IC handler and contact cleaning method
    32.
    发明授权
    IC handler and contact cleaning method 失效
    IC处理程序和接触清洁方法

    公开(公告)号:US06769963B2

    公开(公告)日:2004-08-03

    申请号:US09995228

    申请日:2001-11-27

    CPC classification number: B24B7/20 G01R31/01 Y10S209/905

    Abstract: The invention can be easily applied to various contacts irrespective of the length of time needed for replacing ICs with other ICs relative to the contact. An IC handler comprises contact cleaning chips made of a material including polishing particles in the same shape as an ICs wherein a transfer attachment is removed from the contacts when contact cleaning chips are conveyed to the contacts so as to contact the contacts, then the contacts are taken out.

    Abstract translation: 无论与其他IC相对于接触更换IC所需的时间长短,本发明可以容易地应用于各种接触。 IC处理器包括由包括与IC相同形状的抛光颗粒的材料制成的接触清洁芯片,其中当接触清洁芯片被传送到触点以便接触触点时,从触点移除传送附件,接触件 带走。

    Pattern inspection method and semiconductor device manufacturing method
    33.
    发明授权
    Pattern inspection method and semiconductor device manufacturing method 失效
    图案检查方法和半导体器件制造方法

    公开(公告)号:US08532395B2

    公开(公告)日:2013-09-10

    申请号:US13014171

    申请日:2011-01-26

    Applicant: Tadashi Mitsui

    Inventor: Tadashi Mitsui

    Abstract: In one embodiment, a pattern inspection method is disclosed. The method can include predicting an edge shape at a given future time with respect to the same inspection target pattern, setting a threshold corresponding to a required specification of the inspection target pattern, and predicting the time when the inspection target pattern fails to meet the required specification from the predicted edge shape and the threshold. The method can further include taking a plurality of images concerning the inspection target pattern at different times by use of an imaging apparatus, detecting edges of the obtained images, respectively, matching the detected edges of different imaging times, and obtaining a difference between corresponding edges to generate a difference vector after the matching. The edge shape of the future time can be predicted based on the generated difference vector and an interval between the imaging times.

    Abstract translation: 在一个实施例中,公开了一种图案检查方法。 该方法可以包括相对于相同的检查目标图案在给定的未来时间预测边缘形状,设置对应于检查目标图案的所需指定的阈值,以及预测检查目标图案不能满足所需要的时间 规格从预测的边缘形状和阈值。 该方法还可以包括通过使用成像装置在不同时间拍摄关于检查对象图案的多个图像,分别检测所获得的图像的边缘,以匹配不同成像时间的检测到的边缘,并获得相应边缘之间的差 以在匹配之后生成差矢量。 可以基于生成的差矢量和成像时间之间的间隔来预测未来时间的边缘形状。

    PATTERN SHAPE EVALUATION METHOD AND PATTERN SHAPE EVALUATION APPARATUS UTILIZING THE SAME
    34.
    发明申请
    PATTERN SHAPE EVALUATION METHOD AND PATTERN SHAPE EVALUATION APPARATUS UTILIZING THE SAME 有权
    图案形状评估方法和图案形状评估装置

    公开(公告)号:US20100128966A1

    公开(公告)日:2010-05-27

    申请号:US12562173

    申请日:2009-09-18

    CPC classification number: G06K9/342 G06K9/48

    Abstract: The present invention provides a pattern shape evaluation method that can securely decide whether patterns are connected or disconnected and, further, evaluate a pattern shape qualitatively.The pattern shape evaluation method for deciding whether a pair of patterns are disconnected or connected, including: setting a measurement region in a predetermined region for an image data containing two patterns disconnected from each other or continuous one pattern; extracting a plurality of pattern contour points that make up a contour of the disconnected two patterns or the continuous one pattern in the measurement region; creating two pattern contour point sequences each of which is a set of the pattern contour points, in the pattern contour point sequence, each of distances between neighboring ones of the pattern contour points is a predetermined value or less, based on the plurality of pattern contour points; calculating an angle between a line passing through two of the pattern contour points which provide a shortest distance between the two pattern contour point sequences and a reference line arbitrarily defined with respect to the measurement region; and deciding whether the pair of patterns are disconnected or connected, based on the angle.

