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    Exposure apparatus
    1.
    发明授权
    Exposure apparatus 失效
    曝光装置

    公开(公告)号：US5835560A

    公开(公告)日：1998-11-10

    申请号：US963874

    申请日：1997-11-04

    申请人： Mitsuaki Amemiya ,  Yutaka Watanabe ,  Kazuyuki Kasumi

    发明人： Mitsuaki Amemiya ,  Yutaka Watanabe ,  Kazuyuki Kasumi

    IPC分类号： G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  G21K5/00

    CPC分类号： G03F7/70058 ,  G03F7/708 ,  G21K1/06 ,  G21K5/02

    摘要： An exposure apparatus includes a mirror for reflecting radiation light from a light source, a driving mechanism for holding and oscillating the mirror, a detector for detecting the position of a beam of the radiation light projected on the mirror, an adjusting mechanism for adjusting the position of the mirror with respect to the radiation light on the basis of an output of the detector, and a reference table for positioning the driving mechanism and the detector with respect to the same reference.

    摘要翻译： 曝光装置包括用于反射来自光源的辐射光的反射镜，用于保持和振荡反射镜的驱动机构，用于检测投射在反射镜上的辐射光束的位置的检测器，用于调节位置的调节机构 基于检测器的输出相对于辐射光的反射镜，以及用于相对于相同基准定位驱动机构和检测器的参考表。

    Mirror unit and an exposure apparatus using the unit
    3.
    发明授权
    Mirror unit and an exposure apparatus using the unit 失效
    镜子单元和使用本机的曝光设备

    公开(公告)号：US5572563A

    公开(公告)日：1996-11-05

    申请号：US357650

    申请日：1994-12-16

    申请人： Kazuyuki Kasumi ,  Yutaka Watanabe

    发明人： Kazuyuki Kasumi ,  Yutaka Watanabe

    IPC分类号： G02B5/08 ,  G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027

    CPC分类号： G03F7/70891 ,  G21K1/06 ,  G21K5/00

    摘要： A mirror unit includes a mirror having a reflecting surface, a holding member for supporting the mirror and an airtight chamber incorporating the mirror, supported by the holding member, in an airtight state. Either the mirror or the holding member constitutes a portion of a side wall of the airtight chamber. The mirror unit can be suitably used in an exposure apparatus which uses a synchrotron radiation light source or the like as a light source.

    摘要翻译： 反射镜单元包括具有反射表面的反射镜，用于支撑反射镜的保持构件和由保持构件支撑的并入反射镜的气密室，处于气密状态。 镜子或保持构件都构成气密室的侧壁的一部分。 反射镜单元可以适用于使用同步辐射光源等作为光源的曝光装置。

    Processing apparatus and device manufacturing method
    5.
    发明授权
    Processing apparatus and device manufacturing method 有权
    加工装置及装置的制造方法

    公开(公告)号：US07785091B2

    公开(公告)日：2010-08-31

    申请号：US11755973

    申请日：2007-05-31

    申请人： Kazuyuki Kasumi ,  Eigo Kawakami

    发明人： Kazuyuki Kasumi ,  Eigo Kawakami

    IPC分类号： B28B17/00 ,  B29C59/00

    CPC分类号： B29C59/022 ,  B29C33/3842 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： A processing apparatus configured to transfer a pattern of a mold onto a target member by pressing the mold against a resin applied to the target member includes a driver configured to move the mold and the target member relative to each other, and a controller configured to control the driver so that a changing rate of a load generated between the mold and the resin in a first state is smaller than that in a second state, and the first state being a state in which the mold that adheres to the resin starts moving in a direction separating from the resin, and the second state being a state in which the mold that moves in the direction separating from the resin is about to separate from the resin.

    摘要翻译： 一种处理装置，其被配置为通过将模具压靠在施加到所述目标构件上的树脂上而将模具的图案转印到目标构件上，所述处理装置包括驱动器，所述驱动器被配置为相对于彼此移动所述模具和所述目标构件;以及控制器， 驱动器，使得在第一状态下在模具和树脂之间产生的负载的变化率小于第二状态时的变化率，并且第一状态是粘附到树脂的模具开始移动的状态 方向与树脂分离，第二状态是在与树脂分离的方向上移动的模具将与树脂分离的状态。

    LOAD-LOCK TECHNIQUE
    6.
    发明申请
    LOAD-LOCK TECHNIQUE 有权
    负载技术

    公开(公告)号：US20080003081A1

    公开(公告)日：2008-01-03

    申请号：US11843074

    申请日：2007-08-22

    申请人： Kazuyuki Kasumi

    发明人： Kazuyuki Kasumi

    IPC分类号： B65G49/07

    CPC分类号： H01L21/67748 ,  Y10T137/87917

    摘要： A method of exhausting a gas in a chamber of a load-lock system having a first valve defining an opening for supplying a gas and a second valve defining an opening for conveyance of an article. The method includes a gas supplying step for supplying a gas heated by a heater into the chamber through the first valve, while the first valve and the second valve are kept open, a conveying step for conveying the article into the chamber while the second valve is kept open, and an exhausting step to be carried out after the gas supplying step and the conveying step are executed and the first and second valves are closed, to exhaust the gas inside the chamber while the first valve and the second valve are kept closed.

