公开(公告)号：US20220334487A1

公开(公告)日：2022-10-20

申请号：US17858129

申请日：2022-07-06

Applicant: Inpria Corporation

Inventor： Stephen T. Meyers ,  Jeremy T. Anderson ,  Brian J. Cardineau ,  Joseph B. Edson ,  Kai Jiang ,  Douglas A. Keszler ,  Alan J. Telecky

IPC: G03F7/16 ,  G03F7/004 ,  G03F7/20 ,  C23C14/08 ,  G03F7/38 ,  C23C16/455 ,  G03F7/40 ,  G03F7/32 ,  C23C16/40

Abstract: Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water vapor or other OH source composition under modest conditions. The organometallic precursors generally comprise a radiation sensitive organo ligand to tin that can result in a coating that can be effective for high resolution patterning at relatively low radiation doses and is particularly useful for EUV patterning. The precursors compositions are readily processable under commercially suitable conditions. Solution phase processing with in situ hydrolysis or vapor based deposition can be used to form the coatings.

公开(公告)号：US20220187705A1

公开(公告)日：2022-06-16

申请号：US17689135

申请日：2022-03-08

Applicant: Inpria Corporation

Inventor： Kai Jiang ,  Stephen T. Meyers ,  Lauren B. McQuade ,  Jeremy T. Anderson ,  Brian J. Cardineau ,  Benjamin L. Clark ,  Dominick Smiddy ,  Margaret Wilson-Moses

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/16

Abstract: Precursor solutions for radiation patternable coatings are formed with an organic solvent and monoalkyl tin trialkoxides in which the water content of the solvent is adjusted to be within 10 percent of a selected value. Generally, the water content of the solvent is adjusted through water addition, although water removal can also be used. In some embodiments, the adjusted water content of the solvent can be from about 250 ppm by weight to about 10,000 ppm by weight. With the appropriate selection of ligands, the adjusted precursor solutions can be stable for at least about 42 days, and in some cases at least 8 months.

公开(公告)号：US11300876B2

公开(公告)日：2022-04-12

申请号：US16446732

申请日：2019-06-20

Applicant: Inpria Corporation

Inventor： Kai Jiang ,  Stephen T. Meyers ,  Lauren B. McQuade ,  Jeremy T. Anderson ,  Brian J. Cardineau ,  Benjamin L. Clark ,  Dominick Smiddy ,  Margaret Wilson-Moses

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/16

Abstract: Precursor solutions for radiation patternable coatings are formed with an organic solvent and monoalkyl tin trialkoxides in which the water content of the solvent is adjusted to be within 10 percent of a selected value. Generally, the water content of the solvent is adjusted through water addition, although water removal can also be used. In some embodiments, the adjusted water content of the solvent can be from about 250 ppm by weight to about 10,000 ppm by weight. With the appropriate selection of ligands, the adjusted precursor solutions can be stable for at least about 42 days, and in some cases at least 8 months.

公开(公告)号：US20210198293A1

公开(公告)日：2021-07-01

申请号：US17198669

申请日：2021-03-11

Applicant: Inpria Corporation

Inventor： Joseph B. Edson ,  Thomas J. Lamkin ,  William Earley ,  Truman Wambach ,  Jeremy T. Anderson

IPC: C07F7/22

Abstract: A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR′)3 or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′2)3 and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn—(NR′COR″)3, where R is a hydrocarbyl group with 1-31 carbon atoms, and where R′ and R″ are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption.

公开(公告)号：US10787466B2

公开(公告)日：2020-09-29

申请号：US15950292

申请日：2018-04-11

Applicant: Inpria Corporation

Inventor： Joseph B. Edson ,  Thomas J. Lamkin ,  William Earley ,  Truman Wambach ,  Jeremy T. Anderson

IPC: C07F7/22

Abstract: A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR′)3 or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′2)3 and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn—(NR′COR″)3, where R is a hydrocarbyl group with 1-31 carbon atoms, and where R′ and R″ are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption.

