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公开(公告)号：US20090135395A1
公开(公告)日：2009-05-28
申请号：US12337262
申请日：2008-12-17
IPC分类号： G03B27/54
CPC分类号： G02B7/14 , G02B7/023 , G02B7/102 , G03F7/70108 , G03F7/70116 , G03F7/70825
摘要： An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.
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公开(公告)号：US09383544B2
公开(公告)日：2016-07-05
申请号：US13590509
申请日：2012-08-21
CPC分类号： G02B7/14 , G02B7/023 , G02B7/102 , G03F7/70108 , G03F7/70116 , G03F7/70825
摘要： An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.
摘要翻译： 公开了一种包括多个光学部件的半导体光刻用光学系统以及相关的部件和方法。 该装置可以包括可以在5ms和500ms之间的时间内沿着直线移动一定距离的光学部件。 直线可以具有在0°和90°之间的极坐标和方位角，并且设备的直线和光轴之间的距离小于投影曝光的投影曝光束束的横截面尺寸 仪器。 该装置还可以包括构造成引导光学部件的引导单元。 该装置还可以包括驱动单元，该驱动单元经配置以经由驱动力驱动光学部件，使得由光学部件和可选部件的惯性力产生的转矩与光学部件同时移动，以及由驱动力产生的转矩，其作用 在导向单元上相互补偿，小于10％。
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公开(公告)号：US20120327385A1
公开(公告)日：2012-12-27
申请号：US13590509
申请日：2012-08-21
IPC分类号： G03B27/54
CPC分类号： G02B7/14 , G02B7/023 , G02B7/102 , G03F7/70108 , G03F7/70116 , G03F7/70825
摘要： Semiconductor lithography system includes a plurality of optical components, including an optical component movable a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.
摘要翻译： 半导体光刻系统包括多个光学部件，包括在5ms和500ms之间的时间内沿着直线移动一定距离的光学部件。 直线可以具有在0°和90°之间的极坐标和方位角，并且设备的直线和光轴之间的距离小于投影曝光的投影曝光束束的横截面尺寸 仪器。 该装置还可以包括构造成引导光学部件的引导单元。 该装置还可以包括驱动单元，该驱动单元经配置以经由驱动力驱动光学部件，使得由光学部件和可选部件的惯性力产生的转矩与光学部件同时移动，以及由驱动力产生的转矩，其作用 在导向单元上相互补偿，小于10％。
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公开(公告)号：US08269947B2
公开(公告)日：2012-09-18
申请号：US12372095
申请日：2009-02-17
CPC分类号： G02B7/14 , G02B7/023 , G02B7/102 , G03F7/70108 , G03F7/70116 , G03F7/70825
摘要： An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.
摘要翻译： 公开了一种包括多个光学部件的半导体光刻用光学系统以及相关的部件和方法。 该装置可以包括可以在5ms和500ms之间的时间内沿着直线移动一定距离的光学部件。 直线可以具有在0°和90°之间的极坐标和方位角，并且设备的直线和光轴之间的距离小于投影曝光的投影曝光束束的横截面尺寸 仪器。 该装置还可以包括构造成引导光学部件的引导单元。 该装置还可以包括驱动单元，该驱动单元经配置以经由驱动力驱动光学部件，使得由光学部件和可选部件的惯性力产生的转矩与光学部件同时移动，以及由驱动力产生的转矩，其作用 在导向单元上相互补偿，小于10％。
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公开(公告)号：US20090207396A1
公开(公告)日：2009-08-20
申请号：US12372095
申请日：2009-02-17
IPC分类号： G03B27/54
CPC分类号： G02B7/14 , G02B7/023 , G02B7/102 , G03F7/70108 , G03F7/70116 , G03F7/70825
摘要： An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.