    Abstract translation: 本发明提供一种能够可靠地决定图案是连接还是断开的图案形状评价方法,并进一步定性地评价图案形状。 用于确定一对图案是断开连接还是连接的图案形状评估方法包括:为包含彼此断开或连续的一个图案的两个图案的图像数据的预定区域设置测量区域; 提取构成测量区域中的断开的两个图案或连续的一个图案的轮廓的多个图案轮廓点; 创建两个图案轮廓点序列,每个图案轮廓点序列是图案轮廓点的集合,在图案轮廓点序列中,基于多个图案轮廓,每个图案轮廓点的相邻距离之间的距离是预定值或更小 点数 计算通过提供两个图案轮廓点序列之间的最短距离的两个图案轮廓点的线与相对于测量区域任意定义的参考线之间的角度; 并且基于角度来决定该对图案是断开还是连接。

    Pattern shape evaluation method, program, and semiconductor device manufacturing method
    36.
    发明申请
    Pattern shape evaluation method, program, and semiconductor device manufacturing method 有权
    图案形状评估方法,程序和半导体器件制造方法

    公开(公告)号:US20080138916A1

    公开(公告)日:2008-06-12

    申请号:US11785781

    申请日:2007-04-20

    Applicant: Tadashi Mitsui

    Inventor: Tadashi Mitsui

    CPC classification number: G06T7/001 G06T2207/10056 G06T2207/30148

    Abstract: A pattern shape evaluation method comprising detecting an edge of an evaluation target pattern from an image of the evaluation target pattern to output the edge as a first edge, detecting an edge of a reference pattern from an image of the reference pattern to output the edge as a second edge, performing a relative scan of the first edge and the second edge to superpose the first edge onto the second edge, and outputting a resulting edge as a third edge, calculating a characteristic amount indicating characteristics of the third edge from the third edge, and deriving a characteristic amount function which provides the characteristic amount against relative coordinates in the relative scan and comparing the characteristic amount function with a preset value to judge whether or not the evaluation target pattern is good.

    Abstract translation: 一种图案形状评估方法,包括从评估对象图案的图像中检测评估对象图案的边缘,将边缘输出为第一边缘,从参考图案的图像检测参考图案的边缘以将边缘输出为 第二边缘,执行所述第一边缘和所述第二边缘的相对扫描以将所述第一边缘叠加到所述第二边缘上,并且将所得到的边缘作为第三边缘输出,从所述第三边缘计算指示所述第三边缘的特性的特征量 导出相对于相对扫描中的相对坐标提供特征量的特征量函数,并将特征量函数与预设值进行比较,以判断评价对象图案是否良好。

    Image processing apparatus, image processing method, defect detection method, semiconductor device manufacturing method, and program
    37.
    发明申请
    Image processing apparatus, image processing method, defect detection method, semiconductor device manufacturing method, and program 失效
    图像处理装置,图像处理方法,缺陷检测方法,半导体器件制造方法和程序

    公开(公告)号:US20070280547A1

    公开(公告)日:2007-12-06

    申请号:US11785693

    申请日:2007-04-19

    Applicant: Tadashi Mitsui

    Inventor: Tadashi Mitsui

    CPC classification number: H04N19/105 H04N19/14 H04N19/176 H04N19/94

    Abstract: An image processing apparatus which compresses an image, the apparatus includes: a storage unit which stores a code book, the code book being prepared by allocating identification codes to code blocks, the code blocks being formed by executing quantization processing regarding a plurality of first image blocks as multidimensional vectors, the plurality of first image blocks being generated by cutting, in preset sizes, first regions out of a code book preparation image containing a first edge, each of the first regions surrounding and including an edge point of the first edge, the first edge being detected from the code book preparation image; an edge detection unit which detects a second edge from a compression target image containing the second edge; an image block generation unit which cuts, in preset sizes, second regions out of the compression target image to generate a plurality of second image blocks, each of the second regions surrounding and including an edge point of the detected second edge; a search unit which searches the code book stored in the storage unit for code blocks similar to the second image blocks; and an output unit which outputs information on the identification codes of the similar code blocks which have been searched for and information on coordinates of the edge points of the second image blocks.

