3D memory semiconductor devices and structures

    公开(公告)号:US11018156B2

    公开(公告)日:2021-05-25

    申请号:US17099706

    申请日:2020-11-16

    Abstract: A 3D memory device, the device including: a plurality of memory cells, where each of the plurality of memory cells includes at least one memory transistor, where each of the at least one memory transistor includes a source and a drain; a plurality of bit-line pillars, where each of the plurality of bit-line pillars is directly connected to a plurality of the source or the drain, where each of the plurality of bit-line pillars includes metal atoms such that the plurality of bit-line pillars have at least partial metallic properties; and a thermal path from the bit-line pillars to an external surface of the device to remove heat. Various 3D processing flows and methods are also disclosed.

    3D MEMORY SEMICONDUCTOR DEVICES AND STRUCTURES WITH BIT-LINE PILLARS

    公开(公告)号:US20220189990A1

    公开(公告)日:2022-06-16

    申请号:US17681767

    申请日:2022-02-26

    Abstract: A 3D memory device, the device comprising: a plurality of memory cells, wherein each memory cell of said plurality of memory cells comprises at least one memory transistor, wherein each of said at least one memory transistor comprises a source, a drain, and a channel; a plurality of bit-line pillars, wherein each bit-line pillar of said plurality of bit-line pillars is directly connected to a plurality of said source or said drain, wherein said bit-line pillars are vertically oriented, wherein said channel is horizontally oriented, wherein said plurality of memory cells comprise a partially or fully metalized source, and/or, a partially or fully metalized drain, and wherein said plurality of bit-line pillars comprise a thermally conductive path from said plurality of memory cells to an external surface of said device.

    3D MEMORY SEMICONDUCTOR DEVICES AND STRUCTURES

    公开(公告)号:US20220013533A1

    公开(公告)日:2022-01-13

    申请号:US17484394

    申请日:2021-09-24

    Abstract: A 3D memory device, the device including: a plurality of memory cells, where each memory cell of the plurality of memory cells includes at least one memory transistor, where each of the at least one memory transistor includes a source, a drain, and a channel; a plurality of bit-line pillars, where each bit-line pillar of the plurality of bit-line pillars is directly connected to a plurality of the source or the drain, where the bit-line pillars are vertically oriented, where the channel is horizontally oriented; and a level of memory control circuits, where the memory control circuits is disposed either above or below the plurality of memory cells.

    3D semiconductor device and structure

    公开(公告)号:US11152386B2

    公开(公告)日:2021-10-19

    申请号:US16483431

    申请日:2018-02-03

    Abstract: A 3D memory device, the device including: a first vertical pillar; a second vertical pillar, where the first vertical pillar and the second vertical pillar function as a source or a drain for a plurality of overlaying horizontally-oriented memory transistors, where the plurality of overlaying horizontally-oriented memory transistors are self-aligned being formed following the same lithography step; and memory control circuits, where the memory control circuits are disposed at least partially directly underneath the plurality of overlaying horizontally-oriented memory transistors, or are disposed at least partially directly above the plurality of overlaying horizontally-oriented memory transistors.

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