向环支撑。 倾斜装置具有内部和外部倾斜部。 内倾斜部通过扭转接头与外倾斜部连接，外倾斜部通过扭转接头与轴承部连接。
-
公开(公告)号：US09383544B2
公开(公告)日：2016-07-05
申请号：US13590509
申请日：2012-08-21
CPC分类号： G02B7/14 , G02B7/023 , G02B7/102 , G03F7/70108 , G03F7/70116 , G03F7/70825
摘要： An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.
摘要翻译： 公开了一种包括多个光学部件的半导体光刻用光学系统以及相关的部件和方法。 该装置可以包括可以在5ms和500ms之间的时间内沿着直线移动一定距离的光学部件。 直线可以具有在0°和90°之间的极坐标和方位角，并且设备的直线和光轴之间的距离小于投影曝光的投影曝光束束的横截面尺寸 仪器。 该装置还可以包括构造成引导光学部件的引导单元。 该装置还可以包括驱动单元，该驱动单元经配置以经由驱动力驱动光学部件，使得由光学部件和可选部件的惯性力产生的转矩与光学部件同时移动，以及由驱动力产生的转矩，其作用 在导向单元上相互补偿，小于10％。
-
33.发明授权Method and system for indirect determination of local irradiance in an optical system 有权用于间接确定光学系统中局部辐照度的方法和系统公开(公告)号：US08454230B2
公开(公告)日：2013-06-04
申请号：US12706422
申请日：2010-02-16
申请人： Frank Melzer , Axel Scholz
发明人： Frank Melzer , Axel Scholz
CPC分类号： G01J1/4257 , G01J2005/0077 , G03F7/70075 , G03F7/7085
摘要： The invention concerns a method for the indirect determination of local irradiance in an optical system; wherein the optical system comprises optical elements between which an illuminated beam path is formed and a measurement object which absorbs the radiation in the beam path at least partially is positioned in a partial region of the beam path selected for the locally-resolved determination of the irradiance and the temperature distribution of at least one part of the measurement object is determined by means of a temperature detector.
摘要翻译： 本发明涉及一种用于间接确定光学系统中局部辐照度的方法; 其中所述光学系统包括光学元件，在所述光学元件之间形成照明光束路径，并且吸收所述光束路径中的辐射的测量对象至少部分地位于所述光束路径的部分区域中，所述光束路径被选择用于局部分辨的辐射度确定 并且通过温度检测器确定测量对象的至少一部分的温度分布。
-
公开(公告)号：US20120327385A1
公开(公告)日：2012-12-27
申请号：US13590509
申请日：2012-08-21
IPC分类号： G03B27/54
CPC分类号： G02B7/14 , G02B7/023 , G02B7/102 , G03F7/70108 , G03F7/70116 , G03F7/70825
摘要： Semiconductor lithography system includes a plurality of optical components, including an optical component movable a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.
摘要翻译： 半导体光刻系统包括多个光学部件，包括在5ms和500ms之间的时间内沿着直线移动一定距离的光学部件。 直线可以具有在0°和90°之间的极坐标和方位角，并且设备的直线和光轴之间的距离小于投影曝光的投影曝光束束的横截面尺寸 仪器。 该装置还可以包括构造成引导光学部件的引导单元。 该装置还可以包括驱动单元，该驱动单元经配置以经由驱动力驱动光学部件，使得由光学部件和可选部件的惯性力产生的转矩与光学部件同时移动，以及由驱动力产生的转矩，其作用 在导向单元上相互补偿，小于10％。
-
公开(公告)号：US08269947B2
公开(公告)日：2012-09-18
申请号：US12372095
申请日：2009-02-17
CPC分类号： G02B7/14 , G02B7/023 , G02B7/102 , G03F7/70108 , G03F7/70116 , G03F7/70825
摘要： An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.
摘要翻译： 公开了一种包括多个光学部件的半导体光刻用光学系统以及相关的部件和方法。 该装置可以包括可以在5ms和500ms之间的时间内沿着直线移动一定距离的光学部件。 直线可以具有在0°和90°之间的极坐标和方位角，并且设备的直线和光轴之间的距离小于投影曝光的投影曝光束束的横截面尺寸 仪器。 该装置还可以包括构造成引导光学部件的引导单元。 该装置还可以包括驱动单元，该驱动单元经配置以经由驱动力驱动光学部件，使得由光学部件和可选部件的惯性力产生的转矩与光学部件同时移动，以及由驱动力产生的转矩，其作用 在导向单元上相互补偿，小于10％。
-
公开(公告)号：US20090207396A1
公开(公告)日：2009-08-20
申请号：US12372095
申请日：2009-02-17
IPC分类号： G03B27/54
CPC分类号： G02B7/14 , G02B7/023 , G02B7/102 , G03F7/70108 , G03F7/70116 , G03F7/70825
摘要： An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.
摘要翻译： 公开了一种包括多个光学部件的半导体光刻用光学系统以及相关的部件和方法。 该装置可以包括可以在5ms和500ms之间的时间内沿着直线移动一定距离的光学部件。 直线可以具有在0°和90°之间的极坐标和方位角，并且设备的直线和光轴之间的距离小于投影曝光的投影曝光束束的横截面尺寸 仪器。 该装置还可以包括构造成引导光学部件的引导单元。 该装置还可以包括驱动单元，该驱动单元经配置以经由驱动力驱动光学部件，使得由光学部件和可选部件的惯性力产生的转矩与光学部件同时移动，以及由驱动力产生的转矩，其作用 在导向单元上相互补偿，小于10％。
-
-
-
-
-
搜索结果
36 条记录 (耗时 0.04 秒)
