公开(公告)号：US08144967B2

公开(公告)日：2012-03-27

申请号：US12210547

申请日：2008-09-15

申请人： Miyoko Kawashima

发明人： Miyoko Kawashima

IPC分类号： G03F1/02

CPC分类号： G03F1/36

摘要： The invention provides a generation method of generating data of a mask, comprising a calculation step of calculating an aerial image formed on an image plane of a projection optical system, an extraction step of extracting a two-dimensional image from the aerial image, a determination step of determining a main pattern of the mask based on the two-dimensional image, an extraction step of extracting, from the aerial image, a peak portion at which a light intensity takes a peak value in a region other than a region in which the main pattern is projected, a determination step of determining an assist pattern based on the light intensity of the peak portion, and a generation step of inserting the assist pattern into a portion of the mask, which corresponds to the peak portion, thereby generating, as the data of the mask, pattern data including the assist pattern and the main pattern.

摘要翻译： 本发明提供一种生成掩模的数据的生成方法，包括计算在投影光学系统的像面上形成的空间像的计算步骤，从空中图像提取二维图像的提取步骤， 基于二维图像确定掩模的主图案的步骤，提取步骤，从空间图像中提取除了区域以外的区域中的光强度具有峰值的峰值部分， 主图案被投影，基于峰部的光强度来确定辅助图案的确定步骤以及将辅助图案插入与峰部对应的部分中的生成步骤，从而生成作为 掩模的数据，包括辅助图案和主图案的图案数据。

公开(公告)号：US4783385A

公开(公告)日：1988-11-08

申请号：US32374

申请日：1987-03-31

申请人： Gerhard F. Duesdieker

发明人： Gerhard F. Duesdieker

IPC分类号： G03F1/00 ,  G03C5/08 ,  G03F1/02 ,  G03F3/06 ,  G03F3/08 ,  G03F9/00

CPC分类号： G03F3/06

摘要： Process for production of photographic masks for tonal correction by dry dot etching comprising exposing a mask film, e.g., positive film, behind a film combination of half-tone positives and negatives that contains at least one pair of a positive and a negative of the same color separation, said pair being separated from one another by a spacer film, e.g., transparent, matt film, etc. The half-tone values at the points to be corrected are in the range of 30-70%.

摘要翻译： 用于生产用于通过干点蚀刻进行色调校正的照相掩模的方法，包括将掩模膜（例如阳性膜）暴露在半色调正面的膜组合之后和含有至少一对阳性和阴性对的阴性之后 颜色分离，所述对通过间隔膜（例如透明，无光泽膜等）彼此分离。要校正的点的半色调值在30-70％的范围内。

公开(公告)号：US3537853A

公开(公告)日：1970-11-03

申请号：US3537853D

申请日：1968-10-04

申请人： GRACE W R & CO

发明人： WESSELLS FORREST ASHTON ,  GUSH DONALD P

IPC分类号： B01J19/10 ,  B08B3/12 ,  C08F283/01 ,  C08G18/83 ,  C08G75/04 ,  G03F7/027 ,  G03F7/16 ,  G03F7/20 ,  G03C5/00 ,  G03F1/02

CPC分类号： G03F7/2014 ,  B01J19/10 ,  B08B3/12 ,  C08F283/01 ,  C08G18/835 ,  C08G75/04 ,  C08G75/045 ,  C08G75/12 ,  G03F7/0275 ,  G03F7/16 ,  G03F7/2012 ,  G03F7/2022 ,  Y10S430/152 ,  C08F2/46

摘要： 1,263,122. Photographic processes. W. R. GRACE & CO. Feb.3, 1969 [June 10, 1968], No.44961/71. Divided out of 1,263,121. Heading G2C. A photographic process for producing photocured images which comprises imagewise exposing a photo-curable layer on a transparent support through the support, uniformly exposing through the support to cure up to 10 mils of the layer from the support and developing to remove the uncured areas of the layer. The developed image may again be uniformly exposed to harden it. Preferred photo-curable compositions are those of Specifications 1,215,591, 1,251,232, 1,102,910 and 1,007,345. Development may be by ultrasonic cleaning as disclosed in Specification 1,263,121.

