公开(公告)号：US08771803B2

公开(公告)日：2014-07-08

申请号：US12304498

申请日：2007-06-13

申请人： Marius Dichtl

发明人： Marius Dichtl

IPC分类号： C08J7/04

CPC分类号： B41M3/003 ,  B29D11/00365 ,  B41M3/148 ,  G02B3/0006 ,  G02B3/0031 ,  G02B3/0056 ,  G02B5/201 ,  G02B27/60 ,  Y10T428/24802 ,  Y10T428/24934

摘要： The present invention relates to a method for applying a colored or colorless micropattern to a support, in which a) a die form (40) is prepared whose surface exhibits an arrangement of elevations (42) and depressions (44) in the form of the desired micropattern, b) the depressions (44) in the die form are filled with a curable colored or colorless lacquer (26), c) the support (20, 30) is pretreated for a good anchoring of the colored or colorless lacquer (26), d) the surface of the die form (40) is brought into contact with the support (20, 30), e) the lacquer (26) that is in contact with the support (20, 30) in the depressions in the die form (40) is cured and, in the process, joined with the support (20, 30), and f) the surface of the die form (40) is removed from the support (20, 30) again such that the cured lacquer (26) that is joined with the support (20, 30) is pulled out of the depressions (44) in the die form (40).

摘要翻译： 本发明涉及一种将有色或无色的微图案应用于支撑体的方法，其中a）制备模具形式（40），其表面呈现呈高度（42）和凹陷（44）的布置，形式为 所需的微图案，b）模具形式的凹陷（44）填充有可固化的有色或无色漆（26），c）预处理支撑体（20,30）以有效或无色的漆（26 ），d）使模具形式（40）的表面与支撑件（20,30）接触，e）与所述支撑件（20,30）中的凹部中的支撑件（20,30）接触的漆（26） 模具形式（40）被固化，并且在该过程中与支撑件（20,30）接合，以及f）再次将模具形式（40）的表面从支撑件（20,30）移除，使得固化 与支撑件（20,30）接合的漆（26）从模具形式（40）中的凹陷（44）中拉出。

公开(公告)号：US08740095B2

公开(公告)日：2014-06-03

申请号：US12304522

申请日：2007-06-13

申请人： Marius Dichtl

发明人： Marius Dichtl

IPC分类号： G06K19/06

CPC分类号： B42D25/342 ,  B42D25/00 ,  B42D25/21 ,  B42D25/29 ,  B42D25/41 ,  B42D2033/24 ,  D21H21/42 ,  D21H21/44 ,  Y10T29/49826

摘要： The present invention relates to a security element for security papers, value documents and the like, having a micro-optical moiré magnification arrangement having a motif image (30) that consists of a planar periodic or at least locally periodic arrangement of a plurality of micromotif elements (36, 38), and a planar periodic or at least locally periodic arrangement of a plurality of microfocusing elements for the moiré-magnified viewing of the micromotif elements (36, 38) of the motif image, the motif image (30) including two or more sub-regions (32, 34) having micromotif elements (36, 38) that differ from each other in their contrast, and wherein the shape of the sub-regions (32, 34) forms, due to the contrast differences in the micromotif elements (36, 38), a perceptible macroscopic piece of image information in the form of characters, patterns or codes.

摘要翻译： 本发明涉及一种用于安全纸，价值凭证等的安全元件，具有微光学莫尔放大布置，其具有由多个微型显微镜的平面周期性或至少局部周期性布置组成的图案（30） 元件（36,38），以及多个微焦点元件的平面周期性或至少局部周期性布置，用于对所述图案图像的微突起元件（36,38）进行莫尔放大观看，所述图案图像（30）包括 两个或更多个子区域（32,34）具有在其对比度彼此不同的微突起元件（36,38），并且其中子区域（32,34）的形状由于 微型元件（36,38），以字符，图案或代码的形式的可察觉的宏观图像信息片段。

公开(公告)号：US20090322071A1

公开(公告)日：2009-12-31

申请号：US12304522

申请日：2007-06-13

申请人： Marius Dichtl

发明人： Marius Dichtl

IPC分类号： B42D15/00 ,  B23P11/00

CPC分类号： B42D25/342 ,  B42D25/00 ,  B42D25/21 ,  B42D25/29 ,  B42D25/41 ,  B42D2033/24 ,  D21H21/42 ,  D21H21/44 ,  Y10T29/49826

