TAPER-ETCHING METHOD AND METHOD OF MANUFACTURING NEAR-FIELD LIGHT GENERATOR
    31.
    发明申请
    TAPER-ETCHING METHOD AND METHOD OF MANUFACTURING NEAR-FIELD LIGHT GENERATOR 有权
    切割蚀刻方法和制造近场光发生器的方法

    公开(公告)号:US20120315716A1

    公开(公告)日:2012-12-13

    申请号:US13157938

    申请日:2011-06-10

    IPC分类号: H01L33/58 H01L21/308

    摘要: A method of taper-etching a layer to be etched that is made of SiO2 or SiON and has a top surface. The method includes the step of forming an etching mask with an opening on the top surface of the layer to be etched, and the step of taper-etching a portion of the layer to be etched, the portion being exposed from the opening, by reactive ion etching so that a groove having two wall faces that intersect at a predetermined angle is formed in the layer to be etched. The etching mask is formed of a material containing elemental Al. The step of taper-etching employs an etching gas that contains a main component gas, which contributes to the etching of the layer to be etched, and N2.

    摘要翻译: 一种由SiO 2或SiON制成并具有顶表面的蚀刻层的蚀刻方法。 该方法包括以下步骤:在待蚀刻层的顶表面上形成具有开口的蚀刻掩模;以及将待蚀刻层的一部分从开口暴露的部分,通过反应 离子蚀刻,使得在被蚀刻层中形成具有以预定角度相交的两个壁面的凹槽。 蚀刻掩模由含有元素Al的材料形成。 锥蚀刻的步骤使用包含有助于蚀刻蚀刻层的主要成分气体和N 2的蚀刻气体。

    PLASMON GENERATOR INCLUDING TWO PORTIONS MADE OF DIFFERENT METALS
    32.
    发明申请
    PLASMON GENERATOR INCLUDING TWO PORTIONS MADE OF DIFFERENT METALS 有权
    等离子发生器,包括不同金属的两个部分

    公开(公告)号:US20140247706A1

    公开(公告)日:2014-09-04

    申请号:US13783933

    申请日:2013-03-04

    IPC分类号: G11B13/08

    摘要: A plasmon generator has a front end face located in a medium facing surface of a magnetic head. The plasmon generator includes a first portion formed of a first metal material and a second portion formed of a second metal material. The first portion has an inclined surface facing toward the front end face. The second portion is located between the inclined surface and the front end face, and includes a first end face located in the front end face and a second end face in contact with the inclined surface. The second metal material is higher in Vickers hardness than the first metal material. The first portion has a plasmon exciting part. The front end face generates near-field light.

    摘要翻译: 等离子体发生器具有位于磁头的介质面向表面中的前端面。 等离子体发生器包括由第一金属材料形成的第一部分和由第二金属材料形成的第二部分。 第一部分具有面向前端面的倾斜表面。 第二部分位于倾斜表面和前端面之间,并且包括位于前端面中的第一端面和与倾斜表面接触的第二端面。 第二种金属材料的维氏硬度高于第一种金属材料。 第一部分具有等离子体激元部分。 前端面产生近场光。

    METHOD OF MANUFACTURING PLASMON GENERATOR
    34.
    发明申请
    METHOD OF MANUFACTURING PLASMON GENERATOR 有权
    制造等离子发生器的方法

    公开(公告)号:US20140298644A1

    公开(公告)日:2014-10-09

    申请号:US13856109

    申请日:2013-04-03

    IPC分类号: G11B5/84

    摘要: A method of manufacturing a plasmon generator includes the steps of: an initial film made of a metal polycrystal and including a pre-plasmon-generator portion that later becomes the plasmon generator; heating the initial film with heating light so that a plurality of crystal grains constituting the metal polycrystal grow at least in the pre-plasmon-generator portion; stopping the heating of the initial film; and forming the plasmon generator by processing the initial film after the step of stopping the heating. The step of forming the plasmon generator includes the step of providing the pre-plasmon-generator portion with a front end face that generates near-field light.

