公开(公告)号：US12060317B2

公开(公告)日：2024-08-13

申请号：US17331869

申请日：2021-05-27

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Masahiro Fukushima ,  Satoshi Watanabe ,  Ryosuke Taniguchi ,  Naoya Inoue

IPC分类号： G03F7/004 ,  C07C303/32 ,  C07C309/06 ,  C07C309/19 ,  C07C309/24 ,  C07C381/12 ,  G03F1/22 ,  G03F7/037 ,  G03F7/038 ,  G03F7/20 ,  G03F7/26

CPC分类号： C07C381/12 ,  C07C303/32 ,  C07C309/06 ,  C07C309/19 ,  C07C309/24 ,  G03F1/22 ,  G03F7/0045 ,  G03F7/037 ,  G03F7/0382 ,  G03F7/2004 ,  G03F7/26

摘要： An onium salt having a partial structure of formula (A) is provided wherein Ra1 and Ra2 are hydrogen or a C1-C10 hydrocarbyl group in which hydrogen may be substituted by halogen and —CH2— may be replaced by —O— or —C(═O)—, both Ra1 and Ra2 are not hydrogen at the same time, Ra1 and Ra2 may bond together to form an aliphatic ring. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.

公开(公告)号：US12013636B2

公开(公告)日：2024-06-18

申请号：US17517257

申请日：2021-11-02

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Masahiko Shimada ,  Koji Ichikawa

IPC分类号： G03F7/004 ,  C07C25/02 ,  C07C303/32 ,  C07C309/06 ,  C07C309/10 ,  C07C309/11 ,  C07C309/12 ,  C07C309/17 ,  C07C309/19 ,  C07C309/24 ,  C07C381/12 ,  C07D307/93 ,  G03F7/038 ,  G03F7/039 ,  G03F7/30 ,  G03F7/38

CPC分类号： G03F7/0045 ,  C07C25/02 ,  C07C303/32 ,  C07C309/06 ,  C07C309/10 ,  C07C309/11 ,  C07C309/17 ,  C07C309/24 ,  C07C381/12 ,  C07D307/93 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/30 ,  G03F7/38 ,  C07C2603/74

摘要： Disclosed are a salt represented by formula (I), an acid generator and a resist composition:




wherein Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; R11 and R12 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; X0 represents *—CO—O—, *—O—CO—, etc.; L1 represents a single bond or a hydrocarbon group which may have a substituent; Ar represents an aromatic hydrocarbon group which may have a substituent; X1 represents an oxygen atom or a sulfur atom; R1 represents a halogen atom or a haloalkyl group; R2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m1 represents an integer of 1 to 6; m2 represents an integer of 0 to 4; and Z+ represents an organic cation.

公开(公告)号：US20240069442A1

公开(公告)日：2024-02-29

申请号：US18503696

申请日：2023-11-07

申请人： International Business Machines Corporation

发明人： Gerhard Ingmar Meijer ,  Valery Weber ,  Peter Willem Jan Staar

IPC分类号： G03F7/26 ,  C07C309/06 ,  C07C309/19 ,  C07C309/30 ,  C07C309/39 ,  C07C311/48 ,  C07D285/16 ,  C07F7/22 ,  C07F9/92 ,  C07F9/94 ,  G03F7/004

CPC分类号： G03F7/26 ,  C07C309/06 ,  C07C309/19 ,  C07C309/30 ,  C07C309/39 ,  C07C311/48 ,  C07D285/16 ,  C07F7/2208 ,  C07F9/92 ,  C07F9/94 ,  G03F7/0045 ,  C07C381/12 ,  C07C2602/42

摘要： The present invention relates to a novel photoacid generator compound cation, comprising an element having for 92 eV photons (extreme ultraviolet (EUV)) an absorption cross section of at least 0.5×107·cm2/mol; having at least two stable oxidation states; and selected from the elements of group 1 to group 15 of the periodic table of the elements. Additionally, the present invention relates to a photoacid generator comprising said photoacid generator compound cation and an anion. Furthermore, the present invention aims to provide a photoresist composition comprising said photoacid generator and an acid labile polymer. Finally, the present invention relates to a method of generating an acid using the photoresist composition and a method of forming a patterned materials feature on a substrate.

