-
公开(公告)号:US3441892A
公开(公告)日:1969-04-29
申请号:US3441892D
申请日:1967-06-27
Applicant: WESTON INSTRUMENTS INC
Inventor: LUEDEMAN ROBERT T
IPC: H01C7/04
CPC classification number: H01C7/04
-
公开(公告)号:US3439181A
公开(公告)日:1969-04-15
申请号:US3439181D
申请日:1967-03-10
Applicant: WESTON INSTRUMENTS INC
Inventor: GOITIANDIA PETER , KELLY AUSTIN T
CPC classification number: H03K17/00 , Y10T307/461
-
公开(公告)号:US3418576A
公开(公告)日:1968-12-24
申请号:US37953464
申请日:1964-07-01
Applicant: WESTON INSTRUMENTS INC
Inventor: JOHN DEAN DEREK
-
44.Method of forming films of compounds having at least two anions by cathode sputtering 失效
Title translation: 通过阴极溅射形成具有至少两个阴离子的化合物的膜的方法公开(公告)号:US3418229A
公开(公告)日:1968-12-24
申请号:US46827065
申请日:1965-06-30
Applicant: WESTON INSTRUMENTS INC
Inventor: LAKSHMANAN TAVORATH K , MITCHELL JOSEPH M
CPC classification number: C23C14/0057 , C23C14/0629 , H01L21/02557 , H01L21/0256 , H01L21/02562 , H01L21/02631 , Y10S148/148 , Y10S148/158
-
公开(公告)号:US3396347A
公开(公告)日:1968-08-06
申请号:US61016367
申请日:1967-01-18
Applicant: WESTON INSTRUMENTS INC
Inventor: RICHMAN PETER L , TOWNER WALTER T , NORDAHL JOHN G
CPC classification number: H03B5/20 , H03B27/00 , H03B2200/0066
-
公开(公告)号:US3358259A
公开(公告)日:1967-12-12
申请号:US58194366
申请日:1966-09-26
Applicant: WESTON INSTRUMENTS INC
Inventor: KIRKENDALL WILLIAM D
IPC: H01C10/40
CPC classification number: H01C10/40
-
公开(公告)号:US3327228A
公开(公告)日:1967-06-20
申请号:US27033663
申请日:1963-04-03
Applicant: WESTON INSTRUMENTS INC
Inventor: DEAVENPORT JOE E , SEXTON DON W
IPC: H03M1/00
-
公开(公告)号:US3319534A
公开(公告)日:1967-05-16
申请号:US42891465
申请日:1965-01-29
Applicant: WESTON INSTRUMENTS INC
Inventor: BOONSHAFT JULIUS C
-
公开(公告)号:US3305768A
公开(公告)日:1967-02-21
申请号:US25858063
申请日:1963-02-14
Applicant: WESTON INSTRUMENTS INC
Inventor: KOEP KENNETH J
IPC: G01R1/28
CPC classification number: G01R1/28
-
公开(公告)号:US3232126A
公开(公告)日:1966-02-01
申请号:US35767564
申请日:1964-04-06
Applicant: WESTON INSTRUMENTS INC
Inventor: FRANK PUCCIARELLO FRANK , MICHAEL WAPNER
-
-
-
-
-
-
-
-
-