摘要： The present invention relates to a security element for security papers, value documents and the like, having a micro-optical moiré magnification arrangement having a motif image (30) that consists of a planar periodic or at least locally periodic arrangement of a plurality of micromotif elements (36, 38), and a planar periodic or at least locally periodic arrangement of a plurality of microfocusing elements for the moiré-magnified viewing of the micromotif elements (36, 38) of the motif image, the motif image (30) including two or more sub-regions (32, 34) having micromotif elements (36, 38) that differ from each other in their contrast, and wherein the shape of the sub-regions (32, 34) forms, due to the contrast differences in the micromotif elements (36, 38), a perceptible macroscopic piece of image information in the form of characters, patterns or codes.

摘要翻译： 本发明涉及一种用于安全纸，价值凭证等的安全元件，具有微光学莫尔放大布置，其具有由多个微型显微镜的平面周期性或至少局部周期性布置组成的图案（30） 元件（36,38），以及多个微焦点元件的平面周期性或至少局部周期性布置，用于对所述图案图像的微突起元件（36,38）进行莫尔放大观看，所述图案图像（30）包括 两个或更多个子区域（32,34）具有在其对比度彼此不同的微突起元件（36,38），并且其中子区域（32,34）的形状由于 微型元件（36,38），以字符，图案或代码的形式的可察觉的宏观图像信息片段。

公开(公告)号：US07880152B2

公开(公告)日：2011-02-01

申请号：US10599659

申请日：2005-03-30

申请人： Wittich Kaule ,  Rainer Plontke ,  Ines Stolberg ,  Andreas Schubert ,  Marius Dichtl

发明人： Wittich Kaule ,  Rainer Plontke ,  Ines Stolberg ,  Andreas Schubert ,  Marius Dichtl

IPC分类号： A61N5/00 ,  G21G5/00

CPC分类号： G11B7/261 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0005 ,  G03F7/0017 ,  G11B7/007 ,  H01J37/3174

摘要： The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis of the beam being essentially perpendicular to a resist layer in which the resist profiled element is to be produced. The electron beam can be adjusted in terms of the electron surface dose in such a way that a non-orthogonal resist profiled element can be produced as a result of the irradiation by the electron beam.

摘要翻译： 本发明涉及一种用于制造抗蚀剂成型元件的装置和方法。 根据本发明，使用电子束光刻系统来产生电子束，所述光束的轴线基本上垂直于要在其中产生抗蚀剂成型元件的抗蚀剂层。 可以以电子表面剂量的方式调整电子束，使得由于电子束的照射可以产生非正交抗蚀剂成型元件。

公开(公告)号：US20100109317A1

公开(公告)日：2010-05-06

申请号：US12527043

申请日：2008-02-13

申请人： Winfried Hoffmüller ,  Marius Dichtl

发明人： Winfried Hoffmüller ,  Marius Dichtl

IPC分类号： B42D15/00 ,  B05D5/06

CPC分类号： B42D25/324 ,  B41M3/14 ,  B42D25/29 ,  B42D25/41 ,  B42D2035/20 ,  B42D2035/44 ,  C08L2312/00 ,  C09D5/28 ,  C09D11/101 ,  C09D133/14 ,  C09D133/16 ,  G02B3/0012 ,  Y10T428/24355 ,  Y10T428/24802

摘要： The present invention relates to a highly refractive embossing lacquer for producing micro-optic arrangements which contains at least one binding agent which has at least one radiation-curing compound system consisting of one or more organic compounds. The highly refractive embossing lacquer is characterized in that at least a portion of the organic compounds of the radiation-curing compound system consists of molecules with at least one polarizable element, so that a polymeric material with a refractive index of greater than 1.5 is formed upon radiation curing. The invention also relates to a security element which is produced with at least one micro-optic authenticity feature. Micro-optic authenticity features according to the present invention permit the production of security elements that are so thin that they can be easily incorporated into value documents.