    Abstract translation: 一种压缩图像的图像处理装置,所述装置包括:存储单元,存储代码簿,所述代码本通过将识别码分配给代码块而准备,所述代码块是通过执行关于多个第一图像的量化处理而形成的 块作为多维向量,所述多个第一图像块通过以包含第一边缘的码本准备图像中的预定大小切割第一区域而产生,所述第一区域中的每一个围绕并包括所述第一边缘的边缘点, 从码本准备图像中检测第一边缘; 边缘检测单元,其从包含第二边缘的压缩目标图像检测第二边缘; 图像块生成单元,其以预设尺寸切割出压缩目标图像之外的第二区域,以生成多个第二图像块,每个第二区域围绕并包括检测到的第二边缘的边缘点; 搜索单元,其搜索与所述第二图像块相似的代码块存储在所述存储单元中的代码簿; 以及输出单元,其输出关于已经搜索的类似代码块的识别代码的信息和关于第二图像块的边缘点的坐标的信息。

    Pattern shape evaluation apparatus, pattern shape evaluation method, semiconductor device manufacturing method, and program
    38.
    发明申请
    Pattern shape evaluation apparatus, pattern shape evaluation method, semiconductor device manufacturing method, and program 有权
    图案形状评价装置,图案形状评价方法,半导体装置制造方法和程序

    公开(公告)号:US20070280541A1

    公开(公告)日:2007-12-06

    申请号:US11783729

    申请日:2007-04-11

    CPC classification number: G06K9/4609

    Abstract: A pattern shape evaluation method includes acquiring an image of an evaluation target pattern including a plurality of element patterns; detecting edge of the evaluation target pattern from the image; classifying the detected edge of the evaluation target pattern into a plurality of evaluation target pattern edge groups; acquiring edge of a reference pattern serving as an evaluation standard for the element patterns; classifying the edge of the reference pattern into a plurality of reference pattern edge groups; selecting a reference pattern edge group to be aligned with the edge of the evaluation target pattern from the classified reference pattern edge groups; aligning the edge of the selected reference pattern edge group with the edge of the evaluation target pattern; and evaluating the shape of the evaluation target pattern by use of the result of the alignment.

    Abstract translation: 图案形状评估方法包括获取包括多个元素图案的评估对象图案的图像; 从图像中检测评估对象图案的边缘; 将检测出的评价对象图案的边缘分类为多个评价对象图案边缘组; 获取用作元素图案的评估标准的参考图案的边缘; 将参考图案的边缘分类成多个参考图案边缘组; 从分类的参考图案边缘组中选择与评估对象图案的边缘对准的参考图案边缘组; 将所选择的参考图案边缘组的边缘与评估对象图案的边缘对齐; 以及通过使用对准的结果来评价评价对象图案的形状。

    Pattern shape evaluation apparatus, pattern shape evaluation method, method of manufacturing semiconductor device, and program
    39.
    发明申请
    Pattern shape evaluation apparatus, pattern shape evaluation method, method of manufacturing semiconductor device, and program 有权
    图案形状评价装置,图案形状评价方法,半导体装置的制造方法以及程序

    公开(公告)号:US20070098249A1

    公开(公告)日:2007-05-03

    申请号:US11589057

    申请日:2006-10-30

    CPC classification number: G06T7/0006 G06K9/32 G06T2207/30148

    Abstract: A pattern shape evaluation method includes acquiring design data accompanied by an evaluation area in which information on a particular evaluation area within a pattern of a semiconductor device is added to the design data for the pattern, acquiring an image of the pattern, generating edge data for the pattern from the image of the pattern, aligning the design data accompanied by the evaluation area with the edge data and evaluating the shape of the pattern within the evaluation area after the alignment.

    Abstract translation: 图案形状评估方法包括获取伴随有评估区域的设计数据,其中将关于半导体器件的图案内的特定评估区域的信息添加到图案的设计数据中,获取图案的图像,生成边缘数据, 来自图案的图案的图案,将伴随评估区域的设计数据与边缘数据对齐,并且在对准之后评估评估区域内的图案的形状。

    Pattern evaluation method, pattern evaluation system and computer-readable recorded medium

    公开(公告)号:US06985626B2

    公开(公告)日:2006-01-10

    申请号:US10105387

    申请日:2002-03-26

    Applicant: Tadashi Mitsui

    Inventor: Tadashi Mitsui

    Abstract: A pattern evaluation method includes processing image data of at least one pattern serving as an object to be evaluated and detecting coordinates of edge points of the pattern in an image of the image data, making pairs of edge points from the edge points of the pattern, setting an arbitrary axis, calculating a distances between the edge points of each pair of the pairs of edge points and an angle between a straight line connecting the edge points of the pair and the axis, preparing a distance/angle distribution map which represents distribution of the distances and angles of the pairs of edge points, extracting a characteristic point of the distance/angle distribution map and analyzing the pattern on the basis of the extracted characteristic point.

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