公开(公告)号：US20180157784A1

公开(公告)日：2018-06-07

申请号：US15502950

申请日：2016-11-04

Applicant: KLA-Tencor Corporation

Inventor： Vladimir Levinski ,  Eitan Hajaj ,  Tal Itzkovich ,  Sharon Aharon ,  Michael E. Adel ,  Yuri Paskover ,  Daria Negri ,  Yuval Lubashevsky ,  Amnon Manassen ,  Myungjun Lee ,  Mark D. Smith

IPC: G06F17/50 ,  G03F7/20

Abstract: Metrology targets and target design methods are provided, in which target elements are defined by replacing elements from a periodic pattern having a pitch p, by assist elements having at least one geometric difference from the replaced elements, to form a composite periodic structure that maintains the pitch p as a single pitch. Constructing targets within the bounds of compatibility with advanced multiple patterning techniques improves the fidelity of the targets and fill factor modulation enables adjustment of the targets to produce sufficient metrology sensitivity for extracting the overlay while achieving process compatibility of the targets.

公开(公告)号：US20180031424A1

公开(公告)日：2018-02-01

申请号：US15222503

申请日：2016-07-28

Applicant: KLA-Tencor Corporation

Inventor： Andrew V. Hill ,  Amnon Manassen ,  Yuri Paskover ,  Yuval Lubashevsky

IPC: G01J4/04 ,  G01B11/27

CPC classification number: G01J4/04 ,  G01B11/272 ,  G03F7/70633

Abstract: Metrology methods and systems are provided, in which the detected image is split at a field plane of the collection path of the metrology system's optical system into at least two pupil plane images. Optical elements such as prisms may be used to split the field plane images, and multiple targets or target cells may be measured simultaneously by spatially splitting the field plane and/or the illumination sources and/or by using two polarization types. The simultaneous capturing of multiple targets or target cells increases the throughput of the disclosed metrology systems.

公开(公告)号：US09864209B2

公开(公告)日：2018-01-09

申请号：US15112819

申请日：2016-05-19

Applicant: KLA-Tencor Corporation

Inventor： Vladimir Levinski ,  Yuri Paskover ,  Daniel Kandel

IPC: G02B27/60 ,  G01B11/25 ,  G01B11/02

CPC classification number: G02B27/60 ,  G01B11/02 ,  G01B11/25 ,  G03F7/70616

Abstract: Metrology targets and methods are provided, which provide self-Moiré measurements of unresolved target features, i.e., interaction of electromagnetic fields re-scattered off elements within a single target layer provides signals with Moiré pitches that are measurable, although the actual target pitches are unresolved and possibly device-like. Targets comprise cell(s) with interlaced lines of elements having different device-like pitches which are selected to yield resolved Moiré pitch(es). Different target designs are presented for scatterometry and imaging metrology measurements, as well as for critical dimension, dose and focus, and pitch walk measurements—of device-like targets.

公开(公告)号：US20170268869A1

公开(公告)日：2017-09-21

申请号：US15305166

申请日：2016-08-18

Applicant: KLA-Tencor Corporation

Inventor： Vladimir Levinski ,  Yuri Paskover ,  Yuval Lubashevsky ,  Amnon Manassen

IPC: G01B11/27 ,  G01B9/02 ,  G01N21/47

CPC classification number: G01B11/272 ,  G01B9/0201 ,  G01N21/4788 ,  G03F7/70633

Abstract: Metrology measurement methods and tools are provided, which illuminate a stationary diffractive target by a stationary illumination source, measure a signal composed of a sum of a zeroth order diffraction signal and a first order diffraction signal, repeat the measuring for a plurality of relations between the zeroth and the first diffraction signals, while maintaining the diffractive target and the illumination source stationary, and derive the first order diffraction signal from the measured sums. Illumination may be coherent and measurements may be in the pupil plane, or illumination may be incoherent and measurements may be in the field plane, in either case, partial overlapping of the zeroth and the first diffraction orders are measured. Illumination may be annular and the diffractive target may be a one cell SCOL target with periodic structures having different pitches to separate the overlap regions.

公开(公告)号：US20160231102A1

公开(公告)日：2016-08-11

申请号：US15131728

申请日：2016-04-18

Applicant: KLA-Tencor Corporation

Inventor： Boris Efraty ,  Yuri Paskover

IPC: G01B11/00

CPC classification number: G01B11/00 ,  G03F7/70633

Abstract: Methods are provided, which estimate a quality of a metrology target by calculating a noise metric of its ROI kernels, derived from application of a Fourier filter on the measured kernel with respect to a periodicity of the target's periodic structure(s); and using the calculated noise metric to indicate the target quality. An additional Fourier filter may be applied perpendicularly on the measured kernel with respect to a periodicity of a perpendicular segmentation of the periodic structure(s), and the (2D) noise metric may be derived by application of both Fourier filters. The estimated noise may be analyzed statistically to provide various types of information on the target.

Abstract translation: 提供了一种方法，其通过计算其ROI核心的噪声度量来估计度量目标的质量，所述噪声度量是相对于所述目标周期性结构的周期性而在测量的内核上应用傅里叶滤波器得到的; 并使用计算出的噪声度量来指示目标质量。 可以相对于周期性结构的垂直分割的周期性将附加的傅立叶滤波器垂直地施加在测量的内核上，并且可以通过应用两个傅里叶滤波器来导出（2D）噪声度量。 可以对估计的噪声进行统计分析，以提供目标上的各种类型的信息。