公开(公告)号：US12298642B2

公开(公告)日：2025-05-13

申请号：US17937282

申请日：2022-09-30

Applicant: View, Inc.

Inventor： Robin Sean Friedman ,  Sridhar Karthik Kailasam ,  Rao P. Mulpuri ,  Ronald M. Parker ,  Ronald A. Powell ,  Anshu Ajit Pradhan ,  Robert Tad Rozbicki ,  Vinod Khosla

IPC: G02F1/1524 ,  B01J19/12 ,  C03C23/00 ,  G01M11/02 ,  G01R31/08 ,  G02F1/01 ,  G02F1/13 ,  G09G3/00 ,  B05D3/12 ,  G02F1/15 ,  G02F1/1516 ,  G02F1/153 ,  G02F1/163

Abstract: Methods, apparatus, and systems for mitigating pinhole defects in optical devices such as electrochromic windows. One method mitigates a pinhole defect in an electrochromic device by identifying the site of the pinhole defect and obscuring the pinhole to make it less visually discernible. In some cases, the pinhole defect may be the result of mitigating a short-related defect.

公开(公告)号：US20240377692A1

公开(公告)日：2024-11-14

申请号：US18781422

申请日：2024-07-23

Applicant: View, Inc.

Inventor： Sridhar K. Kailasam ,  Dhairya Shrivastava ,  Zhiwei Cai ,  Robert T. Rozbicki ,  Dane Gillaspie ,  Todd Martin ,  Anshu A. Pradhan ,  Ronald M. Parker

IPC: G02F1/153

Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.

公开(公告)号：US11934080B2

公开(公告)日：2024-03-19

申请号：US17247541

申请日：2020-12-15

Applicant: View, Inc.

Inventor： Sridhar K. Kailasam ,  Dhairya Shrivastava ,  Zhiwei Cai ,  Robert T. Rozbicki ,  Dane Gillaspie ,  Todd Martin ,  Anshu A. Pradhan ,  Ronald M. Parker

IPC: G02F1/153

CPC classification number: G02F1/153 ,  G02F2201/501 ,  G02F2201/508

Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.

公开(公告)号：US20190339579A1

公开(公告)日：2019-11-07

申请号：US16453891

申请日：2019-06-26

Applicant: View, Inc.

Inventor： Sridhar Karthik Kailasam ,  Dhairya Shrivastava ,  Zhiwei Cai ,  Robert T. Rozbicki ,  Dane Thomas Gillaspie ,  Todd William Martin ,  Anshu A. Pradhan ,  Ronald M. Parker

IPC: G02F1/153

Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.

公开(公告)号：US10409130B2

公开(公告)日：2019-09-10

申请号：US15934854

申请日：2018-03-23

Applicant: View, Inc.

Inventor： Ronald M. Parker ,  Robert T. Rozbicki ,  Yashraj Bhatnagar ,  Abhishek Anant Dixit ,  Anshu A. Pradhan

IPC: G02F1/153 ,  G02F1/15 ,  G09G3/19 ,  H04N9/16 ,  B32B17/10 ,  G02F1/161 ,  B32B37/18 ,  B32B38/00 ,  G02F1/1345 ,  G02F1/1523 ,  G02F1/155

Abstract: Methods of manufacturing electrochromic windows are described. Insulated glass units (IGU's) are protected, e.g. during handling and shipping, by a protective bumper. The bumper can be custom made using IGU dimension data received from the IGU fabrication tool. The bumper may be made of environmentally friendly materials. Laser isolation configurations and related methods of patterning and/or configuring an electrochromic device on a substrate are described. Edge deletion is used to ensure a good seal between spacer and glass in an IGU and thus better protection of an electrochromic device sealed in the IGU. Configurations for protecting the electrochromic device edge in the primary seal and maximizing viewable area in an electrochromic pane of an IGU are also described.

公开(公告)号：US20190171076A1

公开(公告)日：2019-06-06

申请号：US16249822

申请日：2019-01-16

Applicant: View, Inc.

Inventor： Sridhar Karthik Kailasam ,  Dhairya Shrivastava ,  Zhiwei Cai ,  Robert T. Rozbicki ,  Dane Thomas Gillaspie ,  Todd William Martin ,  Anshu A. Pradhan ,  Ronald M. Parker

IPC: G02F1/153

Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.

公开(公告)号：US10241375B2

公开(公告)日：2019-03-26

申请号：US15226835

申请日：2016-08-02

Applicant: View, Inc.