公开(公告)号：US07563389B2

公开(公告)日：2009-07-21

申请号：US12331827

申请日：2008-12-10

申请人： Deepak Shukla ,  Krishnan Chari

发明人： Deepak Shukla ,  Krishnan Chari

IPC分类号： C09K19/36 ,  C09K19/52 ,  C09K19/54 ,  C09K19/58 ,  G02F1/13 ,  G03F1/02 ,  G03F7/004

CPC分类号： C09K19/586 ,  C09K19/588 ,  Y10T428/10 ,  Y10T428/1036 ,  Y10T428/1055

摘要： The present invention relates to photo-tunable dopant compositions comprising a photo-reactive chiral compound capable of undergoing a photochemical reaction resulting in the loss of chirality, and a triplet sensitizer. The present invention also relates to a display comprising a substrate, a liquid crystalline layer thereon, wherein the liquid crystalline layer comprises a nematic host, at least one chiral dopant, a photo-reacted compound, and a triplet sensitizer, and at least one transparent conductive layer. The present invention also relates to a method of tuning a cholesteric liquid crystal material comprising providing at least one mesogenic compound, at least one triplet sensitizer, and at least one photo-reactive chiral compound; combining the at least one mesogenic compound, at least one triplet sensitizer, and at least one photo-reactive chiral compound to form a mixture; and irradiating the mixture for a period of time.

摘要翻译： 本发明涉及光可掺杂掺杂剂组合物，其包含能够经历导致手性丧失的光化学反应的光反应性手性化合物和三线态敏化剂。 本发明还涉及一种显示器，其包括基底，其上的液晶层，其中所述液晶层包括向列型主体，至少一种手性掺杂剂，光反应化合物和三线态敏化剂，以及至少一种透明 导电层。 本发明还涉及一种调节胆甾型液晶材料的方法，包括提供至少一种介晶化合物，至少一种三线态敏化剂和至少一种光反应性手性化合物; 组合所述至少一种介晶化合物，至少一种三线态敏化剂和至少一种光反应性手性化合物以形成混合物; 并将混合物照射一段时间。

公开(公告)号：US20080206679A1

公开(公告)日：2008-08-28

申请号：US11677879

申请日：2007-02-22

申请人： George Liu ,  Vencent Chang ,  Norman Chen ,  Kuei Shun Chen ,  Chin-Hsiang Lin

发明人： George Liu ,  Vencent Chang ,  Norman Chen ,  Kuei Shun Chen ,  Chin-Hsiang Lin

IPC分类号： G03F1/02

CPC分类号： G03F1/144 ,  G03F1/70 ,  G03F7/0045 ,  G03F7/2022 ,  G03F7/70475

摘要： Contrast enhancing exposure apparatus and method for use in semiconductor fabrication are described. In one embodiment, a method for forming a pattern on a substrate, wherein the substrate includes a photoresist layer comprising photoacid generators (“PAGs”) and photobase generators (“PBGs”), is described. The method includes dividing the pattern into two component patterns; exposing the photoresist layer of the substrate to UV light through a first mask corresponding to a first one of the component patterns; subsequent to the exposing the photoresist layer of the substrate to UV light through the first mask, exposing the photoresist layer of the substrate to UV light through a second mask corresponding to a second one of the component patterns, wherein the PAGs and PBGs disposed in areas of the photoresist layer that have been exposed to UV light at least twice are activated and wherein the activated PAGs neutralize the activated PBGs in areas of the photoresist layer that have been exposed to UV light at least twice.

