公开(公告)号：US20060186352A1

公开(公告)日：2006-08-24

申请号：US11359303

申请日：2006-02-21

申请人： Mitsuaki Amemiya

发明人： Mitsuaki Amemiya

IPC分类号： G21G5/00

CPC分类号： G03F7/7085 ,  G01J1/26 ,  G01J1/429 ,  G03F7/70558

摘要： A measuring method that utilizes a bandpass filter and a measurement apparatus to measure an intensity of light having a predetermined wavelength among lights emitted from a light source, the bandpass filter transmitting the light having the predetermined wavelength, the measurement apparatus measuring an absolute intensity of an incident light includes the steps of measuring an output of the measurement apparatus continuously, stopping or starting an emission of the light source in the measuring step, calculating a first extreme value t→t0−0 and a second extreme value t→t0+0 in the output of the measurement apparatus at time t0 where t is time in the measuring step, and t0 is time when the emission of the light source stops; and calculating a difference between the first extreme value t→t0−0 and the second extreme value t→t0+0.

摘要翻译： 一种利用带通滤波器和测量装置测量从光源发出的光中的具有预定波长的光的强度的测量方法，所述带通滤光器透射具有预定波长的光，所述测量装置测量绝对强度 入射光包括在测量步骤中连续地测量测量设备的输出，停止或开始光源的发射的步骤，计算第一极限值t→t 0 -0和 在测量步骤的时间t 0 0时，测量装置的输出中的第二极值t-> t <0> 0 <0>，其中t是测量步骤中的时间，t 0 是光源的发射停止的时刻; 以及计算第一极限值t-> t <0> -0和第二极值t→t 0 + 0之间的差值。

公开(公告)号：US06642528B2

公开(公告)日：2003-11-04

申请号：US09986563

申请日：2001-11-09

申请人： Mitsuaki Amemiya ,  Masami Tsukamoto

发明人： Mitsuaki Amemiya ,  Masami Tsukamoto

IPC分类号： H01J3730

CPC分类号： G03F9/7053 ,  G03F7/70233 ,  H01J37/3045 ,  H01J2237/3175

摘要： An apparatus and method for detecting an alignment mark on a substrate using electron beams. The method include the steps of setting an accelerating voltage of the electron beams in accordance with the layer structure of the substrate, irradiating the substrate with the electron beams having the accelerating voltage set in the setting step, and detecting one of radiation and electrons from the substrate after the irradiating step is performed, and determining the position of the alignment mark based on the detecting operation. The apparatus includes a device for setting such an accelerating voltage, a device for irradiating the substrate with the electron beams, and a detector for detecting one of the radiation and the electrons. In one embodiment, fluorescent X-rays are detected, while in another embodiment secondary electrons or backscattered electrons are detected.

公开(公告)号：US5093579A

公开(公告)日：1992-03-03

申请号：US550989

申请日：1990-07-11

申请人： Mitsuaki Amemiya ,  Shinichi Hara ,  Eiji Sakamoto

发明人： Mitsuaki Amemiya ,  Shinichi Hara ,  Eiji Sakamoto

IPC分类号： H01L21/30 ,  G03F7/20 ,  H01L21/027 ,  H01L21/683

CPC分类号： H01L21/6838 ,  G03F7/707 ,  G03F7/70866 ,  G03F7/70875

摘要： A substrate holding device includes a holding table having a reduced pressure passageway; a pressure gauge for measuring a value related to the pressure in the reduced pressure passageway; a pump for producing a pressure difference between a first surface of the substrate to be attracted to the holding table and a second surface of the substrate not to be attracted to the holding table; a valve which can be opened/closed for control of the pressure in the reduced pressure passageway; a pressure control system for controlling the opening/closing of the valve on the basis of an output corresponding to the value measured by the pressure gauge; and a temperature control system for controlling the temperature of the holding table.

公开(公告)号：US07633598B2

公开(公告)日：2009-12-15

申请号：US11456673

申请日：2006-07-11

申请人： Mitsuaki Amemiya

发明人： Mitsuaki Amemiya

IPC分类号： G03B27/42

CPC分类号： G02B5/208 ,  G02B7/006 ,  G03F7/70191

摘要： A filter used for an exposure apparatus that exposes a plate using a light from a light source includes a light transmitting film configured to transmit the light from the light source, a first rod member that includes plural first rod members, and thermally contacts the light transmitting film, the plural second rod members being rod members and including a second rod member; and a second member that includes plural second rod members, and thermally contacts the light transmitting film and/or the first member, the plural second rod members being other rod members including a second rod member, wherein a heating value transmittable by the first rod member per unit time in a longitudinal direction of the first rod member is smaller than a heating value transmittable by the second rod member per unit time in a longitudinal direction of the second rod member.

