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公开(公告)号：US11698566B2
公开(公告)日：2023-07-11
申请号：US16453891
申请日：2019-06-26
Applicant: View, Inc.
Inventor： Sridhar Karthik Kailasam , Dhairya Shrivastava , Zhiwei Cai , Robert T. Rozbicki , Dane Thomas Gillaspie , Todd William Martin , Anshu A. Pradhan , Ronald M. Parker
IPC: G02F1/153
CPC classification number: G02F1/153 , G02F2201/501 , G02F2201/508
Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.
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公开(公告)号：US20210163346A1
公开(公告)日：2021-06-03
申请号：US17248930
申请日：2021-02-12
Applicant: View, Inc.
Inventor： Ronald M. Parker , Anshu A. Pradhan , Abhishek Anant Dixit , Douglas Dauson
Abstract: Methods for protecting transparent electronically conductive layers on glass substrates are described herein. Methods include depositing a sacrificial coating during deposition of the transparent electronically conductive layer, before packing the glass substrate for storage or shipping, after unpacking glass substrates from a stack of glass substrates, and/or after a washing operation prior to fabricating an electrochromic stack on the transparent electronically conductive layer. Methods also include removing the sacrificial coating during a washing operation, during tempering, or prior to depositing an electrochromic stack by, e.g., heating the sacrificial coating or exposing the sacrificial coating to an inert plasma.
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公开(公告)号：US20210103195A1
公开(公告)日：2021-04-08
申请号：US17247541
申请日：2020-12-15
Applicant: View, Inc.
Inventor： Sridhar K. Kailasam , Dhairya Shrivastava , Zhiwei Cai , Robert T. Rozbicki , Dane Gillaspie , Todd Martin , Anshu A. Pradhan , Ronald M. Parker
IPC: G02F1/153
Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.
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公开(公告)号：US10534237B2
公开(公告)日：2020-01-14
申请号：US15252099
申请日：2016-08-30
Applicant: View, Inc.
Inventor： Robin Friedman , Sridhar Karthik Kailasam , Rao Mulpuri , Ronald M. Parker , Ronald A. Powell , Anshu A. Pradhan , Robert T. Rozbicki , Vinod Khosla
IPC: G02F1/163 , G02F1/1523 , G02F1/15 , B01J19/12 , G01R31/08 , G02F1/01 , G02F1/13 , C03C23/00 , G02F1/153 , B05D3/12 , G02F1/1516
Abstract: Methods, apparatus, and systems for mitigating pinhole defects in optical devices such as electrochromic windows. One method mitigates a pinhole defect in an electrochromic device by identifying the site of the pinhole defect and obscuring the pinhole to make it less visually discernible. In some cases, the pinhole defect may be the result of mitigating a short-related defect.
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公开(公告)号：US10520783B2
公开(公告)日：2019-12-31
申请号：US15537370
申请日：2015-12-15
Applicant: View, Inc.
Inventor： Sridhar Karthik Kailasam , Dhairya Shrivastava , Zhiwei Cai , Robert T. Rozbicki , Dane Thomas Gillaspie , Todd William Martin , Anshu A. Pradhan , Ronald M. Parker
IPC: G02F1/153
Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.
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Patent Agency Ranking
公开(公告)号：US20190391456A1
公开(公告)日：2019-12-26
申请号：US16560805
申请日：2019-09-04
Applicant: View, Inc.
Inventor： Ronald M. Parker , Yashraj Bhatnagar , Trevor Frank , Travis D. Wilbur , Stephen C. Brown
IPC: G02F1/163 , G02F1/161 , B32B17/10 , E06B3/663 , G02F1/153 , E06B9/24 , G02F1/155 , H01R13/22 , H01R13/62
Abstract: This disclosure describes insulated glass units (IGUs) that incorporate electrochromic devices. More specifically, this disclosure focuses on different configurations available for providing an electrical connection to the interior region of an IGU. In many cases, an IGU includes two panes separated by a spacer. The spacer defines an interior region of the IGU and an exterior region of the IGU. Often, the electrochromic device positioned on the pane does not extend past the spacer, and some electrical connection must be provided to supply power from the exterior of the IGU to the electrochromic device on the interior of the IGU. In some embodiments, the spacer includes one or more holes (e.g, channels, mouse holes, other holes, etc.) through which an electrical connection (e.g., wires, busbar leads, etc.) may pass to provide power to the electrochromic device.
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公开(公告)号：US09995985B2
公开(公告)日：2018-06-12
申请号：US15364162
申请日：2016-11-29
Applicant: View, Inc.
