EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
    41.
    发明申请
    EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    曝光装置和装置制造方法

    公开(公告)号:US20100182583A1

    公开(公告)日:2010-07-22

    申请号:US12690503

    申请日:2010-01-20

    IPC分类号: G03B27/72 G03B27/32

    摘要: An exposure apparatus 1 comprises a collecting mirror 104 configured to collect emitted light from plasma 101, an illumination optical system which includes illumination system mirrors 201 to 204 and is configured to illuminate a reticle 301 light collected by the collecting mirror 104 using the second reflective optical element 201 to 204, and a projection optical system configured to project a pattern of the reticle 301 onto a wafer 308. At a predetermined temperature, a first wavelength where a reflectance of light entering the collecting mirror 104 or the illumination system mirrors 201 to 204 at a predetermined angle is peaked is shorter than a second wavelength where a reflectance of light in the projection optical system is peaked.

    摘要翻译: 曝光装置1包括被配置为收集来自等离子体101的发射光的收集镜104,照明光学系统,其包括照明系统镜201至204,并且被配置为使用第二反射光学照明收集反射镜104收集的标线片301的光 元件201至204,以及投影光学系统,其配置为将标线片301的图案投影到晶片308上。在预定温度下,入射到聚光镜104或照明系统的光的反射率的第一波长201至204 峰值的预定角度比投影光学系统中的光的反射率达到峰值的第二波长短。

    Exposure apparatus using blaze type diffraction grating to diffract EUV light and device manufacturing method using the exposure apparatus
    42.
    发明授权
    Exposure apparatus using blaze type diffraction grating to diffract EUV light and device manufacturing method using the exposure apparatus 有权
    使用火焰型衍射光栅的曝光装置衍射EUV光和使用曝光装置的装置制造方法

    公开(公告)号:US07436490B2

    公开(公告)日:2008-10-14

    申请号:US11103041

    申请日:2005-04-11

    申请人: Akira Miyake

    发明人: Akira Miyake

    IPC分类号: G03B27/72 G02B3/08

    摘要: This invention generally relates to an exposure apparatus and an exposure method using EUV light. In one preferred form of the present invention, the exposure apparatus is arranged to expose a substrate to a pattern of an original by use of extreme ultraviolet light, and it includes a blaze type diffraction grating disposed so that light from a plasma light source is incident thereon, and an optical system for directing extreme ultraviolet light from the blaze type diffraction grating to at least one of the original and the substrate.

    摘要翻译: 本发明一般涉及使用EUV光的曝光装置和曝光方法。 在本发明的一个优选形式中,曝光装置被布置为通过使用极紫外光将基板暴露于原稿的图案,并且其包括火焰型衍射光栅,其布置成使得来自等离子体光源的光入射 以及用于将来自火焰型衍射光栅的极紫外光引导到原始和基板中的至少一个的光学系统。

    MIRROR UNIT, METHOD OF PRODUCING THE SAME, AND EXPOSURE APPARATUS AND METHOD USING THE MIRROR UNIT
    43.
    发明申请
    MIRROR UNIT, METHOD OF PRODUCING THE SAME, AND EXPOSURE APPARATUS AND METHOD USING THE MIRROR UNIT 失效
    镜子单元,其制造方法和曝光装置以及使用镜子单元的方法

    公开(公告)号:US20080117512A1

    公开(公告)日:2008-05-22

    申请号:US11938439

    申请日:2007-11-12

    IPC分类号: G02B1/10

    摘要: Disclosed are a mirror unit and a method of producing the same. In one preferred embodiment, the mirror unit includes a mirror with a multilayered film formed on a substrate, the multilayered film having two materials periodically laminated in layers on the substrate, and a substrate deforming device for producing deformation of a shape of the substrate of the mirror, wherein, in the multilayered film, the number of laminated layers in a predetermined region of the substrate differs from that in another region of the substrate. A mirror unit producing method according to another preferred embodiment includes forming a multilayered film on a substrate, the multilayered film having two materials periodically laminated in layers on the substrate, providing substrate deforming means in association with the substrate, the deforming means having a function for producing deformation of the shape of the substrate, and partially removing the multilayered film.

