公开(公告)号：US20090315186A1

公开(公告)日：2009-12-24

申请号：US12457153

申请日：2009-06-02

申请人： Ken Ozawa

发明人： Ken Ozawa

IPC分类号： H01L21/768 ,  H01L23/535

CPC分类号： H01L21/76832 ,  H01L21/7681

摘要： An etching stopper film is formed on top of a first insulating film. The etching stopper film is a film formed by depositing at least two films, made of constituent materials identical in quality to each other, one another. Subsequently, a first opening pattern is formed in the etching stopper film. Subsequently, a second insulating film is formed on top of the etching stopper film. Subsequently, a mask pattern is formed on top of the second insulating film. Subsequently, the second insulating film is etched with the use of the mask pattern as a mask to be followed by etching of the first insulating film with the use of the etching stopper film as a mask.

摘要翻译： 在第一绝缘膜的顶部形成蚀刻停止膜。 蚀刻停止膜是通过彼此沉积至少两层由质量相同的构成材料制成的膜而形成的膜。 随后，在蚀刻停止膜中形成第一开口图案。 随后，在蚀刻停止膜的顶部上形成第二绝缘膜。 随后，在第二绝缘膜的顶部上形成掩模图案。 随后，使用掩模图案作为掩模蚀刻第二绝缘膜，然后使用蚀刻阻挡膜作为掩模蚀刻第一绝缘膜。

公开(公告)号：US07438996B2

公开(公告)日：2008-10-21

申请号：US10511079

申请日：2003-12-19

申请人： Ken Ozawa

发明人： Ken Ozawa

IPC分类号： G03F1/00

CPC分类号： G03F1/36 ,  G03F1/44 ,  G03F1/68

摘要： There is provided a method for correcting a photo mask, which allows the difference between a test mask and a corrected mask with respect to an error of line width depending on coarse/dense pattern to be decreased when the photo masks are corrected by optical proximity effect correction.The present method is consisted of: producing a test mask which acts as a mask for extracting process model for applying an optical proximity effect correction method (s1); transferring and measuring the dimensions of the transferred pattern using the test mask (s2 and s3); obtaining a function model (referred to as process model) of which a simulated result of the transferred pattern of a mask pattern of the photo mask using a function model matches the measured result (s4); obtaining a mask pattern of which a transferred pattern matches a designed pattern using said process model and creating mask data in accordance with the obtained mask pattern (s5); producing a corrected mask in accordance with the created mask data (s5); and setting an exposing condition where an OPE characteristic becomes flat with respect of wide and narrow pitches by adjusting at least one of a numerical aperture (NA) and a coherence factor (σ) of an exposing device when the corrected mask is transferred.

摘要翻译： 提供了一种用于校正光掩模的方法，其允许当光掩模通过光学邻近效应校正时，测试掩模和校正掩模之间的差异相对于根据粗/密图案的线宽度的误差而减小 更正。 本发明的方法包括：产生用作提取用于应用光学邻近效应校正方法的处理模型的掩模的测试掩模（s1）; 使用测试掩模转移和测量转印图案的尺寸（s2和s3）; 获得使用功能模型的光掩模的掩模图案的转印图案的模拟结果与测量结果匹配的功能模型（称为过程模型）（s4）; 使用所述处理模型获得传送图案与设计图案匹配的掩模图案，并根据获得的掩模图案创建掩模数据（s5）; 根据创建的掩模数据产生校正掩模（s5）; 以及当校正的掩模被传送时，通过调节曝光装置的数值孔径（NA）和相干因子（sigma）中的至少一个来设定OPE特性相对于宽和窄间距变平坦的曝光条件。

公开(公告)号：US07379639B2

公开(公告)日：2008-05-27

申请号：US11361250

申请日：2006-02-23

申请人： Ken Ozawa ,  Kazuharu Inoue

发明人： Ken Ozawa ,  Kazuharu Inoue

IPC分类号： G02B6/32

CPC分类号： G02B6/43 ,  G02B6/4204 ,  H01S5/005

摘要： A lens assembly for transmitting an optical signal has a light-emitting element that diffuses the optical signal and a collimator lens that converts the optical signal diffused out of the light-emitting element from its diffused light into parallel light. The device also has a condenser lens that gathers the parallel light output from the collimator lens to focus the parallel light into an opening of an optical waveguide. The opening is provided in an end of the optical waveguide. An optical axis of the condenser lens is shifted toward the other 10 end of the waveguide by a predetermined distance with respect to an optical axis of the collimator lens.