Inventor： Ronald M. Parker , Robert T. Rozbicki , Yashraj Bhatnagar , Abhishek Anant Dixit , Anshu A. Pradhan
IPC: G02F1/153 , G02F1/15 , G09G3/19 , H04N9/16 , B32B17/10 , G02F1/161 , B32B37/18 , B32B38/00 , G02F1/1345 , G02F1/155
CPC classification number: G02F1/1533 , B32B17/10055 , B32B17/10128 , B32B17/10183 , B32B17/10513 , B32B17/10697 , B32B17/10908 , B32B17/10917 , B32B17/1099 , B32B37/18 , B32B38/0008 , B32B38/105 , B32B2333/12 , B32B2457/20 , G02F1/13458 , G02F1/1523 , G02F1/155 , G02F1/161 , Y10T29/49002 , Y10T83/0304 , Y10T428/2419 , Y10T428/24231
Abstract: Methods of manufacturing electrochromic windows are described. Insulated glass units (IGU's) are protected, e.g. during handling and shipping, by a protective bumper. The bumper can be custom made using IGU dimension data received from the IGU fabrication tool. The bumper may be made of environmentally friendly materials. Laser isolation configurations and related methods of patterning and/or configuring an electrochromic device on a substrate are described. Edge deletion is used to ensure a good seal between spacer and glass in an IGU and thus better protection of an electrochromic device sealed in the IGU. Configurations for protecting the electrochromic device edge in the primary seal and maximizing viewable area in an electrochromic pane of an IGU are also described.
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公开(公告)号：US20170371218A1
公开(公告)日：2017-12-28
申请号：US15537370
申请日：2015-12-15
Applicant: VIEW, INC.
Inventor： Sridhar Karthik Kailasam , Dhairya Shrivastava , Zhiwei Cai , Robert T. Rozbicki , Dane Thomas Gillaspie , Todd William Martin , Anshu A. Pradhan , Ronald M. Parker
IPC: G02F1/153
Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.
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公开(公告)号：US20160089869A1
公开(公告)日：2016-03-31
申请号：US14782772
申请日：2014-04-11
Applicant: VIEW, INC.
Inventor： Ronald M. Parker , Trevor Frank , Ryan Taylor
CPC classification number: B32B37/18 , B32B37/06 , B32B37/08 , B32B2315/08 , E06B3/66328 , E06B3/6715 , E06B3/67326 , E06B3/6775 , E06B2009/2464
Abstract: Methods and apparatus for fabricating pressure compensated insulated glass units (IGUs). In one example, a method assembles an IGU from a first lite, a second lite and a spacer registered with and between the first and second lite, while at least the space between the first and second lites and within the perimeter of the spacer contains a heated or cooled inert gas. In another example, a method provides a vented IGU, heats or cools the vented IGU, introduces inert gas into the interior volume of the vented IGU, and seals vent ports before the IGU comes to ambient temperature. In another example, a method introduces or removes inert gas from an IGU by penetrating a seal of the IGU and then reseals the IGU. In another example, an apparatus for fabricating an IGU comprises a temperature control unit configured to heat or cool an inert gas and an IGU press wherein the apparatus is configured to introduce a heated inert gas or a cooled inert gas into the IGU as the hermetic seal of the IGU is formed.
Abstract translation: 用于制造压力补偿绝缘玻璃单元（IGU）的方法和装置。 在一个示例中，一种方法从在第一和第二精矿之间注册的第一批次，第二批次和间隔物组装IGU，而至少第一和第二批次之间并且在间隔物的周边内的空间包含一个 加热或冷却的惰性气体。 在另一个实例中，一种方法提供一个通风的IGU，加热或冷却通风的IGU，将惰性气体引入到通风的IGU的内部容积中，并且在IGU达到环境温度之前密封通气口。 在另一个实例中，一种方法是通过穿透IGU的密封件从IGU引入或除去惰性气体，然后再去除IGU。 在另一个实例中，用于制造IGU的装置包括：温度控制单元，被配置为加热或冷却惰性气体和IGU压力机，其中所述装置构造成将加热的惰性气体或冷却的惰性气体引入IGU中作为气密封 的IGU形成。
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公开(公告)号：US12072598B2
公开(公告)日：2024-08-27
申请号：US18322472
申请日：2023-05-23
Applicant: View, Inc.
Inventor： Sridhar Karthik Kailasam , Dhairya Shrivastava , Zhiwei Cai , Robert Tad Rozbicki , Dane Thomas Gillaspie , Todd William Martin , Anshu Ajit Pradhan , Ronald M. Parker
IPC: G02F1/153
CPC classification number: G02F1/153 , G02F2201/501 , G02F2201/508
Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.
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