摘要翻译： 用于使用来自光源的光曝光板的曝光装置的过滤器包括：构造成透过来自光源的光的透光膜;第一杆构件，包括多个第一杆构件，并且热接触透光 多个第二杆构件是杆构件并且包括第二杆构件; 以及第二构件，其包括多个第二杆构件，并且与所述透光膜和/或所述第一构件热接触，所述多个第二杆构件是包括第二杆构件的其他杆构件，其中，可由所述第一杆构件 在第一杆构件的纵向方向上的每单位时间小于在第二杆构件的纵向方向上每单位时间可由第二杆构件传递的加热值。

公开(公告)号：US06331709B1

公开(公告)日：2001-12-18

申请号：US08725400

申请日：1996-10-03

申请人： Mitsuaki Amemiya ,  Masami Tsukamoto

发明人： Mitsuaki Amemiya ,  Masami Tsukamoto

IPC分类号： H01J3730

CPC分类号： G03F9/7053 ,  G03F7/70233 ,  H01J37/3045 ,  H01J2237/3175

摘要： An apparatus and method for detecting an alignment mark on a substrate using electron beams. The method include the steps of setting an accelerating voltage of the electron beams in accordance with the layer structure of the substrate, irradiating the substrate with the electron beams having the accelerating voltage set in the setting step, and detecting one of radiation and electrons from the substrate after the irradiating step is performed, and determining the position of the alignment mark based on the detecting operation. The apparatus includes a device for setting such an accelerating voltage, a device for irradiating the substrate with the electron beams, and a detector for detecting one of the radiation and the electrons. Fluorescent X-rays, secondary electrons or backscattered electrons are detected.

摘要翻译： 一种使用电子束检测基板上的对准标记的装置和方法。 该方法包括以下步骤：根据衬底的层结构设定电子束的加速电压，用设定步骤中设定的加速电压的电子束照射衬底，并从 执行照射步骤之后的基板，并且基于检测操作确定对准标记的位置。 该装置包括用于设置这种加速电压的装置，用于用电子束照射基板的装置，以及用于检测辐射和电子之一的检测器。 检测荧光X射线，二次电子或背散射电子。

公开(公告)号：US5267292A

公开(公告)日：1993-11-30

申请号：US026105

申请日：1993-03-01

申请人： Yutaka Tanaka ,  Nobutoshi Mizusawa ,  Mitsuaki Amemiya ,  Takao Kariya ,  Isamu Shimoda

发明人： Yutaka Tanaka ,  Nobutoshi Mizusawa ,  Mitsuaki Amemiya ,  Takao Kariya ,  Isamu Shimoda

IPC分类号： G03F7/20 ,  G21K5/00

CPC分类号： G03F7/70816 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/70875

摘要： An X-ray exposure apparatus for exposing a semiconductor wafer to a mask with X-rays, to print a pattern of the mask onto the wafer, is disclosed. The ambience within a stage accommodating chamber, accommodating a mask, a semiconductor wafer, and the like, is replaced by helium. Thereafter, a predetermined quantity of helium is supplied into the stage accommodating chamber. This effectively prevents degradation of the purity of helium due to air leakage into the chamber. Therefore, any undesirable decrease in the quantity of X-ray transmission can be avoided. Thus, high-precision and high-throughput exposure is ensured.

摘要翻译： 公开了一种用于将半导体晶片暴露于具有X射线的掩模的X射线曝光装置，以将掩模的图案印刷在晶片上。 由氦气代替在平台容纳室内容纳掩模，半导体晶片等的氛围。 此后，将预定量的氦供应到载物台容纳室中。 这有效地防止由于空气泄漏到室中氦的纯度的降低。 因此，可以避免X射线透射量的任何不期望的减少。 因此，确保了高精度和高通量的曝光。

公开(公告)号：US07014707B2

公开(公告)日：2006-03-21

申请号：US09487718

申请日：2000-01-19

申请人： Mitsuaki Amemiya

发明人： Mitsuaki Amemiya

IPC分类号： C30B11/00

CPC分类号： C30B11/006 ,  C30B11/00 ,  C30B11/003 ,  C30B29/12 ,  Y10T117/10

摘要： In order to prevent a region of supercooling from increasing and to effect uniform crystal growth, the generation of latent heat is detected from changes in temperature of a crucible or a heater or from changes in heat flow rate and also the position of solid-liquid interface is mathematically found, to control the crucible-descending rate or temperature distribution so that the crystal growth rate can be kept at a predetermined value.

