公开(公告)号：US07074474B2

公开(公告)日：2006-07-11

申请号：US10717514

申请日：2003-11-21

申请人： Yasuhiro Toi ,  Masahiro Noda ,  Atsushi Harada ,  Shigeki Tanaka

发明人： Yasuhiro Toi ,  Masahiro Noda ,  Atsushi Harada ,  Shigeki Tanaka

IPC分类号： B32B3/06

CPC分类号： B64C1/12 ,  B29C43/12 ,  B29C70/443 ,  Y02T50/43 ,  Y10T428/24033 ,  Y10T428/24174 ,  Y10T428/24198 ,  Y10T428/24661

摘要： A composite material-stiffened panel has a skin obtained by molding a fiber-reinforced resin composite material into a flat skin, stiffeners arranged in rows on one surface of the skin, and a fiber-reinforced resin-composite material stitched on the skin covering the stiffeners. The composite material-stiffened panel can be manufactured as follows: A first fabric material is placed on a tool having a panel-shaped surface. Stiffeners are placed on the first fabric materials. A second fabric material is placed on the stiffeners to cover at least some of the stiffeners. The second fabric materials are reformed to match the shape of the stiffeners. The reformed second fabric material is stitched on the first fabric material along edges of the stiffeners. All the materials are covered with a bagging film for vacuum. Resin is infiltrated into the fabric materials by a RTM or a RFI method. The infiltrated resin is heated to be hardened.

摘要翻译： 复合材料硬化面板具有通过将纤维增强树脂复合材料成型为平坦皮肤，在皮肤的一个表面上排成行的加强件和在皮肤上缝合的纤维增强树脂复合材料而获得的皮肤， 扶强材。 复合材料加强面板可以如下制造：将第一织物材料放置在具有面板形表面的工具上。 加强筋被放置在第一种织物材料上。 将第二织物材料放置在加强件上以覆盖至少一些加强件。 将第二织物材料重新形成以匹配加强件的形状。 经改质的第二织物材料沿着加强件的边缘缝合在第一织物材料上。 所有的材料都用真空的袋装薄膜覆盖。 树脂通过RTM或RFI方法渗透到织物材料中。 将渗透的树脂加热硬化。

公开(公告)号：US20060065456A1

公开(公告)日：2006-03-30

申请号：US11234070

申请日：2005-09-23

申请人： Masahiro Noda

发明人： Masahiro Noda

IPC分类号： B62K11/00

CPC分类号： B62K11/04 ,  B62K19/30 ,  B62K2202/00

摘要： The present invention makes maintenance work for an air cleaner easier in a straddle type vehicle that has the under bone type frame structure in which a portion positioned in front of a seat is recessed downward. For example, an air cleaner is disposed behind a cylinder block of an engine to be interposed between a pair of a right and a left seat rail. An upper portion of the air cleaner projects upward more than the seat rails. A top of the air cleaner is covered by a seat front cover that divides a space defined in front of the seat. The air cleaner includes a lid and a cleaner case that is taller than is broad. When the maintenance work is made, the seat front cover is removed, and the lid is taken out obliquely upward forward.

摘要翻译： 本发明使得具有下骨型框架结构的跨骑式车辆的空气净化器的维护工作更容易，其中位于座椅前方的部分向下凹陷。 例如，空气滤清器设置在发动机的气缸体的后面，以插入在一对右座椅导轨和左座椅导轨之间。 空气滤清器的上部比座椅导轨向上突出。 空气净化器的顶部覆盖有座椅前盖，其分隔在座椅前面限定的空间。 空气净化器包括盖子和比较宽的清洁器壳体。 当进行维护工作时，拆下座椅前盖，将盖子向前倾斜地取出。

公开(公告)号：US06702911B2

公开(公告)日：2004-03-09

申请号：US10023725

申请日：2001-12-21

申请人： Yasuhiro Toi ,  Masahiro Noda ,  Atsushi Harada ,  Shigeki Tanaka

发明人： Yasuhiro Toi ,  Masahiro Noda ,  Atsushi Harada ,  Shigeki Tanaka

IPC分类号： B32B3114

CPC分类号： B64C1/12 ,  B29C43/12 ,  B29C70/443 ,  Y02T50/43 ,  Y10T428/24033 ,  Y10T428/24174 ,  Y10T428/24198 ,  Y10T428/24661

摘要： A composite material-stiffened panel has a skin obtained by molding a fiber-reinforced resin composite material into a flat skin, stiffeners arranged in rows on one surface of the skin, and a fiber-reinforced resin-composite material stitched on the skin covering the stiffeners. The composite material-stiffened panel can be manufactured as follows: A first fabric material is placed on a tool having a panel-shaped surface. Stiffeners are placed on the first fabric materials. A second fabric material is placed on the stiffeners to cover at least some of the stiffeners. The second fabric materials are reformed to match the shape of the stiffeners. The reformed second fabric material is stitched on the first fabric material along edges of the stiffeners. All the materials are covered with a bagging film for vacuum. Resin is infiltrated into the fabric materials by a RTM or a RFI method. The infiltrated resin is heated to be hardened.

