公开(公告)号：US08711535B2

公开(公告)日：2014-04-29

申请号：US13891199

申请日：2013-05-10

Applicant: United Microelectronics Corp.

Inventor： Chang-Tzu Wang ,  Tien-Hao Tang ,  Kuan-Cheng Su

IPC: H02H3/20 ,  H01L27/02

CPC classification number: H02H3/20 ,  H01L27/0262 ,  H01L2924/1301 ,  H01L2924/1304 ,  H02H9/04 ,  H02H9/046

Abstract: The ESD protection circuit is electrically connected between a first power rail and a second power rail, and includes an ESD protection device, a switching device electrically connected between the ESD protection device and a first power rail, and a low-pass filter electrically connected between the first power rail and the first switching device. The ESD protection device includes a BJT and a first resistor electrically connected between a base of the BJT and a first power rail. When no ESD event occurs, a potential of the base is larger than or equal to a potential of an emitter of the BJT. When the ESD event occurs, the potential of the base is smaller than the potential of the emitter.

Abstract translation: ESD保护电路电连接在第一电力轨道和第二电力轨道之间，并且包括ESD保护装置，电连接在ESD保护装置和第一电力轨道之间的开关装置和电连接在第一电力轨道之间的低通滤波器 第一电力轨道和第一开关装置。 ESD保护器件包括BJT和电连接在BJT的基极和第一电源轨之间的第一电阻器。 当不发生ESD事件时，基极的电位大于或等于BJT发射极的电位。 当ESD事件发生时，基极的电位小于发射极的电位。

公开(公告)号：US20130250462A1

公开(公告)日：2013-09-26

申请号：US13891199

申请日：2013-05-10

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Chang-Tzu Wang ,  Tien-Hao Tang ,  Kuan-Cheng Su

IPC: H02H9/04

CPC classification number: H02H3/20 ,  H01L27/0262 ,  H01L2924/1301 ,  H01L2924/1304 ,  H02H9/04 ,  H02H9/046

Abstract: The ESD protection circuit is electrically connected between a first power rail and a second power rail, and includes an ESD protection device, a switching device electrically connected between the ESD protection device and a first power rail, and a low-pass filter electrically connected between the first power rail and the first switching device. The ESD protection device includes a BJT and a first resistor electrically connected between a base of the BJT and a first power rail. When no ESD event occurs, a potential of the base is larger than or equal to a potential of an emitter of the BJT. When the ESD event occurs, the potential of the base is smaller than the potential of the emitter.

Abstract translation: ESD保护电路电连接在第一电力轨道和第二电力轨道之间，并且包括ESD保护装置，电连接在ESD保护装置和第一电力轨道之间的开关装置和电连接在第一电力轨道之间的低通滤波器 第一电力轨道和第一开关装置。 ESD保护器件包括BJT和电连接在BJT的基极和第一电源轨之间的第一电阻器。 当不发生ESD事件时，基极的电位大于或等于BJT发射极的电位。 当ESD事件发生时，基极的电位小于发射极的电位。

公开(公告)号：US12211833B2

公开(公告)日：2025-01-28

申请号：US17742392

申请日：2022-05-11

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Hou-Jen Chiu ,  Mei-Ling Chao ,  Tien-Hao Tang ,  Kuan-Cheng Su

IPC: H01L27/02

Abstract: An electrostatic discharge protection structure includes a semiconductor substrate, a gate structure disposed on the semiconductor substrate, a first well region of a first conductivity type disposed in the semiconductor substrate, a first doped region of the first conductivity type, a second doped region of a second conductivity type, a third doped region of the first conductivity type, and a fourth doped region of the second conductivity type. The first and second doped regions are disposed in the first well region and connected with each other. The second doped region is an emitter of a first bipolar junction transistor. The third and fourth doped regions are disposed in the semiconductor substrate and connected with each other. The third and second doped regions are located at two opposite sides of the gate structure in a first horizontal direction. The third doped region is an emitter of a second bipolar junction transistor.

公开(公告)号：US20240194668A1

公开(公告)日：2024-06-13

申请号：US18105256

申请日：2023-02-03

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Yu-Hsuan Lin ,  Hou-Jen Chiu ,  Mei-Ling Chao ,  Tien-Hao Tang ,  Kuan-Cheng Su

IPC: H01L27/02 ,  H01L27/082 ,  H01L29/08

CPC classification number: H01L27/0259 ,  H01L27/082 ,  H01L29/0808 ,  H01L29/0821 ,  H01L29/735

Abstract: An electrostatic discharge protection structure includes a semiconductor substrate and a first n-type well region, a p-type well region, a first p-type doped region, a second p-type doped region, and an isolation structure disposed in the semiconductor substrate. The p-type well region is located adjacent to the first n-type well region. The first p-type doped region and the second p-type doped region are located above the first n-type well region and the p-type well region, respectively. A first portion of the isolation structure is located between the first p-type doped region and the second p-type doped region in a horizontal direction. An edge of the first n-type well region is located under the first portion. A distance between the first p-type doped region and the edge of the first n-type well region in the horizontal direction is less than a length of the first portion in the horizontal direction.