摘要翻译： 描述了用于半导体制造的对比增强曝光装置和方法。 在一个实施例中，描述了在衬底上形成图案的方法，其中衬底包括包含光酸发生器（“PAG”）和光产生器（“PBG”）的光致抗蚀剂层。 该方法包括将图案划分成两个分量图案; 通过与第一组分图案相对应的第一掩模将衬底的光致抗蚀剂层暴露于UV光; 在将衬底的光致抗蚀剂层暴露于通过第一掩模的UV光之后，通过对应于第二组件图案的第二掩模将衬底的光致抗蚀剂层暴露于UV光，其中设置在区域中的PAG和PBG 已经暴露于UV光的光致抗蚀剂层至少两次被激活，并且其中激活的PAG在已经暴露于UV光的光致抗蚀剂层的区域中中和活化的PBG至少两次。

公开(公告)号：US4197123A

公开(公告)日：1980-04-08

申请号：US924476

申请日：1978-07-13

申请人： Alfred Oetiker ,  Christoph Chylewski ,  Max Marthaler

发明人： Alfred Oetiker ,  Christoph Chylewski ,  Max Marthaler

IPC分类号： G03C7/02 ,  G03C7/28 ,  G03F1/00 ,  G03F1/02 ,  G03C7/04 ,  G03C7/16

CPC分类号： G03C7/28

摘要： The present invention provides a new process for the production of masked subtractive positive color images by the silver dye bleach process, which comprises the steps of exposure, silver developing, dye-bleaching, silver-bleaching and fixing. The photographic material used contains, in at least two layers, one image-wise bleachable dye per layer, the absorption maximum of the dye corresponding in each case to one of the three primary colors red, green and blue and a silver halide emulsion layer sensitive in a specific spectral region being allocated to each dye, wherein this material (a) in at least one layer contains a dye, the undesired secondary color density of which is to be compensated, and a silver halide emulsion containing silver iodide is allocated to this dye, in the same layer and/or an adjacent layer, (b) in at least one further layer contains at least one further dye, the main color density of which corresponds to a secondary color density, which is to be compensated, of the first dye, and also a silver halide emulsion free from iodide ions, (c) contains a further layer which is adjacent to layer (b) and contains colloidal nuclei which are able, under reducing conditions, to deposit metallic silver from soluble silver complexes, and also contains an insensitive iodide-free silver halide emulsion which is not spectrally sensitized, and optionally a stabilizer, and (d) containing a separating layer, which does not contain any of the dyes of the layer or layers (a), between the layer or layers (a) and the layer (c). The silver developing bath with which the material is treated contains ligands which form water-soluble and diffusible silver complexes with silver.

摘要翻译： 本发明提供了一种用于通过银染料漂白方法生产掩蔽的减去正彩色图像的新方法，其包括曝光，银显影，染料漂白，银漂白和定影的步骤。 使用的照相材料在至少两层中每层含有一个成像漂白染料，染料在每种情况下的吸收最大值分别为三原色之一，红色，绿色和蓝色，卤化银乳剂层敏感 在分配给每种染料的特定光谱区域中，其中至少一层中的该材料（a）含有染料，其不希望的二次色密度被补偿，并且将含有碘化银的卤化银乳剂分配给该染料 在同一层和/或相邻层中的染料，（b）在至少一个另外的层中含有至少一种另外的染料，其主要颜色密度对应于要补偿的第二颜色密度 第一染料，以及不含碘离子的卤化银乳剂，（c）含有与层（b）相邻的另一层，并含有胶体核，其能够在还原条件下从solubl沉积金属银 e银络合物，并且还含有不受光谱敏化的不含碘化物的卤化银乳剂，以及任选的稳定剂，和（d）含有不含任何层或层的染料的分离层（a ），层或层（a）和层（c）之间。 处理材料的银显影槽含有与银形成水溶性和可扩散的银络合物的配体。

公开(公告)号：US4078492A

公开(公告)日：1978-03-14

申请号：US512123

申请日：1974-10-04

申请人： Alan D. Levy ,  Mark A. Seltman

发明人： Alan D. Levy ,  Mark A. Seltman

IPC分类号： B41M1/30 ,  B44F1/06 ,  E06B9/13 ,  A47G5/02 ,  B41M3/00 ,  G03F1/02

CPC分类号： B44F1/063 ,  B41M1/30 ,  E06B9/13 ,  Y10S428/914 ,  Y10T29/49826

摘要： A decorative stained glass effect window shade in the form of a light transparent elongated plastic film adapted to cover a window opening and having thereon a colored reproduction of an actual stained glass window assembly and produced by photographing a stained glass window on a positive transparency film, transferring the photograph from the transparency to an ink reproducing member and reproducing the transparency onto a transparent plastic film in light transmitting colored inks.

