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54 条记录 (耗时 0.029 秒)

    Adaptive lithography membrane masks
    1.
    发明授权
    Adaptive lithography membrane masks 失效
    自适应光刻膜面膜

    公开(公告)号：US06404481B1

    公开(公告)日：2002-06-11

    申请号：US09578573

    申请日：2000-05-25

    申请人： Martin Feldman ,  Henry I. Smith ,  Ken-Ichi Murooka ,  Michael H. Lim

    发明人： Martin Feldman ,  Henry I. Smith ,  Ken-Ichi Murooka ,  Michael H. Lim

    IPC分类号： G03B2768

    CPC分类号： G03F7/70433 ,  G03F1/20 ,  G03F1/22 ,  G03F7/70633 ,  G03F7/70875

    摘要： Techniques are disclosed to compensate for distortions in lithography by locally heating the membrane in a lithographic mask. The techniques may be used both to shrink and to expand areas of the mask locally, in order to adjust for varying magnitudes and signs of distortion. In one embodiment the correction method comprises two steps: (1) A send-ahead wafer is exposed and measured by conventional means to determine the overlay errors at several points throughout the field. (2) During exposure of subsequent wafers, calibrated beams of light are focused on the mask. The heating from the absorbed light produces displacements that compensate for the overlay errors measured with the send-ahead wafer. Any source of distortion may be corrected—for example, distortion appearing on the mask initially, distortion that only develops on the mask over time, or distortion on the wafer. In another embodiment, a reference pattern is formed on the membrane as a means of measuring mask distortion, and the heat input distribution needed to correct distortion is determined by subsequent measurements of the reference pattern. In this alternative embodiment, any source of distortion in the mask may be corrected.

    摘要翻译： 公开了通过局部加热光刻掩模中的膜来补偿光刻中的变形的技术。 这些技术可以同时用于收缩和局部扩大掩模的区域，以便调整变化的幅度和失真的迹象。 在一个实施例中，校正方法包括两个步骤：（1）通过传统手段对发射晶片进行曝光和测量，以确定整个场中的几个点处的覆盖误差。 （2）在后续晶片曝光期间，校准光束聚焦在掩模上。 来自吸收光的加热产生位移，补偿由发射晶片测量的重叠误差。 可以校正任何失真源 - 例如，最初出现在掩模上的失真，仅在掩模上随时间发生的失真或晶片上的失真。 在另一个实施例中，作为测量掩模失真的手段在膜上形成参考图案，并且通过参考图案的后续测量来确定校正失真所需的热输入分布。 在该替代实施例中，可以校正掩模中的任何失真源。

    Maskless lithography using a multiplexed array of fresnel zone plates
    3.
    发明授权
    Maskless lithography using a multiplexed array of fresnel zone plates 无效
    使用菲涅耳带片复用阵列的无掩模光刻

    公开(公告)号：US5900637A

    公开(公告)日：1999-05-04

    申请号：US866550

    申请日：1997-05-30

    申请人： Henry I. Smith

    发明人： Henry I. Smith

    IPC分类号： G03F7/20 ,  H01J37/317

    CPC分类号： G03F7/70383 ,  G03F7/70291 ,  G03F7/704

    摘要： An array of Fresnel zone plates is illuminated by parallel beamlets of narrow-band electromagnetic radiation. The individual zone plates focus a significant fraction of the incident radiation to foci on a substrate located at least several micrometers distant. The beamlets are capable of being individually turned on or off by shutters, or by deflecting small mirrors that would otherwise direct a beamlet to its Fresnel zone plate. Pattern generation is accomplished by moving the substrate while multiplexing the individual beamlets on or off.