公开(公告)号：US20200257196A1

公开(公告)日：2020-08-13

申请号：US16861333

申请日：2020-04-29

Applicant: Inpria Corporation

Inventor： Stephen T. Meyers ,  Jeremy T. Anderson ,  Brian J. Cardineau ,  Joseph B. Edson ,  Kai Jiang ,  Douglas A. Keszler ,  Alan J. Telecky

IPC: G03F7/004 ,  G03F7/40 ,  G03F7/32 ,  G03F7/20 ,  G03F7/16

Abstract: Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water vapor or other OH source composition under modest conditions. The organometallic precursors generally comprise a radiation sensitive organo ligand to tin that can result in a coating that can be effective for high resolution patterning at relatively low radiation doses and is particularly useful for EUV patterning. The precursors compositions are readily processable under commercially suitable conditions. Solution phase processing with in situ hydrolysis or vapor based deposition can be used to form the coatings.

公开(公告)号：US20190391486A1

公开(公告)日：2019-12-26

申请号：US16446732

申请日：2019-06-20

Applicant: Inpria Corporation

Inventor： Kai Jiang ,  Stephen T. Meyers ,  Lauren B. McQuade ,  Jeremy T. Anderson ,  Brian J. Cardineau ,  Benjamin L. Clark ,  Dominick Smiddy ,  Margaret Wilson-Moses

IPC: G03F7/004 ,  G03F7/16 ,  G03F7/20

Abstract: Precursor solutions for radiation patternable coatings are formed with an organic solvent and monoalkyl tin trialkoxides in which the water content of the solvent is adjusted to be within 10 percent of a selected value. Generally, the water content of the solvent is adjusted through water addition, although water removal can also be used. In some embodiments, the adjusted water content of the solvent can be from about 250 ppm by weight to about 10,000 ppm by weight. With the appropriate selection of ligands, the adjusted precursor solutions can be stable for at least about 42 days, and in some cases at least 8 months.

公开(公告)号：US12276913B2

公开(公告)日：2025-04-15

申请号：US17858172

申请日：2022-07-06

Applicant: Inpria Corporation

Inventor： Stephen T. Meyers ,  Jeremy T. Anderson ,  Brian J. Cardineau ,  Joseph B. Edson ,  Kai Jiang ,  Douglas A. Keszler ,  Alan J. Telecky

IPC: G03F7/16 ,  C23C14/08 ,  C23C16/40 ,  C23C16/455 ,  G03F7/004 ,  G03F7/20 ,  G03F7/30 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

Abstract: Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water vapor or other OH source composition under modest conditions. The organometallic precursors generally comprise a radiation sensitive organo ligand to tin that can result in a coating that can be effective for high resolution patterning at relatively low radiation doses and is particularly useful for EUV patterning. The precursors compositions are readily processable under commercially suitable conditions. Solution phase processing with in situ hydrolysis or vapor based deposition can be used to form the coatings.

公开(公告)号：US20250011346A1

公开(公告)日：2025-01-09

申请号：US18895654

申请日：2024-09-25

Applicant: Inpria Corporation

Inventor： Brian J. Cardineau ,  Stephen T. Meyers ,  Kai Jiang ,  William Earley ,  Jeremy T. Anderson

IPC: C07F7/22 ,  G03F7/004 ,  G03F7/20 ,  G03F7/32

Abstract: Organotin clusters are described with the formula R3Sn3(O2CR′)5−x(OH)2+x(μ3-O) with 0≤x

公开(公告)号：US12189286B2

公开(公告)日：2025-01-07

申请号：US17903672

申请日：2022-09-06

Applicant: Inpria Corporation

Inventor： Stephen T. Meyers ,  Douglas A. Keszler ,  Kai Jiang ,  Jeremy T. Anderson ,  Andrew Grenville

IPC: G03F7/004 ,  G03F7/09 ,  G03F7/20 ,  G03F7/30 ,  G03F7/32

Abstract: Organometallic solutions have been found to provide high resolution radiation based patterning using thin coatings. The patterning can involve irradiation of the coated surface with a selected pattern and developing the pattern with a developing agent to form the developed image. The patternable coatings may be susceptible to positive-tone patterning or negative-tone patterning based on the use of an organic developing agent or an aqueous acid or base developing agent. The radiation sensitive coatings can comprise a metal oxo/hydroxo network with organic ligands. A precursor solution can comprise an organic liquid and metal polynuclear oxo-hydroxo cations with organic ligands having metal carbon bonds and/or metal carboxylate bonds.