摘要翻译： 用于发送光信号的透镜组件具有使光信号扩散的发光元件和将从发光元件扩散出来的光信号从其漫射光转换成平行光的准直透镜。 该装置还具有聚光透镜，其收集从准直透镜输出的平行光以将平行光聚焦到光波导的开口中。 开口设置在光波导的一端。 聚光透镜的光轴相对于准直透镜的光轴朝向波导的另一个10端移动预定的距离。

公开(公告)号：US20060194125A1

公开(公告)日：2006-08-31

申请号：US11361750

申请日：2006-02-23

申请人： Nobuyuki Matsuzawa ,  Yoko Watanabe ,  Boontarika Thunnakart ,  Ken Ozawa ,  Yuko Yamaguchi

发明人： Nobuyuki Matsuzawa ,  Yoko Watanabe ,  Boontarika Thunnakart ,  Ken Ozawa ,  Yuko Yamaguchi

IPC分类号： G03C5/00 ,  G21K5/00 ,  G03F1/00

CPC分类号： G03F7/091 ,  G03F7/70341

摘要： An antireflection film wherein, even where exposure light enters obliquely in a liquid immersion lithography technique, a sufficiently reduced reflectance can be achieved at the interface between a resist layer and a silicon substrate. A two-layer antireflection film is used in exposure by an exposure system having a wavelength of 190 to 195 nm and a numerical aperture of 1.0 or less and formed between the resist layer and the silicon substrate. Where complex refractive indices N1 and N2 and film thicknesses of upper and lower layers of the antireflection film are represented by n1-k1i, n2-k2i and d1, d2, respectively, and a predetermined combination of values of [n10, k10, d10, n20, k20, d20] is selected, n1, k1, d1, n2, k2 and d2 satisfy {(n1-n10)/(n1m-n10)}2+{(k1-k10)/(k1m-k10)}2+{(d1-d10)/(d1m-d10)}2+{(n2-n20)/(n2m-n20)}2+{(k2-k20)/(k2m-k20)}2+{(d2-d20)/(d2m-d20)}2≦1.

公开(公告)号：US20060187798A1

公开(公告)日：2006-08-24

申请号：US11361250

申请日：2006-02-23

申请人： Ken Ozawa ,  Kazuharu Inoue

发明人： Ken Ozawa ,  Kazuharu Inoue

IPC分类号： G11B7/135

CPC分类号： G02B6/43 ,  G02B6/4204 ,  H01S5/005

摘要： A lens assembly for transmitting an optical signal has a light-emitting element that diffuses the optical signal and a collimator lens that converts the optical signal diffused out of the light-emitting element from its diffused light into parallel light. The device also has a condenser lens that gathers the parallel light output from the collimator lens to focus the parallel light into an opening of an optical waveguide. The opening is provided in an end of the optical waveguide. An optical axis of the condenser lens is shifted toward the other 10 end of the waveguide by a predetermined distance with respect to an optical axis of the collimator lens.

摘要翻译： 用于发送光信号的透镜组件具有使光信号扩散的发光元件和将从发光元件扩散出来的光信号从其漫射光转换成平行光的准直透镜。 该装置还具有聚光透镜，其收集从准直透镜输出的平行光以将平行光聚焦到光波导的开口中。 开口设置在光波导的一端。 聚光透镜的光轴相对于准直透镜的光轴朝向波导的另一个10端移动预定的距离。

公开(公告)号：US20060114570A1

公开(公告)日：2006-06-01

申请号：US11284050

申请日：2005-11-21

申请人： Ken Ozawa

发明人： Ken Ozawa

IPC分类号： G02B27/10

CPC分类号： H01L27/14685 ,  G02B3/0031 ,  G02B3/0037 ,  H01L27/14605 ,  H01L27/14627

摘要： A solid state imaging device includes a substrate having a plurality of pixels and a plurality of on-chip lenses arranged above the substrate, each on-chip lens having a lens surface formed by subjecting a transparent photosensitive film to exposure using a mask having a gradation pattern and development so that the lens surface serves to correct shading in accordance with the gradation pattern.

公开(公告)号：US06538723B2

公开(公告)日：2003-03-25

申请号：US09351173

申请日：1999-07-12

申请人： Shigeru Hagiwara ,  Ken Ozawa

发明人： Shigeru Hagiwara ,  Ken Ozawa

IPC分类号： G03B2754

CPC分类号： G03F7/70358 ,  G03B27/54

摘要： In a scanning exposure apparatus and method, a pattern formed on a mask is transferred onto a substrate by scanning the mask and the substrate synchronously with respect to pulsed light emitted from a pulsed laser light source. A number of pulses of a light beam that are to be emitted to each point on the substrate during scanning exposure is determined, and the light source is controlled according to the determined number of pulses, so that the maximum scanning speeds of the mask and the substrate and/or the maximum oscillation period of the pulsed light are maintained during the scanning exposure process. In another arrangement, during the process of exposing a shot area on the substrate, integral values of the amount of exposure energy are detected at a plurality of points in that shot area. Based on this detection result, the oscillation frequency of the pulsed light that is to be emitted to the next shot area is determined so that the next shot area is exposed at an appropriate exposure level. In another arrangement, the light source and/or the exposure light emitted from the light source are adjusted so that the output level of the light source is set to the minimum required level, and so that the target value of the integral exposure dose is reliably achieved without reducing the scanning speeds of the mask and the substrate from their maximum. In still another arrangement, during the process for exposing the substrate to the laser beam, while scanning the substrate to transfer the mask pattern, the illuminance of the light source is controlled at a constant value. In yet another arrangement, when the exposure apparatus is not performing exposure (i.e., during the non-exposure period of the operation), the illuminance of the light source is maintained at a constant level, but the exposure light is blocked by a blind so as not to reach the mask or the mask stage.