    摘要翻译： 菲涅尔区域阵列由窄带电磁辐射的平行子束照射。 单个区域板将入射辐射的大部分聚焦在位于至少几微米远的基底上。 小梁能够通过百叶窗单独打开或关闭，或者通过偏转否则将小射束引导到其菲涅尔区域板的小反射镜。 通过移动衬底，同时复用各个子束来进行图案生成。

    X-ray lithography masking
    4.
    发明授权
    X-ray lithography masking 失效
    X射线光刻掩模

    公开(公告)号：US5809103A

    公开(公告)日：1998-09-15

    申请号：US770678

    申请日：1996-12-20

    申请人： Henry I. Smith ,  Michael Lim ,  James Carter ,  Mark Schattenburg

    发明人： Henry I. Smith ,  Michael Lim ,  James Carter ,  Mark Schattenburg

    IPC分类号： G03F1/22 ,  G03F1/62 ,  G03F1/64 ,  G21K1/10 ,  G21K5/00

    CPC分类号： G03F1/22 ,  G03F1/62 ,  G03F1/64 ,  G21K1/10

    摘要： X-ray masking apparatus includes a frame having a supporting rim surrounding an x-ray transparent region, a thin membrane of hard inorganic x-ray transparent material attached at its periphery to the supporting rim covering the x-ray transparent region and a layer of x-ray opaque material on the thin membrane inside the x-ray transparent region arranged in a pattern to selectively transmit x-ray energy entering the x-ray transparent region through the membrane to a predetermined image plane separated from the layer by the thin membrane. A method of making the masking apparatus includes depositing back and front layers of hard inorganic x-ray transparent material on front and back surfaces of a substrate, depositing back and front layers of reinforcing material on the back and front layers, respectively, of the hard inorganic x-ray transparent material, removing the material including at least a portion of the substrate and the back layers of an inside region adjacent to the front layer of hard inorganic x-ray transparent material, removing a portion of the front layer of reinforcing material opposite the inside region to expose the surface of the front layer of hard inorganic x-ray transparent material separated from the inside region by the latter front layer, and depositing a layer of x-ray opaque material on the surface of the latter front layer adjacent to the inside region.

    摘要翻译： X射线掩蔽装置包括具有围绕x射线透明区域的支撑边缘的框架，在其外围附着到覆盖x射线透明区域的支撑边缘的硬质无机x射线透明材料薄膜和一层 x射线不透明材料在x射线透明区域内的薄膜上，以图案方式布置，以选择性地将通过膜进入x射线透明区域的x射线能量传递到由薄膜与层隔开的预定图像平面 。 一种制造掩模装置的方法包括在基片的前表面和后表面上沉积硬的无机x射线透明材料的背层和前层，分别在硬背面和前层上沉积后层和前层的增强材料 无机x射线透明材料，去除包括基材的至少一部分的材料和与硬无机x射线透明材料的前层相邻的内部区域的背层，去除增强材料的前层的一部分 与内部区域相对，以暴露由后者前层从内部区域分离的硬质无机x射线透明材料的前层的表面，并且在相邻的前面层的表面上沉积一层x射线不透明材料 到内部区域。

    Spatial period division exposing
    5.
    发明授权
    Spatial period division exposing 失效
    空间分裂暴露

    公开(公告)号：US4360586A

    公开(公告)日：1982-11-23

    申请号：US140150

    申请日：1980-04-14

    申请人： Dale C. Flanders ,  Henry I. Smith

    发明人： Dale C. Flanders ,  Henry I. Smith

    IPC分类号： G02B5/18 ,  G03F7/20 ,  B05D3/06 ,  G03F9/00

    CPC分类号： G03F7/70325 ,  G02B5/1857 ,  G03F7/2039

    摘要： Soft carbon-K X-rays (38) expose a PMMA photoresist (31) on an oxide layer (32) of a silicon substrate (33) through a parent mask (30) separated a distance S from the resist by a spacer (34) with the parent mask slits (12, 17) defining a spatial period p to establish an intensity pattern of period p/n at the photomask with S=p.sup.2 /n.lambda., where .lambda. is the wavelength of the incident radiation and .lambda.

