公开(公告)号：US06522386B1

公开(公告)日：2003-02-18

申请号：US09502042

申请日：2000-02-11

申请人： Kenji Nishi

发明人： Kenji Nishi

IPC分类号： G03B2768

CPC分类号： G03F7/706 ,  G03F7/70241 ,  G03F7/70308 ,  G03F7/70358

摘要： A static image distortion characteristic is averaged in the width of a projection area in a scanning direction and becomes a dynamic image distortion characteristic, when a mask pattern is scan-exposed onto a photosensitized substrate by a projection exposure apparatus. At least a random component included in the dynamic image distortion characteristic is corrected by a arranging an image correction plate obtained by locally polishing the surface of a transparent parallel plate. Correction plates which minimize other aberrations beforehand are manufactured and installed within a projection optical path, considering that also the other aberrations are averaged and become dynamic aberration characteristics at the time of scan-exposure.

摘要翻译： 当通过投影曝光装置将掩模图案扫描曝光到光敏基板上时，静态图像失真特性在扫描方向上的投影区域的宽度上被平均化，并且变成动态图像失真特性。 通过布置通过对透明平行板的表面进行局部抛光而获得的图像校正板来校正包含在动态图像失真特性中的至少一个随机分量。 考虑到其他像差也被平均化并且在扫描曝光时成为动态像差特性，因此预先将其它像差最小化的校正板制造并安装在投影光路内。

公开(公告)号：US06404481B1

公开(公告)日：2002-06-11

申请号：US09578573

申请日：2000-05-25

申请人： Martin Feldman ,  Henry I. Smith ,  Ken-Ichi Murooka ,  Michael H. Lim

发明人： Martin Feldman ,  Henry I. Smith ,  Ken-Ichi Murooka ,  Michael H. Lim

IPC分类号： G03B2768

CPC分类号： G03F7/70433 ,  G03F1/20 ,  G03F1/22 ,  G03F7/70633 ,  G03F7/70875

摘要： Techniques are disclosed to compensate for distortions in lithography by locally heating the membrane in a lithographic mask. The techniques may be used both to shrink and to expand areas of the mask locally, in order to adjust for varying magnitudes and signs of distortion. In one embodiment the correction method comprises two steps: (1) A send-ahead wafer is exposed and measured by conventional means to determine the overlay errors at several points throughout the field. (2) During exposure of subsequent wafers, calibrated beams of light are focused on the mask. The heating from the absorbed light produces displacements that compensate for the overlay errors measured with the send-ahead wafer. Any source of distortion may be corrected—for example, distortion appearing on the mask initially, distortion that only develops on the mask over time, or distortion on the wafer. In another embodiment, a reference pattern is formed on the membrane as a means of measuring mask distortion, and the heat input distribution needed to correct distortion is determined by subsequent measurements of the reference pattern. In this alternative embodiment, any source of distortion in the mask may be corrected.

摘要翻译： 公开了通过局部加热光刻掩模中的膜来补偿光刻中的变形的技术。 这些技术可以同时用于收缩和局部扩大掩模的区域，以便调整变化的幅度和失真的迹象。 在一个实施例中，校正方法包括两个步骤：（1）通过传统手段对发射晶片进行曝光和测量，以确定整个场中的几个点处的覆盖误差。 （2）在后续晶片曝光期间，校准光束聚焦在掩模上。 来自吸收光的加热产生位移，补偿由发射晶片测量的重叠误差。 可以校正任何失真源 - 例如，最初出现在掩模上的失真，仅在掩模上随时间发生的失真或晶片上的失真。 在另一个实施例中，作为测量掩模失真的手段在膜上形成参考图案，并且通过参考图案的后续测量来确定校正失真所需的热输入分布。 在该替代实施例中，可以校正掩模中的任何失真源。

公开(公告)号：US06339466B1

公开(公告)日：2002-01-15

申请号：US09327954

申请日：1999-06-08

申请人： Toru Matama

发明人： Toru Matama

IPC分类号： G03B2768

CPC分类号： H04N1/0405 ,  G03B27/68 ,  G06T5/006 ,  H04N1/0402 ,  H04N1/0455 ,  H04N1/387

摘要： An image processing apparatus that includes a determining section for determining whether or not read-in image data of an image recorded on a photographic film will require distortion aberration correction for correcting distortion caused by a photographing lens employed to record the image on the photographic film. Additionally, a reading-range setting section is included for setting an image reading range to be substantially the same range that is used for an output image, when a determination has been made that distortion aberration correction is not required. Alternatively, the reading-range setting section sets the image reading range to be larger than the range used for the output image by a predetermined amount, when it is determined that distortion aberration correction is required. As a result, missing image regions on the output image can be prevented.

摘要翻译： 一种图像处理装置，包括用于确定记录在摄影胶片上的图像的读入图像数据是否需要畸变像差校正的确定部分，用于校正由用于在照相胶片上记录图像的拍摄镜头引起的失真。 此外，当确定不需要畸变像差校正时，包括读取范围设置部分，用于将图像读取范围设置为与用于输出图像的基本相同的范围。 或者，当确定需要畸变像差校正时，读取范围设置部分将图像读取范围设置为大于用于输出图像的范围预定量。 结果，可以防止输出图像上的缺失图像区域。

公开(公告)号：US06268902B1

公开(公告)日：2001-07-31

申请号：US08622364

申请日：1996-03-26

申请人： Tetsuya Mori

发明人： Tetsuya Mori

IPC分类号： G03B2768

CPC分类号： G03F7/70358 ,  G03F7/70725

摘要： An exposure apparatus includes an exposure device for exposing an exposure area of a substrate to a pattern of a mask, wherein the mask pattern is provided on the basis of a design pattern, and the mask pattern deviates in at least one of position, size and shape, from the design pattern, and a detector for detecting the deviation of the mask pattern from the design pattern and for producing a detection output. The exposure device is responsive to the output of the detector to effect an exposure operation to compensate for the pattern deviation.

摘要翻译： 曝光装置包括曝光装置，用于将基板的曝光区域暴露于掩模图案，其中基于设计图案设置掩模图案，并且掩模图案在至少一个位置，尺寸和 形状，以及用于检测掩模图案与设计图案的偏差并用于产生检测输出的检测器。 曝光装置响应于检测器的输出以进行曝光操作以补偿图案偏差。