摘要翻译： 复合材料硬化面板具有通过将纤维增强树脂复合材料成型为平坦皮肤，在皮肤的一个表面上排成行的加强件和在皮肤上缝合的纤维增强树脂复合材料而获得的皮肤， 扶强材。 复合材料加强面板可以如下制造：将第一织物材料放置在具有面板形表面的工具上。 加强筋被放置在第一种织物材料上。 将第二织物材料放置在加强件上以覆盖至少一些加强件。 将第二织物材料重新形成以匹配加强件的形状。 经改质的第二织物材料沿着加强件的边缘缝合在第一织物材料上。 所有的材料都用真空的袋装薄膜覆盖。 树脂通过RTM或RFI方法渗透到织物材料中。 将渗透的树脂加热硬化。

公开(公告)号：US08647382B2

公开(公告)日：2014-02-11

申请号：US13699708

申请日：2011-06-08

申请人： Kazunori Kudo ,  Masahiro Noda

发明人： Kazunori Kudo ,  Masahiro Noda

IPC分类号： A61F2/16

CPC分类号： A61F9/0017 ,  A61F2/0095 ,  A61F2/148 ,  A61F2/1662 ,  A61F2/1664 ,  A61F2/1667 ,  A61F2/167 ,  A61F2/1672 ,  A61F2/1678 ,  A61F2/1691 ,  A61F9/0008 ,  A61F2002/1681 ,  A61F2002/16903

摘要： An exemplary ocular implant insertion system includes a case and a preloaded ocular implant insertion apparatus. The apparatus includes first and second movable structures that move the ocular implant in a predetermined sequence. The respective configurations of the case and the ocular implant insertion apparatus are such that the ocular implant insertion apparatus is not removable from the case when the ocular implant insertion apparatus is in the pre-use state and is removable after the first movable structure has moved at least a portion of the optical implant.

摘要翻译： 示例性的眼部植入物插入系统包括壳体和预加载的眼部植入物插入装置。 该装置包括以预定顺序移动眼部植入物的第一和第二可移动结构。 外壳和眼植入物插入装置的各自结构使得眼睛植入物插入装置不能从眼睛植入物插入装置处于使用前状态的情况下移除，并且在第一可移动结构移动之后是可移除的 至少一部分光学植入物。

公开(公告)号：US08603103B2

公开(公告)日：2013-12-10

申请号：US13143322

申请日：2010-01-05

申请人： Kazunori Kudo ,  Masahiro Noda

发明人： Kazunori Kudo ,  Masahiro Noda

IPC分类号： A61F9/007

CPC分类号： A61F2/167 ,  A61F2/1672

摘要： There is provided an intraocular lens insertion device capable of appropriately regulating the motion of a rear supporting portion during a process of moving an intraocular lens, and reducing the possibility of reoperation being required after the intraocular lens is inserted into an eye. An intraocular lens insertion device 1 comprises a main body 2, and a slider 3 and a plunger 4 that are attached to the main body 2. Further, the intraocular lens insertion device 1 is of a preset type in which an intraocular lens 5 is placed inside the main body 2 in advance. The slider 3 includes a first abutting portion 21 for pushing up a supporting portion 7 (rear supporting portion 7a) arranged on a rear side of an optical part 6 with respect to a lens advancement axis A, and second abutting portions 22a, 22b abutting against an outer edge of a rear portion of the optical part 6.

摘要翻译： 提供一种眼内透镜插入装置，其能够在移动眼内透镜的过程中适当地调节后支撑部的运动，并且在将眼内透镜插入眼睛之后降低再次操作的可能性。 眼内透镜插入装置1包括主体2和附接到主体2的滑块3和柱塞4.此外，眼内透镜插入装置1是其中放置眼内透镜5的预设类型 提前在主体2内。 滑块3包括：第一抵接部21，用于将相对于透镜前进轴线A布置在光学部件6的后侧上的支撑部分7（后支撑部分7a）向上推动;以及第二抵接部分22a，22b抵靠 光学部件6的后部的外边缘。