公开(公告)号：US20230411688A1

公开(公告)日：2023-12-21

申请号：US18030975

申请日：2021-11-30

申请人： LG ENERGY SOLUTION, LTD.

发明人： Jeong-Beom LEE ,  Ye-Eun KIM ,  Seok-Koo KIM ,  Je-Young KIM

IPC分类号： H01M10/0567 ,  H01M10/0568 ,  H01M10/0569 ,  H01M10/0525 ,  C07C309/65 ,  C07C309/06

CPC分类号： H01M10/0567 ,  H01M10/0568 ,  H01M10/0569 ,  H01M2300/0037 ,  C07C309/65 ,  C07C309/06 ,  H01M2300/0028 ,  H01M10/0525

摘要： An electrolyte for a lithium secondary battery including a wettability-improving additive having a trifluoromethylsulfonyl group. The electrolyte has reduced surface tension to improve the wettability of an electrode assembly with the electrolyte. Therefore, it is possible to ensure high electrolyte wettability even when the electrolyte includes a high-boiling point solvent or a high concentration of lithium salt.

公开(公告)号：US11681218B2

公开(公告)日：2023-06-20

申请号：US16272116

申请日：2019-02-11

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Tatsuro Masuyama ,  Yuichi Mukai ,  Koji Ichikawa

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/038 ,  C07D407/12 ,  C07D407/14 ,  C07D407/08 ,  G03F7/16 ,  C08G61/02 ,  C07C309/06 ,  C07D305/06 ,  C08L33/14

CPC分类号： G03F7/0045 ,  C07D407/12 ,  C07D407/14 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/168 ,  C07C309/06 ,  C07D305/06 ,  C07D407/08 ,  C08G61/025 ,  C08L33/14

摘要： The present invention can provide a salt capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition.
A resist composition comprising a resin including a structural unit having an acid-labile group, an acid generator and a compound represented by formula (I):




wherein, in formula (I),



R1 represents a hydrocarbon group having 1 to 36 carbon atoms which may have a substituent,
X1 represents *—CO—O—, *—O—CO—, *—O—CO—O— or *—O—, and * represents a bonding site to R1,
L1 represents a single bond or a hydrocarbon group having 1 to 36 carbon atoms which may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —S—, —CO— or —SO2—,
R2 represents a saturated hydrocarbon group having 1 to 12 carbon atoms,
u1 represents an integer of 0 to 2,
s1 represents 1 or 2,
t1 represents 0 or 1, in which s1+t1 is 1 or 2,
n represents an integer of 2 or more, and
a plurality of X1, L1, s1, t1, R2 and u1 each may be the same or different from each other.

公开(公告)号：US20180226094A1

公开(公告)日：2018-08-09

申请号：US15750323

申请日：2016-08-03

申请人： Dexerials Corporation

发明人： Hirofumi Kondo ,  Kouki Hatsuda ,  Nobuo Tano

IPC分类号： G11B5/725 ,  G11B5/71 ,  C10M105/72 ,  C10M105/70 ,  C07D233/58 ,  C07C309/06

CPC分类号： G11B5/725 ,  C07C309/06 ,  C07D233/58 ,  C07D487/04 ,  C10M105/70 ,  C10M105/72 ,  C10M133/40 ,  C10M133/46 ,  C10M135/10 ,  C10M159/12 ,  C10M2215/2245 ,  C10M2219/0406 ,  C10N2220/04 ,  C10N2230/10 ,  C10N2240/204 ,  G11B5/71

摘要： A lubricant which includes an ionic liquid including a conjugate acid and a conjugate base having 2 or more anions in a molecule of the conjugate base, wherein the conjugate acid has a group including a straight-chain hydrocarbon group having 6 or more carbon atoms, and a pKa of an acid that is a source of the conjugate base in acetonitrile is 10 or less.

公开(公告)号：US09944593B2

公开(公告)日：2018-04-17

申请号：US15027167

申请日：2014-09-30

申请人： SOLVAY SPECIALTY POLYMERS ITALY S.P.A.