摘要翻译： 一种装饰性彩色玻璃效果窗帘，其为透光细长塑料薄膜的形式，适于覆盖窗户开口，并具有彩色再现实际彩色玻璃窗组件，并通过在正透明胶片上拍摄彩色玻璃窗而产生， 将照片从透明物转印到墨水再现构件上，并将透明度再现在透光的彩色油墨中的透明塑料膜上。

公开(公告)号：US07659042B2

公开(公告)日：2010-02-09

申请号：US12184215

申请日：2008-07-31

申请人： Christophe Pierrat

发明人： Christophe Pierrat

IPC分类号： G03F1/02

CPC分类号： G03F1/30 ,  G03F1/70

摘要： A full phase shifting mask (FPSM) can be advantageously used in a damascene process for hard-to-etch metal layers. Because the FPSM can be used with a positive photoresist, features on an original layout can be replaced with shifters on a FPSM layout. Adjacent shifters should be of opposite phase, e.g. 0 and 180 degrees. In one embodiment, a dark field trim mask can be used with the FPSM. The trim mask can include cuts that correspond to cuts on the FPSM. Cuts on the FPSM can be made to resolve phase conflicts between proximate shifters. In one case, exposing two proximate shifters on the FPSM and a corresponding cut on the trim mask can form a feature in the metal layer. The FPSM and/or the trim mask can include proximity corrections to further improve printing resolution.

摘要翻译： 全相移掩模（FPSM）可有利地用于难蚀刻金属层的镶嵌工艺。 因为FPSM可以与正光致抗蚀剂一起使用，原始布局上的特征可以用FPSM布局上的移位器替代。 相邻移位器应该是相反的，例如 0和180度。 在一个实施例中，暗场修剪掩模可以与FPSM一起使用。 修剪蒙版可以包括对应于FPSM上的切割的切口。 可以对FPSM进行切割以解决相邻移位器之间的相位冲突。 在一种情况下，在FPSM上曝光两个相邻的移位器并且在修剪蒙版上相应的切割可以在金属层中形成特征。 FPSM和/或修剪掩模可以包括接近校正以进一步提高打印分辨率。

公开(公告)号：US20090191479A1

公开(公告)日：2009-07-30

申请号：US12360857

申请日：2009-01-28

申请人： Atsushi Sugasaki

发明人： Atsushi Sugasaki

IPC分类号： G03F7/004 ,  G03F1/02

CPC分类号： B41C1/05 ,  B41M5/24 ,  B41N1/12

摘要： The present invention provides a resin composition for laser engraving containing at least an acetylene compound and a binder polymer, a relief printing plate precursor for laser engraving using the same, a relief printing plate, and a method for producing a relief printing plate.

摘要翻译： 本发明提供一种至少含有乙炔化合物和粘合剂聚合物的激光雕刻用树脂组合物，使用其的激光雕刻用凸版印刷版原版，凸版印刷版和凸版印刷版的制造方法。

公开(公告)号：US4675702A

公开(公告)日：1987-06-23

申请号：US840416

申请日：1986-03-14

申请人： Heinz J. Gerber

发明人： Heinz J. Gerber

IPC分类号： G03F1/00 ,  G01D9/42 ,  G02F1/13 ,  G03B27/32 ,  G03F1/02 ,  G03F7/20 ,  H04N1/036

CPC分类号： G03F7/70291 ,  G01D9/42 ,  G03F7/70475

摘要： A photoplotter supports a sheet of photosensitive material for exposure by an associated light source. A light valve device interposed between the light source and the sheet has a main face parallel to the sheet divided into a plurality of subareas or pixels the light transmissivities of which are individually controlled through an associated computer to cause the exposure to be that of a desired graphic or artwork.

摘要翻译： 光印板支持用于由相关光源曝光的感光材料片。 介于光源和片材之间的光阀装置具有平行于片材的主面，该主面被分成多个子区域或像素，其透光率通过相关联的计算机单独控制，以使曝光成为期望的 图形或艺术品。