Inventor： Mark A. Collins ,  Ronald M. Parker ,  Robert T. Rozbicki ,  Dhairya Shrivastava

IPC: G02F1/153 ,  G02F1/03 ,  G02F1/15 ,  G02F1/133 ,  G09G3/38 ,  G02F1/1523 ,  G02B1/14 ,  B32B17/10 ,  G02F1/1333 ,  G02F1/155 ,  G02F1/161

Abstract: Methods of manufacturing electrochromic windows are described. An electrochromic device is fabricated to substantially cover a glass sheet, for example float glass, and a cutting pattern is defined based on one or more low-defectivity areas in the device from which one or more electrochromic panes are cut. Laser scribes and/or bus bars may be added prior to cutting the panes or after. Edge deletion can also be performed prior to or after cutting the electrochromic panes from the glass sheet. Insulated glass units (IGUs) are fabricated from the electrochromic panes and optionally one or more of the panes of the IGU are strengthened.

公开(公告)号：US09703167B2

公开(公告)日：2017-07-11

申请号：US14512297

申请日：2014-10-10

Applicant: View, Inc.

Inventor： Ronald M. Parker ,  Robert T. Rozbicki ,  Yashraj Bhatnagar ,  Abhishek Anant Dixit ,  Anshu A. Pradhan

IPC: G02F1/153 ,  G02F1/03 ,  G09G3/19 ,  G02F1/161 ,  B32B17/10 ,  B32B37/18 ,  B32B38/00 ,  G02F1/1345

CPC classification number: G02F1/1533 ,  B32B17/10055 ,  B32B17/10128 ,  B32B17/10183 ,  B32B17/10513 ,  B32B17/10697 ,  B32B17/10908 ,  B32B17/10917 ,  B32B17/1099 ,  B32B37/18 ,  B32B38/0008 ,  B32B38/105 ,  B32B2333/12 ,  B32B2457/20 ,  G02F1/13458 ,  G02F1/1523 ,  G02F1/155 ,  G02F1/161 ,  Y10T29/49002 ,  Y10T83/0304 ,  Y10T428/2419 ,  Y10T428/24231

Abstract: Methods of manufacturing electrochromic windows are described. Insulated glass units (IGU's) are protected, e.g. during handling and shipping, by a protective bumper. The bumper can be custom made using IGU dimension data received from the IGU fabrication tool. The bumper may be made of environmentally friendly materials. Laser isolation configurations and related methods of patterning and/or configuring an electrochromic device on a substrate are described. Edge deletion is used to ensure a good seal between spacer and glass in an IGU and thus better protection of an electrochromic device sealed in the IGU. Configurations for protecting the electrochromic device edge in the primary seal and maximizing viewable area in an electrochromic pane of an IGU are also described.

公开(公告)号：US20140192393A1

公开(公告)日：2014-07-10

申请号：US14152873

申请日：2014-01-10

Applicant: View Inc.

Inventor： Yashraj Bhatnagar ,  Trevor Frank ,  Fabian Strong ,  Sridhar Kailasam ,  Robert Babcock ,  Ronald M. Parker ,  Robert T. Rozbicki

IPC: G02F1/161 ,  B32B17/10

CPC classification number: G02F1/161 ,  B32B17/10055 ,  B32B17/10174 ,  B32B17/10513 ,  E06B3/66314 ,  E06B3/66328 ,  E06B3/66352 ,  E06B2003/6638 ,  E06B2003/66385 ,  Y10T403/55 ,  Y10T403/7018

Abstract: This disclosure provides spacers for smart windows. In one aspect, a window assembly includes a first substantially transparent substrate having an optically switchable device on a surface of the first substrate. The optically switchable device includes electrodes. A first electrode of the electrodes has a length about the length of a side of the optically switchable device. The window assembly further includes a second substantially transparent substrate a metal spacer between the first and the second substrates. The metal spacer has a substantially rectangular cross section, with one side of the metal spacer including a recess configured to accommodate the length of the first electrode such that there is no contact between the first electrode and the metal spacer. A primary seal material bonds the first substrate to the metal spacer and bonds the second substrate to the metal spacer.

Abstract translation: 本公开提供了用于智能窗口的间隔物。 在一个方面，一种窗口组件包括在第一基板的表面上具有光可切换装置的第一基本上透明的基板。 光学可切换装置包括电极。 电极的第一电极具有围绕光可切换装置的一侧的长度的长度。 窗组件还包括第二基本上透明的基底，在第一和第二基底之间的金属间隔物。 金属间隔件具有基本上矩形的横截面，金属间隔件的一侧包括凹部，该凹部被构造成适应第一电极的长度，使得在第一电极和金属间隔件之间不存在接触。 第一密封材料将第一基底结合到金属间隔物并将第二基底结合到金属间隔物上。

公开(公告)号：US12240206B2

公开(公告)日：2025-03-04

申请号：US18300123

申请日：2023-04-13

Applicant: View, Inc. ,  Corning Incorporated

Inventor： Ronald M. Parker ,  Anshu Ajit Pradhan ,  Abhishek Anant Dixit ,  Douglas Samuel Dauson

IPC: B32B17/10 ,  B29C65/00 ,  G02F1/1524 ,  G02F1/153 ,  G02F1/155

Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.