Preparation of epoxysilicon compounds using rhodium catalysts
    31.
    发明授权
    Preparation of epoxysilicon compounds using rhodium catalysts 失效
    使用铑催化剂制备环氧化合物

    公开(公告)号:US5169962A

    公开(公告)日:1992-12-08

    申请号:US583524

    申请日:1990-09-17

    CPC classification number: C08G77/38 C07F7/0879 C08L83/06

    Abstract: A method for making an epoxyfunctional organosilicon compound is provided, comprising the step of reacting at a temperature of from about 25.degree. to about 100.degree. C. a mixture comprising (A) an ethylenically unsaturated epoxide; (B) an organohydrogenpolysiloxane or organohydrogensilane; and (C) a rhodium complex catalyst selected from the group consisting of:(i) RhX.sub.3 (SR.sub.2).sub.3 ;(ii) RhX.sub.3 .multidot.xH.sub.2 O;(iii) [RhX(norbornadiene)].sub.2 ;(iv) RhX(CO)(R.sub.3 P).sub.3 ;(v) RhX(R.sub.3 P).sub.3 ; and(vi) [RhCl(cyclooctadiene)].sub.2 ;wherein X is a halogen atom, x is a number equal to 3 or 4, and R is an alkyl radical having from 1 to 8 inclusive carbon atoms, aryl, aralkyl, or alkaryl radical or the R.sub.3.sup.1 SiQ-- group in which Q represents a divalent aliphatic hydrocarbon radical having from 1 to 6 inclusive carbon atoms and R.sup.1 represents an alkyl radical having from 1 to 8 inclusive carbon atoms, aryl, aralkyl, or alkaryl radical or a (CH.sub.3).sub.3 Si-- radical.

    Triaryl sulfonium photoinitiators
    33.
    发明授权
    Triaryl sulfonium photoinitiators 失效
    三芳基锍光引发剂

    公开(公告)号:US5012001A

    公开(公告)日:1991-04-30

    申请号:US516842

    申请日:1990-04-30

    CPC classification number: C07C381/12 C07D333/76

    Abstract: Triarylsulfonium polyfluoro metal or metalloid salts are provided by effecting the oxidation of a diarylsulfide, while under dehydrating conditions, in the presence of a strong protonic acid. The resulting triarylsulfonium acid salt can thereafter be directly metathesized with an alkali metal or alkaline earth metal polyhalo salt.These compounds have the general formula ##STR1## where Q is selected from .dbd.S.fwdarw.O, --S-- and mixtures thereof, M is a transition metal or metalloid, "c" is an integer of 1 to 3, "d" is an integer of 0 to 3, R.sup.6 is phenyl or naphthyl, R.sup.7 is phenylene or naphthalene optionally substituted with one or more radicals selected from the class consisting of --CH.sub.3, --OCH.sub.3, --CO.sub.2 H, --Br, --Cl, and NO.sub.2.

    Abstract translation: 三芳基锍多氟金属或准金属盐通过在脱水条件下在强质子酸存在下进行二芳基硫醚的氧化来提供。 得到的三芳基锍酸盐之后可以用碱金属或碱土金属的多卤盐直接复分解。 这些化合物具有通式MF6- + R6Q(R7Q)cR7SR7(QR7)dQR6,其中Q选自= S,O,-S-及其混合物,M为过渡金属或准金属,“c”为整数 为1〜3,“d”为0〜3的整数,R6为苯基或萘基,R7为任选被一个或多个选自-CH 3,-OCH 3,-CO 2 H - 的基团取代的亚苯基或萘基, Br,-Cl和NO2。

    Silicone-organic block polymers and method for making
    35.
    发明授权
    Silicone-organic block polymers and method for making 失效
    硅酮 - 有机嵌段聚合物及其制备方法

    公开(公告)号:US4677169A

    公开(公告)日:1987-06-30

    申请号:US840168

    申请日:1986-03-17

    CPC classification number: C08F283/124 C08F293/00 C08G77/442

    Abstract: A method is provided for making silicone-organic block polymers, such as polydimethylsiloxane-polystyrene block polymers resulting from the thermal generation of free-radicals in the presence of free-radical polymerizable organic monomer. A silicone prepolymer is used having chemically combined pinacolate groups in the backbone or terminal positions which are capable of generating free-radicals upon thermolysis and which retain chemically combined remnants of such pinacolate diradicals which serve as connecting sites for free-radical polymerized organic blocks.

    Abstract translation: 提供一种制备硅氧烷 - 有机嵌段聚合物的方法,例如在可自由基聚合的有机单体存在下由自由基的热产生产生的聚二甲基硅氧烷 - 聚苯乙烯嵌段聚合物。 使用硅氧烷预聚物,其在骨架或末端位置具有化学结合的频哪醇酸基团,其能够在热解时产生自由基,并且保留作为自由基聚合有机嵌段的连接位点的这种频哪变异构双链体的化学组合残余物。

    Photoinitiators
    38.
    发明授权
    Photoinitiators 失效
    光引发剂

    公开(公告)号:US4417061A

    公开(公告)日:1983-11-22

    申请号:US320996

    申请日:1981-11-13

    CPC classification number: C08G65/105 C07F9/68 C07F9/902 C08F236/16 C08G59/68

    Abstract: Onium salts of Group IVa elements having an MF.sub.6.sup.- anion, where M is selected from P, As and Sb, have been found to be photo active under ultraviolet light. These onium salts can be employed as cationic photoinitiators when used with a variety of organic resins and cyclic organic compounds.

    Abstract translation: 已经发现,在紫外光下,具有选自P,As和Sb的M6-阴离子的IVa族元素的鎓盐是光活性的。 当与各种有机树脂和环状有机化合物一起使用时,这些鎓盐可用作阳离子光引发剂。

    Low temperature curable organic resin compositions
    39.
    发明授权
    Low temperature curable organic resin compositions 失效
    低温可固化有机树脂组合物

    公开(公告)号:US4239725A

    公开(公告)日:1980-12-16

    申请号:US122280

    申请日:1980-02-19

    CPC classification number: G03F7/029 C08F4/00 C08G59/68 C08G85/00 Y10S264/83

    Abstract: Low temperature curable organic resin compositions, for example, epoxy resins are provided, which can be either exothermically cured or cured in several minutes or less at relatively low temperatures. Certain diaryliodonium salts have been found to spontaneously release strong protonic acids when used in combination with a copper salt and a reducing agent.

    Abstract translation: 提供了低温可固化有机树脂组合物,例如环氧树脂,其可以在相对低的温度下在几分钟或更短时间内放热固化或固化。 已经发现某些二芳基碘鎓盐与铜盐和还原剂组合使用时会自发释放强质子酸。

    Photoinitiators
    40.
    发明授权
    Photoinitiators 失效
    光引发剂

    公开(公告)号:US4234732A

    公开(公告)日:1980-11-18

    申请号:US103914

    申请日:1979-12-17

    CPC classification number: C08G59/68 C07F9/902 G03F7/029

    Abstract: Halogen onium salts, and onium salts of Group VA and V1A elements having an MF.sub.6.sup.- anion, where M is selected from P, As and Sb, have been found to exhibit unusual activity under ultraviolet light. These onium salts can be employed as cationic photoinitiators when used with a variety of organic resins and cyclic organic compounds.

    Abstract translation: 已经发现,在紫外光下,具有M,选自P,As和Sb的具有MF6-阴离子的组VA和V1A元素的卤素鎓盐和鎓盐呈现异常的活性。 当与各种有机树脂和环状有机化合物一起使用时,这些鎓盐可用作阳离子光引发剂。

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