    摘要翻译: 公开了镜单元及其制造方法。 在一个优选实施例中,反射镜单元包括具有在基板上形成的多层膜的反射镜,该多层膜具有在基板上周期层压的两种材料,以及用于产生基板的形状变形的基板变形装置 其特征在于,在所述多层膜中,所述基板的规定区域的层叠层数与所述基板的其他区域的层叠数不同。 根据另一优选实施例的镜单元制造方法包括在基板上形成多层膜,所述多层膜具有在基板上周期层压的两种材料,提供与基板相关联的基板变形装置,变形装置具有 产生基板形状的变形,并且部分地去除多层膜。

    LIGHT-EMITTING DEVICE
    45.
    发明申请
    LIGHT-EMITTING DEVICE 审中-公开
    发光装置

    公开(公告)号:US20080112165A1

    公开(公告)日:2008-05-15

    申请号:US11940769

    申请日:2007-11-15

    IPC分类号: F21V13/04 F21V7/04

    摘要: A lighting apparatus includes a substrate, a plurality of light-emitting chips and a light-emitting member. The substrate has a layer including a base material and a medium. The base material is formed of an inorganic material and includes a plurality of cells. The medium is provided in the cells and has a refractive index lower than that of the inorganic material. The light-emitting chips are made of a semiconductor material and mounted on the substrate. The light-emitting member includes a fluorescent material and is provided above the light-emitting chips.

    摘要翻译: 照明装置包括基板,多个发光芯片和发光部件。 基板具有包括基材和介质的层。 基材由无机材料形成,并且包括多个单元。 介质设置在电池中,折射率低于无机材料的折射率。 发光芯片由半导体材料制成并安装在基板上。 发光构件包括荧光材料,并且设置在发光芯片的上方。

    Spherical Active Carbon And Process For Producing The Same
    46.
    发明申请
    Spherical Active Carbon And Process For Producing The Same 审中-公开
    球形活性炭及其生产方法

    公开(公告)号:US20080063592A1

    公开(公告)日:2008-03-13

    申请号:US11597265

    申请日:2005-05-16

    IPC分类号: C01B31/08

    摘要: An active carbon produced from an infusible carbonaceous material as a raw material, which active carbon when used for prevention of automobile fuel evaporation, etc., would not cause any trouble attributed to dust generation, exhibiting reduced pressure loss; and a process for producing the same. There is provided a spherical active carbon produced from an infusible solid carbon material as a raw material, wherein providing that x represents an average particle diameter (mm) and y an MS hardness (%), when x is in the range of 0.5 to 20, y is ≧100×(1-0.8×1.45(0.3-x)). This spherical active carbon can be produced by a process comprising mixing a carbon material with a carbonizable binder; extruding the mixture into a strand form; carrying out rolling granulation so as to obtain a spherical form; rendering the same infusible under appropriate conditions corresponding to the particle size; and performing carbonization and thereafter activation under conditions appropriately restricting the contact with activation gas.

    摘要翻译: 从作为原料的不可渗入的碳质材料生成的活性碳,当用于防止汽车燃料蒸发等时使用的活性炭不会引起由于粉尘产生而引起的任何故障,表现出减小的压力损失; 及其制造方法。 提供由作为原料的不溶性固体碳材料制成的球状活性炭,其中x表示平均粒径(mm),y表示MS硬度(%),当x在0.5〜20的范围内时 ,y => 100×(1-0.8×1.4×(0.3-x))。 该球形活性炭可以通过包括将碳材料与可碳化粘合剂混合的方法来制备; 将混合物挤出成锭状; 进行轧制造粒,得到球形; 在与粒度对应的适当条件下使相同的不可渗透性; 进行碳酸化,然后在适当限制与活化气体接触的条件下进行活化。

