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    METHOD FOR INSPECTING DEFECT AND APPARATUS FOR INSPECTING DEFECT
    31.
    发明申请
    METHOD FOR INSPECTING DEFECT AND APPARATUS FOR INSPECTING DEFECT 有权
    检查缺陷的方法和检查缺陷的装置

    公开(公告)号：US20090323054A1

    公开(公告)日：2009-12-31

    申请号：US12555530

    申请日：2009-09-08

    申请人： Akira HAMAMATSU ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

    发明人： Akira HAMAMATSU ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

    IPC分类号： G01N21/88 ,  G06F19/00

    CPC分类号： G01N21/8806 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623

    摘要： The present invention is an apparatus for inspecting foreign particles/defects, comprises an illumination optical system, a detection optical system, a shielding unit which is provided in said detection optical system to selectively shield diffracted light pattern coming from circuit pattern existing on an inspection object and an arithmetic processing system, wherein said shielding unit comprises a micro-mirror array device or a reflected type liquid crystal, or a transmission type liquid crystal, or an object which is transferred a shielding pattern to an optical transparent substrate, or a substrate or a film which is etched so as to leave shielding patterns, or an optical transparent substrate which can be changed in transmission by heating, sudden cold, or light illumination, or change of electric field or magnetic field, or a shielding plate of cylindrical shape or plate shape.

    摘要翻译： 本发明是用于检查异物的缺陷的装置，包括照明光学系统，检测光学系统，屏蔽单元，其设置在所述检测光学系统中，以选择性地屏蔽来自存在于检查对象上的电路图案的衍射光图案 以及算术处理系统，其中所述屏蔽单元包括微镜阵列器件或反射型液晶或透射型液晶，或将屏蔽图案转印到光学透明基板或基板或 蚀刻以留下屏蔽图案的薄膜，或通过加热，突然冷或光照射或电场或磁场的变化或透镜中的可变化的光学透明基板或圆柱形的屏蔽板或 板形。

    METHOD FOR INSPECTING DEFECT AND APPARATUS FOR INSPECTING DEFECT
    33.
    发明申请
    METHOD FOR INSPECTING DEFECT AND APPARATUS FOR INSPECTING DEFECT 有权
    检查缺陷的方法和检查缺陷的装置

    公开(公告)号：US20070247616A1

    公开(公告)日：2007-10-25

    申请号：US11770217

    申请日：2007-06-28

    申请人： AKIRA HAMAMATSU ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

    发明人： AKIRA HAMAMATSU ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

    IPC分类号： G01N21/01 ,  G01N21/00

    CPC分类号： G01N21/8806 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623

    摘要： The present invention is an apparatus for inspecting foreign particles/defects, comprises an illumination optical system, a detection optical system, a shielding unit which is provided in said detection optical system to selectively shield diffracted light pattern coming from circuit pattern existing on an inspection object and an arithmetic processing system, wherein said shielding unit comprises a micro-mirror array device or a reflected type liquid crystal, or a transmission type liquid crystal, or an object which is transferred a shielding pattern to an optical transparent substrate, or a substrate or a film which is etched so as to leave shielding patterns, or an optical transparent substrate which can be changed in transmission by heating, sudden cold, or light illumination, or change of electric field or magnetic field, or a shielding plate of cylindrical shape or plate shape.

    摘要翻译： 本发明是用于检查异物的缺陷的装置，包括照明光学系统，检测光学系统，屏蔽单元，其设置在所述检测光学系统中，以选择性地屏蔽来自存在于检查对象上的电路图案的衍射光图案 以及算术处理系统，其中所述屏蔽单元包括微镜阵列器件或反射型液晶或透射型液晶，或将屏蔽图案转印到光学透明基板或基板或 蚀刻以留下屏蔽图案的薄膜，或通过加热，突然冷或光照射或电场或磁场的变化或透镜中的可变化的光学透明基板或圆柱形的屏蔽板或 板形。

    Method for inspecting defect and apparatus for inspecting defect
    34.
    发明授权
    Method for inspecting defect and apparatus for inspecting defect 有权
    检查缺陷的方法和缺陷检查装置

    公开(公告)号：US07248352B2

    公开(公告)日：2007-07-24

    申请号：US10724750

    申请日：2003-12-02

    申请人： Akira Hamamatsu ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

    发明人： Akira Hamamatsu ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

    IPC分类号： G01N21/00

    CPC分类号： G01N21/8806 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623

    摘要： The present invention is an apparatus for inspecting foreign particles/defects, comprises an illumination optical system, a detection optical system, a shielding unit which is provided in said detection optical system to selectively shield diffracted light pattern coming from circuit pattern existing on an inspection object and an arithmetic processing system, wherein said shielding unit comprises a micro-mirror array device or a reflected type liquid crystal, or a transmission type liquid crystal, or an object which is transferred a shielding pattern to an optical transparent substrate, or a substrate or a film which is etched so as to leave shielding patterns, or an optical transparent substrate which can be changed in transmission by heating, sudden cold, or light illumination, or change of electric field or magnetic field, or a shielding plate of cylindrical shape or plate shape.