    摘要翻译： 一种排气装置的方法，所述方法包括：具有限定用于供应气体的开口的第一阀和限定用于输送物品的开口的第二阀的装载系统的腔室。 该方法包括：气体供给步骤，用于在第一阀和第二阀保持打开的同时通过第一阀将由加热器加热的气体供给到室中;一个输送步骤，用于将物品输送到室中，而第二阀为 保持打开状态，在执行气体供给步骤和输送步骤之后执行排气步骤，并且关闭第一和第二阀，以在第一阀和第二阀保持关闭的同时排出室内的气体。

    Exposure apparatus, device manufacturing method, stage apparatus, and alignment method
    7.
    发明授权
    Exposure apparatus, device manufacturing method, stage apparatus, and alignment method 失效
    曝光装置，装置制造方法，舞台装置和对准方法

    公开(公告)号：US07248335B2

    公开(公告)日：2007-07-24

    申请号：US11377282

    申请日：2006-03-17

    申请人： Kazuyuki Kasumi

    发明人： Kazuyuki Kasumi

    IPC分类号： G03B27/42

    CPC分类号： G03F9/7015 ,  G03F7/7035 ,  G03F7/70716 ,  G03F9/7038 ,  G03F9/7084 ,  G03F9/7088

    摘要： An exposure apparatus for exposing a substrate to a pattern due to an original includes a substrate stage which holds and moves the substrate, and a first measurement unit which is arranged on the substrate stage, and measures a position of a mark formed on the original by projecting and receiving light.

    摘要翻译： 用于将原材料暴露于图案的曝光装置包括保持和移动基板的基板台和布置在基板台上的第一测量单元，并且通过以下步骤测量原稿上形成的标记的位置： 投射和接收光。

    PROCESSING METHOD
    8.
    发明申请
    PROCESSING METHOD 有权
    处理方法

    公开(公告)号：US20070132157A1

    公开(公告)日：2007-06-14

    申请号：US11608009

    申请日：2006-12-07

    申请人： Toshinobu Tokita ,  Hirohisa Ota ,  Eigo Kawakami ,  Kazuyuki Kasumi

    发明人： Toshinobu Tokita ,  Hirohisa Ota ,  Eigo Kawakami ,  Kazuyuki Kasumi

    IPC分类号： B29C35/08 ,  C03C25/68 ,  G03C5/04

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： A processing method for forming a first pattern on a substrate to which a resist is applied includes the steps of pressing an original having a second pattern that has a relief reverse to that of the first pattern, against the resist on the substrate, and irradiating light onto the resist via the original, wherein a size of a concave of the second pattern is greater than a size of a convex of the first pattern corresponding to the concave of the second pattern, and a size of a convex of the second pattern is smaller than a size of a concave of the first pattern corresponding to the convex of the second pattern.

    摘要翻译： 在施加抗蚀剂的基板上形成第一图案的处理方法包括将具有与第一图案相反的第二图案的原稿压在基板上的抗蚀剂上的步骤，以及照射光 通过原稿到抗蚀剂上，其中第二图案的凹部的尺寸大于对应于第二图案的凹部的第一图案的凸起的尺寸，并且第二图案的凸起的尺寸较小 比第一图案的凹部的尺寸对应于第二图案的凸起。

    Exposure apparatus and exposing method
    10.
    发明授权
    Exposure apparatus and exposing method 失效
    曝光装置和曝光方法

    公开(公告)号：US06754303B2

    公开(公告)日：2004-06-22

    申请号：US10214605

    申请日：2002-08-09

    申请人： Kazuyuki Kasumi

    发明人： Kazuyuki Kasumi

    IPC分类号： G21K500

    CPC分类号： G03F7/70141

    摘要： An X-ray exposure apparatus for transferring a mask pattern onto a substrate. The apparatus includes an X-ray source for generating X-ray light, an optical system which includes a collimator lens for generating parallel X-ray light for transferring a mask pattern to a substrate, from the X-ray source, a detection unit which detects a position of the X-ray source relative to a mask, and a correction unit which corrects a position and an attitude of the optical system on the basis of a detection result obtained by the detection unit.

    摘要翻译： 一种用于将掩模图案转印到基板上的X射线曝光装置。 该装置包括用于产生X射线光的X射线源，包括用于从X射线源产生用于将掩模图案传送到衬底的平行X射线光的准直透镜的光学系统，检测单元， 检测X射线源相对于掩模的位置;以及校正单元，其基于由检测单元获得的检测结果来校正光学系统的位置和姿态。