公开(公告)号：US08507383B2

公开(公告)日：2013-08-13

申请号：US13012879

申请日：2011-01-25

申请人： Takashi Ando ,  Leslie Charns ,  Jason E. Cummings ,  Lukasz J. Hupka ,  Dinesh R. Koli ,  Tomohisa Konno ,  Mahadevaiyer Krishnan ,  Michael F. Lofaro ,  Jakub W. Nalaskowski ,  Masahiro Noda ,  Dinesh K. Penigalapati ,  Tatsuya Yamanaka

发明人： Takashi Ando ,  Leslie Charns ,  Jason E. Cummings ,  Lukasz J. Hupka ,  Dinesh R. Koli ,  Tomohisa Konno ,  Mahadevaiyer Krishnan ,  Michael F. Lofaro ,  Jakub W. Nalaskowski ,  Masahiro Noda ,  Dinesh K. Penigalapati ,  Tatsuya Yamanaka

IPC分类号： H01L21/302 ,  C03C15/00 ,  C23F1/00

CPC分类号： H01L21/31053 ,  H01L29/517 ,  H01L29/6653 ,  H01L29/66545

摘要： Methods for polishing multiple dielectric layers to form replacement metal gate structures include a first chemical mechanical polish step to remove overburden and planarize a top layer to leave a planarized thickness over a gate structure. A second chemical mechanical polish step includes removal of the thickness to expose an underlying covered surface of a dielectric of the gate structure with a slurry configured to polish the top layer and the underlying covered surface substantially equally to accomplish a planar topography. A third chemical mechanical polish step is employed to remove the dielectric of the gate structure and expose a gate conductor.

摘要翻译： 用于抛光多个电介质层以形成替换金属栅极结构的方法包括第一化学机械抛光步骤，以去除覆盖层并平坦化顶层以在栅极结构上留下平坦化的厚度。 第二化学机械抛光步骤包括去除厚度以暴露栅极结构的电介质的下面覆盖的表面，其中浆料被配置成基本上等同地抛光顶层和下面的被覆表面以实现平面形貌。 采用第三种化学机械抛光步骤来去除栅极结构的电介质并露出栅极导体。

公开(公告)号：US08497210B2

公开(公告)日：2013-07-30

申请号：US13012142

申请日：2011-01-24

申请人： Leslie Charns ,  Jason E. Cummings ,  Lukasz J. Hupka ,  Dinesh R. Koli ,  Tomohisa Konno ,  Mahadevaiyer Krishnan ,  Michael F. Lofaro ,  Jakub W. Nalaskowski ,  Masahiro Noda ,  Dinesh K. Penigalapati ,  Tatsuya Yamanaka

发明人： Leslie Charns ,  Jason E. Cummings ,  Lukasz J. Hupka ,  Dinesh R. Koli ,  Tomohisa Konno ,  Mahadevaiyer Krishnan ,  Michael F. Lofaro ,  Jakub W. Nalaskowski ,  Masahiro Noda ,  Dinesh K. Penigalapati ,  Tatsuya Yamanaka

IPC分类号： H01L21/302

CPC分类号： H01L21/31053 ,  H01L29/517 ,  H01L29/6653 ,  H01L29/66545

摘要： A polishing method includes polishing, in a first polish, a wafer to remove overburden and planarize a top layer leaving a portion remaining on an underlying layer. A second polishing step includes two phases. In a first phase, the top layer is removed and the underlying layer is exposed, with a top layer to underlying layer selectivity of between about 1:1 to about 2:1 to provide a planar topography. In a second phase, residual portions of the top layer are removed from a top of the underlying layer to ensure complete exposure of an underlying layer surface.

摘要翻译： 抛光方法包括在第一抛光剂中抛光晶片以去除覆盖层并平坦化顶层，留下保留在下层上的部分。 第二抛光步骤包括两个阶段。 在第一阶段中，去除顶层并暴露下层，其顶层至基层选择性为约1:1至约2:1，以提供平面形貌。 在第二阶段中，顶层的残余部分从下层的顶部去除，以确保下层的表面完全曝光。

公开(公告)号：US20120083123A1

公开(公告)日：2012-04-05

申请号：US13012836

申请日：2011-01-25

申请人： Josephine B. Chang ,  Leslie Charns ,  Jason E. Cummings ,  Michael A. Guillorn ,  Lukasz J. Hupka ,  Dinesh R. Koli ,  Tomohisa Konno ,  Mahadevaiyer Krishnan ,  Michael F. Lofaro ,  Jakub W. Nalaskowski ,  Masahiro Noda ,  Dinesh K. Penigalapati ,  Tatsuya Yamanaka