公开(公告)号：US06501535B1

公开(公告)日：2002-12-31

申请号：US09478337

申请日：2000-01-06

申请人： Ken Ozawa

发明人： Ken Ozawa

IPC分类号： G03B2772

CPC分类号： G03F7/70358 ,  G03F7/70041 ,  G03F7/70558 ,  G03F7/70725

摘要： In an exposure control method and apparatus, pulsed illumination light from an excimer laser light source is reduced by an energy rough modulator before illuminating a reticle. The reticle and a wafer are moved or scanned relative to a projection optical system to sequentially transfer a pattern image of the reticle to individual shot areas on a wafer. An integrator sensor indirectly monitors the amount of exposure on the wafer, and an energy monitor monitors the energy of pulsed illumination light inside the excimer laser light source. Based on the result of measurement by the integrator sensor and the correlation between the result of measurement by the integrator sensor and the result of measurement by the energy monitor, the emission power of the excimer laser light source is finely modulated at a high speed without employing an energy fine modulator that finely modulates the transmittance by a mechanical drive and without causing an energy loss along the optical path of illumination light.

摘要翻译： 在曝光控制方法和装置中，来自准分子激光光源的脉冲照明光在照射掩模版之前被能量粗调制器减少。 将掩模版和晶片相对于投影光学系统移动或扫描，以将掩模版的图案图像顺序地传送到晶片上的各个照射区域。 积分器传感器间接地监视晶片上的曝光量，并且能量监视器监视准分子激光光源内的脉冲照明光的能量。 基于积分器传感器的测量结果和积分器传感器的测量结果与能量监测器的测量结果之间的相关性，准分子激光光源的发射功率被高精度地调制而不使用 能量微调制器，其通过机械驱动精细地调制透射率，而不会沿着照明光的光路造成能量损失。

公开(公告)号：USRE37309E1

公开(公告)日：2001-08-07

申请号：US09112380

申请日：1998-07-09

申请人： Toshiharu Nakashima ,  Masato Hamatani ,  Ken Ozawa

发明人： Toshiharu Nakashima ,  Masato Hamatani ,  Ken Ozawa

IPC分类号： G02B2700

CPC分类号： G03F7/70075 ,  G03F7/70358 ,  G03F7/70575 ,  G03F7/70583

摘要： A projection exposure apparatus for transferring a pattern formed on a mask onto a photosensitive substrate by a scanning exposure method, includes a light source for generating a light beam having a predetermined spatial coherence, an illumination optical system for receiving the light beam from the light source and illuminating a local area on the mask with the light beam, and a device for synchronously moving the mask and the photosensitive substrate so as to transfer the pattern on the mask onto the photosensitive substrate. A direction, corresponding to a higher spatial coherence of the light beam, is made to coincide with the direction of relative scanning an illumination area and the mask in the illumination area.

摘要翻译： 用于通过扫描曝光方法将形成在掩模上的图案转印到感光基板上的投影曝光装置包括：用于产生具有预定空间相干性的光束的光源;用于接收来自光源的光束的照明光学系统 以及用光束照射掩模上的局部区域，以及用于同步移动掩模和感光基板以将掩模上的图案转印到感光基板上的装置。 对应于光束的较高空间相干性的方向与照明区域中的照明区域和掩模的相对扫描方向一致。

公开(公告)号：US5473412A

公开(公告)日：1995-12-05

申请号：US395187

申请日：1995-02-27

申请人： Ken Ozawa

发明人： Ken Ozawa

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G03B27/32

CPC分类号： G03F7/70058

摘要： The average number N of coarse exposure pulses is obtained by dividing a proper exposure amount to a wafer by the average pulse energy. Under a condition that the average number N of coarse exposure pulses is equal to or more than the minimum number of pulses N.sub.min, the achievement accuracy R is calculated by dividing the actual accumulated exposure amount to the wafer by the proper exposure amount and the coarse exposure is performed until the achievement accuracy R reaches the coarse exposure finish judgment level Rc. Thereafter, the attenuating rate for pulse lights is set to be a predetermined value and the correcting exposure is performed by the cutoff control method until the achievement accuracy R reaches the correction exposure finish judgment level Rcc.

摘要翻译： 通过将适当的曝光量除以平均脉冲能量，得到粗暴露脉冲的平均数N. 在粗暴露脉冲的平均数N等于或大于最小脉冲数Nmin的条件下，通过将实际累积曝光量除以适当的曝光量和粗曝光来计算实现精度R 直到达到准确度R达到粗曝光完成判定电平Rc为止。 此后，将脉冲光的衰减率设定为预定值，并通过截止控制方法进行校正曝光，直到成像精度R达到校正曝光完成判定电平Rcc。