    摘要翻译： 软碳-K X射线（38）通过母屏蔽（30）在硅衬底（33）的氧化物层（32）上暴露PMMA光致抗蚀剂（31），所述母掩模（30）通过间隔物（34）与光刻胶隔开距离S ），其中母掩模狭缝（12,17）限定空间周期p以在S = p2 /nλ的光掩模处建立周期p / n的强度图案，其中λ是入射辐射的波长，λ

    System and method for contrast enhanced zone plate array lithography
    7.
    发明授权
    System and method for contrast enhanced zone plate array lithography 失效
    对比增强区板阵列光刻的系统和方法

    公开(公告)号：US07666580B2

    公开(公告)日：2010-02-23

    申请号：US12337000

    申请日：2008-12-17

    申请人： Rajesh Menon ,  Henry I. Smith

    发明人： Rajesh Menon ,  Henry I. Smith

    IPC分类号： G03F7/22

    CPC分类号： G03F7/70291 ,  G03F7/091

    摘要： A lithography system is disclosed that includes an array of focusing elements for directing focused illumination toward a recording medium, and a reversible contrast-enhancement material disposed between the recording medium and the array of focusing elements.

    摘要翻译： 公开了一种光刻系统，其包括用于将聚焦照明引向记录介质的聚焦元件阵列，以及设置在记录介质和聚焦元件阵列之间的可逆对比度增强材料。

    Optical gap measuring apparatus and method having two-dimensional grating mark with chirp in one direction
    10.
    发明授权
    Optical gap measuring apparatus and method having two-dimensional grating mark with chirp in one direction 失效
    具有在一个方向上具有啁啾的二维光栅标记的光学间隙测量装置和方法

    公开(公告)号：US06522411B1

    公开(公告)日：2003-02-18

    申请号：US09578578

    申请日：2000-05-25

    申请人： Euclid E. Moon ,  Patrick N. Everett ,  Henry I. Smith

    发明人： Euclid E. Moon ,  Patrick N. Everett ,  Henry I. Smith

    IPC分类号： G01B902

    CPC分类号： G03F9/7076 ,  G03F7/7035 ,  G03F9/703 ,  G03F9/7038 ,  G03F9/7049

    摘要： An apparatus and method of measuring the gap between one substantially planar object, such as a mask, and a second planar object, such as a substrate. The invention achieves a high degree of sensitivity, accuracy, capture range, and reliability, through a novel design of a mark located only on the mask-plate. The light is inclined to the surfaces so associated optical components do not interrupt the exposing beam used in lithography. The same optics are used as for aligning overlay. Each gapping mark on the mask-plate includes one or more two-dimensional gratings, each with period constant in the incident plane, but varying in the transverse plane. When illuminated, two images are formed of each of the two-dimensional gratings, with fringes resulting from interference between paths having traveled different distances through the gap and the mask-plate as a result of successive diffractions and reflections. Phase and geometric measurements from these images yield accurate measurement of the gap between the plates. Direct calibration, referenced to the light-wavelength, is obtained from a diffractive Michelson technique that uses a linear grating also included within the gapping mark.

    摘要翻译： 测量诸如掩模的一个基本上平面的物体与诸如基板的第二平面物体之间的间隙的装置和方法。 本发明通过仅位于掩模板上的标记的新颖设计实现了高度的灵敏度，精度，捕获范围和可靠性。 光线倾斜于表面，因此相关联的光学部件不会中断光刻中使用的曝光光束。 使用相同的光学元件用于对齐覆盖层。 掩模板上的每个间隙标记包括一个或多个二维光栅，每个二维光栅在入射平面中具有周期常数，但在横向平面中变化。 当被照亮时，由每个二维光栅形成两个图像，其中由作为连续的衍射和反射的结果的通过间隙行进了不同距离的路径和掩模板之间的干涉导致的条纹。 这些图像的相位和几何测量可以准确测量板之间的间隙。 参考光波长的直接校准是从采用迈克尔逊衍射技术获得的，该技术使用也包含在间隙标记内的线性光栅。