发明人： Josephine B. Chang ,  Leslie Charns ,  Jason E. Cummings ,  Michael A. Guillorn ,  Lukasz J. Hupka ,  Dinesh R. Koli ,  Tomohisa Konno ,  Mahadevaiyer Krishnan ,  Michael F. Lofaro ,  Jakub W. Nalaskowski ,  Masahiro Noda ,  Dinesh K. Penigalapati ,  Tatsuya Yamanaka

IPC分类号： H01L21/306

CPC分类号： H01L21/31053 ,  H01L29/517 ,  H01L29/6653 ,  H01L29/66545

摘要： A planarization method includes planarizing a semiconductor wafer in a first chemical mechanical polish step to remove overburden and planarize a top layer leaving a thickness of top layer material over underlying layers. The top layer material is planarized in a second chemical mechanical polish step to further remove the top layer and expose underlying layers of a second material and a third material such that a selectivity of the top layer material to the second material to the third material is between about 1:1:1 to about 2:1:1 to provide a planar topography.

摘要翻译： 平面化方法包括在第一化学机械抛光步骤中平坦化半导体晶片以去除覆盖层并平坦化顶层，从而在顶层之上留下厚度的顶层材料。 顶层材料在第二化学机械抛光步骤中被平坦化，以进一步去除顶层并暴露第二材料和第三材料的下层，使得顶层材料对第二材料对第三材料的选择性在 约1：1至约2：1：1，以提供平面形貌。

公开(公告)号：US20120083122A1

公开(公告)日：2012-04-05

申请号：US13012142

申请日：2011-01-24

申请人： Leslie Charns ,  Jason E. Cummings ,  Lukasz J. Hupka ,  Dinesh R. Koli ,  Tomohisa Konno ,  Mahadevaiyer Krishnan ,  Michael F. Lofaro ,  Jakub W. Nalaskowski ,  Masahiro Noda ,  Dinesh K. Penigalapati ,  Tatsuya Yamanaka

发明人： Leslie Charns ,  Jason E. Cummings ,  Lukasz J. Hupka ,  Dinesh R. Koli ,  Tomohisa Konno ,  Mahadevaiyer Krishnan ,  Michael F. Lofaro ,  Jakub W. Nalaskowski ,  Masahiro Noda ,  Dinesh K. Penigalapati ,  Tatsuya Yamanaka

IPC分类号： H01L21/306

CPC分类号： H01L21/31053 ,  H01L29/517 ,  H01L29/6653 ,  H01L29/66545

摘要： A polishing method includes polishing, in a first polish, a wafer to remove overburden and planarize a top layer leaving a portion remaining on an underlying layer. A second polishing step includes two phases. In a first phase, the top layer is removed and the underlying layer is exposed, with a top layer to underlying layer selectivity of between about 1:1 to about 2:1 to provide a planar topography. In a second phase, residual portions of the top layer are removed from a top of the underlying layer to ensure complete exposure of an underlying layer surface.

摘要翻译： 抛光方法包括在第一抛光剂中抛光晶片以去除覆盖层并平坦化顶层，留下保留在下层上的部分。 第二抛光步骤包括两个阶段。 在第一阶段中，去除顶层并暴露下层，其顶层至基层选择性为约1:1至约2:1，以提供平面形貌。 在第二阶段中，顶层的残余部分从下层的顶部去除，以确保下层的表面完全曝光。

公开(公告)号：US07789715B2

公开(公告)日：2010-09-07

申请号：US12431841

申请日：2009-04-29

申请人： Masahiro Noda

发明人： Masahiro Noda

IPC分类号： H01R4/18 ,  H01R4/72

CPC分类号： H01R13/422 ,  H01R4/185 ,  H01R13/629

摘要： An insulation barrel (24) of a terminal fitting (20) is formed with an inclination restricting portion (32) capable of restricting an inclination of the terminal fitting (20) in a direction intersecting an axial line direction by contacting an inner wall of a cavity (11) and a posture correcting portion (31) inclined with respect to the axial line direction of the terminal fitting (20) and capable of sliding contact with an opening edge at the rear end of the cavity (11) in the process of inserting the terminal fitting (20) into the cavity (11).

摘要翻译： 端子接头（20）的绝缘筒（24）形成有倾斜限制部分（32），该倾斜限制部分能够通过使端子接头的内壁接触而限制端子接头（20）在与轴线方向相交的方向上的倾斜 空腔（11）和相对于端子接头（20）的轴线方向倾斜的姿态校正部（31），并且能够在空腔（11）的后端与开口边缘滑动接触 将端子接头（20）插入空腔（11）中。