    MULTILAYER MIRROR, EVALUATION METHOD, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD
    47.
    发明申请
    MULTILAYER MIRROR, EVALUATION METHOD, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD 失效
    多层反射镜,评价方法,曝光装置,装置制造方法

    公开(公告)号:US20070287076A1

    公开(公告)日:2007-12-13

    申请号:US11760155

    申请日:2007-06-08

    IPC分类号: G21K5/00 G03F1/00

    摘要: A multilayer mirror used for EUV light includes a substrate, a reflection layer for reflecting the EUV light, a stress compensation layer, formed between the substrate and the reflection layer, for compensating a deformation of the substrate by the reflection layer, wherein the substrate has a first area, in which the stress compensation layer is layered but no reflection layer is layered.

    摘要翻译: 用于EUV光的多层反射镜包括基板,用于反射EUV光的反射层,形成在基板和反射层之间的应力补偿层,用于补偿反射层对基板的变形,其中基板具有 其中应力补偿层被层叠但没有反射层的第一区域被层叠。

    X-ray illumination optical system and X-ray reduction exposure apparatus
    49.
    发明授权
    X-ray illumination optical system and X-ray reduction exposure apparatus 有权
    X射线照射光学系统和X射线照射装置

    公开(公告)号:US07133489B2

    公开(公告)日:2006-11-07

    申请号:US10930746

    申请日:2004-09-01

    IPC分类号: G21K5/00

    CPC分类号: G03F7/70058 G21K1/06

    摘要: An illumination optical system illuminates a surface to be illuminated. The illumination optical system includes a mirror having a surface effective to shape X-rays from a source into X-rays having an arcuate sectional shape, and an optical system for illuminating the surface to be illuminated, with the X-rays having an arcuate sectional shape from the mirror and in an oblique direction with respect to that surface.

    摘要翻译: 照明光学系统照亮要照明的表面。 照明光学系统包括具有有效地将来自源的X射线成形为具有弓形截面形状的X射线的表面的反射镜,以及用于照射被照射的表面的光学系统,其中X射线具有弓形截面 形状,并且相对于该表面倾斜。

    Method of screening cell death inhibitor
    50.
    发明授权
    Method of screening cell death inhibitor 失效
    筛选细胞死亡抑制剂的方法

    公开(公告)号:US07097990B2

    公开(公告)日:2006-08-29

    申请号:US10492477

    申请日:2002-08-08

    摘要: There is provided a method of screening for substance that inhibits cell death induced by activation of PARP, particularly a substance that is useful as a therapeutic and/or preventive agent for rheumatoid arthritis, neuronal death at the time of cerebral ischemia, cell death of the heart after myocardial infarction reperfusion, autoimmune destruction of β-cells of pancreatic islets of Langerhans, cell death after shock, or inflammatory reaction by immunocyte death. Also provided are a novel protein and a novel gene encoding the same. The aforementioned screening method comprises a step of allowing a test substance to contact a cell expressing an LTRPC2 protein under a conditions such that the LTRPC2 protein can be activated, and a step of analyzing inhibition of LTRPC2 protein activation. The aforementioned novel protein is a rat or mouse LTRPC2 protein, and the aforementioned novel gene is a rat or mouse LTRPC2 gene.

    摘要翻译: 提供了一种筛选抑制由PARP活化诱导的细胞死亡的物质的方法,特别是可用作类风湿性关节炎的治疗和/或预防剂,脑缺血时的神经元死亡,细胞死亡 心肌梗死再灌注后心脏,胰岛胰岛β细胞自身免疫破坏,休克后细胞死亡或免疫细胞死亡引起炎症反应。 还提供了一种新的蛋白质和编码该蛋白质的新基因。 上述筛选方法包括在使LTRPC2蛋白可被活化的条件下,使测试物质接触表达LTRPC2蛋白的细胞的步骤,以及分析LTRPC2蛋白活化的抑制的步骤。 上述新型蛋白质是大鼠或小鼠LTRPC2蛋白,上述新型基因是大鼠或小鼠LTRPC2基因。