公开(公告)号：US20100104972A1

公开(公告)日：2010-04-29

申请号：US11997527

申请日：2006-07-10

Applicant: Ryoji Watanabe ,  Takehiro Seshimo ,  Takeshi Iwai

Inventor： Ryoji Watanabe ,  Takehiro Seshimo ,  Takeshi Iwai

IPC: G03F7/20 ,  G03F7/004

CPC classification number: G03F7/0048 ,  G03F7/0397 ,  Y10S430/114

Abstract: A resist composition of the present invention is obtained by dissolving a resin component (A) that displays changed alkali solubility under action of acid and an acid generator component (B) that generates acid upon exposure in an organic solvent (S), wherein the organic solvent (S) includes an aromatic organic solvent (S1). According to the present invention, a resist composition and a method of forming a resist pattern, in which the level of LWR is reduced, can be provided.

Abstract translation: 本发明的抗蚀剂组合物是通过在有机溶剂（S）中暴露后溶解在酸作用下显示出改变的碱溶性的树脂组分（A）和产生酸的酸产生剂组分（B），其中有机溶剂 溶剂（S）包括芳族有机溶剂（S1）。 根据本发明，可以提供抗蚀剂组合物和形成抗蚀剂图案的方法，其中LWR的水平降低。

公开(公告)号：US20100086873A1

公开(公告)日：2010-04-08

申请号：US12573686

申请日：2009-10-05

Applicant: Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Takahiro Dazai ,  Tomoyuki Hirano ,  Fumitake Kaneko ,  Kotaro Endo

Inventor： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Takahiro Dazai ,  Tomoyuki Hirano ,  Fumitake Kaneko ,  Kotaro Endo

IPC: G03F7/20 ,  G03F7/004

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041 ,  Y10S430/111 ,  Y10S430/123

Abstract: A positive resist composition including: a base component (A) which includes a polymeric compound (A1) containing a structural unit (a0) represented by the general formula (a0-1) and a structural unit (a1) derived from an acrylate ester having an acid dissociable, dissolution inhibiting group; and an acid generator component (B) which includes an acid generator (B1) containing an anion moiety represented by the general formula (I): (in the formula (a0-1), R1 represents a hydrogen atom, a lower alkyl group of 1 to 5 carbon atoms or a halogenated lower alkyl group of 1 to 5 carbon atoms; R2 represents a bivalent linking group; and R3 represents a cyclic group containing —SO2— within the ring skeleton. In the formula (I), X represents a cyclic group of 3 to 30 carbon atoms, Q1 represents a bivalent linking group containing an oxygen atom; Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group of 1 to 4 carbon atoms).

Abstract translation: 一种正型抗蚀剂组合物，其包含：包含含有由通式（a0-1）表示的结构单元（a0）的聚合化合物（A1）和由具有由通式（a0-1）表示的结构单元（a0））的结构单元（a1）的基础组分（A） 酸解离，溶解抑制组; 和含有由通式（I）表示的阴离子部分的酸发生剂（B1）的酸产生剂成分（B）：（式（a0-1）中，R 1表示氢原子，低级烷基 1〜5个碳原子的卤代低级烷基或1〜5个碳原子的卤代低级烷基; R2表示二价连接基团; R3表示环状骨架中含有-SO2-的环状基团，式（I）中，X表示 3〜30个碳原子的环状基团，Q1表示含有氧原子的二价连接基团，Y1表示碳原子数1〜4的亚烷基或碳原子数1〜4的氟化亚烷基。

公开(公告)号：US20090068591A1

公开(公告)日：2009-03-12

申请号：US12208109

申请日：2008-09-10

Applicant: Akiya Kawaue ,  Takeshi Iwai ,  Hideo Hada ,  Shinichi Hidesaka ,  Tsuyoshi Kurosawa ,  Natsuko Maruyama ,  Kensuke Matsuzawa ,  Takehiro Seshimo ,  Hiroaki Shimizu ,  Tsuyoshi Nakamura

Inventor： Akiya Kawaue ,  Takeshi Iwai ,  Hideo Hada ,  Shinichi Hidesaka ,  Tsuyoshi Kurosawa ,  Natsuko Maruyama ,  Kensuke Matsuzawa ,  Takehiro Seshimo ,  Hiroaki Shimizu ,  Tsuyoshi Nakamura

IPC: G03F7/004 ,  G03F7/20 ,  C07D493/18

CPC classification number: C07D493/18 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/123 ,  Y10S430/124 ,  Y10S430/125

Abstract: A compound represented by formula (I); and a compound represented by formula (b1-1): wherein X represents —O—, —S—, —O—R3— or —S—R4—, wherein each of R3 and R4 independently represents an alkylene group of 1 to 5 carbon atoms; R2 represents an alkyl group of 1 to 6 carbon atoms, an alkoxy group of 1 to 6 carbon atoms, a halogenated alkyl group of 1 to 6 carbon atoms, a halogen atom, a hydroxyalkyl group of 1 to 6 carbon atoms, a hydroxyl group or a cyano group; a represents an integer of 0 to 2; Q1 represents an alkylene group of 1 to 12 carbon atoms or a single bond; Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group; M+ represents an alkali metal ion; and A+ represents an organic cation.

Abstract translation: 由式（I）表示的化合物; 和由式（b1-1）表示的化合物：其中X表示-O - ， - S - ， - O-R 3 - 或-S-R 4 - ，其中R 3和R 4各自独立地表示1至5的亚烷基 碳原子 R2表示碳原子数为1〜6的烷基，碳原子数为1〜6的烷氧基，碳原子数为1〜6的卤代烷基，碳原子数为1〜6的卤原子，羟基烷基，羟基 或氰基; a表示0〜2的整数， Q1表示1〜12个碳原子的亚烷基或单键; Y1表示1〜4个碳原子的亚烷基或氟化亚烷基; M +表示碱金属离子; 而A +代表有机阳离子。

公开(公告)号：US20080311522A1

公开(公告)日：2008-12-18

申请号：US12135680

申请日：2008-06-09

Applicant: Takeshi Iwai ,  Hideo Hada ,  Keita Ishiduka ,  Akiya Kawaue ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Tsuyoshi Nakamura ,  Komei Hirahara ,  Yuichi Suzuki ,  Takehiro Seshimo

Inventor： Takeshi Iwai ,  Hideo Hada ,  Keita Ishiduka ,  Akiya Kawaue ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Tsuyoshi Nakamura ,  Komei Hirahara ,  Yuichi Suzuki ,  Takehiro Seshimo

IPC: G03F7/004 ,  C07C309/04 ,  C07C69/74

CPC classification number: C07C309/06 ,  C07C309/04 ,  C07C309/10 ,  C07C381/12 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/111 ,  Y10S430/123

Abstract: A compound represented by general formula (b-14); and acid generator consisting of the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-14): wherein R7″ to R9″ each independently represents an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group in which a portion or all of the hydrogen atoms are substituted with an alkoxyalkyloxy group or an alkoxycarbonylalkyloxy group; and X− represents an anion.

Abstract translation: 由通式（b-14）表示的化合物; 和由该化合物组成的酸发生剂; 以及抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和暴露时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸 发生器（B1）由通式（b1-14）表示的化合物组成：其中R7“至R9”各自独立地表示芳基或烷基，其中R7“至R9”中的两个可以键合 彼此形成具有硫原子的环，并且R 7“至R 9”中的至少一个表示取代的芳基，其中部分或全部氢原子被烷氧基烷氧基或烷氧基羰基烷氧基取代; X-表示阴离子。