摘要翻译： 公开了一种包括多个光学部件的半导体光刻用光学系统以及相关的部件和方法。 该装置可以包括可以在5ms和500ms之间的时间内沿着直线移动一定距离的光学部件。 直线可以具有在0°和90°之间的极坐标和方位角，并且设备的直线和光轴之间的距离小于投影曝光的投影曝光束束的横截面尺寸 仪器。 该装置还可以包括构造成引导光学部件的引导单元。 该装置还可以包括驱动单元，该驱动单元经配置以经由驱动力驱动光学部件，使得由光学部件和可选部件的惯性力产生的转矩与光学部件同时移动，以及由驱动力产生的转矩，其作用 在导向单元上相互补偿，小于10％。
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公开(公告)号：US06897599B2
公开(公告)日：2005-05-24
申请号：US10075797
申请日：2002-02-12
CPC分类号： G03F7/70991 , F16F15/005 , F16F15/02 , G03F7/709
摘要： In a system for overcoming or at least damping oscillations in or through channels (9) which carry fluid in a component, in particular coolant in cooling channels in an optical element (1), in particular a projection objective lens (1a) for semiconductor lithography, oscillations which occur are detected and evaluated by sensors (5), after which the result is passed, in the form of an adaptronic control loop to piezoelectric elements (9), which are integrated in the optical element, and are in the form of thin plates, films or layers which, when activated, produce the oscillations or frequencies which counteract oscillations and natural frequencies produced by the turbulence.
摘要翻译： 在用于克服或至少阻挡在通道（9）中或至少阻尼振荡的系统中，所述通道（9）承载组件中的流体，特别是光学元件（1）中的冷却通道中的冷却剂，特别是用于半导体的投影物镜（1a） 光刻，发生的振荡由传感器（5）检测和评估，之后结果通过自适应控制环路形式的压电元件（9）的形式，压电元件（9）集成在光学元件中，呈现形式 薄板，薄膜或层，当被激活时，产生抵消由湍流产生的振荡和固有频率的振荡或频率。
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公开(公告)号：US06844994B2
公开(公告)日：2005-01-18
申请号：US09956715
申请日：2001-09-19
申请人： Frank Melzer , Michael Mühlbeyer , Bernhard Gellrich , Franz Sorg , Stefan Xalter , Thomas Ittner
发明人： Frank Melzer , Michael Mühlbeyer , Bernhard Gellrich , Franz Sorg , Stefan Xalter , Thomas Ittner
IPC分类号： G02B26/00 , G02B5/10 , G02B13/24 , G02B26/06 , G02B26/08 , G02B27/00 , G02B27/18 , G03F7/20 , H01L21/027 , G02B7/02
CPC分类号： G03F7/70258 , G02B26/06 , G02B27/0068
摘要： In a system for specific deformation of optical elements in an imaging device, in particular in a projection exposure machine having a projection lens for micro-lithography, for the purpose of eliminating image errors or for active adjustment, piezoelectric elements are applied as actuators in the form of thin plates, films or layers to surfaces to be deformed, or integrated into them. In conjunction with an adaptronic servo loop having sensors, forces and/or moments are exerted on the optical elements for their specific deformation by means of a controlled activation of the piezoelectric elements as actuators.
摘要翻译： 在用于成像装置中的光学元件的特定变形的系统中，特别是在具有用于微光刻的投影透镜的投影曝光机中，为了消除图像误差或主动调节，压电元件作为致动器 形式的薄板，薄膜或层到要变形的表面或整合到它们中。 结合具有传感器的自适应伺服回路，通过作为致动器的压电元件的受控激活，力和/或力矩被施加在光学元件上用于其特定变形。
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公开(公告)号：US06700715B2
公开(公告)日：2004-03-02
申请号：US10016704
申请日：2001-12-11
申请人： Franz Sorg , Stefan Xalter , Michael Muehlbeyer , Bernhard Gellrich , Frank Melzer , Thomas Ittner
发明人： Franz Sorg , Stefan Xalter , Michael Muehlbeyer , Bernhard Gellrich , Frank Melzer , Thomas Ittner
IPC分类号： G02B702
CPC分类号： G03F7/709 , F16F15/005 , F16F15/02 , G02B27/646
摘要： In an oscillation damping system, the oscillations which act on an optical element in an imaging device, in particular on deformation-decoupled mounts and manipulators in a projection illumination arrangement, in particular in a projection objective for microlithographic projection exposure objective lithography, are detected by sensors, by actuators waves with same or at least similar frequencies and amplitudes of anti-phases to the disturbing oscillations are generated and introduced in said mount.
