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31.
公开(公告)号:US3961101A
公开(公告)日:1976-06-01
申请号:US506444
申请日:1974-09-16
CPC分类号: G03F7/022 , G03F7/30 , Y10S430/143
摘要: The development of an exposed electron beam sensitive resist film in a two-stage process, rather than in a single stage, with a water wash between stages, improves the sensitivity and resolution that can be achieved for the resist.
摘要翻译: 在两级工艺中,而不是在单级中暴露的电子束敏感抗蚀剂膜的发展,在阶段之间进行水洗,提高了抗蚀剂可以实现的灵敏度和分辨率。
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公开(公告)号:US3440047A
公开(公告)日:1969-04-22
申请号:US3440047D
申请日:1964-08-10
发明人: LEVINOS STEVEN , BERGFJORD JOHN A
CPC分类号: G03F7/11 , B41N3/08 , G03F7/027 , Y10S430/116
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