    摘要翻译: 一种制造等离子体激元发生器的方法,包括以下步骤:由金属多晶体制成的初始膜,其中包括等离子体激元发生部分,其后来成为等离子体发生器; 用加热光加热初始膜,使得构成金属多晶的多个晶粒至少在前等离子体发生器部分中生长; 停止加热初始薄膜; 以及在停止加热的步骤之后通过加工初始膜来形成等离子体发生器。 形成等离子体发生器的步骤包括为等离子体激元发生器部分提供产生近场光的前端面的步骤。

    TAPER-ETCHING METHOD AND METHOD OF MANUFACTURING NEAR-FIELD LIGHT GENERATOR
    35.
    发明申请
    TAPER-ETCHING METHOD AND METHOD OF MANUFACTURING NEAR-FIELD LIGHT GENERATOR 有权
    切割蚀刻方法和制造近场光发生器的方法

    公开(公告)号:US20130186854A1

    公开(公告)日:2013-07-25

    申请号:US13353834

    申请日:2012-01-19

    IPC分类号: G11B7/22 B44C1/22

    摘要: A method of taper-etching a layer to be etched that is made of a dielectric material and has a top surface. The method includes the steps of: forming an etching mask with an opening on the top surface of the layer to be etched; and taper-etching a portion of the layer to be etched, the portion being exposed from the opening, by reactive ion etching so that a groove having two wall faces intersecting at a predetermined angle is formed in the layer to be etched. The step of taper-etching employs an etching gas containing a first gas contributing to the etching of the layer to be etched and a second gas contributing to the deposition of a sidewall protective film, and changes, during the step, the ratio of the flow rate of the second gas to the flow rate of the first gas so that the ratio increases.

    摘要翻译: 对由电介质材料制成并具有顶表面的被蚀刻层进行锥形蚀刻的方法。 该方法包括以下步骤:在待蚀刻层的顶表面上形成具有开口的蚀刻掩模; 并且通过反应离子蚀刻使待蚀刻的层的一部分从开口暴露出来,使得在待蚀刻的层中形成具有与预定角度相交的两个壁面的凹槽。 锥蚀刻的步骤使用包含有助于蚀刻被蚀刻层的第一气体的蚀刻气体和有助于沉积侧壁保护膜的第二气体,并且在该步骤期间改变流动比 第二气体与第一气体的流量的比率使得该比率增加。

    METHOD OF MANUFACTURING HEAT-ASSISTED MAGNETIC RECORDING HEAD WITH INTERNAL MIRROR
    36.
    发明申请
    METHOD OF MANUFACTURING HEAT-ASSISTED MAGNETIC RECORDING HEAD WITH INTERNAL MIRROR 有权
    用内镜制造热辅助磁记录头的方法

    公开(公告)号:US20120269048A1

    公开(公告)日:2012-10-25

    申请号:US13538996

    申请日:2012-06-29

    IPC分类号: G11B11/00

    摘要: A manufacturing method for a heat-assisted magnetic recording head includes the step of forming an internal mirror that includes a reflecting film support body and a reflecting film. The reflecting film support body includes first and second inclined surfaces. The reflecting film includes first and second portions that are located on the first and second inclined surfaces, respectively. The step of forming the internal mirror includes the step of forming the reflecting film support body and the step of forming the reflecting film. The step of forming the reflecting film support body forms an initial support body, and performs two taper-etching processes on the initial support body so that the initial support body is provided with the first and second inclined surfaces.

    摘要翻译: 一种热辅助磁记录头的制造方法,包括形成包括反射膜支撑体和反射膜的内反射镜的步骤。 反射膜支撑体包括第一和第二倾斜表面。 反射膜包括分别位于第一和第二倾斜表面上的第一和第二部分。 形成内反射镜的步骤包括形成反射膜支撑体的步骤和形成反射膜的步骤。 形成反射膜支撑体的步骤形成初始支撑体,并且在初始支撑体上执行两个锥形蚀刻处理,使得初始支撑体设置有第一和第二倾斜表面。

    METHOD OF MANUFACTURING A NEAR-FIELD LIGHT GENERATOR INCLUDING A WAVEGUIDE AND A PLASMON GENERATOR
    38.
    发明申请
    METHOD OF MANUFACTURING A NEAR-FIELD LIGHT GENERATOR INCLUDING A WAVEGUIDE AND A PLASMON GENERATOR 有权
    一种包括波导和等离子发生器在内的近场光发生器的制造方法