公开(公告)号：US06647086B2

公开(公告)日：2003-11-11

申请号：US09859043

申请日：2001-05-17

申请人： Mitsuaki Amemiya ,  Yutaka Watanabe

发明人： Mitsuaki Amemiya ,  Yutaka Watanabe

IPC分类号： G21K500

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/7005 ,  G21K5/04 ,  H05G2/00 ,  H05G2/008

摘要： A proximity X-ray exposure apparatus for irradiating a reticle with X-rays generated from an X-ray source and irradiating a substrate with X-rays that have passed through the reticle. The apparatus includes a plasma X-ray source for generating X-rays by producing plasma, and a control device for controlling X-ray intensity distribution by controlling production of the plasma so that the plasma is produced at a plurality of positions in one irradiating operation of the substrate with the X-rays. The control device controls the X-ray intensity distribution in order to control the plurality of positions so that a required amount of defocusing, which is a size of a projection image corresponding to one point on the reticle formed by irradiating the reticle with X-rays generated at the plurality of positions, can be obtained.

摘要翻译： 一种接近X射线曝光装置，用于用X射线源产生的X射线照射掩模版，并且通过已经通过掩模版的X射线照射衬底。 该装置包括：通过产生等离子体产生X射线的等离子体X射线源;以及控制装置，用于通过控制等离子体的产生来控制X射线强度分布，使得在一次照射操作中在多个位置产生等离子体 的X射线。 控制装置控制X射线强度分布，以便控制多个位置，使得所需量的散焦，其是通过用X射线照射掩模版而形成的与掩模版上的一个点相对应的投影图像的尺寸 在多个位置产生。

公开(公告)号：US5835560A

公开(公告)日：1998-11-10

申请号：US963874

申请日：1997-11-04

申请人： Mitsuaki Amemiya ,  Yutaka Watanabe ,  Kazuyuki Kasumi

发明人： Mitsuaki Amemiya ,  Yutaka Watanabe ,  Kazuyuki Kasumi

IPC分类号： G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  G21K5/00

CPC分类号： G03F7/70058 ,  G03F7/708 ,  G21K1/06 ,  G21K5/02

摘要： An exposure apparatus includes a mirror for reflecting radiation light from a light source, a driving mechanism for holding and oscillating the mirror, a detector for detecting the position of a beam of the radiation light projected on the mirror, an adjusting mechanism for adjusting the position of the mirror with respect to the radiation light on the basis of an output of the detector, and a reference table for positioning the driving mechanism and the detector with respect to the same reference.

摘要翻译： 曝光装置包括用于反射来自光源的辐射光的反射镜，用于保持和振荡反射镜的驱动机构，用于检测投射在反射镜上的辐射光束的位置的检测器，用于调节位置的调节机构 基于检测器的输出相对于辐射光的反射镜，以及用于相对于相同基准定位驱动机构和检测器的参考表。

公开(公告)号：US5444758A

公开(公告)日：1995-08-22

申请号：US257522

申请日：1994-06-09

申请人： Akira Miyake ,  Mitsuaki Amemiya

发明人： Akira Miyake ,  Mitsuaki Amemiya

IPC分类号： G01B15/00 ,  G01B11/00 ,  G01T1/29 ,  H05H13/04 ,  G21K5/00

CPC分类号： G01B11/00 ,  G01T1/29

摘要： A beam position detecting device wherein the intensity of a radiation beam from a synchrotron ring is measured on the basis of electric currents flowing through two wires, while accumulated electric current in the synchrotron ring is measured by using a current transformer. The beam position can be determined accurately on the basis of these measured values.

摘要翻译： 一种光束位置检测装置，其中，基于流过两条导线的电流来测量来自同步加速器环的辐射束的强度，同时使用电流互感器测量同步加速器环中的累积电流。 可以基于这些测量值精确地确定光束位置。