    摘要翻译： 本发明是用于检查异物的缺陷的装置，包括照明光学系统，检测光学系统，屏蔽单元，其设置在所述检测光学系统中，以选择性地屏蔽来自存在于检查对象上的电路图案的衍射光图案 以及算术处理系统，其中所述屏蔽单元包括微镜阵列器件或反射型液晶或透射型液晶，或将屏蔽图案转印到光学透明基板或基板或 蚀刻以留下屏蔽图案的薄膜，或通过加热，突然冷或光照射或电场或磁场的变化或透镜中的可变化的光学透明基板，或圆柱形的屏蔽板或 板形。

    Defect detector and defect detecting method
    35.
    发明申请
    Defect detector and defect detecting method 有权
    缺陷检测器和缺陷检测方法

    公开(公告)号：US20060124874A1

    公开(公告)日：2006-06-15

    申请号：US10536715

    申请日：2003-11-27

    申请人： Sachio Uto ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Takahiro Jingu ,  Toshihiko Nakata ,  Masahiro Watanabe

    发明人： Sachio Uto ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Takahiro Jingu ,  Toshihiko Nakata ,  Masahiro Watanabe

    IPC分类号： G01N21/00 ,  G01N21/88

    CPC分类号： G01N21/00 ,  G01N21/9501 ,  G06T7/0004 ,  G06T2207/30148

    摘要： A defects inspecting apparatus having: a scanning stage for running into a predetermined direction while mounting an inspection target substrate thereon; an illumination optic system for irradiating an illumination light beam upon a surface of the inspection target substrate at a predetermined angle inclined thereto; a detection optic system including, an upper-directed photo-detector for receiving upper-directed reflected/scattered lights emitting upwards from the inspection target substrate, thereby converting them into an upper-directed image signal, and a side-directed photo-detector for receiving side-directed reflected/scattered lights emitting for the inspection target substrate into an inclined direction, so as to flatly intersects the illumination light beam, and thereby converting into a side-directed image signal; and a signal processing system-for detecting defects upon basis of the upper-directed image signal and the side-directed image signal.

    摘要翻译： 一种缺陷检查装置，具有：在其上安装检查对象基板的同时沿预定方向行进的扫描台; 照明光学系统，用于以与其倾斜的预定角度将照明光束照射在检查对象基板的表面上; 检测光学系统，包括：用于接收从检查对象基板向上发射的上方反射/散射光的上方光检测器，从而将其转换为高定向图像信号;以及侧向光检测器， 将检测对象基板发射的侧向反射/散射光倾斜到倾斜方向，以与照明光束平坦地相交，从而转换为侧向图像信号; 以及信号处理系统 - 用于基于上限图像信号和侧向图像信号来检测缺陷。

    Method and apparatus for reviewing defects
    36.
    发明授权
    Method and apparatus for reviewing defects 有权
    检查缺陷的方法和装置

    公开(公告)号：US08975582B2

    公开(公告)日：2015-03-10

    申请号：US13311734

    申请日：2011-12-06

    申请人： Hidetoshi Nishiyama ,  Toshifumi Honda ,  Sachio Uto

    发明人： Hidetoshi Nishiyama ,  Toshifumi Honda ,  Sachio Uto

    IPC分类号： G01N23/225 ,  G02B15/14 ,  G02B21/00 ,  H01J37/22 ,  H01J37/28 ,  H01K3/02

    CPC分类号： G01N23/225 ,  G02B15/14 ,  G02B21/0016 ,  H01J37/226 ,  H01J37/28 ,  H01J2237/216 ,  H01J2237/2482 ,  H01J2237/2817 ,  H01K3/02

    摘要： A method of inspecting defects of a sample on a movable table includes a first step for, on a basis of position information of the defects which is previously detected by an other inspection system, driving the table so that the defects come into a viewing field of an optical microscope having a focus which is adjusted, a second step for re-detecting the defects to obtain a first detection result, a third step for correcting the position information of defects on a basis of position information of the re-detected defects, and a fourth step for reviewing the defects whose position information is corrected to obtain a second detection result. At the second step, re-detecting is performed using reflection light or scattered light from the sample which passes an optical filter which includes a light shielding portion and a light transmitting portion.