发明人： Cristiano Monzani ,  Vito Tortelli

IPC分类号： C07C303/32 ,  C07D213/20 ,  C07C277/08 ,  C07C209/00 ,  C07D487/04 ,  C07C211/63 ,  C07C279/06 ,  C07C309/06

CPC分类号： C07C303/32 ,  C07C209/00 ,  C07C211/63 ,  C07C277/08 ,  C07C279/06 ,  C07C309/06 ,  C07D213/20 ,  C07D487/04 ,  C07C279/04 ,  C07C309/10

摘要： A process for the preparation of the fluoroalkyl sulfonate salt of a nitrogen-based organic base said process comprising the step of reacting a fluoroalkyl sulfonyl halide with an organic base selected from the group consisting of tertiary amines, pyridines, amidines and guanidines.

公开(公告)号：US09920272B2

公开(公告)日：2018-03-20

申请号：US15319697

申请日：2015-05-19

申请人： DEXERIALS CORPORATION

发明人： Hirofumi Kondo ,  Kouki Hatsuda ,  Makiya Ito ,  Nobuo Tano ,  Kyungsung Yun ,  Masayoshi Watanabe

IPC分类号： C10M105/72 ,  C07D233/58 ,  C07D285/06 ,  G11B5/725 ,  C10M159/12 ,  C10M105/70 ,  C07C309/06 ,  C07D285/16

CPC分类号： C10M105/72 ,  C07C309/06 ,  C07D233/58 ,  C07D285/16 ,  C10M105/70 ,  C10M159/12 ,  C10M2215/221 ,  C10M2215/2265 ,  C10M2219/044 ,  C10N2220/04 ,  C10N2230/02 ,  C10N2230/06 ,  C10N2230/08 ,  C10N2240/204 ,  C10N2250/121 ,  G11B5/725 ,  C10M2219/0406

摘要： A lubricant including an ionic liquid, which includes a conjugate acid (B+) and a conjugate base (X−), and is protic, wherein the ionic liquid is represented by the following general formula (1): where R1 and R2 each represent a hydrogen atom or R1 and R2 form a benzene ring together with carbon atoms to which R1 and R2 are bonded, and R3 represents a straight-chain hydrocarbon group having 10 or more carbon atoms in the general formula (1).

公开(公告)号：US20180012623A1

公开(公告)日：2018-01-11

申请号：US15633062

申请日：2017-06-26

申请人： Dexerials Corporation

发明人： Hirofumi Kondo ,  Kouki Hatsuda ,  Nobuo Tano ,  Pankaj Baghel

IPC分类号： G11B5/725 ,  C07D233/74 ,  C07C309/06

CPC分类号： G11B5/725 ,  C07C309/06 ,  C07C311/48 ,  C07D233/74 ,  C07D285/15

摘要： A lubricant including an ionic liquid including a conjugate base and a conjugate acid, wherein the conjugate acid includes a straight-chain hydrocarbon group having 6 or greater carbon atoms and a straight chain hydrocarbon group s having 6 or greater but 14 or less carbon atoms, and wherein a pKa of an acid that is a source of the conjugate base in acetonitrile is 10 or less.

公开(公告)号：US20170294675A1

公开(公告)日：2017-10-12

申请号：US15517349

申请日：2015-10-08

申请人： NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY

发明人： Keigo KUBOTA ,  Kenichi TERAMOTO ,  Rie OOYABU ,  Hajime MATSUMOTO

IPC分类号： H01M10/054 ,  C07C309/21 ,  C07C211/63 ,  H01M4/46 ,  C07F9/54 ,  C07C309/06 ,  H01M10/056

CPC分类号： H01M10/054 ,  C07C211/63 ,  C07C309/06 ,  C07C309/21 ,  C07F9/5407 ,  H01M4/381 ,  H01M4/466 ,  H01M4/483 ,  H01M10/056 ,  H01M10/0568 ,  H01M10/0569 ,  H01M2300/0045

摘要： This invention provides a non-aqueous electrolyte magnesium secondary battery comprising a positive electrode, a negative electrode, a separator, and a non-aqueous electrolyte, the non-aqueous electrolyte comprising [N(SO2CF3)2]− as an anion, and Mg2+ and/or an organic onium cation as a cation.