公开(公告)号：US11004840B2

公开(公告)日：2021-05-11

申请号：US16200662

申请日：2018-11-27

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Shih-Che Yen ,  Tien-Hao Tang ,  Chun Chiang ,  Kuan-Cheng Su

IPC: H01L27/02 ,  H02H9/04

Abstract: A silicon controlled rectifier includes a substrate, an N-type well, a P-type well, a gate structure, a first N-type doped region, a second N-type doped region, a first P-type doped region, a second P-type doped region, a first STI, and a second STI. The N-type well and the P-type well are disposed in the substrate. The gate structure is disposed on the P-type well. The first N-type doped region is disposed in the N-type well at one side of the gate structure. The second N-type doped region is disposed in the P-type well at another side of the gate structure. The first P-type doped region is disposed in the N-type well. The second P-type doped region is disposed in the P-type well. The first STI is between the first N-type and first P-type doped regions. The second STI is between the second N-type and second P-type doped regions.

公开(公告)号：US10204897B2

公开(公告)日：2019-02-12

申请号：US15484143

申请日：2017-04-11

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Chung-Yu Huang ,  Kuan-Cheng Su ,  Tien-Hao Tang ,  Ping-Jui Chen ,  Po-Ya Lai

IPC: H01L27/02 ,  H01L29/06 ,  H01L29/78

Abstract: An ESD protection semiconductor device includes a substrate, a gate set formed on the substrate, a source region and a drain region formed in the substrate respectively at two sides of the gate set, and at least a doped region formed in the source region. The source region and the drain region include a first conductivity type, and the doped region includes a second conductivity type complementary to the first conductivity type. The doped region is electrically connected to a ground potential.

公开(公告)号：US10103136B2

公开(公告)日：2018-10-16

申请号：US15464362

申请日：2017-03-21

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Chung-Yu Huang ,  Kuan-Cheng Su ,  Tien-Hao Tang ,  Ping-Jui Chen ,  Po-Ya Lai

IPC: H01L23/62 ,  H01L27/02 ,  H01L29/423 ,  H01L29/08 ,  H01L29/06 ,  H01L29/78

Abstract: An ESD protection semiconductor device includes a substrate, a gate set formed on the substrate, a source region and a drain region formed in the substrate respectively at two sides of the gate set, at least a first doped region formed in the source region, and at least a second doped region formed in the drain region. The source region, the drain region and the second doped region include a first conductivity type, and the first doped region includes a second conductivity type. The first conductivity type and the second conductivity type are complementary to each other. The second doped region is electrically connected to the first doped region. The gate set includes at least a first gate structure, a second gate structure, and a third gate structure.

公开(公告)号：US10090291B2

公开(公告)日：2018-10-02

申请号：US15138226

申请日：2016-04-26

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Mei-Ling Chao ,  Tien-Hao Tang ,  Kuan-Cheng Su

IPC: H01L27/02 ,  H01L29/417 ,  H01L29/06 ,  H01L29/08 ,  H01L29/10

Abstract: A layout structure of an ESD protection semiconductor device includes a substrate, a first doped region, a pair of second doped regions, a pair of third doped regions, at least a first gate structure formed within the first doped region, and a drain region and a first source region formed at two sides of the first gate structure. The substrate, the first doped region and the third doped regions include a first conductivity type. The second doped regions, the drain region and the first source region include a second conductivity type complementary to the first conductivity type. The first doped region includes a pair of lateral portions and a pair of vertical portions. The pair of second doped regions is formed under the pair of lateral portions, and the pair of third doped regions is formed under the pair of vertical portions.

公开(公告)号：US20180269198A1

公开(公告)日：2018-09-20

申请号：US15983113

申请日：2018-05-18

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Chung-Yu Huang ,  Kuan-Cheng Su ,  Tien-Hao Tang ,  Ping-Chen Chang

IPC: H01L27/02 ,  H01L29/78 ,  H01L29/08

CPC classification number: H01L27/0255 ,  H01L27/027 ,  H01L29/0653 ,  H01L29/0696 ,  H01L29/0847 ,  H01L29/0873 ,  H01L29/78 ,  H01L29/7818 ,  H01L29/7831 ,  H01L29/7835

Abstract: An electrostatic discharge (ESD) protection device includes a substrate, a first gate group and a second gate group on the substrate, a drain region and a fourth doped region respectively at two sides of the first gate group, a source region and the fourth doped region respectively at two sides of the second gate group, a first doped region in the substrate and surrounded by the drain region, and a second doped region in the substrate and surrounded by the fourth doped region. The drain region and the source region have a first conductivity type. The first doped region and the second doped region have a second conductivity type complementary to the first conductivity type. The drain region is electrically connected to an input/output pad. The source region is electrically connected to a ground pad. The first doped region and the second doped region are electrically connected to each other.

公开(公告)号：US10008489B2

公开(公告)日：2018-06-26

申请号：US14724825

申请日：2015-05-29

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Chung-Yu Huang ,  Kuan-Cheng Su ,  Tien-Hao Tang ,  Ping-Chen Chang

IPC: H01L27/02 ,  H01L29/78 ,  H01L29/08

CPC classification number: H01L27/0255 ,  H01L27/027 ,  H01L29/0653 ,  H01L29/0696 ,  H01L29/0847 ,  H01L29/0873 ,  H01L29/78 ,  H01L29/7818 ,  H01L29/7831 ,  H01L29/7835

Abstract: An electrostatic discharge protection semiconductor device includes a substrate, a gate set positioned on the substrate, a source region and a drain region formed in the substrate respectively at two sides of the gate set, at least a first doped region formed in the drain region, and at least a second doped region formed in the substrate. The source region and the drain region include a first conductivity type, the first doped region and the second doped region include a second conductivity type, and the first conductivity and the second conductivity type are complementary to each other. The first doped region and the second doped region are electrically connected to each other.