摘要翻译： 本发明涉及一种用于生产微光学装置的高折射压纹漆，它含有至少一种具有至少一种由一种或多种有机化合物组成的辐射固化化合物系统的粘合剂。 高折射压花漆的特征在于，辐射固化化合物系统的至少一部分有机化合物由具有至少一个可极化元素的分子组成，使得折射率大于1.5的聚合物材料形成在 辐射固化。 本发明还涉及一种利用至少一个微光学真实性特征产生的安全元件。 根据本发明的微光真实性特征允许生产如此薄的安全元件，使得它们可以容易地并入价值文档中。

公开(公告)号：US20090297805A1

公开(公告)日：2009-12-03

申请号：US12304498

申请日：2007-06-13

申请人： Marius Dichtl

发明人： Marius Dichtl

IPC分类号： B41M3/14 ,  B05D3/06 ,  B05D5/06

CPC分类号： B41M3/003 ,  B29D11/00365 ,  B41M3/148 ,  G02B3/0006 ,  G02B3/0031 ,  G02B3/0056 ,  G02B5/201 ,  G02B27/60 ,  Y10T428/24802 ,  Y10T428/24934

摘要： The present invention relates to a method for applying a colored or colorless micropattern to a support, in which a) a die form (40) is prepared whose surface exhibits an arrangement of elevations (42) and depressions (44) in the form of the desired micropattern, b) the depressions (44) in the die form are filled with a curable colored or colorless lacquer (26), c) the support (20, 30) is pretreated for a good anchoring of the colored or colorless lacquer (26), d) the surface of the die form (40) is brought into contact with the support (20, 30), e) the lacquer (26) that is in contact with the support (20, 30) in the depressions in the die form (40) is cured and, in the process, joined with the support (20, 30), and f) the surface of the die form (40) is removed from the support (20, 30) again such that the cured lacquer (26) that is joined with the support (20, 30) is pulled out of the depressions (44) in the die form (40).

摘要翻译： 本发明涉及一种将有色或无色的微图案应用于支撑体的方法，其中a）制备模具形式（40），其表面呈现呈高度（42）和凹陷（44）的布置，形式为 所需的微图案，b）模具形式的凹陷（44）填充有可固化的有色或无色漆（26），c）预处理支撑体（20,30）以有效或无色的漆（26 ），d）使模具形式（40）的表面与支撑件（20,30）接触，e）与所述支撑件（20,30）中的凹部中的支撑件（20,30）接触的漆（26） 模具形式（40）被固化，并且在该过程中与支撑件（20,30）接合，以及f）再次将模具形式（40）的表面从支撑件（20,30）移除，使得固化 与支撑件（20,30）接合的漆（26）从模具形式（40）中的凹陷（44）中拉出。

公开(公告)号：US20070109532A1

公开(公告)日：2007-05-17

申请号：US10587294

申请日：2005-01-24

申请人： Marius Dichtl

发明人： Marius Dichtl

IPC分类号： G06K9/74

CPC分类号： B42D25/30 ,  B42D25/23 ,  B42D25/29 ,  B42D2035/14 ,  B42D2035/16 ,  B42D2035/20 ,  G02B5/1819 ,  G02B5/1823 ,  G02B5/1828 ,  G02B5/1861 ,  G07D7/0032

摘要： The present invention relates to a grating image having one or more grating fields, each of which includes an electromagnetic radiation-influencing grating pattern comprising a plurality of grating lines, the grating lines being characterized by the parameters orientation, curvature, spacing and profile. According to the present invention, in the grating image, a grating field (30) that is separately perceptible with the naked eye includes an electromagnetic radiation-influencing grating pattern having grating lines (32) for which at least one of the characteristic parameters orientation, curvature, spacing and profile varies (34) across the surface of the grating field.

摘要翻译： 本发明涉及具有一个或多个光栅场的光栅图像，每个光栅场包括包括多个光栅线的电磁辐射影响光栅图案，该光栅线的特征在于参数取向，曲率，间距和轮廓。 根据本发明，在光栅图像中，用肉眼可感知的光栅场（30）包括具有光栅线（32）的电磁辐射影响光栅图案，其中至少一个特征参数取向， 曲率，间距和轮廓在光栅场的表面上变化（34）。