    摘要翻译： 一种在可移动台上检查样本的缺陷的方法包括：第一步骤，用于基于先前由另一检查系统检测到的缺陷的位置信息来驱动该表，使得缺陷进入到 具有调整焦点的光学显微镜，用于重新检测缺陷以获得第一检测结果的第二步骤，基于重新检测到的缺陷的位置信息来校正缺陷的位置信息的第三步骤，以及 检查位置信息被校正以获得第二检测结果的缺陷的第四步骤。 在第二步骤中，使用来自通过包括遮光部分和透光部分的滤光器的样品的反射光或散射光进行再检测。

    Apparatus and method for inspecting defects
    37.
    发明授权
    Apparatus and method for inspecting defects 有权
    用于检查缺陷的装置和方法

    公开(公告)号：US07973920B2

    公开(公告)日：2011-07-05

    申请号：US12950243

    申请日：2010-11-19

    申请人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

    发明人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

    IPC分类号： G01N21/88

    CPC分类号： G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

    摘要： A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.

    摘要翻译： 缺陷检查装置包括：可移动台，用于安装具有作为检查对象的电路图案的基板;照射光学系统，其将来自倾斜方向的狭缝状光束照射到基板的电路图案;检测光学系统， 包括图像传感器，用于通过照射狭缝状光束并将接收到的光转换成信号来从基板接收反射/散射光，以及处理该信号的图像处理器。 照射光学系统包括柱面透镜和相干性降低光学系统，其接收光束并发射在柱面透镜的聚光方向上空间相减的多个狭缝状光子束。 柱面透镜将多个狭缝状光子束聚焦成照射到基板表面的狭缝状光束。

    Method for inspecting defect and apparatus for inspecting defect
    38.
    发明授权
    Method for inspecting defect and apparatus for inspecting defect 有权
    检查缺陷的方法和缺陷检查装置

    公开(公告)号：US07903244B2

    公开(公告)日：2011-03-08

    申请号：US12555530

    申请日：2009-09-08

    申请人： Akira Hamamatsu ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

    发明人： Akira Hamamatsu ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

    IPC分类号： G01N21/00

    CPC分类号： G01N21/8806 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623

    摘要： The present invention is an apparatus for inspecting foreign particles/defects, comprises an illumination optical system, a detection optical system, a shielding unit which is provided in said detection optical system to selectively shield diffracted light pattern coming from circuit pattern existing on an inspection object and an arithmetic processing system, wherein said shielding unit comprises a micro-mirror array device or a reflected type liquid crystal, or a transmission type liquid crystal, or an object which is transferred a shielding pattern to an optical transparent substrate, or a substrate or a film which is etched so as to leave shielding patterns, or an optical transparent substrate which can be changed in transmission by heating, sudden cold, or light illumination, or change of electric field or magnetic field, or a shielding plate of cylindrical shape or plate shape.

    摘要翻译： 本发明是用于检查异物的缺陷的装置，包括照明光学系统，检测光学系统，屏蔽单元，其设置在所述检测光学系统中，以选择性地屏蔽来自存在于检查对象上的电路图案的衍射光图案 以及算术处理系统，其中所述屏蔽单元包括微镜阵列器件或反射型液晶或透射型液晶，或将屏蔽图案转印到光学透明基板或基板或 蚀刻以留下屏蔽图案的薄膜，或通过加热，突然冷或光照射或电场或磁场的变化或透镜中的可变化的光学透明基板或圆柱形的屏蔽板或 板形。

    Apparatus and method for inspecting defects
    39.
    发明授权
    Apparatus and method for inspecting defects 有权
    用于检查缺陷的装置和方法

    公开(公告)号：US07768635B2

    公开(公告)日：2010-08-03

    申请号：US12328357

    申请日：2008-12-04

    申请人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

    发明人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

    IPC分类号： G01N21/00

    CPC分类号： G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

    摘要： A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.

    摘要翻译： 缺陷检查装置包括：可移动台，用于安装具有作为检查对象的电路图案的基板;照射光学系统，其将来自倾斜方向的狭缝状光束照射到基板的电路图案;检测光学系统， 包括图像传感器，用于通过照射狭缝状光束并将接收到的光转换成信号来从基板接收反射/散射光，以及处理该信号的图像处理器。 照射光学系统包括柱面透镜和相干性降低光学系统，其接收光束并发射在柱面透镜的聚光方向上空间相减的多个狭缝状光子束。 柱面透镜将多个狭缝状光子束聚焦成照射到基板表面的狭缝状光束。