    公开(公告)号:US20140291284A1

    公开(公告)日:2014-10-02

    申请号:US13851603

    申请日:2013-03-27

    IPC分类号: G02B6/122

    摘要: In a method of manufacturing a near-field light generator, a structure including a core and a polishing stopper layer disposed on the top surface of the core is formed on a first cladding layer. Next, a cladding material layer is formed to cover the first cladding layer and the structure. The cladding material layer is then polished until the polishing stopper layer is exposed. Next, the polishing stopper layer is removed so that the cladding material layer has a protruding portion protruding upward to a higher level than the top surface of the core. The cladding material layer is then polished so as to remove the protruding portion and thereby make the cladding material layer into a second cladding layer. Then, a third cladding layer and a plasmon generator are formed.

    摘要翻译: 在制造近场光发生器的方法中,在第一包层上形成包括设置在芯的顶表面上的芯和抛光阻挡层的结构。 接下来,形成包层材料层以覆盖第一包层和结构。 然后抛光包层材料层直到抛光停止层露出。 接下来,去除抛光停止层,使得包层材料层具有向上突出到比芯的顶表面更高的水平的突出部分。 然后对覆层材料层进行研磨以除去突出部分,从而使包层材料层成为第二覆层。 然后,形成第三包覆层和等离子体发生器。

    MULTILAYER PLASMON GENERATOR
    39.
    发明申请
    MULTILAYER PLASMON GENERATOR 有权
    多层等离子发生器

    公开(公告)号:US20140269237A1

    公开(公告)日:2014-09-18

    申请号:US13846278

    申请日:2013-03-18

    IPC分类号: G11B13/04 B23K10/00

    摘要: A plasmon generator has a front end face, a first metal layer, a second metal layer, and an intermediate layer. The front end face generates near-field light based on a surface plasmon. The intermediate layer is interposed between the first metal layer and the second metal layer. Each of the first metal layer, the second metal layer and the intermediate layer has an end located in the front end face. Each of the first and second metal layers is formed of a metal material. The intermediate layer is formed of a material higher in Vickers hardness than the metal material used to form the first metal layer and the metal material used to form the second metal layer.

    摘要翻译: 等离子体发生器具有前端面,第一金属层,第二金属层和中间层。 前端面基于表面等离子体激发产生近场光。 中间层介于第一金属层和第二金属层之间。 第一金属层,第二金属层和中间层中的每一个具有位于前端面中的端部。 第一和第二金属层中的每一个由金属材料形成。 中间层由维氏硬度比用于形成第一金属层的金属材料和用于形成第二金属层的金属材料的材料形成。

    NEAR-FIELD LIGHT GENERATOR AND THERMALLY-ASSISTED MAGNETIC RECORDING HEAD
    40.
    发明申请
    NEAR-FIELD LIGHT GENERATOR AND THERMALLY-ASSISTED MAGNETIC RECORDING HEAD 有权
    近场光发生器和热辅助磁记录头

    公开(公告)号:US20140269232A1

    公开(公告)日:2014-09-18

    申请号:US13846337

    申请日:2013-03-18

    IPC分类号: G11B13/08 G02B27/56 G02B5/00

    摘要: A near-field light generator includes a multilayer structure having a front end face. The multilayer structure includes a first dielectric layer, a second dielectric layer, a third dielectric layer, a first metal layer, and a second metal layer. The first metal layer is interposed between the first dielectric layer and the second dielectric layer. The second metal layer is interposed between the second dielectric layer and the third dielectric layer. Each of the first to third dielectric layers and the first and second metal layers has an end located in the front end face. The dielectric material used to form the first dielectric layer, the dielectric material used to form the second dielectric layer, and the dielectric material used to form the third dielectric layer have the same permittivity.

    摘要翻译: 近场光发生器包括具有前端面的多层结构。 多层结构包括第一介电层,第二介电层,第三介电层,第一金属层和第二金属层。 第一金属层介于第一介电层和第二电介质层之间。 第二金属层介于第二电介质层和第三电介质层之间。 第一至第三电介质层和第一和第二金属层中的每一个具有位于前端面中的端部。 用于形成第一电介质层的电介质材料,用于形成第二电介质层的电介质材料以及用于形成第三电介质层的电介质材料具有相同的介电常数。