摘要翻译： 在振荡阻尼系统中，作用在成像装置中的光学元件，特别是在投影照明装置中的变形解耦安装件和操纵器上的振荡，特别是用于微光刻投影曝光物镜光刻的投影物镜中的振荡被检测 通过致动器产生具有与干扰振荡相同或至少相似的频率和反相振幅的致动器传感器，并将其引入到所述安装件中。
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9.发明授权Lighting system, particularly for use in extreme ultraviolet (EUV) lithography 失效照明系统，特别适用于极紫外（EUV）光刻公开(公告)号：US07196841B2
公开(公告)日：2007-03-27
申请号：US10512100
申请日：2003-04-08
申请人： Frank Melzer , Wolfgang Singer
发明人： Frank Melzer , Wolfgang Singer
CPC分类号： G03F7/70075 , G02B26/0816 , G03F7/70141 , G03F7/702
摘要： A lighting system, particularly for use in extreme ultraviolet (EUV) lithography, comprising a projection lens for producing semiconductor elements for wavelengths ≦193 nm is provided with a light source, an object plane, an exit pupil, a first optical element having first screen elements for producing light channels, and with a second optical element having second screen elements. A screen element of the second optical element is assigned to each light channel that is formed by one of the first screen elements of the first optical element. The screen elements of the first optical element and of the second optical element can be configured or arranged so that they produce, for each light channel, a continuous beam course from the light source up to the object plane. The angles of the first screen elements of the first optical element can be adjusted in order to modify a tilt. The location and/or angles of the second screen elements of the second optical element can be adjusted individually and independently of one another in order to realize another assignment of the first screen elements of the first optical element to the second screen elements of the second optical element by displacing and/or tilting the first and second screen elements.
摘要翻译： 特别是用于极紫外（EUV）光刻的照明系统，包括用于制造波长<= 193nm的半导体元件的投影透镜，其具有光源，物平面，出射光瞳，具有第一光学元件的第一光学元件 用于产生光通道的屏幕元件，以及具有第二屏元件的第二光学元件。 第二光学元件的屏幕元件被分配给由第一光学元件的第一屏幕元件之一形成的每个光通道。 第一光学元件和第二光学元件的屏幕元件可以被配置或布置成使得它们为每个光通道产生从光源到物平面的连续光束路线。 可以调节第一光学元件的第一屏元件的角度以便改变倾斜。 第二光学元件的第二屏幕元件的位置和/或角度可以彼此独立地且独立地进行调整，以便实现第一光学元件的第一屏幕元件与第二光学元件的第二屏幕元件的另一分配 元件通过移位和/或倾斜第一和第二屏元件。
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公开(公告)号：US07091505B2
公开(公告)日：2006-08-15
申请号：US10775037
申请日：2004-02-09
申请人： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
发明人： Wolfgang Singer , Wilhelm Egle , Markus Weiss , Joachim Hainz , Joachim Wietzorrek , Johannes Wangler , Frank Melzer , Bernhard Gellrich , Bernhard Geuppert , Erich Schubert , Martin Antoni
CPC分类号： B82Y10/00 , G02B5/09 , G02B7/182 , G02B17/006 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F7/70158 , G03F7/70166 , G03F7/70175 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/70825 , G21K1/06 , G21K5/04
摘要： There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength ≦193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.
摘要翻译： 提供了沿着扫描方向以扫描模式操作的投影曝光系统。 投影曝光系统包括收集器，其收集波长<= 193nm的光并照亮平面中的区域。 平面由具有与扫描方向平行的y方向和垂直于扫描方向的x方向的局部坐标系限定。 收集器包括（a）第一镜壳，（b）第一镜壳内的第二镜壳，以及（c）用于紧固第一镜壳和第二镜壳的紧固装置。 镜壳基本上围绕公共旋转轴线旋转对称。 紧固装置具有在镜壳的径向方向上延伸的支撑辐条，并且当投影到平面中时支撑辐条产生不平行于y方向的突起。
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