公开(公告)号：US5214541A

公开(公告)日：1993-05-25

申请号：US874064

申请日：1992-04-24

Applicant: Yukio Yamasita ,  Haruyoshi Sato ,  Toru Nakamura ,  Hitoshi Yuasa ,  Yutaka Otsuki

Inventor： Yukio Yamasita ,  Haruyoshi Sato ,  Toru Nakamura ,  Hitoshi Yuasa ,  Yutaka Otsuki

IPC: G03F7/00

CPC classification number: G03F7/0007 ,  Y10S359/90

Abstract: A method for producing a color filter involves (A) forming a photosensitive coating film on a transparent electrically conductive layer provided on an outermost surface of a substrate having an alignment film, and exposing the photosensitive coating film to light through a mask having patterns of at least three different degrees of light transmittances; (B) developing and removing a photosensitive coating film portion registering with one of the patterns of smallest and largest degrees of light transmittances for exposing the transparent electrically conductive layer and electrodepositing a colored coating on the exposed electrically conductive layer for forming a colored layer thereon, operation of developing and removing the photosensitive coating film and electrodepositing the colored coating being repeated for the respective patterns of different degrees of light transmittances in sequence of difference in light transmittances to form different colored layers, respectively; and (Z) transcribing the colored layers, the transparent electrically conductive layer and the alignment film onto another substrate.

公开(公告)号：US5096800A

公开(公告)日：1992-03-17

申请号：US618387

申请日：1990-11-27

Applicant: Hitoshi Yuasa ,  Eiji Yoda ,  Haruyoshi Sato ,  Yutaka Otsuki

Inventor： Hitoshi Yuasa ,  Eiji Yoda ,  Haruyoshi Sato ,  Yutaka Otsuki

IPC: G03F7/027 ,  C08F2/48 ,  C08F290/00 ,  C08F299/00 ,  C08L47/00 ,  C09D4/00 ,  C09D147/00 ,  G03F7/033 ,  H05K3/28

CPC classification number: G03F7/033 ,  H05K3/287

Abstract: A resin composition for forming a durable protection coating contains (A) an alkali-soluble resin which is a polymer of a conjugated diene and has a monoamidated succinic acid group represented by the following formula (I) of: ##STR1## wherein R.sup.1 and R.sup.2 each stand for a hydrogen atom, a halogen atom or an organic residue having 1 to 3 carbon atoms; and R.sup.3 stands for an organic residue having 1 to 16 carbon atoms; (B) a pre-polymer having a photosensitive ethylenic double bond; and (C) a photopolymerization initiator. The mixing ratio by weight of the alkali-soluble resin (A) to the pre-polymer (B) ranges from 1:4 to 4:1. A process for preparing the durable protection coating contains applying the resin composition on a substrate, and exposing the resin composition to ultraviolet ray through a circuit pattern mask to cure the resin composition followed by development and after-curing to form the protection coating.

公开(公告)号：US5049621A

公开(公告)日：1991-09-17

申请号：US450617

申请日：1989-12-14

Applicant: Toru Nakamura ,  Hitoshi Yuasa

Inventor： Toru Nakamura ,  Hitoshi Yuasa

IPC: C08F8/46 ,  C08C19/38 ,  C08F2/14 ,  C08F36/00 ,  C08F36/06

CPC classification number: C08C19/38

Abstract: The present invention relates to a process for producing butadiene oligomer adducts of (A) a butadiene oligomer or co-oligomer prepared from a monomer, selected from conjugated diolefins and vinyl-substituted aromatic compounds, and butadiene with (B) an ethylene-.alpha., .beta.-dicarboxyl compound, characterized by heating (A) said butadiene oligomer or co-oligomer with (B) said compound at a temperature of 120.degree.-220.degree. C. in the presence of 0.005-5% by weight of trimethylhydroquinone based on an amount of (A). The adducts of the invention are useful, for instance, as a film-forming material for water-based coatings.

公开(公告)号：US4613456A

公开(公告)日：1986-09-23

申请号：US735341

申请日：1985-05-17

Applicant: Mitsuo Matsuno ,  Teraki Yamanashi ,  Hitoshi Yuasa ,  Hirosuke Imai

Inventor： Mitsuo Matsuno ,  Teraki Yamanashi ,  Hitoshi Yuasa ,  Hirosuke Imai

IPC: A61K8/34 ,  A61Q13/00 ,  C07C29/143 ,  C07C33/05 ,  C07C45/45 ,  C07C45/50 ,  C07C47/115 ,  C07C49/21 ,  C11B9/00 ,  A61K7/46

CPC classification number: C11B9/0042 ,  C07C45/50 ,  C07C47/115 ,  C07C49/21 ,  C07C2103/64

Abstract: This invention discloses a tricyclo[2.2.1.0.sup.2,6 ]heptane derivative of the general formula ##STR1## where X represents --CH.sub.2 CH.sub.2 -- or ##STR2## and R.sup.1 and R.sup.2 independently represent hydrogen or methyl, a process for preparing the same, and perfume compositions containing the same.

Abstract translation: 本发明公开了通式为“IMAGE”的三环[2.2.1.0 2,6]庚烷衍生物，其中X代表-CH2CH2-或，R1和R2独立地表示氢或甲基，其制备方法和香料 含有它们的组合物。

公开(公告)号：US4604490A

公开(公告)日：1986-08-05

申请号：US746279

申请日：1985-06-19

Applicant: Hitoshi Yuasa ,  Mitsuo Matsuno ,  Hirosuke Imai

Inventor： Hitoshi Yuasa ,  Mitsuo Matsuno ,  Hirosuke Imai

IPC: C10L1/04 ,  C07C13/28 ,  C07C2/50

CPC classification number: C10L1/04

Abstract: The present invention is connected with a high-density liquid fuel for rockets and jet engines which mainly comprises a compound represented by the general formula ##STR1## wherein each of m and n is 0 or 1, and each of R.sup.1 to R.sup.3 is a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, but a sum of R.sup.1 to R.sup.3 is an integer of 1 to 3.

Abstract translation: 本发明与用于火箭和喷气发动机的高密度液体燃料连接，其主要包括由通式“IMAGE”表示的化合物，其中m和n各自为0或1，并且每个R 1至R 3为氢 原子或碳原子数为1〜3的烷基，但R 1〜R 3的总和为1〜3的整数。